DE10238463A1 - Stabilisierte, wässerige Siliciumdioxid-Dispersion - Google Patents

Stabilisierte, wässerige Siliciumdioxid-Dispersion Download PDF

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Publication number
DE10238463A1
DE10238463A1 DE10238463A DE10238463A DE10238463A1 DE 10238463 A1 DE10238463 A1 DE 10238463A1 DE 10238463 A DE10238463 A DE 10238463A DE 10238463 A DE10238463 A DE 10238463A DE 10238463 A1 DE10238463 A1 DE 10238463A1
Authority
DE
Germany
Prior art keywords
cation
silicon dioxide
aqueous dispersion
dispersion according
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE10238463A
Other languages
German (de)
English (en)
Inventor
Wolfgang Dr. Lortz
Christoph Dr. Batz-Sohn
Gabriele Perlet
Werner Will
Gerrit Dr. Schneider
Peter Dr. Neugebauer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa GmbH filed Critical Degussa GmbH
Priority to DE10238463A priority Critical patent/DE10238463A1/de
Priority to KR1020057002730A priority patent/KR100772258B1/ko
Priority to AU2003250188A priority patent/AU2003250188A1/en
Priority to PL373839A priority patent/PL203972B1/pl
Priority to JP2004530060A priority patent/JP4448030B2/ja
Priority to CNB038198096A priority patent/CN100447082C/zh
Priority to PCT/EP2003/008333 priority patent/WO2004018359A1/fr
Priority to EP03792235A priority patent/EP1529014A1/fr
Priority to CA002496467A priority patent/CA2496467C/fr
Priority to US10/644,755 priority patent/US7374787B2/en
Publication of DE10238463A1 publication Critical patent/DE10238463A1/de
Priority to NO20051492A priority patent/NO20051492L/no
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/149—Coating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3045—Treatment with inorganic compounds
    • C09C1/3054—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1436—Composite particles, e.g. coated particles
    • C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
DE10238463A 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion Ceased DE10238463A1 (de)

Priority Applications (11)

Application Number Priority Date Filing Date Title
DE10238463A DE10238463A1 (de) 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion
CNB038198096A CN100447082C (zh) 2002-08-22 2003-07-29 稳定的含水二氧化硅分散液
AU2003250188A AU2003250188A1 (en) 2002-08-22 2003-07-29 Stabilized, aqueous silicon dioxide dispersion
PL373839A PL203972B1 (pl) 2002-08-22 2003-07-29 Wodna dyspersja proszkowego dwutlenku krzemu, sposób wytwarzania wodnej dyspersji, proszek i zastosowanie dyspersji
JP2004530060A JP4448030B2 (ja) 2002-08-22 2003-07-29 安定化された水性二酸化ケイ素分散液
KR1020057002730A KR100772258B1 (ko) 2002-08-22 2003-07-29 안정화된 수성 실리콘 디옥사이드 분산액
PCT/EP2003/008333 WO2004018359A1 (fr) 2002-08-22 2003-07-29 Dispersion de dioxyde silicium aqueuse stabilisee
EP03792235A EP1529014A1 (fr) 2002-08-22 2003-07-29 Dispersion de dioxyde silicium aqueuse stabilisee
CA002496467A CA2496467C (fr) 2002-08-22 2003-07-29 Dispersion de dioxyde silicium aqueuse stabilisee
US10/644,755 US7374787B2 (en) 2002-08-22 2003-08-21 Stabilized, aqueous silicon dioxide dispersion
NO20051492A NO20051492L (no) 2002-08-22 2005-03-21 Stabilisert, vandig silisiumdioksiddispergering.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10238463A DE10238463A1 (de) 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion

Publications (1)

Publication Number Publication Date
DE10238463A1 true DE10238463A1 (de) 2004-03-04

Family

ID=31197230

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10238463A Ceased DE10238463A1 (de) 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion

Country Status (10)

Country Link
EP (1) EP1529014A1 (fr)
JP (1) JP4448030B2 (fr)
KR (1) KR100772258B1 (fr)
CN (1) CN100447082C (fr)
AU (1) AU2003250188A1 (fr)
CA (1) CA2496467C (fr)
DE (1) DE10238463A1 (fr)
NO (1) NO20051492L (fr)
PL (1) PL203972B1 (fr)
WO (1) WO2004018359A1 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT500776A1 (de) * 2004-08-18 2006-03-15 Wagner Friedrich Rutschhemmende höhenaufbauende strukturbeschichtung
WO2006097240A2 (fr) 2005-03-17 2006-09-21 Wacker Chemie Ag Dispersions aqueuses d'acides siliciques partiellement hydrophobes
WO2007079841A1 (fr) * 2005-12-23 2007-07-19 Deutsche Institute Für Textil- Und Faserforschung Denkendorf Particules à l'échelle nanométrique à base de sio2 et oxydes mixtes correspondants, leur production et leur utilisation pour le traitement de materiaux textiles
WO2008046854A2 (fr) * 2006-10-20 2008-04-24 Evonik Degussa Gmbh Dispersions aqueuses stables de dioxyde de silicium
AT502282B1 (de) * 2005-07-26 2008-12-15 Friedrich Wagner Rutschhemmender sprühauftrag für bewegliche bodenbeläge
DE102008041466A1 (de) 2008-08-22 2010-02-25 Wacker Chemie Ag Wäßrige Dispersionen hydrophober Kieselsäuren
EP2222793B1 (fr) * 2007-11-19 2017-10-11 Grace GmbH & Co. KG Particules anticorrosion

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200613485A (en) * 2004-03-22 2006-05-01 Kao Corp Polishing composition
DE102004021092A1 (de) 2004-04-29 2005-11-24 Degussa Ag Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
JPWO2006046463A1 (ja) * 2004-10-28 2008-05-22 コニカミノルタフォトイメージング株式会社 カチオン性微粒子分散体及びインクジェット記録用紙
JP2007258606A (ja) * 2006-03-24 2007-10-04 Fujifilm Corp 化学的機械的研磨用研磨液
JP5426373B2 (ja) * 2006-07-12 2014-02-26 キャボット マイクロエレクトロニクス コーポレイション 金属含有基材のためのｃｍｐ法
DE102007059861A1 (de) * 2007-12-12 2009-06-18 Evonik Degussa Gmbh Verfahren zur Herstellung von Siliciumdioxid-Dispersionen
CN101838479B (zh) * 2010-03-19 2013-11-20 福建师范大学 一种可分散超细二氧化硅的制备方法
JP6414547B2 (ja) * 2013-06-10 2018-10-31 日産化学株式会社 シリカゾル及びシリカゾルの製造方法
CN105778775B (zh) * 2014-12-23 2021-03-02 安集微电子（上海）有限公司 一种中性胶体二氧化硅的制备方法
CN104830300A (zh) * 2015-04-30 2015-08-12 河南大学 一种小粒径纳米聚硅乳液及其制备方法
CN108751204A (zh) * 2018-05-14 2018-11-06 江苏联瑞新材料股份有限公司 一种亚微米二氧化硅分散液的制备方法
CN111777949A (zh) * 2020-07-13 2020-10-16 长沙金硅地环保科技有限公司 一种高分子纳米硅与水溶胶聚合物及其应用
JP2022067800A (ja) * 2020-10-21 2022-05-09 山口精研工業株式会社 シリカ分散液、及び研磨剤組成物
CN114044520B (zh) * 2021-11-29 2024-06-28 苏州西丽卡电子材料有限公司 一种高铝超纯合成石英砂的制备方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892797A (en) * 1956-02-17 1959-06-30 Du Pont Process for modifying the properties of a silica sol and product thereof
US3007878A (en) * 1956-11-01 1961-11-07 Du Pont Aquasols of positively-charged coated silica particles and their production
SE501214C2 (sv) * 1992-08-31 1994-12-12 Eka Nobel Ab Silikasol samt förfarande för framställning av papper under användande av solen
JP4704564B2 (ja) * 1998-10-02 2011-06-15 キャボット コーポレイション シリカ分散体、コーティング組成物、及び記録媒体

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT500776A1 (de) * 2004-08-18 2006-03-15 Wagner Friedrich Rutschhemmende höhenaufbauende strukturbeschichtung
AT500776B1 (de) * 2004-08-18 2008-12-15 Wagner Friedrich Verwendung einer zusammensetzung zum aufbringen einer rutschhemmenden, höhenaufbauenden strukturbeschichtung
WO2006097240A2 (fr) 2005-03-17 2006-09-21 Wacker Chemie Ag Dispersions aqueuses d'acides siliciques partiellement hydrophobes
AT502282B1 (de) * 2005-07-26 2008-12-15 Friedrich Wagner Rutschhemmender sprühauftrag für bewegliche bodenbeläge
WO2007079841A1 (fr) * 2005-12-23 2007-07-19 Deutsche Institute Für Textil- Und Faserforschung Denkendorf Particules à l'échelle nanométrique à base de sio2 et oxydes mixtes correspondants, leur production et leur utilisation pour le traitement de materiaux textiles
WO2008046854A2 (fr) * 2006-10-20 2008-04-24 Evonik Degussa Gmbh Dispersions aqueuses stables de dioxyde de silicium
WO2008046854A3 (fr) * 2006-10-20 2008-06-12 Evonik Degussa Gmbh Dispersions aqueuses stables de dioxyde de silicium
US8545618B2 (en) 2006-10-20 2013-10-01 Evonik Degussa Gmbh Stable aqueous silica dispersions
EP2222793B1 (fr) * 2007-11-19 2017-10-11 Grace GmbH & Co. KG Particules anticorrosion
DE102008041466A1 (de) 2008-08-22 2010-02-25 Wacker Chemie Ag Wäßrige Dispersionen hydrophober Kieselsäuren

Also Published As

Publication number Publication date
JP4448030B2 (ja) 2010-04-07
CA2496467A1 (fr) 2004-03-04
PL373839A1 (en) 2005-09-19
CN1675128A (zh) 2005-09-28
WO2004018359A1 (fr) 2004-03-04
NO20051492L (no) 2005-05-13
KR100772258B1 (ko) 2007-11-01
PL203972B1 (pl) 2009-11-30
CN100447082C (zh) 2008-12-31
EP1529014A1 (fr) 2005-05-11
CA2496467C (fr) 2008-12-09
JP2005536426A (ja) 2005-12-02
AU2003250188A1 (en) 2004-03-11
KR20050050646A (ko) 2005-05-31

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8127 New person/name/address of the applicant

Owner name: DEGUSSA GMBH, 40474 DUESSELDORF, DE

8127 New person/name/address of the applicant

Owner name: EVONIK DEGUSSA GMBH, 40474 DUESSELDORF, DE

8131 Rejection