CZ2013115A3 - Prístroj s elektronovým svazkem - Google Patents

Prístroj s elektronovým svazkem Download PDF

Info

Publication number
CZ2013115A3
CZ2013115A3 CZ20130115A CZ2013115A CZ2013115A3 CZ 2013115 A3 CZ2013115 A3 CZ 2013115A3 CZ 20130115 A CZ20130115 A CZ 20130115A CZ 2013115 A CZ2013115 A CZ 2013115A CZ 2013115 A3 CZ2013115 A3 CZ 2013115A3
Authority
CZ
Czechia
Prior art keywords
electron beam
axial displacement
beam apparatus
visualizing
adjusting
Prior art date
Application number
CZ20130115A
Other languages
English (en)
Inventor
Ohshima@Takashi
Hatano@Michio
Morishita@Hideo
Original Assignee
Hitachi High - Technologies Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High - Technologies Corporation filed Critical Hitachi High - Technologies Corporation
Publication of CZ2013115A3 publication Critical patent/CZ2013115A3/cs

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20207—Tilt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation

Abstract

Tento vynález navrhuje prístroj s elektronovým svazkem obsahující prostredky pro vizualizování osového posunutí zpomalovacího elektrického pole a prostredky pro úpravu osového posunutí. Prostredky pro vizualizování osového posunutí obsahují reflexní desticku (6) a optický systém (2, 3) pro smerování sekundárního elektronového svazku (9) na reflexní desticku (6) a prostredky pro úpravu osového posunutí obsahují mechanismus (8) pro naklápení a otácení stolku (5) na vzorek. S tímto usporádáním lze v prístroji s elektronovým svazkem, napríklad v rastrovacím elektronovém mikroskopu apod., vyloucit takové problémy, jako je posunutí zorného pole zpusobené posunutím osové symetrie elektrického pole mezi cockou (3) objektivu a vzorkem (4) a neschopnost merit sekundární elektrony a odrazené elektrony, které poskytují zádoucí informace.
CZ20130115A 2010-08-18 2011-07-07 Prístroj s elektronovým svazkem CZ2013115A3 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010182755 2010-08-18

Publications (1)

Publication Number Publication Date
CZ2013115A3 true CZ2013115A3 (cs) 2013-04-03

Family

ID=45605015

Family Applications (1)

Application Number Title Priority Date Filing Date
CZ20130115A CZ2013115A3 (cs) 2010-08-18 2011-07-07 Prístroj s elektronovým svazkem

Country Status (5)

Country Link
US (1) US9208994B2 (cs)
JP (1) JP5676617B2 (cs)
CZ (1) CZ2013115A3 (cs)
DE (1) DE112011102731T5 (cs)
WO (1) WO2012023354A1 (cs)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5416319B1 (ja) * 2012-03-16 2014-02-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料観察システムおよび操作プログラム
JP5709801B2 (ja) 2012-06-06 2015-04-30 株式会社日立ハイテクノロジーズ 試料ホルダ、及び、観察用試料固定方法
WO2014132757A1 (ja) * 2013-02-26 2014-09-04 株式会社 日立ハイテクノロジーズ 荷電粒子線装置
JP5501514B1 (ja) * 2013-09-13 2014-05-21 株式会社日立ハイテクノロジーズ 電子顕微鏡設定システム
JP2017010608A (ja) 2013-10-03 2017-01-12 株式会社日立ハイテクノロジーズ 荷電粒子線の傾斜補正方法および荷電粒子線装置
US9455115B2 (en) * 2014-12-17 2016-09-27 Carl Zeiss Microscopy Gmbh Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system
JP6790559B2 (ja) * 2016-08-02 2020-11-25 日本製鉄株式会社 試料台およびそれを備えた電子顕微鏡
JP6928943B2 (ja) * 2017-03-28 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
DE102018202728B4 (de) 2018-02-22 2019-11-21 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens
JP7170490B2 (ja) * 2018-10-11 2022-11-14 東邦チタニウム株式会社 金属粉体の評価方法、および評価装置
US11538652B2 (en) 2019-11-15 2022-12-27 Fei Company Systems and methods of hysteresis compensation
US11244805B2 (en) 2019-11-15 2022-02-08 Fei Company Electron microscope stage
US11562877B2 (en) 2019-11-15 2023-01-24 Fei Company Systems and methods of clamp compensation
JP2022112409A (ja) * 2021-01-21 2022-08-02 株式会社ニューフレアテクノロジー マルチビーム画像取得装置及びマルチビーム画像取得方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3774953B2 (ja) * 1995-10-19 2006-05-17 株式会社日立製作所 走査形電子顕微鏡
EP0769799B1 (en) 1995-10-19 2010-02-17 Hitachi, Ltd. Scanning electron microscope
JPH1186770A (ja) * 1997-09-12 1999-03-30 Hitachi Ltd 走査電子顕微鏡
JP3649008B2 (ja) * 1998-12-02 2005-05-18 株式会社日立製作所 電子線装置
JP2000286310A (ja) * 1999-03-31 2000-10-13 Hitachi Ltd パターン欠陥検査方法および検査装置
DE69924240T2 (de) 1999-06-23 2006-02-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ladungsträgerteilchenstrahlvorrichtung
US7138629B2 (en) * 2003-04-22 2006-11-21 Ebara Corporation Testing apparatus using charged particles and device manufacturing method using the testing apparatus
US7262411B2 (en) * 2004-12-08 2007-08-28 The Regents Of The University Of California Direct collection transmission electron microscopy
JP4895569B2 (ja) * 2005-01-26 2012-03-14 株式会社日立ハイテクノロジーズ 帯電制御装置及び帯電制御装置を備えた計測装置
JP4111218B2 (ja) * 2005-11-18 2008-07-02 株式会社日立製作所 電子線画像処理方法及びその装置
JP4977509B2 (ja) 2007-03-26 2012-07-18 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5241168B2 (ja) * 2007-08-09 2013-07-17 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP5227643B2 (ja) * 2008-04-14 2013-07-03 株式会社日立ハイテクノロジーズ 高分解能でかつ高コントラストな観察が可能な電子線応用装置
WO2009154953A2 (en) * 2008-06-20 2009-12-23 Carl Zeiss Smt Inc. Sample inspection methods, systems and components
JP5097642B2 (ja) * 2008-08-08 2012-12-12 株式会社日立ハイテクノロジーズ 走査形電子顕微鏡
JP2010055756A (ja) * 2008-08-26 2010-03-11 Hitachi High-Technologies Corp 荷電粒子線の照射方法及び荷電粒子線装置
CN102272878B (zh) * 2008-10-31 2014-07-23 Fei公司 样本厚度的测量和终点确定
JP5374167B2 (ja) * 2009-01-20 2013-12-25 株式会社日立製作所 荷電粒子線装置
JP5307582B2 (ja) * 2009-03-03 2013-10-02 日本電子株式会社 電子顕微鏡

Also Published As

Publication number Publication date
JP5676617B2 (ja) 2015-02-25
US20130146766A1 (en) 2013-06-13
JPWO2012023354A1 (ja) 2013-10-28
DE112011102731T5 (de) 2013-08-22
WO2012023354A1 (ja) 2012-02-23
US9208994B2 (en) 2015-12-08

Similar Documents

Publication Publication Date Title
CZ2013115A3 (cs) Prístroj s elektronovým svazkem
GB2535141A (en) Compact microscope
BR112017016937A2 (pt) sistemas e métodos para avaliação de amostras biológicas
JP2013506152A5 (cs)
EP3657229A3 (en) Microscope, focusing unit, fluid holding unit, and optical unit
EP4236045A3 (en) Optical adjusting apparatus
BR112013012727A2 (pt) "instrumento de levantamento robótico e método para a autocolimação automática de um telescópio de um instrumento de levantamento compreendendo um alvo de autocolimação."
GB2505353A (en) Gimbal instrument having a prealigned and replaceable optics bench
EP2728309A3 (en) Robotic laser pointer apparatus and methods
FR2960698B1 (fr) Systeme de detection de cathodoluminescence reglable et microscope mettant en oeuvre un tel systeme.
EP2690493A3 (en) Illumination light beam forming device, illumination light source device and image display device
EP2495169A3 (en) Precision approach path indicator
EP2637003A3 (en) Spectrometer, and image evaluating unit and image forming device incorporating the same
EP3018404A8 (en) Lens system for an led luminaire
TW200712425A (en) Object size measuring system and method thereof
WO2013036049A3 (ko) 공초점 형광 현미경
WO2014191834A3 (en) Spectometer
MX367095B (es) Instalacion para medir el espesor de la pared de contenedores.
DE602007005795D1 (cs)
MY159053A (en) Multiple scan single pass line scan apparatus for solar cell inspection and methodology thereof
JP2012109227A5 (ja) ライトユニット及び表示装置
WO2012159752A3 (de) Mikroskopiesystem zur augenuntersuchung und verfahren zum betreiben eines mikroskopiesystems
MX340074B (es) Aparato para inspeccionar objetos.
JP2014503842A5 (ja) 共焦点レーザー走査顕微鏡
JP2007034296A5 (cs)