DE102006040769B4 - Halbleiterlaservorrichtung - Google Patents

Halbleiterlaservorrichtung Download PDF

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Publication number
DE102006040769B4
DE102006040769B4 DE102006040769.5A DE102006040769A DE102006040769B4 DE 102006040769 B4 DE102006040769 B4 DE 102006040769B4 DE 102006040769 A DE102006040769 A DE 102006040769A DE 102006040769 B4 DE102006040769 B4 DE 102006040769B4
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DE
Germany
Prior art keywords
layer
reflectance
semiconductor laser
thickness
end surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE102006040769.5A
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German (de)
English (en)
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DE102006040769A1 (de
Inventor
Hiromasu Matsuoka
Yasuyuki Nakagawa
Toshihiko Shiga
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Mitsubishi Electric Corp
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Mitsubishi Electric Corp
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Publication date
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Publication of DE102006040769A1 publication Critical patent/DE102006040769A1/de
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/028Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/028Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0287Facet reflectivity

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
DE102006040769.5A 2005-09-05 2006-08-31 Halbleiterlaservorrichtung Active DE102006040769B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005-256833 2005-09-05
JP2005256833A JP4923489B2 (ja) 2005-09-05 2005-09-05 半導体レーザ装置

Publications (2)

Publication Number Publication Date
DE102006040769A1 DE102006040769A1 (de) 2007-03-15
DE102006040769B4 true DE102006040769B4 (de) 2018-06-21

Family

ID=37763314

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102006040769.5A Active DE102006040769B4 (de) 2005-09-05 2006-08-31 Halbleiterlaservorrichtung

Country Status (5)

Country Link
US (1) US7616673B2 (https=)
JP (1) JP4923489B2 (https=)
KR (1) KR100834867B1 (https=)
DE (1) DE102006040769B4 (https=)
TW (1) TWI299930B (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008277625A (ja) * 2007-05-01 2008-11-13 Mitsubishi Electric Corp 半導体発光素子
JP2009182052A (ja) * 2008-01-29 2009-08-13 Sumitomo Electric Ind Ltd 半導体レーザ素子
CN103688212B (zh) 2011-05-21 2017-11-28 伊英克公司 电光显示器
JP2018006396A (ja) * 2016-06-28 2018-01-11 ウシオ電機株式会社 半導体レーザ素子および半導体レーザ装置
TWI810873B (zh) * 2022-03-29 2023-08-01 華信光電科技股份有限公司 具有高導熱低反射前鏡面之邊射型半導體雷射
CN118748350B (zh) * 2024-06-24 2025-02-25 陕西源杰半导体科技股份有限公司 一种非气密应用的半导体激光器

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3259585B2 (ja) 1995-03-16 2002-02-25 日本鋼管株式会社 耐もらい錆性に優れた有機複合被覆鋼板
US6396864B1 (en) 1998-03-13 2002-05-28 Jds Uniphase Corporation Thermally conductive coatings for light emitting devices
US20030156614A1 (en) 2002-02-19 2003-08-21 Matsushita Electric Industrial Co., Ltd. Semiconductor laser and method for manufacturing the same
US6618409B1 (en) 2000-05-03 2003-09-09 Corning Incorporated Passivation of semiconductor laser facets
US20030210722A1 (en) 2002-03-11 2003-11-13 Takahiro Arakida Semiconductor laser device
US20040238828A1 (en) 2003-03-14 2004-12-02 Sumitomo Electric Industries, Ltd. Semiconductor optical integrated device
US20050127383A1 (en) * 2003-12-10 2005-06-16 Takeshi Kikawa Laser diode and manufacturing method thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261384A (ja) * 1985-09-11 1987-03-18 Mitsubishi Electric Corp 高出力半導体レ−ザ装置
JP2572868B2 (ja) 1990-03-09 1997-01-16 三菱電機株式会社 半導体レーザ
JP2000068586A (ja) 1998-08-20 2000-03-03 Hitachi Ltd 光モジュールおよび光伝送装置
JP2000124554A (ja) * 1998-10-13 2000-04-28 Hitachi Cable Ltd 高消光比半導体光増幅器及びそれを用いた光スイッチ
JP2001119096A (ja) 1999-10-18 2001-04-27 Fuji Photo Film Co Ltd 半導体レーザー装置
JP2001257413A (ja) * 2000-03-14 2001-09-21 Toshiba Electronic Engineering Corp 半導体レーザ装置及びその製造方法
KR100386593B1 (ko) * 2001-04-26 2003-06-09 엘지전자 주식회사 반도체 레이저 다이오드
JP2003110187A (ja) * 2001-10-02 2003-04-11 Rohm Co Ltd 半導体レーザおよびその製造方法
JP2004088049A (ja) * 2002-03-08 2004-03-18 Mitsubishi Electric Corp 光半導体装置
JP3770386B2 (ja) * 2002-03-29 2006-04-26 ユーディナデバイス株式会社 光半導体装置及びその製造方法
JP4097552B2 (ja) * 2003-03-27 2008-06-11 三菱電機株式会社 半導体レーザ装置
JP2004327581A (ja) * 2003-04-23 2004-11-18 Mitsubishi Electric Corp 半導体レーザ装置
JP2004327678A (ja) * 2003-04-24 2004-11-18 Sony Corp 多波長半導体レーザ及びその製造方法
JP4287702B2 (ja) * 2003-06-04 2009-07-01 シャープ株式会社 酸化物半導体発光素子

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3259585B2 (ja) 1995-03-16 2002-02-25 日本鋼管株式会社 耐もらい錆性に優れた有機複合被覆鋼板
US6396864B1 (en) 1998-03-13 2002-05-28 Jds Uniphase Corporation Thermally conductive coatings for light emitting devices
US6618409B1 (en) 2000-05-03 2003-09-09 Corning Incorporated Passivation of semiconductor laser facets
US20030156614A1 (en) 2002-02-19 2003-08-21 Matsushita Electric Industrial Co., Ltd. Semiconductor laser and method for manufacturing the same
US20030210722A1 (en) 2002-03-11 2003-11-13 Takahiro Arakida Semiconductor laser device
US20040238828A1 (en) 2003-03-14 2004-12-02 Sumitomo Electric Industries, Ltd. Semiconductor optical integrated device
US20050127383A1 (en) * 2003-12-10 2005-06-16 Takeshi Kikawa Laser diode and manufacturing method thereof

Also Published As

Publication number Publication date
US7616673B2 (en) 2009-11-10
TW200713722A (en) 2007-04-01
KR100834867B1 (ko) 2008-06-03
JP4923489B2 (ja) 2012-04-25
US20070053398A1 (en) 2007-03-08
JP2007073631A (ja) 2007-03-22
DE102006040769A1 (de) 2007-03-15
TWI299930B (en) 2008-08-11
KR20070026271A (ko) 2007-03-08

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