CZ283292B6 - Způsob prohlížení optického matricového disku a zařízení k provádění tohoto způsobu - Google Patents
Způsob prohlížení optického matricového disku a zařízení k provádění tohoto způsobu Download PDFInfo
- Publication number
- CZ283292B6 CZ283292B6 CZ952571A CZ257195A CZ283292B6 CZ 283292 B6 CZ283292 B6 CZ 283292B6 CZ 952571 A CZ952571 A CZ 952571A CZ 257195 A CZ257195 A CZ 257195A CZ 283292 B6 CZ283292 B6 CZ 283292B6
- Authority
- CZ
- Czechia
- Prior art keywords
- optical matrix
- light beam
- matrix disc
- disc
- developing fluid
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 77
- 239000011159 matrix material Substances 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims abstract description 43
- 239000012530 fluid Substances 0.000 claims abstract description 56
- 238000005452 bending Methods 0.000 claims abstract description 38
- 230000008569 process Effects 0.000 claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 16
- 230000005540 biological transmission Effects 0.000 claims description 7
- 229910052594 sapphire Inorganic materials 0.000 claims description 6
- 239000010980 sapphire Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000012544 monitoring process Methods 0.000 abstract description 3
- 239000011247 coating layer Substances 0.000 description 18
- 239000010410 layer Substances 0.000 description 17
- 238000011161 development Methods 0.000 description 16
- 239000011521 glass Substances 0.000 description 15
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 230000004044 response Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000002745 absorbent Effects 0.000 description 3
- 239000002250 absorbent Substances 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229920002972 Acrylic fiber Polymers 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N Adamantane Natural products C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
- 238000000703 high-speed centrifugation Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000033458 reproduction Effects 0.000 description 1
- 239000008237 rinsing water Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
- G03F7/3028—Imagewise removal using liquid means from a wafer supported on a rotating chuck characterised by means for on-wafer monitoring of the processing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB939307239A GB9307239D0 (en) | 1993-04-07 | 1993-04-07 | Method and apparatus for process control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CZ257195A3 CZ257195A3 (en) | 1996-09-11 |
| CZ283292B6 true CZ283292B6 (cs) | 1998-02-18 |
Family
ID=10733474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CZ952571A CZ283292B6 (cs) | 1993-04-07 | 1994-04-05 | Způsob prohlížení optického matricového disku a zařízení k provádění tohoto způsobu |
Country Status (17)
| Country | Link |
|---|---|
| EP (1) | EP0695438A1 (OSRAM) |
| JP (1) | JPH08508602A (OSRAM) |
| CN (1) | CN1120866A (OSRAM) |
| AU (1) | AU675125B2 (OSRAM) |
| BR (1) | BR9406451A (OSRAM) |
| CA (1) | CA2159100A1 (OSRAM) |
| CZ (1) | CZ283292B6 (OSRAM) |
| FI (1) | FI954769A7 (OSRAM) |
| GB (1) | GB9307239D0 (OSRAM) |
| HU (1) | HUT73543A (OSRAM) |
| IL (1) | IL109238A (OSRAM) |
| NO (1) | NO953933L (OSRAM) |
| NZ (1) | NZ263235A (OSRAM) |
| RU (1) | RU2107893C1 (OSRAM) |
| SG (1) | SG44328A1 (OSRAM) |
| TW (1) | TW255966B (OSRAM) |
| WO (1) | WO1994023343A1 (OSRAM) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7016026B2 (en) * | 2002-04-10 | 2006-03-21 | Baker Hughes Incorporated | Method and apparatus for a downhole refractometer and attenuated reflectance spectrometer |
| US8576686B2 (en) | 2005-01-25 | 2013-11-05 | Cinram Group, Inc. | Apparatus for multilevel optical recording |
| US8472020B2 (en) | 2005-02-15 | 2013-06-25 | Cinram Group, Inc. | Process for enhancing dye polymer recording yields by pre-scanning coated substrate for defects |
| US7535806B2 (en) | 2005-07-07 | 2009-05-19 | Cinram International Inc. | Apparatus and method for detecting laser dropout |
| EP1965383A1 (en) * | 2007-03-02 | 2008-09-03 | Singulus Mastering B.V. | Diffraction order measurement |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5857843U (ja) * | 1981-10-16 | 1983-04-19 | パイオニア株式会社 | フオトレジスト湿式現像装置 |
| JPS59121337A (ja) * | 1982-12-24 | 1984-07-13 | Fujitsu Ltd | レジスト現像装置 |
| EP0379281A3 (en) * | 1989-01-19 | 1991-03-20 | Cosmopolitan Textile Company Limited | Web inspecting method and apparatus |
| JP2861073B2 (ja) * | 1989-07-05 | 1999-02-24 | ソニー株式会社 | 現像装置 |
| US5124216A (en) * | 1990-07-31 | 1992-06-23 | At&T Bell Laboratories | Method for monitoring photoresist latent images |
| JPH04141840A (ja) * | 1990-10-01 | 1992-05-15 | Matsushita Electric Ind Co Ltd | フォトレジスト自動現像装置 |
| JPH04311837A (ja) * | 1991-04-10 | 1992-11-04 | Tdk Corp | 光ディスク原盤の現像方法 |
| US5357304A (en) * | 1992-03-25 | 1994-10-18 | Sony Corporation | Image development apparatus and method |
-
1993
- 1993-04-07 GB GB939307239A patent/GB9307239D0/en active Pending
-
1994
- 1994-04-05 CN CN94191725.8A patent/CN1120866A/zh active Pending
- 1994-04-05 EP EP94911284A patent/EP0695438A1/en not_active Withdrawn
- 1994-04-05 NZ NZ263235A patent/NZ263235A/en unknown
- 1994-04-05 JP JP6521868A patent/JPH08508602A/ja active Pending
- 1994-04-05 AU AU63841/94A patent/AU675125B2/en not_active Ceased
- 1994-04-05 CA CA002159100A patent/CA2159100A1/en not_active Abandoned
- 1994-04-05 RU RU95121761A patent/RU2107893C1/ru active
- 1994-04-05 HU HU9502729A patent/HUT73543A/hu unknown
- 1994-04-05 CZ CZ952571A patent/CZ283292B6/cs unknown
- 1994-04-05 WO PCT/GB1994/000720 patent/WO1994023343A1/en active IP Right Grant
- 1994-04-05 SG SG1995001399A patent/SG44328A1/en unknown
- 1994-04-05 BR BR9406451A patent/BR9406451A/pt not_active Application Discontinuation
- 1994-04-06 TW TW083102979A patent/TW255966B/zh active
- 1994-04-06 IL IL109238A patent/IL109238A/xx not_active IP Right Cessation
-
1995
- 1995-10-03 NO NO953933A patent/NO953933L/no unknown
- 1995-10-06 FI FI954769A patent/FI954769A7/fi not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| WO1994023343A1 (en) | 1994-10-13 |
| BR9406451A (pt) | 1996-01-02 |
| IL109238A0 (en) | 1994-07-31 |
| AU675125B2 (en) | 1997-01-23 |
| EP0695438A1 (en) | 1996-02-07 |
| CZ257195A3 (en) | 1996-09-11 |
| NZ263235A (en) | 1996-07-26 |
| JPH08508602A (ja) | 1996-09-10 |
| SG44328A1 (en) | 1997-12-19 |
| AU6384194A (en) | 1994-10-24 |
| IL109238A (en) | 1997-07-13 |
| HUT73543A (en) | 1996-08-28 |
| RU2107893C1 (ru) | 1998-03-27 |
| FI954769A0 (fi) | 1995-10-06 |
| CN1120866A (zh) | 1996-04-17 |
| FI954769A7 (fi) | 1995-10-06 |
| NO953933D0 (no) | 1995-10-03 |
| GB9307239D0 (en) | 1993-06-02 |
| CA2159100A1 (en) | 1994-10-13 |
| NO953933L (no) | 1995-10-03 |
| HU9502729D0 (en) | 1995-11-28 |
| TW255966B (OSRAM) | 1995-09-01 |
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