DE112007001757T8 - Siliziumdioxid-Sol und Verfahren zu dessen Herstellung - Google Patents

Siliziumdioxid-Sol und Verfahren zu dessen Herstellung Download PDF

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Publication number
DE112007001757T8
DE112007001757T8 DE200711001757 DE112007001757T DE112007001757T8 DE 112007001757 T8 DE112007001757 T8 DE 112007001757T8 DE 200711001757 DE200711001757 DE 200711001757 DE 112007001757 T DE112007001757 T DE 112007001757T DE 112007001757 T8 DE112007001757 T8 DE 112007001757T8
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DE
Germany
Prior art keywords
preparation
silica sol
sol
silica
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Active
Application number
DE200711001757
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English (en)
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DE112007001757B4 (de
DE112007001757T5 (de
Inventor
Norio Kyoto Masuda
Shinsuke Kyoto Ota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuso Chemical Co Ltd
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Fuso Chemical Co Ltd
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Publication date
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Publication of DE112007001757T5 publication Critical patent/DE112007001757T5/de
Application granted granted Critical
Publication of DE112007001757T8 publication Critical patent/DE112007001757T8/de
Publication of DE112007001757B4 publication Critical patent/DE112007001757B4/de
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Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification
    • C01B33/1485—Stabilisation, e.g. prevention of gelling; Purification
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Colloid Chemistry (AREA)
DE112007001757.0T 2006-07-31 2007-07-25 Siliziumdioxid-Sol Active DE112007001757B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006209220 2006-07-31
JP2006-209220 2006-07-31
PCT/JP2007/064607 WO2008015943A1 (en) 2006-07-31 2007-07-25 Silica sol and process for production thereof

Publications (3)

Publication Number Publication Date
DE112007001757T5 DE112007001757T5 (de) 2009-06-18
DE112007001757T8 true DE112007001757T8 (de) 2009-11-26
DE112007001757B4 DE112007001757B4 (de) 2023-10-05

Family

ID=38997123

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112007001757.0T Active DE112007001757B4 (de) 2006-07-31 2007-07-25 Siliziumdioxid-Sol

Country Status (7)

Country Link
US (1) US8053479B2 (de)
JP (1) JP5270344B2 (de)
KR (1) KR101059677B1 (de)
CN (1) CN101495409B (de)
DE (1) DE112007001757B4 (de)
TW (1) TWI428277B (de)
WO (1) WO2008015943A1 (de)

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JP5905767B2 (ja) * 2012-04-17 2016-04-20 多摩化学工業株式会社 中性コロイダルシリカ分散液の分散安定化方法及び分散安定性に優れた中性コロイダルシリカ分散液
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KR101745676B1 (ko) * 2014-05-30 2017-06-09 주식회사 엘지화학 시아네이트계 수지에 대한 분산성이 우수한 실리카졸 조성물 및 이의 제조 방법
US10442899B2 (en) 2014-11-17 2019-10-15 Silbond Corporation Stable ethylsilicate polymers and method of making the same
JP6455142B2 (ja) * 2014-12-26 2019-01-23 三菱マテリアル株式会社 シリカゾル分散液及びシリカ多孔質膜形成用組成物
CN105439457B (zh) * 2015-06-09 2018-10-23 中国南玻集团股份有限公司 链状或网状硅溶胶及超亲水自清洁增透镀膜液及制备应用
CN107848811B (zh) * 2015-07-31 2021-11-05 福吉米株式会社 二氧化硅溶胶的制造方法
US10407609B2 (en) 2017-05-02 2019-09-10 Saudi Arabian Oil Company Chemical plugs for preventing wellbore treatment fluid losses
FR3069534B1 (fr) * 2017-07-28 2020-10-16 Commissariat Energie Atomique Preparation de nouveaux capteurs et filtres d'aldehydes et/ ou de cetones
KR101834858B1 (ko) 2017-10-18 2018-04-13 주식회사 넥스컴스 실리카 졸의 점도제어를 통한 내열용 복합재 제조방법
CN110197912B (zh) * 2018-02-24 2021-03-09 航天特种材料及工艺技术研究所 一种石墨双极板材料及制备方法
JP7234536B2 (ja) * 2018-03-26 2023-03-08 三菱ケミカル株式会社 シリカゾルの製造方法
JP2020075830A (ja) * 2018-11-07 2020-05-21 三菱ケミカル株式会社 シリカゾルの製造方法及びシリカゾル中の中間生成物の抑制方法
CN109678165B (zh) * 2019-01-03 2020-01-14 山东联科科技股份有限公司 一种叶黄素载体用高吸附性二氧化硅的制备方法
KR20210130146A (ko) 2019-02-21 2021-10-29 미쯔비시 케미컬 주식회사 실리카 입자와 그 제조 방법, 실리카졸, 연마 조성물, 연마 방법, 반도체 웨이퍼의 제조 방법 및 반도체 디바이스의 제조 방법
EP3929154A4 (de) 2019-02-21 2022-04-06 Mitsubishi Chemical Corporation Kieselsäureteilchen und verfahren zu ihrer herstellung, kieselsol, polierzusammensetzung, polierverfahren, verfahren zur herstellung von halbleiter-wafern und verfahren zur herstellung von halbleiterbauelementen
JP7400209B2 (ja) * 2019-05-07 2023-12-19 三菱ケミカル株式会社 シリカ粒子、シリカゾル、研磨組成物、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
JP7454930B2 (ja) * 2019-09-20 2024-03-25 株式会社フジミインコーポレーテッド シリカゾルの製造方法
JP2021116208A (ja) * 2020-01-28 2021-08-10 三菱ケミカル株式会社 シリカ粒子の製造方法、シリカゾルの製造方法、中間生成物の除去方法及び研磨方法
JP7379789B2 (ja) 2020-03-02 2023-11-15 株式会社タイテム コロイダルシリカスラリー
CN112938990A (zh) * 2021-03-09 2021-06-11 上海大学 一种高纯氧化硅溶胶及其制备方法
US11802232B2 (en) 2021-03-10 2023-10-31 Saudi Arabian Oil Company Polymer-nanofiller hydrogels
CN115611287B (zh) * 2021-07-16 2024-04-09 万华化学集团电子材料有限公司 一种可调控缔合度的超高纯硅溶胶制备方法、超高纯硅溶胶及其应用
CN115611286B (zh) * 2021-07-16 2024-04-09 万华化学集团电子材料有限公司 一种花生形超高纯硅溶胶的制备方法、超高纯硅溶胶及其应用
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Also Published As

Publication number Publication date
CN101495409A (zh) 2009-07-29
WO2008015943A1 (en) 2008-02-07
KR101059677B1 (ko) 2011-08-25
JP5270344B2 (ja) 2013-08-21
TW200806578A (en) 2008-02-01
US20090143490A1 (en) 2009-06-04
JPWO2008015943A1 (ja) 2009-12-24
CN101495409B (zh) 2011-07-27
DE112007001757B4 (de) 2023-10-05
KR20090020678A (ko) 2009-02-26
TWI428277B (zh) 2014-03-01
US8053479B2 (en) 2011-11-08
DE112007001757T5 (de) 2009-06-18

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8181 Inventor (new situation)

Inventor name: MASUDA, NORIO, KYOTO, FUKUCHIYAMA-SHI, JP

Inventor name: KIYOHARA, YOSHIHIRO, OSAKA, JP

Inventor name: OTA, SHINSUKE, KYOTO, FUKUCHIYAMA-SHI, JP

8181 Inventor (new situation)

Inventor name: MASUDA, NORIO, KYOTO, FUKUCHIYAMA-SHI, JP

Inventor name: OTA, SHINSUKE, KYOTO, FUKUCHIYAMA-SHI, JP

8696 Reprint of erroneous front page
OP8 Request for examination as to paragraph 44 patent law
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division