DE102015215957B4 - Lötstopplack-Tintenzusammensetzung - Google Patents

Lötstopplack-Tintenzusammensetzung Download PDF

Info

Publication number
DE102015215957B4
DE102015215957B4 DE102015215957.4A DE102015215957A DE102015215957B4 DE 102015215957 B4 DE102015215957 B4 DE 102015215957B4 DE 102015215957 A DE102015215957 A DE 102015215957A DE 102015215957 B4 DE102015215957 B4 DE 102015215957B4
Authority
DE
Germany
Prior art keywords
solder mask
solvent
ink composition
viscosity
shear rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102015215957.4A
Other languages
German (de)
English (en)
Other versions
DE102015215957A1 (de
Inventor
Yiliang Wu
Bryan A. Nerger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xerox Corp
Original Assignee
Xerox Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xerox Corp filed Critical Xerox Corp
Publication of DE102015215957A1 publication Critical patent/DE102015215957A1/de
Application granted granted Critical
Publication of DE102015215957B4 publication Critical patent/DE102015215957B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/102—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions other than those only involving unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/58—Ethylene oxide or propylene oxide copolymers, e.g. pluronics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02—Polycondensates containing more than one epoxy group per molecule
    • C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ink Jet (AREA)
  • Paints Or Removers (AREA)
DE102015215957.4A 2014-08-28 2015-08-20 Lötstopplack-Tintenzusammensetzung Expired - Fee Related DE102015215957B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/471,893 US9796864B2 (en) 2014-08-28 2014-08-28 Solder mask ink composition
US14/471,893 2014-08-28

Publications (2)

Publication Number Publication Date
DE102015215957A1 DE102015215957A1 (de) 2016-03-03
DE102015215957B4 true DE102015215957B4 (de) 2021-05-20

Family

ID=55312447

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102015215957.4A Expired - Fee Related DE102015215957B4 (de) 2014-08-28 2015-08-20 Lötstopplack-Tintenzusammensetzung

Country Status (9)

Country Link
US (1) US9796864B2 (OSRAM)
JP (1) JP2016050311A (OSRAM)
KR (1) KR102196867B1 (OSRAM)
BR (1) BR102015018917A2 (OSRAM)
CA (1) CA2901003C (OSRAM)
DE (1) DE102015215957B4 (OSRAM)
MX (1) MX382880B (OSRAM)
RU (1) RU2672441C2 (OSRAM)
TW (1) TW201607996A (OSRAM)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9606430B2 (en) 2014-08-28 2017-03-28 Xerox Corporation Method of aerosol printing a solder mask ink composition
CN113549369A (zh) * 2021-07-05 2021-10-26 江苏海田电子材料有限公司 抗裂纹阻焊塞孔油墨及其制备方法
CN116694128B (zh) * 2023-06-28 2023-11-24 鹤山市炎墨科技有限公司 一种含有嵌段共聚物的防焊油墨及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4601973A (en) * 1982-06-24 1986-07-22 Ciba-Geigy Corporation Photopolymerizable coating agent, a photopolymerizable material and its use
US20140316080A1 (en) * 2011-11-10 2014-10-23 Sika Technology Ag Hardeners for epoxy resins, which comprise pyridinyl groups

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1105851A1 (ru) * 1982-01-06 1984-07-30 Горьковский государственный университет им.Н.И.Лобачевского Фотополимеризующа с композици
JPS5975955A (ja) * 1982-10-22 1984-04-28 Kansai Paint Co Ltd 自己熱硬化性塗料用樹脂組成物
IL94474A (en) * 1989-06-09 1993-07-08 Morton Int Inc Photoimageable compositions
JPH0338330A (ja) * 1989-07-05 1991-02-19 Hitachi Chem Co Ltd エポキシ樹脂積層板の製造方法
US6458509B1 (en) * 1999-04-30 2002-10-01 Toagosei Co., Ltd. Resist compositions
JP2002336993A (ja) * 2001-03-16 2002-11-26 Tamura Kaken Co Ltd ソルダペースト組成物及びリフローはんだ付方法
JP2002338612A (ja) * 2001-05-11 2002-11-27 Toyobo Co Ltd 光硬化性組成物およびその硬化方法
JP2004087336A (ja) * 2002-08-27 2004-03-18 Sumitomo Bakelite Co Ltd 絶縁膜用材料、絶縁膜用コーティングワニス、及びこれを用いた絶縁膜
JP2007219384A (ja) * 2006-02-20 2007-08-30 Fujifilm Corp パターン形成方法
JP5256645B2 (ja) * 2006-05-31 2013-08-07 三菱化学株式会社 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置
US7964032B2 (en) * 2006-10-17 2011-06-21 Momentive Performance Materials Inc. Fluorine-free trisiloxane surfactant compositions for use in coatings and printing ink compositions
SG195576A1 (en) * 2008-10-20 2013-12-30 Sumitomo Bakelite Co Positive photosensitive resin composition for spray coating and method for producing through electrode using same
JP5569216B2 (ja) * 2010-07-27 2014-08-13 Ｊｎｃ株式会社 熱硬化性組成物およびその用途

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4601973A (en) * 1982-06-24 1986-07-22 Ciba-Geigy Corporation Photopolymerizable coating agent, a photopolymerizable material and its use
US20140316080A1 (en) * 2011-11-10 2014-10-23 Sika Technology Ag Hardeners for epoxy resins, which comprise pyridinyl groups

Also Published As

Publication number Publication date
JP2016050311A (ja) 2016-04-11
CA2901003A1 (en) 2016-02-28
KR102196867B1 (ko) 2020-12-30
RU2015132830A3 (OSRAM) 2018-09-19
US20160060471A1 (en) 2016-03-03
US9796864B2 (en) 2017-10-24
MX382880B (es) 2025-03-13
MX2015010463A (es) 2016-07-08
KR20160026699A (ko) 2016-03-09
CA2901003C (en) 2018-04-24
DE102015215957A1 (de) 2016-03-03
BR102015018917A2 (pt) 2016-03-01
RU2015132830A (ru) 2017-02-09
RU2672441C2 (ru) 2018-11-14
TW201607996A (zh) 2016-03-01

Similar Documents

Publication Publication Date Title
EP0164620B1 (de) Positiv-arbeitende strahlungsempfindliche Beschichtungslösung
DE112009000690T5 (de) Tintenstrahldruckfarbenzusammensetzung für Ätzresists
DE69423710T2 (de) Verfahren zur Herstellung einer Leiterplatte unter Verwendung einer ultraviolett-härtbaren Zusammensetzung
JP6424148B2 (ja) ソルダーマスクインク組成物をエアロゾル印刷する方法
EP0075537A1 (de) Verfahren zum Beschichten gedruckter Schaltungen
DE2903454A1 (de) Lichtempfindliche latexbeschichtungsmasse und ihre verwendung
DE69423709T2 (de) Ätzresistzusammensetzung, Verfahren zur Bildung eines Musters unter ihrer Verwendung und Leiterplatte und ihre Herstellung
DE102016200046A1 (de) Lötmaskenzusammensetzungen für Aerosol-Jet-Druck
EP0418733A2 (de) Durch Strahlung polymerisierbares Gemisch und Verfahren zur Herstellung einer Lötstopmaske
DE112017002573T5 (de) Tintenstrahlharzzusammensetzung und gedruckte Leiterplatte, die dieselbe verwendet
DE2935904C2 (OSRAM)
DE102015215957A1 (de) Lötstopplack-Tintenzusammensetzung
DE112019000731T5 (de) Lichtempfindliche harzzusammensetzung und gehärtetes produkt daraus
DE69816558T2 (de) Lichtempfindliche zusammensetzung und verfahren zur herstellung von mustern
DE4307766C1 (de) UV-Flexodruckfarbe, Verfahren zu deren Herstellung und Verwendung
DE112017002537T5 (de) Verfahren zur Herstellung einer Tintenstrahlharzzusammensetzung
DE3543961A1 (de) Verfahren zur herstellung trockener druckplatten fuer den flachdruck und entwicklerloesung zur verwendung in demselben
DE69218783T2 (de) Beschichtungszusammensetzungen
DE102018116359A1 (de) Wasserbasierte Tintenstrahldrucktinte
DE69106158T3 (de) Endbearbeitungslösung für lithographische Platten.
DE102011080261B4 (de) Beschichtungszusammensetzung und Verfahren zur Herstellung einer Oberflächenschicht
EP4010200B1 (de) Verfahren zum maskieren von zu mattierenden oberflächen
DE2944097A1 (de) Zusammengesetzte beschichtungsmaterialien
DE69030350T2 (de) Flüssige Lötstoppmasken-Zusammensetzung
DE4447348C2 (de) Siebfüllmittel für Textil-, Film- und Siebdruckschablonen

Legal Events

Date Code Title Description
R082 Change of representative

Representative=s name: GRUENECKER PATENT- UND RECHTSANWAELTE PARTG MB, DE

R082 Change of representative

Representative=s name: GRUENECKER PATENT- UND RECHTSANWAELTE PARTG MB, DE

R012 Request for examination validly filed
R079 Amendment of ipc main class

Free format text: PREVIOUS MAIN CLASS: C09D0163000000

Ipc: C09D0011300000

R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee