KR100772258B1 - 안정화된 수성 실리콘 디옥사이드 분산액 - Google Patents

안정화된 수성 실리콘 디옥사이드 분산액 Download PDF

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Publication number
KR100772258B1
KR100772258B1 KR1020057002730A KR20057002730A KR100772258B1 KR 100772258 B1 KR100772258 B1 KR 100772258B1 KR 1020057002730 A KR1020057002730 A KR 1020057002730A KR 20057002730 A KR20057002730 A KR 20057002730A KR 100772258 B1 KR100772258 B1 KR 100772258B1
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KR
South Korea
Prior art keywords
silicon dioxide
dispersion
cation
providing compound
aqueous dispersion
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KR1020057002730A
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English (en)
Korean (ko)
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KR20050050646A (ko
Inventor
볼프강 롤츠
크리스포프 바츠-손
가브리에레 페르레트
베르너 빌
게리트 쉬나이더
페터 노이게바우어
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데구사 게엠베하
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Publication of KR20050050646A publication Critical patent/KR20050050646A/ko
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Publication of KR100772258B1 publication Critical patent/KR100772258B1/ko

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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146After-treatment of sols
    • C01B33/149Coating
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3045Treatment with inorganic compounds
    • C09C1/3054Coating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1436Composite particles, e.g. coated particles
    • C09K3/1445Composite particles, e.g. coated particles the coating consisting exclusively of metals
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1454Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463Aqueous liquid suspensions
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Composite Materials (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
KR1020057002730A 2002-08-22 2003-07-29 안정화된 수성 실리콘 디옥사이드 분산액 KR100772258B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10238463A DE10238463A1 (de) 2002-08-22 2002-08-22 Stabilisierte, wässerige Siliciumdioxid-Dispersion
DE10238463.0 2002-08-22

Publications (2)

Publication Number Publication Date
KR20050050646A KR20050050646A (ko) 2005-05-31
KR100772258B1 true KR100772258B1 (ko) 2007-11-01

Family

ID=31197230

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020057002730A KR100772258B1 (ko) 2002-08-22 2003-07-29 안정화된 수성 실리콘 디옥사이드 분산액

Country Status (10)

Country Link
EP (1) EP1529014A1 (fr)
JP (1) JP4448030B2 (fr)
KR (1) KR100772258B1 (fr)
CN (1) CN100447082C (fr)
AU (1) AU2003250188A1 (fr)
CA (1) CA2496467C (fr)
DE (1) DE10238463A1 (fr)
NO (1) NO20051492L (fr)
PL (1) PL203972B1 (fr)
WO (1) WO2004018359A1 (fr)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200613485A (en) * 2004-03-22 2006-05-01 Kao Corp Polishing composition
DE102004021092A1 (de) 2004-04-29 2005-11-24 Degussa Ag Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
AT500776B1 (de) * 2004-08-18 2008-12-15 Wagner Friedrich Verwendung einer zusammensetzung zum aufbringen einer rutschhemmenden, höhenaufbauenden strukturbeschichtung
AT502282B1 (de) * 2005-07-26 2008-12-15 Friedrich Wagner Rutschhemmender sprühauftrag für bewegliche bodenbeläge
JPWO2006046463A1 (ja) * 2004-10-28 2008-05-22 コニカミノルタフォトイメージング株式会社 カチオン性微粒子分散体及びインクジェット記録用紙
DE102005012409A1 (de) 2005-03-17 2006-09-21 Wacker Chemie Ag Wäßrige Dispersionen teilhydrophober Kieselsäuren
DE102005062606A1 (de) * 2005-12-23 2007-07-05 Deutsche Institute Für Textil- Und Faserforschung Denkendorf Nanoskalige Teilchen auf der Basis von SiO2 und Mischoxiden hiervon, deren Herstellung und Verwendung zur Behandlung textiler Materialien
JP2007258606A (ja) * 2006-03-24 2007-10-04 Fujifilm Corp 化学的機械的研磨用研磨液
MY153666A (en) 2006-07-12 2015-03-13 Cabot Microelectronics Corporations Cmp method for metal-containing substrates
DE102006049526A1 (de) * 2006-10-20 2008-04-24 Evonik Degussa Gmbh Stabile wässrige Dispersionen von Siliciumdioxid
CN101918500B (zh) * 2007-11-19 2015-05-20 格雷斯股份有限两合公司 防腐蚀颗粒
DE102007059861A1 (de) * 2007-12-12 2009-06-18 Evonik Degussa Gmbh Verfahren zur Herstellung von Siliciumdioxid-Dispersionen
DE102008041466A1 (de) 2008-08-22 2010-02-25 Wacker Chemie Ag Wäßrige Dispersionen hydrophober Kieselsäuren
CN101838479B (zh) * 2010-03-19 2013-11-20 福建师范大学 一种可分散超细二氧化硅的制备方法
US10239758B2 (en) 2013-06-10 2019-03-26 Nissan Chemical Industries, Ltd. Silica sol and method for producing silica sol
CN105778775B (zh) * 2014-12-23 2021-03-02 安集微电子(上海)有限公司 一种中性胶体二氧化硅的制备方法
CN104830300A (zh) * 2015-04-30 2015-08-12 河南大学 一种小粒径纳米聚硅乳液及其制备方法
CN108751204A (zh) * 2018-05-14 2018-11-06 江苏联瑞新材料股份有限公司 一种亚微米二氧化硅分散液的制备方法
CN111777949A (zh) * 2020-07-13 2020-10-16 长沙金硅地环保科技有限公司 一种高分子纳米硅与水溶胶聚合物及其应用
JP2022067800A (ja) * 2020-10-21 2022-05-09 山口精研工業株式会社 シリカ分散液、及び研磨剤組成物
CN114044520B (zh) * 2021-11-29 2024-06-28 苏州西丽卡电子材料有限公司 一种高铝超纯合成石英砂的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892797A (en) * 1956-02-17 1959-06-30 Du Pont Process for modifying the properties of a silica sol and product thereof
US3007878A (en) * 1956-11-01 1961-11-07 Du Pont Aquasols of positively-charged coated silica particles and their production
US5603805A (en) * 1992-08-31 1997-02-18 Eka Nobel, Ab Silica sols and use of the sols
WO2000020221A1 (fr) * 1998-10-02 2000-04-13 Cabot Corporation Dispersion de silice, composition de revetement et support d'enregistrement

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892797A (en) * 1956-02-17 1959-06-30 Du Pont Process for modifying the properties of a silica sol and product thereof
US3007878A (en) * 1956-11-01 1961-11-07 Du Pont Aquasols of positively-charged coated silica particles and their production
US5603805A (en) * 1992-08-31 1997-02-18 Eka Nobel, Ab Silica sols and use of the sols
WO2000020221A1 (fr) * 1998-10-02 2000-04-13 Cabot Corporation Dispersion de silice, composition de revetement et support d'enregistrement

Also Published As

Publication number Publication date
PL373839A1 (en) 2005-09-19
AU2003250188A1 (en) 2004-03-11
WO2004018359A1 (fr) 2004-03-04
EP1529014A1 (fr) 2005-05-11
JP2005536426A (ja) 2005-12-02
PL203972B1 (pl) 2009-11-30
CN100447082C (zh) 2008-12-31
CA2496467A1 (fr) 2004-03-04
NO20051492L (no) 2005-05-13
CN1675128A (zh) 2005-09-28
DE10238463A1 (de) 2004-03-04
JP4448030B2 (ja) 2010-04-07
CA2496467C (fr) 2008-12-09
KR20050050646A (ko) 2005-05-31

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