JP6266028B2 - マニピュレータを含む投影露光装置及び投影露光装置を制御する方法 - Google Patents

マニピュレータを含む投影露光装置及び投影露光装置を制御する方法 Download PDF

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JP6266028B2
JP6266028B2 JP2016009061A JP2016009061A JP6266028B2 JP 6266028 B2 JP6266028 B2 JP 6266028B2 JP 2016009061 A JP2016009061 A JP 2016009061A JP 2016009061 A JP2016009061 A JP 2016009061A JP 6266028 B2 JP6266028 B2 JP 6266028B2
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JP2016136253A5 (enExample
JP2016136253A (ja
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ビットナー ボリス
ビットナー ボリス
ヴァルター ホルガー
ヴァルター ホルガー
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2016009061A 2015-01-22 2016-01-20 マニピュレータを含む投影露光装置及び投影露光装置を制御する方法 Active JP6266028B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015201020.1A DE102015201020A1 (de) 2015-01-22 2015-01-22 Projektionsbelichtungsanlage mit Manipulator sowie Verfahren zum Steuern einer Projektionsbelichtungsanlage
DE102015201020.1 2015-01-22

Publications (3)

Publication Number Publication Date
JP2016136253A JP2016136253A (ja) 2016-07-28
JP2016136253A5 JP2016136253A5 (enExample) 2017-08-03
JP6266028B2 true JP6266028B2 (ja) 2018-01-24

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JP2016009061A Active JP6266028B2 (ja) 2015-01-22 2016-01-20 マニピュレータを含む投影露光装置及び投影露光装置を制御する方法

Country Status (4)

Country Link
US (1) US9760019B2 (enExample)
EP (1) EP3048486B1 (enExample)
JP (1) JP6266028B2 (enExample)
DE (1) DE102015201020A1 (enExample)

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DE102013204391B3 (de) 2013-03-13 2014-05-28 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
DE102017208364A1 (de) * 2017-05-18 2018-11-22 Carl Zeiss Smt Gmbh Optisches system sowie verfahren
DE102019219289A1 (de) * 2019-12-11 2021-06-17 Carl Zeiss Smt Gmbh Optisches System, sowie Heizanordnung und Verfahren zum Heizen eines optischen Elements in einem optischen System
DE102020201723A1 (de) 2020-02-12 2021-08-12 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einem thermischen Manipulator
JP7486335B2 (ja) * 2020-03-30 2024-05-17 キヤノン株式会社 インプリント装置、インプリント方法、および物品製造方法
DE102020207752A1 (de) 2020-06-23 2021-12-23 Carl Zeiss Smt Gmbh Heizanordnung und Verfahren zum Heizen eines optischen Elements
DE102020207748A1 (de) * 2020-06-23 2021-03-25 Carl Zeiss Smt Gmbh Optisches System, insbesondere in einermikrolithographischen Projektionsbelichtungsanlage
JP2022022911A (ja) * 2020-07-10 2022-02-07 キヤノン株式会社 結像光学系、露光装置、および物品製造方法
DE102020209784A1 (de) * 2020-08-04 2022-02-10 Carl Zeiss Smt Gmbh Verfahren zur herstellung oder einstellung einer projektionsbelichtungsanlage
US12321099B2 (en) * 2021-08-30 2025-06-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method for generating EUV radiation
DE102022204015A1 (de) 2022-04-26 2023-10-26 Carl Zeiss Smt Gmbh Aktuator und Deformationsspiegel
DE102022114974A1 (de) 2022-06-14 2023-12-14 Carl Zeiss Smt Gmbh Verfahren zum Heizen eines optischen Elements sowie optisches System
DE102022116700A1 (de) * 2022-07-05 2024-01-11 Carl Zeiss Smt Gmbh Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithographie und Verfahren
DE102022212380A1 (de) 2022-11-21 2023-11-23 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Heizen eines EUV-Spiegels, mikrolithographische Projektionsbelichtungsanlage

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TW550377B (en) 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection
US6398373B1 (en) * 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
DE10046379A1 (de) * 2000-09-20 2002-03-28 Zeiss Carl System zur gezielten Deformation von optischen Elementen
DE10146499B4 (de) * 2001-09-21 2006-11-09 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie Verfahren zur Optimierung der Abbildungseigenschaften von mindestens drei optischen Elementen
US6803994B2 (en) 2002-06-21 2004-10-12 Nikon Corporation Wavefront aberration correction system
JP4692753B2 (ja) * 2004-02-13 2011-06-01 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
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DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
US20100033704A1 (en) * 2008-08-11 2010-02-11 Masayuki Shiraishi Deformable mirror, mirror apparatus, and exposure apparatus
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TWI475330B (zh) 2010-07-30 2015-03-01 卡爾蔡司Ｓｍｔ有限公司 超紫外線曝光裝置
DE102011077784A1 (de) 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
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JP2013106014A (ja) 2011-11-16 2013-05-30 Nikon Corp 変形可能な反射光学素子及びその駆動方法、光学系、並びに露光装置
KR101679136B1 (ko) * 2012-02-04 2016-11-23 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 투영 노광 장치의 동작 방법 및 이러한 장치의 투영 오브젝티브
JP2013161992A (ja) 2012-02-06 2013-08-19 Nikon Corp 変形可能な反射光学素子、光学系、及び露光装置
DE102012205096B3 (de) * 2012-03-29 2013-08-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit mindestens einem Manipulator
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DE102013204391B3 (de) * 2013-03-13 2014-05-28 Carl Zeiss Smt Gmbh Projektionsobjektiv mit Wellenfrontmanipulator

Also Published As

Publication number Publication date
EP3048486A3 (de) 2016-08-31
EP3048486A2 (de) 2016-07-27
US9760019B2 (en) 2017-09-12
JP2016136253A (ja) 2016-07-28
EP3048486B1 (de) 2018-06-06
DE102015201020A1 (de) 2016-07-28
US20160216616A1 (en) 2016-07-28

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