DE102011117498B4 - Verfahren zum fertigen eines substrats - Google Patents
Verfahren zum fertigen eines substrats Download PDFInfo
- Publication number
- DE102011117498B4 DE102011117498B4 DE102011117498.6A DE102011117498A DE102011117498B4 DE 102011117498 B4 DE102011117498 B4 DE 102011117498B4 DE 102011117498 A DE102011117498 A DE 102011117498A DE 102011117498 B4 DE102011117498 B4 DE 102011117498B4
- Authority
- DE
- Germany
- Prior art keywords
- resin layer
- substrate
- structures
- film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 85
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims description 31
- 239000011347 resin Substances 0.000 claims abstract description 95
- 229920005989 resin Polymers 0.000 claims abstract description 95
- 239000010410 layer Substances 0.000 claims abstract description 72
- 239000011241 protective layer Substances 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims description 31
- 239000007788 liquid Substances 0.000 claims description 14
- 238000004528 spin coating Methods 0.000 claims description 5
- 229920001940 conductive polymer Polymers 0.000 claims description 4
- 229920005992 thermoplastic resin Polymers 0.000 claims description 3
- 238000012545 processing Methods 0.000 abstract description 3
- 238000005253 cladding Methods 0.000 abstract 2
- 238000004091 panning Methods 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 10
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- 238000001312 dry etching Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 238000003672 processing method Methods 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- 206010040844 Skin exfoliation Diseases 0.000 description 6
- 238000010030 laminating Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- ZGHFDIIVVIFNPS-UHFFFAOYSA-N 3-Methyl-3-buten-2-one Chemical compound CC(=C)C(C)=O ZGHFDIIVVIFNPS-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 239000005871 repellent Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- -1 polyethylene naphthalate Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229920006300 shrink film Polymers 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010248547A JP5627399B2 (ja) | 2010-11-05 | 2010-11-05 | 保護層付き基板の製造方法および基板加工方法 |
| JP2010-248547 | 2010-11-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102011117498A1 DE102011117498A1 (de) | 2012-05-10 |
| DE102011117498B4 true DE102011117498B4 (de) | 2017-09-07 |
Family
ID=45971388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102011117498.6A Expired - Fee Related DE102011117498B4 (de) | 2010-11-05 | 2011-11-02 | Verfahren zum fertigen eines substrats |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9004666B2 (enExample) |
| JP (1) | JP5627399B2 (enExample) |
| KR (1) | KR101489547B1 (enExample) |
| DE (1) | DE102011117498B4 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6230279B2 (ja) * | 2013-06-06 | 2017-11-15 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| US9919526B2 (en) | 2013-11-29 | 2018-03-20 | Canon Kabushiki Kaisha | Method for manufacturing liquid discharge head |
| CN107710118B (zh) * | 2015-08-17 | 2020-10-16 | 富士胶片株式会社 | 触控面板用层叠体 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002368071A (ja) * | 2001-06-11 | 2002-12-20 | Ulvac Japan Ltd | 処理用基板 |
| DE60020308T2 (de) * | 1999-02-01 | 2005-11-17 | Casio Computer Co., Ltd. | Verfahren zur herstellung eines tintenstrahldruckkopfes |
| US20070017894A1 (en) * | 2005-07-25 | 2007-01-25 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head |
| US20090139891A1 (en) * | 2007-03-01 | 2009-06-04 | Matsushita Electric Industrial Co., Ltd. | Layered shrink film, method for producing layered shrink film, and container using layered shrink film |
| US20090183766A1 (en) * | 2008-01-22 | 2009-07-23 | Hidekazu Takahashi | Semiconductor device and method of manufacturing semiconductor device |
| WO2010126116A1 (ja) * | 2009-04-30 | 2010-11-04 | 日立化成工業株式会社 | 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4688053A (en) * | 1985-07-13 | 1987-08-18 | Canon Kabushiki Kaisha | Liquid jet recording head having a layer of a resin composition curable with an active energy ray |
| US5700316A (en) * | 1996-03-29 | 1997-12-23 | Xerox Corporation | Acoustic ink compositions |
| EP0830945B1 (en) * | 1996-04-04 | 2002-07-10 | Sony Corporation | Printer device and method of manufacturing same |
| JPH10264425A (ja) * | 1997-03-25 | 1998-10-06 | Tohoku Ricoh Co Ltd | 感熱記録装置および感熱製版装置 |
| US6375313B1 (en) | 2001-01-08 | 2002-04-23 | Hewlett-Packard Company | Orifice plate for inkjet printhead |
| JP4054583B2 (ja) | 2001-02-28 | 2008-02-27 | キヤノン株式会社 | インクジェットプリントヘッドの製造方法 |
| US6786576B2 (en) * | 2002-01-17 | 2004-09-07 | Masao Mitani | Inkjet recording head with minimal ink drop ejecting capability |
| JP3960084B2 (ja) * | 2002-03-06 | 2007-08-15 | セイコーエプソン株式会社 | ヘッド駆動装置及び方法、液滴吐出装置、ヘッド駆動プログラム、並びにデバイス製造方法及びデバイス |
| JP3578162B2 (ja) * | 2002-04-16 | 2004-10-20 | セイコーエプソン株式会社 | パターンの形成方法、パターン形成装置、導電膜配線、デバイスの製造方法、電気光学装置、並びに電子機器 |
| JP4182921B2 (ja) * | 2004-06-08 | 2008-11-19 | セイコーエプソン株式会社 | ノズルプレートの製造方法 |
| KR100912413B1 (ko) | 2004-07-15 | 2009-08-14 | 가부시키가이샤 리코 | 액체토출헤드, 액체토출헤드의 노즐부재, 카트리지 및 액체토출 기록장치 |
| JP2006137065A (ja) * | 2004-11-11 | 2006-06-01 | Sony Corp | 液体吐出ヘッドの製造方法 |
| JP2006297652A (ja) * | 2005-04-18 | 2006-11-02 | Canon Inc | 静電チャック |
| JP2007062291A (ja) * | 2005-09-01 | 2007-03-15 | Seiko Epson Corp | 液滴吐出ヘッドの製造方法、液滴吐出ヘッドおよび液滴吐出装置 |
| US20070182777A1 (en) * | 2006-02-08 | 2007-08-09 | Eastman Kodak Company | Printhead and method of forming same |
| JP5305691B2 (ja) | 2008-02-27 | 2013-10-02 | キヤノン株式会社 | 液体吐出ヘッドおよびその製造方法 |
| JP5361231B2 (ja) | 2008-03-26 | 2013-12-04 | キヤノン株式会社 | インクジェット記録ヘッド及び電子デバイス |
| JP5315975B2 (ja) * | 2008-12-19 | 2013-10-16 | セイコーエプソン株式会社 | ノズル基板、液滴吐出ヘッド及び液滴吐出装置並びにこれらの製造方法 |
| JP4775470B2 (ja) * | 2009-03-26 | 2011-09-21 | ブラザー工業株式会社 | ノズルプレートの製造方法 |
-
2010
- 2010-11-05 JP JP2010248547A patent/JP5627399B2/ja active Active
-
2011
- 2011-10-12 US US13/271,279 patent/US9004666B2/en not_active Expired - Fee Related
- 2011-10-28 KR KR20110111100A patent/KR101489547B1/ko not_active Expired - Fee Related
- 2011-11-02 DE DE102011117498.6A patent/DE102011117498B4/de not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60020308T2 (de) * | 1999-02-01 | 2005-11-17 | Casio Computer Co., Ltd. | Verfahren zur herstellung eines tintenstrahldruckkopfes |
| JP2002368071A (ja) * | 2001-06-11 | 2002-12-20 | Ulvac Japan Ltd | 処理用基板 |
| US20070017894A1 (en) * | 2005-07-25 | 2007-01-25 | Canon Kabushiki Kaisha | Method of manufacturing liquid discharge head |
| US20090139891A1 (en) * | 2007-03-01 | 2009-06-04 | Matsushita Electric Industrial Co., Ltd. | Layered shrink film, method for producing layered shrink film, and container using layered shrink film |
| US20090183766A1 (en) * | 2008-01-22 | 2009-07-23 | Hidekazu Takahashi | Semiconductor device and method of manufacturing semiconductor device |
| WO2010126116A1 (ja) * | 2009-04-30 | 2010-11-04 | 日立化成工業株式会社 | 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路 |
| US20120076468A1 (en) * | 2009-04-30 | 2012-03-29 | Tatsuya Makino | Resin composition for forming optical waveguide, resin film for forming optical waveguide, and optical waveguide |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101489547B1 (ko) | 2015-02-03 |
| JP5627399B2 (ja) | 2014-11-19 |
| US9004666B2 (en) | 2015-04-14 |
| JP2012096512A (ja) | 2012-05-24 |
| DE102011117498A1 (de) | 2012-05-10 |
| US20120113200A1 (en) | 2012-05-10 |
| KR20120048486A (ko) | 2012-05-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |