DE102015201020A1 - Projektionsbelichtungsanlage mit Manipulator sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage - Google Patents
Projektionsbelichtungsanlage mit Manipulator sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage Download PDFInfo
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- DE102015201020A1 DE102015201020A1 DE102015201020.1A DE102015201020A DE102015201020A1 DE 102015201020 A1 DE102015201020 A1 DE 102015201020A1 DE 102015201020 A DE102015201020 A DE 102015201020A DE 102015201020 A1 DE102015201020 A1 DE 102015201020A1
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102015201020.1A DE102015201020A1 (de) | 2015-01-22 | 2015-01-22 | Projektionsbelichtungsanlage mit Manipulator sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage |
| EP16000098.0A EP3048486B1 (de) | 2015-01-22 | 2016-01-15 | Projektionsbelichtungsanlage mit manipulator sowie verfahren zum steuern einer projektionsbelichtungsanlage |
| JP2016009061A JP6266028B2 (ja) | 2015-01-22 | 2016-01-20 | マニピュレータを含む投影露光装置及び投影露光装置を制御する方法 |
| US15/002,564 US9760019B2 (en) | 2015-01-22 | 2016-01-21 | Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102015201020.1A DE102015201020A1 (de) | 2015-01-22 | 2015-01-22 | Projektionsbelichtungsanlage mit Manipulator sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102015201020A1 true DE102015201020A1 (de) | 2016-07-28 |
Family
ID=55174529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102015201020.1A Ceased DE102015201020A1 (de) | 2015-01-22 | 2015-01-22 | Projektionsbelichtungsanlage mit Manipulator sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9760019B2 (enExample) |
| EP (1) | EP3048486B1 (enExample) |
| JP (1) | JP6266028B2 (enExample) |
| DE (1) | DE102015201020A1 (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020207748A1 (de) * | 2020-06-23 | 2021-03-25 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere in einermikrolithographischen Projektionsbelichtungsanlage |
| DE102019219289A1 (de) * | 2019-12-11 | 2021-06-17 | Carl Zeiss Smt Gmbh | Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System |
| DE102020201723A1 (de) | 2020-02-12 | 2021-08-12 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit einem thermischen Manipulator |
| DE102020207752A1 (de) | 2020-06-23 | 2021-12-23 | Carl Zeiss Smt Gmbh | Heizanordnung und Verfahren zum Heizen eines optischen Elements |
| DE102022204015A1 (de) | 2022-04-26 | 2023-10-26 | Carl Zeiss Smt Gmbh | Aktuator und Deformationsspiegel |
| DE102022212380A1 (de) | 2022-11-21 | 2023-11-23 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Heizen eines EUV-Spiegels, mikrolithographische Projektionsbelichtungsanlage |
| DE102022114974A1 (de) | 2022-06-14 | 2023-12-14 | Carl Zeiss Smt Gmbh | Verfahren zum Heizen eines optischen Elements sowie optisches System |
| DE102022116700A1 (de) * | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithographie und Verfahren |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102013204391B3 (de) | 2013-03-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator |
| KR101668984B1 (ko) * | 2013-09-14 | 2016-10-24 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 장치의 동작 방법 |
| DE102017208364A1 (de) * | 2017-05-18 | 2018-11-22 | Carl Zeiss Smt Gmbh | Optisches system sowie verfahren |
| JP7486335B2 (ja) * | 2020-03-30 | 2024-05-17 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品製造方法 |
| JP2022022911A (ja) * | 2020-07-10 | 2022-02-07 | キヤノン株式会社 | 結像光学系、露光装置、および物品製造方法 |
| DE102020209784A1 (de) * | 2020-08-04 | 2022-02-10 | Carl Zeiss Smt Gmbh | Verfahren zur herstellung oder einstellung einer projektionsbelichtungsanlage |
| US12321099B2 (en) * | 2021-08-30 | 2025-06-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for generating EUV radiation |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020001088A1 (en) | 2000-02-23 | 2002-01-03 | Ulrich Wegmann | Apparatus for wavefront detection |
| US20060023179A1 (en) * | 2004-07-31 | 2006-02-02 | Carl Zeiss | Optical system of a microlithographic projection exposure apparatus |
| WO2008034636A2 (de) | 2006-09-21 | 2008-03-27 | Carl Zeiss Smt Ag | Optisches element und verfahren |
| US20080204682A1 (en) | 2005-06-28 | 2008-08-28 | Nikon Corporation | Exposure method and exposure apparatus, and device manufacturing method |
| US20100033704A1 (en) * | 2008-08-11 | 2010-02-11 | Masayuki Shiraishi | Deformable mirror, mirror apparatus, and exposure apparatus |
| DE102008042356A1 (de) * | 2008-09-25 | 2010-04-08 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit |
| WO2011074319A1 (ja) | 2009-12-14 | 2011-06-23 | 株式会社ニコン | デフォーマブルミラー、照明光学系、露光装置、およびデバイス製造方法 |
| US20110216303A1 (en) | 2004-04-09 | 2011-09-08 | Carl Zeiss Smt Gmbh | Method for adjusting a projection objective |
| DE102011081603A1 (de) | 2011-08-26 | 2012-10-25 | Carl Zeiss Smt Gmbh | Adaptiver Spiegel und Verfahren zu dessen Herstellung |
| JP2013106014A (ja) | 2011-11-16 | 2013-05-30 | Nikon Corp | 変形可能な反射光学素子及びその駆動方法、光学系、並びに露光装置 |
| JP2013161992A (ja) | 2012-02-06 | 2013-08-19 | Nikon Corp | 変形可能な反射光学素子、光学系、及び露光装置 |
| DE102013204391B3 (de) * | 2013-03-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator |
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| US6398373B1 (en) * | 2000-08-09 | 2002-06-04 | Asml Us, Inc. | Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
| DE10046379A1 (de) * | 2000-09-20 | 2002-03-28 | Zeiss Carl | System zur gezielten Deformation von optischen Elementen |
| DE10146499B4 (de) * | 2001-09-21 | 2006-11-09 | Carl Zeiss Smt Ag | Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie Verfahren zur Optimierung der Abbildungseigenschaften von mindestens drei optischen Elementen |
| US6803994B2 (en) | 2002-06-21 | 2004-10-12 | Nikon Corporation | Wavefront aberration correction system |
| EP1724816A4 (en) * | 2004-02-13 | 2007-10-24 | Nikon Corp | EXPOSURE METHOD AND SYSTEM, AND DEVICE MANUFACTURING METHOD |
| EP2598947B1 (en) | 2010-07-30 | 2020-04-29 | Carl Zeiss SMT GmbH | Euv exposure apparatus |
| DE102011077784A1 (de) | 2011-06-20 | 2012-12-20 | Carl Zeiss Smt Gmbh | Projektionsanordnung |
| CN104169797B (zh) * | 2012-02-04 | 2016-05-18 | 卡尔蔡司Smt有限责任公司 | 操作微光刻投射曝光设备的方法及该设备的投射物镜 |
| DE102012205096B3 (de) * | 2012-03-29 | 2013-08-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit mindestens einem Manipulator |
| DE102012212757A1 (de) * | 2012-07-20 | 2014-01-23 | Carl Zeiss Smt Gmbh | Verfahren zum betreiben einer mikrolithographischen projektionsbelichtungsanlage |
| US9651872B2 (en) | 2013-03-13 | 2017-05-16 | Carl Zeiss Smt Gmbh | Projection lens with wavefront manipulator |
-
2015
- 2015-01-22 DE DE102015201020.1A patent/DE102015201020A1/de not_active Ceased
-
2016
- 2016-01-15 EP EP16000098.0A patent/EP3048486B1/de active Active
- 2016-01-20 JP JP2016009061A patent/JP6266028B2/ja active Active
- 2016-01-21 US US15/002,564 patent/US9760019B2/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020001088A1 (en) | 2000-02-23 | 2002-01-03 | Ulrich Wegmann | Apparatus for wavefront detection |
| US20110216303A1 (en) | 2004-04-09 | 2011-09-08 | Carl Zeiss Smt Gmbh | Method for adjusting a projection objective |
| US20060023179A1 (en) * | 2004-07-31 | 2006-02-02 | Carl Zeiss | Optical system of a microlithographic projection exposure apparatus |
| US20080204682A1 (en) | 2005-06-28 | 2008-08-28 | Nikon Corporation | Exposure method and exposure apparatus, and device manufacturing method |
| WO2008034636A2 (de) | 2006-09-21 | 2008-03-27 | Carl Zeiss Smt Ag | Optisches element und verfahren |
| US20100033704A1 (en) * | 2008-08-11 | 2010-02-11 | Masayuki Shiraishi | Deformable mirror, mirror apparatus, and exposure apparatus |
| DE102008042356A1 (de) * | 2008-09-25 | 2010-04-08 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit |
| WO2011074319A1 (ja) | 2009-12-14 | 2011-06-23 | 株式会社ニコン | デフォーマブルミラー、照明光学系、露光装置、およびデバイス製造方法 |
| DE102011081603A1 (de) | 2011-08-26 | 2012-10-25 | Carl Zeiss Smt Gmbh | Adaptiver Spiegel und Verfahren zu dessen Herstellung |
| JP2013106014A (ja) | 2011-11-16 | 2013-05-30 | Nikon Corp | 変形可能な反射光学素子及びその駆動方法、光学系、並びに露光装置 |
| JP2013161992A (ja) | 2012-02-06 | 2013-08-19 | Nikon Corp | 変形可能な反射光学素子、光学系、及び露光装置 |
| DE102013204391B3 (de) * | 2013-03-13 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102019219289A1 (de) * | 2019-12-11 | 2021-06-17 | Carl Zeiss Smt Gmbh | Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System |
| US12085780B2 (en) | 2019-12-11 | 2024-09-10 | Carl Zeiss Smt Gmbh | Optical system, heating arrangement, and method for heating an optical element in an optical system |
| DE102020201723A1 (de) | 2020-02-12 | 2021-08-12 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit einem thermischen Manipulator |
| WO2021160583A1 (de) | 2020-02-12 | 2021-08-19 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage mit einem thermischen manipulator |
| DE102020207748A1 (de) * | 2020-06-23 | 2021-03-25 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere in einermikrolithographischen Projektionsbelichtungsanlage |
| DE102020207752A1 (de) | 2020-06-23 | 2021-12-23 | Carl Zeiss Smt Gmbh | Heizanordnung und Verfahren zum Heizen eines optischen Elements |
| DE102022204015A1 (de) | 2022-04-26 | 2023-10-26 | Carl Zeiss Smt Gmbh | Aktuator und Deformationsspiegel |
| DE102022114974A1 (de) | 2022-06-14 | 2023-12-14 | Carl Zeiss Smt Gmbh | Verfahren zum Heizen eines optischen Elements sowie optisches System |
| DE102022116700A1 (de) * | 2022-07-05 | 2024-01-11 | Carl Zeiss Smt Gmbh | Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithographie und Verfahren |
| DE102022212380A1 (de) | 2022-11-21 | 2023-11-23 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Heizen eines EUV-Spiegels, mikrolithographische Projektionsbelichtungsanlage |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3048486A2 (de) | 2016-07-27 |
| US20160216616A1 (en) | 2016-07-28 |
| EP3048486A3 (de) | 2016-08-31 |
| JP2016136253A (ja) | 2016-07-28 |
| EP3048486B1 (de) | 2018-06-06 |
| US9760019B2 (en) | 2017-09-12 |
| JP6266028B2 (ja) | 2018-01-24 |
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