CN100447082C - 稳定的含水二氧化硅分散液 - Google Patents
稳定的含水二氧化硅分散液 Download PDFInfo
- Publication number
- CN100447082C CN100447082C CNB038198096A CN03819809A CN100447082C CN 100447082 C CN100447082 C CN 100447082C CN B038198096 A CNB038198096 A CN B038198096A CN 03819809 A CN03819809 A CN 03819809A CN 100447082 C CN100447082 C CN 100447082C
- Authority
- CN
- China
- Prior art keywords
- powder
- sio
- aluminum compound
- dispersion liquid
- aqueous dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/149—Coating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3045—Treatment with inorganic compounds
- C09C1/3054—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Composite Materials (AREA)
- Silicon Compounds (AREA)
- Colloid Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
实施例 | BET SiO<sub>2</sub> | Al<sub>2</sub>O<sub>3</sub><sup>(2)</sup> | 提供的去离子水 | 总去离子水 | 1N NaOH |
[m2/g] | [mg] | [g] | [g] | [g] | |
1a | 50 | 0 | 375 | 400 | - |
1b | 50 | 12.5 | 375 | 398.1 | 0.7 |
1c | 50 | 25 | 375 | 395.8 | 1.7 |
1d | 50 | 50 | 375 | 393.1 | 1.9 |
1e | 50 | 75 | 375 | 389.1 | 2.0 |
1f | 50 | 100 | 375 | 387.9 | 2.1 |
1g | 50 | 200 | 375 | 376.8 | 2.5 |
2a | 90 | 0 | 370 | 399.8 | 0.2(3) |
2b | 90 | 25 | 370 | 396.3 | 1.2 |
2c | 90 | 100 | 370 | 385.0 | 5.0 |
2d | 90 | 200 | 370 | 370.9 | 9.1 |
3a | 90 | 200 | 250 | - | - |
3b | 90 | 200 | 250 | 268.8 | 11.2 |
3c | 90 | 200 | 250 | 268.3 | 11.7 |
4 | 90 | 1000 | 350 | - | 7<sup>4)</sup> |
5a | 200 | 0 | 360 | 399.9 | 0.1(3) |
5b | 200 | 25 | 360 | 396.0 | 1.5 |
5c | 200 | 100 | 360 | 382.9 | 7.1 |
5d | 200 | 200 | 360 | 367.2 | 12.8 |
5e | 200 | 200 | 360 | 367.2 | 12.5<sup>5)</sup> |
5f | 200 | 200 | 360 | 367.2 | 12.5<sup>5)</sup> |
5g | 200 | 200 | 360 | 367.2 | 12.5<sup>5)</sup> |
6a | 300 | 0 | 330 | 399.8 | 0.2(3) |
6b | 300 | 200 | 330 | 368.6 | 11.4 |
6c | 300 | 300 | 330 | 352.0 | 18.0 |
6d | 300 | 400 | 330 | 331.2 | 28.8 |
实施例 | SiO<sub>2</sub>含量 | Al<sub>2</sub>O<sub>3</sub>/SiO<sub>2</sub> | 分散液的pH | ζ电位 | 粘度<sup>(2)</sup> |
[重量%] | [mg/m<sup>2</sup>] | [mV] | [mPas] | ||
1a | 20 | 0 | 3.6 | -0.8 | 1142 |
1b | 20 | 0.0025 | 3.5 | -9.8 | 846 |
1c | 20 | 0.0050 | 3.4 | -14.2 | 50 |
1d | 20 | 0.0100 | 3.3 | -15.0 | 55 |
1e | 20 | 0.0150 | 3.4 | -14.4 | 104 |
1f | 20 | 0.0200 | 3.0 | -5.3 | 60 |
1g | 20 | 0.0400 | 3.1 | -3.9 | 970 |
2a | 20 | 0 | 3.3 | -0.5 | 246 |
2b | 20 | 0.0028 | 3.2 | -10.0 | 95 |
2c | 20 | 0.0111 | 3.1 | -9.9 | 40 |
2d | 20 | 0.0222 | 3.0 | -6.5 | 82 |
3a | (3) | 0.0111 | - | - | - |
3b | 40 | 0.0111 | 3.2 | -11.4 | 205 |
3c | 40 | 0.0111 | 4.0 | -13.3 | n.d.<sup>(4)</sup> |
4 | 10 | 0.222 | 3.3 | +25 | n.d. |
5a | 20 | 0 | 3.53 | -0.43 | (5) |
5b | 20 | 0.0013 | 3.4 | -4.1 | 1080 |
5c | 20 | 0.0050 | 3.0 | -6.2 | 672 |
5d | 20 | 0.0100 | 3.1 | -6.3 | 864 |
5e | 20 | 0.0100 | 3.4 | -7.75 | n.d. |
5f | 20 | 0.0100 | 5.0 | -9.5 | n.d. |
5g | 20 | 0.0100 | 6.0 | -11.3 | n.d. |
6a | 20 | 0 | - | - | (5) |
6b | 20 | 0.0067 | 3.3 | -6.6 | 1520 |
6c | 20 | 0.0100 | 3.3 | -6.7 | 537 |
6d | 20 | 0.0133 | 3.4 | -5.2 | 1160 |
Claims (18)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10238463A DE10238463A1 (de) | 2002-08-22 | 2002-08-22 | Stabilisierte, wässerige Siliciumdioxid-Dispersion |
DE10238463.0 | 2002-08-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1675128A CN1675128A (zh) | 2005-09-28 |
CN100447082C true CN100447082C (zh) | 2008-12-31 |
Family
ID=31197230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB038198096A Expired - Lifetime CN100447082C (zh) | 2002-08-22 | 2003-07-29 | 稳定的含水二氧化硅分散液 |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP1529014A1 (zh) |
JP (1) | JP4448030B2 (zh) |
KR (1) | KR100772258B1 (zh) |
CN (1) | CN100447082C (zh) |
AU (1) | AU2003250188A1 (zh) |
CA (1) | CA2496467C (zh) |
DE (1) | DE10238463A1 (zh) |
NO (1) | NO20051492L (zh) |
PL (1) | PL203972B1 (zh) |
WO (1) | WO2004018359A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105778775A (zh) * | 2014-12-23 | 2016-07-20 | 安集微电子(上海)有限公司 | 一种中性胶体二氧化硅的制备方法 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200613485A (en) * | 2004-03-22 | 2006-05-01 | Kao Corp | Polishing composition |
DE102004021092A1 (de) | 2004-04-29 | 2005-11-24 | Degussa Ag | Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel |
AT500776B1 (de) * | 2004-08-18 | 2008-12-15 | Wagner Friedrich | Verwendung einer zusammensetzung zum aufbringen einer rutschhemmenden, höhenaufbauenden strukturbeschichtung |
AT502282B1 (de) * | 2005-07-26 | 2008-12-15 | Friedrich Wagner | Rutschhemmender sprühauftrag für bewegliche bodenbeläge |
JPWO2006046463A1 (ja) * | 2004-10-28 | 2008-05-22 | コニカミノルタフォトイメージング株式会社 | カチオン性微粒子分散体及びインクジェット記録用紙 |
DE102005012409A1 (de) | 2005-03-17 | 2006-09-21 | Wacker Chemie Ag | Wäßrige Dispersionen teilhydrophober Kieselsäuren |
DE102005062606A1 (de) * | 2005-12-23 | 2007-07-05 | Deutsche Institute Für Textil- Und Faserforschung Denkendorf | Nanoskalige Teilchen auf der Basis von SiO2 und Mischoxiden hiervon, deren Herstellung und Verwendung zur Behandlung textiler Materialien |
JP2007258606A (ja) * | 2006-03-24 | 2007-10-04 | Fujifilm Corp | 化学的機械的研磨用研磨液 |
US9074118B2 (en) | 2006-07-12 | 2015-07-07 | Cabot Microelectronics Corporation | CMP method for metal-containing substrates |
DE102006049526A1 (de) | 2006-10-20 | 2008-04-24 | Evonik Degussa Gmbh | Stabile wässrige Dispersionen von Siliciumdioxid |
ES2648063T3 (es) * | 2007-11-19 | 2017-12-28 | Grace Gmbh & Co. Kg | Partículas anticorrosivas |
DE102007059861A1 (de) * | 2007-12-12 | 2009-06-18 | Evonik Degussa Gmbh | Verfahren zur Herstellung von Siliciumdioxid-Dispersionen |
DE102008041466A1 (de) | 2008-08-22 | 2010-02-25 | Wacker Chemie Ag | Wäßrige Dispersionen hydrophober Kieselsäuren |
CN101838479B (zh) * | 2010-03-19 | 2013-11-20 | 福建师范大学 | 一种可分散超细二氧化硅的制备方法 |
WO2014199903A1 (ja) * | 2013-06-10 | 2014-12-18 | 日産化学工業株式会社 | シリカゾル及びシリカゾルの製造方法 |
CN104830300A (zh) * | 2015-04-30 | 2015-08-12 | 河南大学 | 一种小粒径纳米聚硅乳液及其制备方法 |
CN108751204A (zh) * | 2018-05-14 | 2018-11-06 | 江苏联瑞新材料股份有限公司 | 一种亚微米二氧化硅分散液的制备方法 |
CN111777949A (zh) * | 2020-07-13 | 2020-10-16 | 长沙金硅地环保科技有限公司 | 一种高分子纳米硅与水溶胶聚合物及其应用 |
JP2022067800A (ja) * | 2020-10-21 | 2022-05-09 | 山口精研工業株式会社 | シリカ分散液、及び研磨剤組成物 |
CN114044520A (zh) * | 2021-11-29 | 2022-02-15 | 苏州西丽卡电子材料有限公司 | 一种高铝超纯合成石英砂的制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5603805A (en) * | 1992-08-31 | 1997-02-18 | Eka Nobel, Ab | Silica sols and use of the sols |
WO2000020221A1 (en) * | 1998-10-02 | 2000-04-13 | Cabot Corporation | Silica dispersion, coating composition and recording medium |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2892797A (en) * | 1956-02-17 | 1959-06-30 | Du Pont | Process for modifying the properties of a silica sol and product thereof |
US3007878A (en) * | 1956-11-01 | 1961-11-07 | Du Pont | Aquasols of positively-charged coated silica particles and their production |
-
2002
- 2002-08-22 DE DE10238463A patent/DE10238463A1/de not_active Ceased
-
2003
- 2003-07-29 KR KR1020057002730A patent/KR100772258B1/ko active IP Right Grant
- 2003-07-29 JP JP2004530060A patent/JP4448030B2/ja not_active Expired - Fee Related
- 2003-07-29 EP EP03792235A patent/EP1529014A1/en not_active Withdrawn
- 2003-07-29 CA CA002496467A patent/CA2496467C/en not_active Expired - Fee Related
- 2003-07-29 CN CNB038198096A patent/CN100447082C/zh not_active Expired - Lifetime
- 2003-07-29 WO PCT/EP2003/008333 patent/WO2004018359A1/en active Application Filing
- 2003-07-29 PL PL373839A patent/PL203972B1/pl unknown
- 2003-07-29 AU AU2003250188A patent/AU2003250188A1/en not_active Abandoned
-
2005
- 2005-03-21 NO NO20051492A patent/NO20051492L/no not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5603805A (en) * | 1992-08-31 | 1997-02-18 | Eka Nobel, Ab | Silica sols and use of the sols |
WO2000020221A1 (en) * | 1998-10-02 | 2000-04-13 | Cabot Corporation | Silica dispersion, coating composition and recording medium |
Non-Patent Citations (4)
Title |
---|
SiO2分散体及硅溶胶性能研究. 潘鹤林等.涂料工业,第1卷第1期. 1997 |
SiO2分散体及硅溶胶性能研究. 潘鹤林等.涂料工业,第1卷第1期. 1997 * |
Zeta电位测定在天然资源利用领域中的应用. 法特金等.国外金属矿选矿,第11卷第11期. 1999 |
Zeta电位测定在天然资源利用领域中的应用. 法特金等.国外金属矿选矿,第11卷第11期. 1999 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105778775A (zh) * | 2014-12-23 | 2016-07-20 | 安集微电子(上海)有限公司 | 一种中性胶体二氧化硅的制备方法 |
CN105778775B (zh) * | 2014-12-23 | 2021-03-02 | 安集微电子(上海)有限公司 | 一种中性胶体二氧化硅的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
PL203972B1 (pl) | 2009-11-30 |
KR100772258B1 (ko) | 2007-11-01 |
KR20050050646A (ko) | 2005-05-31 |
JP2005536426A (ja) | 2005-12-02 |
CN1675128A (zh) | 2005-09-28 |
DE10238463A1 (de) | 2004-03-04 |
CA2496467C (en) | 2008-12-09 |
JP4448030B2 (ja) | 2010-04-07 |
NO20051492L (no) | 2005-05-13 |
PL373839A1 (en) | 2005-09-19 |
WO2004018359A1 (en) | 2004-03-04 |
CA2496467A1 (en) | 2004-03-04 |
EP1529014A1 (en) | 2005-05-11 |
AU2003250188A1 (en) | 2004-03-11 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: EVONIK DEGUSSA CO., LTD. Free format text: FORMER NAME: DECOUCHY STOCK COMPANY |
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Address after: essen Patentee after: Evonik Degussa GmbH Address before: Dusseldorf, Germany Patentee before: Degussa AG |
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Address after: Essen, Germany Patentee after: Evonik Operations Ltd. Address before: Essen, Germany Patentee before: EVONIK DEGUSSA GmbH |
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Granted publication date: 20081231 |