DE102012012524B3 - Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers - Google Patents
Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers Download PDFInfo
- Publication number
- DE102012012524B3 DE102012012524B3 DE102012012524A DE102012012524A DE102012012524B3 DE 102012012524 B3 DE102012012524 B3 DE 102012012524B3 DE 102012012524 A DE102012012524 A DE 102012012524A DE 102012012524 A DE102012012524 A DE 102012012524A DE 102012012524 B3 DE102012012524 B3 DE 102012012524B3
- Authority
- DE
- Germany
- Prior art keywords
- sio
- suspension
- spray
- doped
- doping solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910004298 SiO 2 Inorganic materials 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims description 20
- 239000007921 spray Substances 0.000 claims abstract description 40
- 239000000725 suspension Substances 0.000 claims abstract description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- 239000002002 slurry Substances 0.000 claims abstract description 12
- 239000002245 particle Substances 0.000 claims description 12
- 239000003595 mist Substances 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 3
- 239000002516 radical scavenger Substances 0.000 claims description 3
- 241000500881 Lepisma Species 0.000 claims description 2
- 230000003993 interaction Effects 0.000 abstract description 5
- 239000002019 doping agent Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 6
- 239000008187 granular material Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 230000004931 aggregating effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 230000024121 nodulation Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000012716 precipitator Substances 0.000 description 1
- -1 rare earth cations Chemical class 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/12—Compositions for glass with special properties for luminescent glass; for fluorescent glass
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/02—Use of particular materials as binders, particle coatings or suspension media therefor
- C09K11/025—Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
- C09K11/08—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
- C09K11/77—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
- C09K11/77064—Aluminosilicates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
- C03B2201/03—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
- C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/3488—Ytterbium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/36—Doped silica-based glasses containing metals containing rare earth metals containing rare earth metals and aluminium, e.g. Er-Al co-doped
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
- C03C3/061—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz by leaching a soluble phase and consolidating
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012012524A DE102012012524B3 (de) | 2012-06-26 | 2012-06-26 | Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers |
| EP13730603.1A EP2872454B1 (de) | 2012-06-26 | 2013-06-25 | Verfahren zur herstellung eines dotierten sio2-schlickers |
| CN201380033440.0A CN104411645A (zh) | 2012-06-26 | 2013-06-25 | 制造掺杂SiO2-浆料的方法以及该SiO2-浆料的用途 |
| PCT/EP2013/063213 WO2014001293A1 (de) | 2012-06-26 | 2013-06-25 | Verfahren zur herstellung eines dotierten sio2-schlickers sowie verwendung des sio2-schlickers |
| JP2015519041A JP6211076B2 (ja) | 2012-06-26 | 2013-06-25 | ドープされたＳｉＯ２スラリーの製造方法、ならびにそのＳｉＯ２スラリーの使用 |
| US14/411,332 US9518218B2 (en) | 2012-06-26 | 2013-06-25 | Method for producing a doped SiO2 slurry and use of the SiO2 slurry |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012012524A DE102012012524B3 (de) | 2012-06-26 | 2012-06-26 | Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102012012524B3 true DE102012012524B3 (de) | 2013-07-18 |
Family
ID=48670589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012012524A Expired - Fee Related DE102012012524B3 (de) | 2012-06-26 | 2012-06-26 | Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9518218B2 (enExample) |
| EP (1) | EP2872454B1 (enExample) |
| JP (1) | JP6211076B2 (enExample) |
| CN (1) | CN104411645A (enExample) |
| DE (1) | DE102012012524B3 (enExample) |
| WO (1) | WO2014001293A1 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140345526A1 (en) * | 2013-05-23 | 2014-11-27 | Applied Materials, Inc. | Coated liner assembly for a semiconductor processing chamber |
| EP3173386A1 (de) * | 2015-11-25 | 2017-05-31 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff |
| EP3708547A1 (de) * | 2019-03-13 | 2020-09-16 | Heraeus Quarzglas GmbH & Co. KG | Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105837025B (zh) * | 2016-04-21 | 2018-12-11 | 烽火通信科技股份有限公司 | 高效制备掺杂光纤预制棒的方法及掺杂光纤预制棒 |
| US9969621B2 (en) * | 2016-05-04 | 2018-05-15 | Saudi Arabian Oil Company | Methods for processing fumed metallic oxides |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004006017A1 (de) * | 2003-12-08 | 2005-07-14 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben |
| DE102007045097A1 (de) * | 2007-09-20 | 2009-04-02 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von dotiertem Quarzglas |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57205334A (en) * | 1981-06-13 | 1982-12-16 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of silica glass |
| JPH09151124A (ja) * | 1995-11-29 | 1997-06-10 | Kao Corp | 熱線遮蔽性粒子及びその製造方法 |
| JP4271294B2 (ja) * | 1999-04-28 | 2009-06-03 | 旭化成ケミカルズ株式会社 | 均一粒子径を有する粒子の製造方法 |
| DE10065028A1 (de) | 2000-12-23 | 2002-07-18 | Degussa | Mit Kalium dotierte pyrogene Oxide |
| DE10065027A1 (de) | 2000-12-23 | 2002-07-04 | Degussa | Wäßrige Dispersion, Verfahren zu deren Herstellung und Verwendung |
| US20040005352A1 (en) * | 2002-04-16 | 2004-01-08 | Lopez Gabriel P. | Biologically functionalized porous microspheres |
| DE10249747A1 (de) | 2002-10-25 | 2004-05-06 | Clariant Gmbh | Verfahren und Vorrichtung zur Durchführung chemischer und physikalischer Prozesse |
| US7637126B2 (en) | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
| FI116619B (fi) * | 2004-07-02 | 2006-01-13 | Liekki Oy | Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde |
| DE102006048508A1 (de) * | 2006-10-13 | 2008-04-17 | Evonik Degussa Gmbh | Oberflächenmodifizierte Kieselsäuren |
| DE102007015097A1 (de) | 2007-03-29 | 2008-10-02 | Heidelberger Druckmaschinen Ag | Farbmessgerät mit Koordinatenabgleich |
| JP5128162B2 (ja) * | 2007-04-06 | 2013-01-23 | 岩崎電気株式会社 | 不透明石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法 |
| CN101850230B (zh) * | 2009-03-31 | 2012-07-04 | 中国石油化工股份有限公司 | 一种流体连续反应器及其应用 |
-
2012
- 2012-06-26 DE DE102012012524A patent/DE102012012524B3/de not_active Expired - Fee Related
-
2013
- 2013-06-25 JP JP2015519041A patent/JP6211076B2/ja not_active Expired - Fee Related
- 2013-06-25 WO PCT/EP2013/063213 patent/WO2014001293A1/de not_active Ceased
- 2013-06-25 EP EP13730603.1A patent/EP2872454B1/de active Active
- 2013-06-25 US US14/411,332 patent/US9518218B2/en active Active
- 2013-06-25 CN CN201380033440.0A patent/CN104411645A/zh active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004006017A1 (de) * | 2003-12-08 | 2005-07-14 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben |
| DE102007045097A1 (de) * | 2007-09-20 | 2009-04-02 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von dotiertem Quarzglas |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140345526A1 (en) * | 2013-05-23 | 2014-11-27 | Applied Materials, Inc. | Coated liner assembly for a semiconductor processing chamber |
| EP3173386A1 (de) * | 2015-11-25 | 2017-05-31 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff |
| US10106453B2 (en) | 2015-11-25 | 2018-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Method for producing a composite body of a material with a high silicic acid content |
| EP3708547A1 (de) * | 2019-03-13 | 2020-09-16 | Heraeus Quarzglas GmbH & Co. KG | Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils |
| WO2020182479A1 (de) | 2019-03-13 | 2020-09-17 | Heraeus Quarzglas Gmbh & Co. Kg | Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils |
| KR20220002868A (ko) * | 2019-03-13 | 2022-01-07 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 플라즈마-보조 제조 공정에서 사용하기 위한 도핑된 석영 유리 성분 및 성분의 제조방법 |
| KR102796652B1 (ko) | 2019-03-13 | 2025-04-17 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 플라즈마-보조 제조 공정에서 사용하기 위한 도핑된 석영 유리 성분 및 성분의 제조방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2015527962A (ja) | 2015-09-24 |
| EP2872454B1 (de) | 2017-08-09 |
| CN104411645A (zh) | 2015-03-11 |
| WO2014001293A1 (de) | 2014-01-03 |
| US20150197688A1 (en) | 2015-07-16 |
| US9518218B2 (en) | 2016-12-13 |
| EP2872454A1 (de) | 2015-05-20 |
| JP6211076B2 (ja) | 2017-10-11 |
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