DE112004001947B4 - Vorrichtung zum Herstellen eines Einkristallhalbleiters - Google Patents
Vorrichtung zum Herstellen eines Einkristallhalbleiters Download PDFInfo
- Publication number
- DE112004001947B4 DE112004001947B4 DE112004001947.8T DE112004001947T DE112004001947B4 DE 112004001947 B4 DE112004001947 B4 DE 112004001947B4 DE 112004001947 T DE112004001947 T DE 112004001947T DE 112004001947 B4 DE112004001947 B4 DE 112004001947B4
- Authority
- DE
- Germany
- Prior art keywords
- wire
- chamber
- producing
- melt
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 59
- 230000008878 coupling Effects 0.000 claims abstract description 45
- 238000010168 coupling process Methods 0.000 claims abstract description 45
- 238000005859 coupling reaction Methods 0.000 claims abstract description 45
- 239000013078 crystal Substances 0.000 claims abstract description 43
- 239000000155 melt Substances 0.000 claims abstract description 32
- 238000010438 heat treatment Methods 0.000 claims abstract description 25
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 9
- 239000010937 tungsten Substances 0.000 claims abstract description 9
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 4
- 239000010935 stainless steel Substances 0.000 claims abstract description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 3
- 239000011733 molybdenum Substances 0.000 claims abstract description 3
- 238000004804 winding Methods 0.000 claims description 9
- 239000011162 core material Substances 0.000 claims description 7
- 230000006735 deficit Effects 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 20
- 229910052710 silicon Inorganic materials 0.000 description 20
- 239000010703 silicon Substances 0.000 description 20
- 229960005486 vaccine Drugs 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 19
- 239000002994 raw material Substances 0.000 description 11
- 230000006866 deterioration Effects 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000004873 anchoring Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 238000011081 inoculation Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000012774 insulation material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000002255 vaccination Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/32—Seed holders, e.g. chucks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/911—Seed or rod holders
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1052—Seed pulling including a sectioned crucible [e.g., double crucible, baffle]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003353962A JP4362760B2 (ja) | 2003-10-14 | 2003-10-14 | 半導体単結晶製造装置 |
| JP2003-353962 | 2003-10-14 | ||
| PCT/JP2004/015050 WO2005035839A1 (ja) | 2003-10-14 | 2004-10-13 | 半導体単結晶製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE112004001947T5 DE112004001947T5 (de) | 2006-08-24 |
| DE112004001947B4 true DE112004001947B4 (de) | 2017-02-09 |
Family
ID=34431176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE112004001947.8T Expired - Lifetime DE112004001947B4 (de) | 2003-10-14 | 2004-10-13 | Vorrichtung zum Herstellen eines Einkristallhalbleiters |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7413609B2 (https=) |
| JP (1) | JP4362760B2 (https=) |
| DE (1) | DE112004001947B4 (https=) |
| TW (1) | TWI261076B (https=) |
| WO (1) | WO2005035839A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010180072A (ja) * | 2009-02-03 | 2010-08-19 | Shin Etsu Handotai Co Ltd | 単結晶製造装置 |
| CN113061974B (zh) * | 2021-03-23 | 2022-02-15 | 浙江晶阳机电股份有限公司 | 一种真空直拉炉生产机构及其拉直取晶方法 |
| US12559861B2 (en) * | 2021-06-03 | 2026-02-24 | The 13Th Research Institute Of China Electronics Technology Group Corporation | Preparation device and method for semi-insulating indium phosphide |
| CN120006375B (zh) * | 2025-04-18 | 2025-07-01 | 常州益群新能源科技有限公司 | 一种能同时生产多根晶体的硅芯炉设备 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH048382A (ja) * | 1990-04-26 | 1992-01-13 | Kazuo Saito | 履物型遊戯乗物 |
| JPH08119790A (ja) * | 1994-10-14 | 1996-05-14 | Komatsu Electron Metals Co Ltd | 半導体単結晶引き上げ装置 |
| US6340391B1 (en) * | 1998-12-28 | 2002-01-22 | Shin-Etsu Handotai Co. | Method for producing single crystal and pulling device |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5928560A (ja) | 1982-08-06 | 1984-02-15 | Nippon Steel Corp | 表面性状と耐食性の優れたステンレス鋼 |
| JPS5928560U (ja) * | 1982-08-12 | 1984-02-22 | 東芝機械株式会社 | 単結晶引上機のシ−ドホルダ支持装置 |
| EP0437775B1 (en) * | 1989-12-22 | 1995-03-08 | Shin-Etsu Handotai Company Limited | Apparatus for producing Czochralski-grown single crystals |
| JP3109564B2 (ja) | 1995-03-27 | 2000-11-20 | 大倉電気株式会社 | 成長結晶体の重量測定装置 |
| JP2940439B2 (ja) * | 1995-06-10 | 1999-08-25 | 信越半導体株式会社 | 単結晶引上げ装置 |
| JP2949571B2 (ja) | 1996-01-31 | 1999-09-13 | 住友金属工業株式会社 | 単結晶成長装置 |
| JP3596226B2 (ja) * | 1997-03-17 | 2004-12-02 | 信越半導体株式会社 | 単結晶保持装置 |
| JP3964002B2 (ja) * | 1997-06-02 | 2007-08-22 | Sumco Techxiv株式会社 | 単結晶保持装置及び単結晶保持方法 |
| US6183556B1 (en) * | 1998-10-06 | 2001-02-06 | Seh-America, Inc. | Insulating and warming shield for a seed crystal and seed chuck |
-
2003
- 2003-10-14 JP JP2003353962A patent/JP4362760B2/ja not_active Expired - Lifetime
-
2004
- 2004-10-08 TW TW093130512A patent/TWI261076B/zh not_active IP Right Cessation
- 2004-10-13 US US10/575,481 patent/US7413609B2/en not_active Expired - Lifetime
- 2004-10-13 WO PCT/JP2004/015050 patent/WO2005035839A1/ja not_active Ceased
- 2004-10-13 DE DE112004001947.8T patent/DE112004001947B4/de not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH048382A (ja) * | 1990-04-26 | 1992-01-13 | Kazuo Saito | 履物型遊戯乗物 |
| JPH08119790A (ja) * | 1994-10-14 | 1996-05-14 | Komatsu Electron Metals Co Ltd | 半導体単結晶引き上げ装置 |
| US6340391B1 (en) * | 1998-12-28 | 2002-01-22 | Shin-Etsu Handotai Co. | Method for producing single crystal and pulling device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005119891A (ja) | 2005-05-12 |
| DE112004001947T5 (de) | 2006-08-24 |
| US20070051303A1 (en) | 2007-03-08 |
| WO2005035839A1 (ja) | 2005-04-21 |
| TWI261076B (en) | 2006-09-01 |
| TW200516179A (en) | 2005-05-16 |
| JP4362760B2 (ja) | 2009-11-11 |
| US7413609B2 (en) | 2008-08-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69207454T2 (de) | Verfahren und Vorrichtung für die Herstellung eines Silizium-Einkristalls | |
| EP0567008B1 (de) | Verfahren zur Züchtung mehrerer Einkristalle und Vorrichtung zu dessen Anwendung | |
| DE3872745T2 (de) | Einkristallstab, verfahren und vorrichtung zu seiner ziehung aus einer schmelze. | |
| DE112013006489B4 (de) | Einkristallblock, Vorrichtungen und Verfahren zur Herstellung desselben | |
| DE102019109544B4 (de) | SiC-Einkristall-Züchtungsvorrichtung und Verfahren zur Züchtung eines SiC-Einkristalls | |
| DE4204777A1 (de) | Vorrichtung und verfahren zum zuechten von einkristallen | |
| DE112017007122B4 (de) | Verfahren zur Herstellung von Silizium-Monokristall, Strömungsausrichtungselement und Monokristall-Ziehvorrichtung | |
| DE112014000786T5 (de) | Abkühlgeschwindigkeitssteuervorrichtung und Ingotzuchtvorrichtung umfassend dieselbe | |
| DE112009003601B4 (de) | Einkristall-Herstellungsanlage und Verfahren zur Herstellung elnes Einkristalls | |
| DE112009001431B4 (de) | Einkristall-Herstellungsvorrichtung und Einkristall-Herstellungsverfahren | |
| AT391887B (de) | Verfahren zum herstellen von kristallinen saphirrohren und einrichtung zu dessen durchfuehrung | |
| DE69414652T2 (de) | Verbessertes Verfahren zur Bildung von Siliconkristallen | |
| DE102004058547B4 (de) | Verfahren und eine Vorrichtung zur Herstellung von Einkristallen mit großem Durchmesser | |
| DE112004001947B4 (de) | Vorrichtung zum Herstellen eines Einkristallhalbleiters | |
| DE102009024473B4 (de) | Verfahren zum Ziehen eines Einkristalls aus Silizium und danach hergestellter Einkristall | |
| DE112006002850B4 (de) | Vorrichtung und Verfahren zur Herstellung von Halbleitereinkristallen | |
| DE112022002251T5 (de) | Quartztiegel und kristallziehvorrichtung | |
| DE10236023A1 (de) | Herstellungsverfahren für Silizium-Einkristallwafer und Silizium-Einkristallwafer | |
| DE4442239A1 (de) | Vorrichtung und Verfahren zur Herstellung von Einkristallen | |
| DE112017003016T5 (de) | Verfahren zur Herstellung von Silicium-Einkristall | |
| DE3215620C2 (de) | Verfahren und Vorrichtung zum Herstellen von einkristallinem Silizium | |
| DE19781967B3 (de) | Verfahren und Vorrichtung zum Ziehen eines Einkristalls | |
| DE69710146T2 (de) | Kristallhaltevorrichtung | |
| DE112009000986T5 (de) | Einkristall-Wachstumsverfahren und Einkristall-Ziehvorrichtung | |
| DE19514412A1 (de) | Doppeltiegel zum Aufwachsen eines Silizium-Einkristalls |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed |
Effective date: 20110428 |
|
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R081 | Change of applicant/patentee |
Owner name: SUMCO TECHXIV CORP., OMURA-SHI, JP Free format text: FORMER OWNER: KOMATSU DENSHI KINZOKU K.K., HIRATSUKA, KANAGAWA, JP |
|
| R082 | Change of representative |
Representative=s name: BOEHMERT & BOEHMERT ANWALTSPARTNERSCHAFT MBB -, DE |
|
| R020 | Patent grant now final | ||
| R071 | Expiry of right |