DE102007010882B4 - Verfahren zur Herstellung einer Lötverbindung zwischen einem Halbleiterchip und einem Substrat - Google Patents

Verfahren zur Herstellung einer Lötverbindung zwischen einem Halbleiterchip und einem Substrat Download PDF

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Publication number
DE102007010882B4
DE102007010882B4 DE102007010882A DE102007010882A DE102007010882B4 DE 102007010882 B4 DE102007010882 B4 DE 102007010882B4 DE 102007010882 A DE102007010882 A DE 102007010882A DE 102007010882 A DE102007010882 A DE 102007010882A DE 102007010882 B4 DE102007010882 B4 DE 102007010882B4
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Germany
Prior art keywords
solder
substrate
semiconductor chip
surface area
metal coating
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DE102007010882A
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German (de)
English (en)
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DE102007010882A1 (de
Inventor
Volker Gabler
Thomas Dr. Licht
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Infineon Technologies AG
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Infineon Technologies AG
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Priority to JP2008050828A priority patent/JP2008277757A/ja
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    • H01L2924/01Chemical elements
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    • H01L2924/10Details of semiconductor or other solid state devices to be connected
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    • H01L2924/30Technical effects
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DE102007010882A 2007-03-06 2007-03-06 Verfahren zur Herstellung einer Lötverbindung zwischen einem Halbleiterchip und einem Substrat Expired - Fee Related DE102007010882B4 (de)

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TWI403004B (en) * 2009-09-04 2013-07-21 Led package structure for increasing heat-dissipating effect and light-emitting efficiency and method for making the same
CN101920405B (zh) * 2010-08-23 2013-07-31 中国电力科学研究院 一种镀锌钢接地网用锡铅基复合钎料及其制备方法
CN115609102B (zh) * 2022-09-26 2025-06-03 西安空间无线电技术研究所 一种芯片热沉组件低空洞率焊接方法
CN115945754A (zh) * 2022-12-28 2023-04-11 哈尔滨工业大学重庆研究院 一种降低铅锡银焊接元器件空洞率的焊接工艺

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EP1350588A2 (en) * 2002-03-29 2003-10-08 Fuji Electric Co., Ltd. Method of manufacturing semiconductor device
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JPH05291314A (ja) * 1992-04-10 1993-11-05 Fujitsu General Ltd ベアチップの半田付方法
DE4235908A1 (de) * 1992-10-23 1994-04-28 Telefunken Microelectron Verfahren zum Verlöten eines Halbleiterkörpers mit einem Trägerelement
EP1350588A2 (en) * 2002-03-29 2003-10-08 Fuji Electric Co., Ltd. Method of manufacturing semiconductor device
DE102005001713A1 (de) * 2004-01-20 2005-08-11 Denso Corp., Kariya Verfahren zum Herstellen eines Verbindungsaufbaus

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In Vakuumlötanlagen: Oxidations- und lunkerfreies Löten. In: Elektronik Produktion und Prüftechnik ( EPP), ISSN 0943-0962, Nov. 1994, S. 38-40; Energie sparendes Lötverfahren für lunkerfreie Verbindung: Im Vakuum löten. In: Elektronik Produktion und Pr üftechnik (EPP), ISSN 0943-0962, Juni 2001, S. 24
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