JP6211076B2 - ドープされたSiO2スラリーの製造方法、ならびにそのSiO2スラリーの使用 - Google Patents
ドープされたSiO2スラリーの製造方法、ならびにそのSiO2スラリーの使用 Download PDFInfo
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- C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
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- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
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- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
- C03B2201/36—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers doped with rare earth metals and aluminium, e.g. Er-Al co-doped
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- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
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- C—CHEMISTRY; METALLURGY
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- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
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- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/36—Doped silica-based glasses containing metals containing rare earth metals containing rare earth metals and aluminium, e.g. Er-Al co-doped
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
- C03C3/061—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz by leaching a soluble phase and consolidating
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Description
以下において、本発明を実施例に基づいて詳しく説明する。
Yb2O3およびAl2O3でドープされた石英ガラスを製造するため、超純水中にSiO2アグリゲートの形態として散在しているSiO2粒子の懸濁液を製造する。このSiO2アグリゲートは、平均粒径が10μmであり、5nm〜100nmの範囲の粒径を有するSiO2一次粒子からなっている。濃縮アンモニア溶液を添加することによって、pH値を14に調節する。このアルカリ性懸濁液の固体含有量は、16質量%である。
例1に記載の固体含有量16質量%のアルカリ性SiO2懸濁液から、例1のドープ溶液からと同じく噴霧物を生成する。噴霧する前に、このSiO2懸濁液および前記ドープ溶液から、15μmより大きい粗粒子または別の不純物を分離するために、成分をそれぞれ相応のメッシュ幅のプラスチックふるいに流し込んでろ過する。必要であれば、特に前記SiO2懸濁液をろ過する場合、プラスチックヘラを用いてふるいの通過が補助されてよい。次に、前記SiO2懸濁液を、作業圧力4〜5bar、および装入量約2.4l/hで噴霧する。ドープ溶液の場合、それに反して作業圧力を2barおよび流量を0.8l/hに調節する。複数の噴霧器ノズルを、前記ドープされたSiO2スラリーの受容器の上で斜め下向きにして、互いに約5〜10cmの間隔で位置調節する。このようにして生成された噴霧物は、10μm〜40μmの平均径を有する液滴を含んでいる。
Claims (8)
- ドープされたSiO2スラリーの製造方法であって、SiO2粒子を水性液体中に含む懸濁液に、少なくとも1種のドープ溶液を連続して添加して前記ドープされたSiO2スラリーを形成させる前記方法において、生じるドープされたSiO2スラリーが絶え間なく動かされる間、前記SiO2懸濁液および/または前記ドープ溶液が、噴霧物として相互に作用し、該噴霧物の平均液滴径が、10μm〜100μmの範囲にあり、かつ前記SiO 2 懸濁液が、12より大きいpH値に調節されることを特徴とする前記方法。
- 前記平均液滴径が、10μm〜50μmの範囲にあることを特徴とする、請求項1に記載の方法。
- 前記SiO2懸濁液からの噴霧物、および前記少なくとも1種のドープ溶液からの噴霧物の場合に、該噴霧物が、霧状物の段階で互いに混合されることを特徴とする請求項1または2に記載の方法。
- 前記SiO2懸濁液および/または前記ドープ溶液が、1つまたは複数の噴霧ノズルを使用することによって噴霧されて噴霧物にされることを特徴とする、請求項1から3までのいずれか1項に記載の方法。
- 前記噴霧物の生成において、0.5bar〜10barの範囲の作業圧力で実施されることを特徴とする請求項1から4までのいずれか1項に記載の方法。
- 前記噴霧物の生成において、0.2l/h〜4.0l/hの範囲の流量で実施されることを特徴とする、請求項1から5までのいずれか1項の方法。
- 前記SiO2懸濁液または前記ドープ溶液、または前記少なくとも部分的にドープされたSiO2スラリーが、1つまたは複数のプロペラ撹拌機を使用することにより動かされることを特徴とする、請求項1から6までのいずれか1項に記載の方法。
- 前記噴霧物の生成の前に、前記SiO2懸濁液および/または前記ドープ溶液がろ過されることを特徴とする、請求項1から7までのいずれか1項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012012524A DE102012012524B3 (de) | 2012-06-26 | 2012-06-26 | Verfahren zur Herstellung eines dotierten SiO2-Schlickers sowie Verwendung des SiO2-Schlickers |
DE102012012524.0 | 2012-06-26 | ||
PCT/EP2013/063213 WO2014001293A1 (de) | 2012-06-26 | 2013-06-25 | Verfahren zur herstellung eines dotierten sio2-schlickers sowie verwendung des sio2-schlickers |
Publications (3)
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JP2015527962A JP2015527962A (ja) | 2015-09-24 |
JP2015527962A5 JP2015527962A5 (ja) | 2016-07-28 |
JP6211076B2 true JP6211076B2 (ja) | 2017-10-11 |
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JP2015519041A Active JP6211076B2 (ja) | 2012-06-26 | 2013-06-25 | ドープされたSiO2スラリーの製造方法、ならびにそのSiO2スラリーの使用 |
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US (1) | US9518218B2 (ja) |
EP (1) | EP2872454B1 (ja) |
JP (1) | JP6211076B2 (ja) |
CN (1) | CN104411645A (ja) |
DE (1) | DE102012012524B3 (ja) |
WO (1) | WO2014001293A1 (ja) |
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CN105210173A (zh) * | 2013-05-23 | 2015-12-30 | 应用材料公司 | 用于半导体处理腔室的经涂布的衬里组件 |
EP3173386B1 (de) * | 2015-11-25 | 2018-05-02 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung eines verbundkörpers aus hochkieselsäurehaltigem werkstoff |
CN105837025B (zh) * | 2016-04-21 | 2018-12-11 | 烽火通信科技股份有限公司 | 高效制备掺杂光纤预制棒的方法及掺杂光纤预制棒 |
US9969621B2 (en) * | 2016-05-04 | 2018-05-15 | Saudi Arabian Oil Company | Methods for processing fumed metallic oxides |
EP3708547A1 (de) * | 2019-03-13 | 2020-09-16 | Heraeus Quarzglas GmbH & Co. KG | Bauteil aus dotiertem quarzglas für den einsatz in einem plasma-unterstützten fertigungsprozess sowie verfahren zur herstellung des bauteils |
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JPS57205334A (en) * | 1981-06-13 | 1982-12-16 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of silica glass |
JPH09151124A (ja) * | 1995-11-29 | 1997-06-10 | Kao Corp | 熱線遮蔽性粒子及びその製造方法 |
JP4271294B2 (ja) * | 1999-04-28 | 2009-06-03 | 旭化成ケミカルズ株式会社 | 均一粒子径を有する粒子の製造方法 |
DE10065028A1 (de) | 2000-12-23 | 2002-07-18 | Degussa | Mit Kalium dotierte pyrogene Oxide |
DE10065027A1 (de) | 2000-12-23 | 2002-07-04 | Degussa | Wäßrige Dispersion, Verfahren zu deren Herstellung und Verwendung |
US20040005352A1 (en) * | 2002-04-16 | 2004-01-08 | Lopez Gabriel P. | Biologically functionalized porous microspheres |
DE10249747A1 (de) * | 2002-10-25 | 2004-05-06 | Clariant Gmbh | Verfahren und Vorrichtung zur Durchführung chemischer und physikalischer Prozesse |
DE102004006017B4 (de) * | 2003-12-08 | 2006-08-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von laseraktivem Quarzglas und Verwendung desselben |
US7637126B2 (en) | 2003-12-08 | 2009-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Method for the production of laser-active quartz glass and use thereof |
FI116619B (fi) * | 2004-07-02 | 2006-01-13 | Liekki Oy | Menetelmä ja laite optisen materiaalin tuottamiseksi sekä optinen aaltojohde |
DE102006048508A1 (de) * | 2006-10-13 | 2008-04-17 | Evonik Degussa Gmbh | Oberflächenmodifizierte Kieselsäuren |
DE102007015097A1 (de) | 2007-03-29 | 2008-10-02 | Heidelberger Druckmaschinen Ag | Farbmessgerät mit Koordinatenabgleich |
JP5128162B2 (ja) * | 2007-04-06 | 2013-01-23 | 岩崎電気株式会社 | 不透明石英ガラス製品の製造方法、それに用いるシリカ顆粒とその生成方法 |
DE102007045097B4 (de) * | 2007-09-20 | 2012-11-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von co-dotiertem Quarzglas |
CN101850230B (zh) * | 2009-03-31 | 2012-07-04 | 中国石油化工股份有限公司 | 一种流体连续反应器及其应用 |
-
2012
- 2012-06-26 DE DE102012012524A patent/DE102012012524B3/de not_active Expired - Fee Related
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2013
- 2013-06-25 US US14/411,332 patent/US9518218B2/en active Active
- 2013-06-25 EP EP13730603.1A patent/EP2872454B1/de active Active
- 2013-06-25 JP JP2015519041A patent/JP6211076B2/ja active Active
- 2013-06-25 CN CN201380033440.0A patent/CN104411645A/zh active Pending
- 2013-06-25 WO PCT/EP2013/063213 patent/WO2014001293A1/de active Application Filing
Also Published As
Publication number | Publication date |
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EP2872454B1 (de) | 2017-08-09 |
CN104411645A (zh) | 2015-03-11 |
EP2872454A1 (de) | 2015-05-20 |
WO2014001293A1 (de) | 2014-01-03 |
US9518218B2 (en) | 2016-12-13 |
DE102012012524B3 (de) | 2013-07-18 |
US20150197688A1 (en) | 2015-07-16 |
JP2015527962A (ja) | 2015-09-24 |
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