DE102014219755A1 - Reflektives optisches Element - Google Patents

Reflektives optisches Element Download PDF

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Publication number
DE102014219755A1
DE102014219755A1 DE201410219755 DE102014219755A DE102014219755A1 DE 102014219755 A1 DE102014219755 A1 DE 102014219755A1 DE 201410219755 DE201410219755 DE 201410219755 DE 102014219755 A DE102014219755 A DE 102014219755A DE 102014219755 A1 DE102014219755 A1 DE 102014219755A1
Authority
DE
Germany
Prior art keywords
optical element
reflective optical
layer
element according
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE201410219755
Other languages
German (de)
English (en)
Inventor
Boris Bittner
Norbert Wabra
Sonja Schneider
Ricarda Schneider
Hendrik Wagner
Rumen Iliew
Walter Pauls
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE201410219755 priority Critical patent/DE102014219755A1/de
Publication of DE102014219755A1 publication Critical patent/DE102014219755A1/de
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0636—Reflectors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE201410219755 2013-10-30 2014-09-30 Reflektives optisches Element Withdrawn DE102014219755A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE201410219755 DE102014219755A1 (de) 2013-10-30 2014-09-30 Reflektives optisches Element

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102013222140 2013-10-30
DE102013222140.1 2013-10-30
DE201410219755 DE102014219755A1 (de) 2013-10-30 2014-09-30 Reflektives optisches Element

Publications (1)

Publication Number Publication Date
DE102014219755A1 true DE102014219755A1 (de) 2015-04-30

Family

ID=52811980

Family Applications (1)

Application Number Title Priority Date Filing Date
DE201410219755 Withdrawn DE102014219755A1 (de) 2013-10-30 2014-09-30 Reflektives optisches Element

Country Status (3)

Country Link
US (1) US9470872B2 (https=)
JP (1) JP6399889B2 (https=)
DE (1) DE102014219755A1 (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017009185A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage
DE102016210794A1 (de) * 2016-06-16 2017-04-27 Carl Zeiss Smt Gmbh Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Betrieb der optischen Anordnung
US11029515B2 (en) 2018-03-05 2021-06-08 Carl Zeiss Smt Gmbh Optical element, and method for correcting the wavefront effect of an optical element
DE102020201774A1 (de) 2020-02-13 2021-08-19 Carl Zeiss Smt Gmbh Optische Baugruppe mit Kompensationselement und Projektionsbelichtungsanlage
DE102024203044A1 (de) * 2024-04-03 2025-10-09 Carl Zeiss Smt Gmbh Verfahren zum Verbessern einer Abbildungsqualität einer Anordnung optischer Elemente und entsprechende Anordnung optischer Elemente

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015225509A1 (de) 2015-12-16 2017-06-22 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102017205405A1 (de) * 2017-03-30 2018-10-04 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
CN112713499A (zh) * 2020-12-30 2021-04-27 武汉光谷航天三江激光产业技术研究院有限公司 光学元件散热装置及方法
CN115145108B (zh) 2022-09-05 2022-12-02 上海传芯半导体有限公司 Euv级衬底、euv掩模基版、euv掩模版及其制造方法
CN118519245B (zh) * 2024-05-30 2025-12-26 中国科学院合肥物质科学研究院 一种基于结构补偿的卡式望远镜消热差的装置及方法

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JPH10163091A (ja) * 1996-11-29 1998-06-19 Canon Inc Ｘ線露光用マスク構造体およびｘ線露光装置
DE19903807A1 (de) 1998-05-05 1999-11-11 Zeiss Carl Fa Beleuchtungssystem insbesondere für die EUV-Lithographie
JPH11329918A (ja) * 1998-05-08 1999-11-30 Nikon Corp 軟ｘ線投影露光装置
JPH11326598A (ja) * 1998-05-08 1999-11-26 Nikon Corp 反射鏡およびその製造方法
JP3989367B2 (ja) * 2002-02-22 2007-10-10 Ｈｏｙａ株式会社 露光用反射型マスクブランク、その製造方法及び露光用反射型マスク
JP3870118B2 (ja) * 2002-04-05 2007-01-17 キヤノン株式会社 結像光学系、該光学系を有する露光装置、収差低減方法
DE10220816A1 (de) 2002-05-10 2003-11-20 Zeiss Carl Microelectronic Sys Reflektives Röntgenmikroskop und Inspektionssystem zur Untersuchung von Objekten mit Wellenlängen 100 nm
DE50313254D1 (de) 2002-05-10 2010-12-23 Zeiss Carl Smt Ag Reflektives roentgenmikroskop zur untersuchung von objekten mit wellenlaengen = 100nm in reflexion
JP4024596B2 (ja) * 2002-06-03 2007-12-19 三菱電機株式会社 光学機器用反射鏡およびその製造方法
DE10335982A1 (de) 2003-08-06 2005-03-03 Zounek, Alexis Dr. Verfahren und Vorrichtung zur Überprüfung der Abbildungseigenschaften von Fotomasken
KR101052386B1 (ko) * 2003-09-27 2011-07-28 칼 짜이스 에스엠테 게엠베하 영점 교차 온도 근처에서 열팽창 계수의 온도에 따라, 상이한 기울기 부호를 갖는 재료로 구성된 미러들을 구비한 초단파 자외선 투영 광학계
JP2006332153A (ja) * 2005-05-24 2006-12-07 Hoya Corp 反射型マスクブランク及び反射型マスク並びに半導体装置の製造方法
US20080266651A1 (en) 2007-04-24 2008-10-30 Katsuhiko Murakami Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and device
DE102009041405B4 (de) 2009-09-14 2020-08-20 Carl Zeiss Smt Gmbh Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung
DE102010028488A1 (de) * 2010-05-03 2011-11-03 Carl Zeiss Smt Gmbh Substrate für Spiegel für die EUV-Lithographie und deren Herstellung
JP5096530B2 (ja) * 2010-07-26 2012-12-12 カール・ツァイス・エスエムティー・ゲーエムベーハー ゼロ転移温度周辺の熱膨張係数に応じて温度の上昇に対する傾きの符号が異なる材料で構成されたミラーを備えたｅｕｖ投影レンズ
DE102011079933A1 (de) * 2010-08-19 2012-02-23 Carl Zeiss Smt Gmbh Optisches Element für die UV- oder EUV-Lithographie
DE102010039930A1 (de) * 2010-08-30 2012-03-01 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage
JP5926264B2 (ja) * 2010-09-27 2016-05-25 カール・ツァイス・エスエムティー・ゲーエムベーハー ミラー、当該ミラーを備える投影対物レンズ、及び当該投影対物レンズを備えるマイクロリソグラフィ用投影露光装置
DE102011080052A1 (de) * 2011-07-28 2013-01-31 Carl Zeiss Smt Gmbh Spiegel, optisches System mit Spiegel und Verfahren zur Herstellung eines Spiegels
DE102012205181B4 (de) 2012-03-30 2015-09-24 Carl Zeiss Smt Gmbh Messvorrichtung zum Vermessen einer Beleuchtungseigenschaft
DE102012212757A1 (de) 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Verfahren zum betreiben einer mikrolithographischen projektionsbelichtungsanlage
DE102012212898A1 (de) 2012-07-24 2014-01-30 Carl Zeiss Smt Gmbh Spiegelanordnung für eine EUV-Projektionsbelichtungsanlage, Verfahren zum Betreiben derselben, sowie EUV-Projektionsbelichtungsanlage
JP5173059B2 (ja) * 2012-09-11 2013-03-27 株式会社東芝 記憶媒体、再生方法、記録方法、再生装置及び記録装置
WO2014139543A1 (en) 2013-03-13 2014-09-18 Carl Zeiss Smt Gmbh Microlithographic apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017009185A1 (de) * 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage
US10331048B2 (en) 2015-07-15 2019-06-25 Carl Zeiss Smt Gmbh Mirror, in particular for a microlithographic projection exposure apparatus
DE102016210794A1 (de) * 2016-06-16 2017-04-27 Carl Zeiss Smt Gmbh Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Betrieb der optischen Anordnung
US11029515B2 (en) 2018-03-05 2021-06-08 Carl Zeiss Smt Gmbh Optical element, and method for correcting the wavefront effect of an optical element
DE102020201774A1 (de) 2020-02-13 2021-08-19 Carl Zeiss Smt Gmbh Optische Baugruppe mit Kompensationselement und Projektionsbelichtungsanlage
US12313978B2 (en) 2020-02-13 2025-05-27 Carl Zeiss Smt Gmbh Optical assembly, projection exposure apparatus and method
DE102024203044A1 (de) * 2024-04-03 2025-10-09 Carl Zeiss Smt Gmbh Verfahren zum Verbessern einer Abbildungsqualität einer Anordnung optischer Elemente und entsprechende Anordnung optischer Elemente

Also Published As

Publication number Publication date
US9470872B2 (en) 2016-10-18
JP6399889B2 (ja) 2018-10-03
JP2015122480A (ja) 2015-07-02
US20150116703A1 (en) 2015-04-30

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