DE1075574B - Verfahren zum Reinigen von Silan - Google Patents
Verfahren zum Reinigen von SilanInfo
- Publication number
- DE1075574B DE1075574B DE1958I0015377 DEI0015377A DE1075574B DE 1075574 B DE1075574 B DE 1075574B DE 1958I0015377 DE1958I0015377 DE 1958I0015377 DE I0015377 A DEI0015377 A DE I0015377A DE 1075574 B DE1075574 B DE 1075574B
- Authority
- DE
- Germany
- Prior art keywords
- silane
- water vapor
- amount
- mixture
- silane gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims description 34
- 229910000077 silane Inorganic materials 0.000 title claims description 34
- 238000000034 method Methods 0.000 title claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 239000000203 mixture Substances 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 150000001639 boron compounds Chemical class 0.000 claims description 7
- 238000003860 storage Methods 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000746 purification Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 239000013078 crystal Substances 0.000 description 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/046—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB2891557A GB832570A (en) | 1957-09-13 | 1957-09-13 | Improvements in or relating to the purification of silane used in production of silicon |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1075574B true DE1075574B (de) | 1960-02-18 |
Family
ID=10283247
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE1958I0015377 Pending DE1075574B (de) | 1957-09-13 | 1958-09-09 | Verfahren zum Reinigen von Silan |
Country Status (5)
| Country | Link |
|---|---|
| BE (1) | BE571148A (enrdf_load_stackoverflow) |
| CH (1) | CH380706A (enrdf_load_stackoverflow) |
| DE (1) | DE1075574B (enrdf_load_stackoverflow) |
| FR (2) | FR1182797A (enrdf_load_stackoverflow) |
| GB (1) | GB832570A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3050366A (en) * | 1959-07-15 | 1962-08-21 | Du Pont | Production of silane by the use of a zinc catalyst |
| CN110950382B (zh) * | 2018-09-26 | 2022-03-15 | 紫石能源有限公司 | 砷烷的制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1028543B (de) | 1954-12-17 | 1958-04-24 | Siemens Ag | Verfahren zum Reinigen von mit Wasser Gel bildenden Halogeniden, insbesondere des Germaniums oder Siliciums, vorzugsweise fuer die Herstellung von Halbleiterstoffen |
-
1957
- 1957-09-13 GB GB2891557A patent/GB832570A/en not_active Expired
- 1957-09-16 FR FR1182797D patent/FR1182797A/fr not_active Expired
-
1958
- 1958-09-05 CH CH6362058A patent/CH380706A/de unknown
- 1958-09-09 FR FR774092A patent/FR74159E/fr not_active Expired
- 1958-09-09 DE DE1958I0015377 patent/DE1075574B/de active Pending
- 1958-09-12 BE BE571148D patent/BE571148A/xx unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1028543B (de) | 1954-12-17 | 1958-04-24 | Siemens Ag | Verfahren zum Reinigen von mit Wasser Gel bildenden Halogeniden, insbesondere des Germaniums oder Siliciums, vorzugsweise fuer die Herstellung von Halbleiterstoffen |
Also Published As
| Publication number | Publication date |
|---|---|
| CH380706A (de) | 1964-08-15 |
| FR1182797A (fr) | 1959-06-29 |
| BE571148A (enrdf_load_stackoverflow) | 1959-03-12 |
| GB832570A (en) | 1960-04-13 |
| FR74159E (fr) | 1960-11-07 |
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