JP5307582B2 - 電子顕微鏡 - Google Patents
電子顕微鏡 Download PDFInfo
- Publication number
- JP5307582B2 JP5307582B2 JP2009049253A JP2009049253A JP5307582B2 JP 5307582 B2 JP5307582 B2 JP 5307582B2 JP 2009049253 A JP2009049253 A JP 2009049253A JP 2009049253 A JP2009049253 A JP 2009049253A JP 5307582 B2 JP5307582 B2 JP 5307582B2
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- JP
- Japan
- Prior art keywords
- aperture
- spherical aberration
- lens
- stop
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/023—Means for mechanically adjusting components not otherwise provided for
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0451—Diaphragms with fixed aperture
- H01J2237/0453—Diaphragms with fixed aperture multiple apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
- H01J2237/0456—Supports
- H01J2237/0458—Supports movable, i.e. for changing between differently sized apertures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2802—Transmission microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2823—Resolution
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Description
X0=(1/M)n+1C
と表される。つまり、倍率Mを大きくすると、それだけ球面収差補正装置14にて発生する収差の試料上における寄与が小さくなる。従って、特許文献2に記載されているように磁界型十二極子のボア半径を小さく、且つ励磁電流を大きくすることで、対物レンズ17の球面収差を相殺しつつ他の収差の寄与を抑える。
2:光軸
3:電子線
10:顕微鏡本体
11:電子銃11
12:収束レンズ
13:開口絞り
14:球面収差補正装置
15:伝達レンズ系(転送レンズ系)15
15a:第1伝達レンズ
15b:第2伝達レンズ
16:開口角絞り
16a〜16e:アパーチャー
17:対物レンズ
18:試料ホルダ
18a:試料
19:検出器
20:制御装置
30:磁界型十二極子
Claims (5)
- 電子線を発生する電子銃と、
前記電子銃の後段に設けられる球面収差補正装置と、
前記球面収差補正装置の後段に設けられる伝達レンズ系と、
前記伝達レンズ系の後段に設けられる対物レンズと、
前記球面収差補正装置の前段に、光軸に対して移動可能に設けられる開口絞りと、
前記伝達レンズ系の主面又はその近傍に前記光軸に対して移動可能に設けられ、前記電子線の開口角を調整する開口角絞りと
を備えることを特徴とする電子顕微鏡。 - 前記伝達レンズ系は軸対称レンズ対であり、
前記伝達レンズ系の倍率は1以上であることを特徴とする請求項1に記載の電子顕微鏡。 - 前記開口角絞りは軸対称レンズ対のうちの後段のレンズの主面から前記対物レンズの前方焦点面の間に設けられることを特徴とする請求項2に記載の電子顕微鏡。
- 前記開口角絞りは穴径の異なる複数のアパーチャーからなることを特徴とする請求項1乃至請求項3の何れかに記載の電子顕微鏡。
- 前記開口角絞りの各アパーチャーの穴径は50μm以上であることを特徴とする請求項4に記載の電子顕微鏡。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009049253A JP5307582B2 (ja) | 2009-03-03 | 2009-03-03 | 電子顕微鏡 |
US12/711,467 US8664599B2 (en) | 2009-03-03 | 2010-02-24 | Electron microscope |
AT10250366T ATE539444T1 (de) | 2009-03-03 | 2010-03-02 | Elektronenmikroskop |
EP10250366A EP2226831B1 (en) | 2009-03-03 | 2010-03-02 | Electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009049253A JP5307582B2 (ja) | 2009-03-03 | 2009-03-03 | 電子顕微鏡 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010205539A JP2010205539A (ja) | 2010-09-16 |
JP5307582B2 true JP5307582B2 (ja) | 2013-10-02 |
Family
ID=42174481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009049253A Active JP5307582B2 (ja) | 2009-03-03 | 2009-03-03 | 電子顕微鏡 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8664599B2 (ja) |
EP (1) | EP2226831B1 (ja) |
JP (1) | JP5307582B2 (ja) |
AT (1) | ATE539444T1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CZ2013115A3 (cs) * | 2010-08-18 | 2013-04-03 | Hitachi High - Technologies Corporation | Prístroj s elektronovým svazkem |
EP2622626B1 (en) * | 2010-09-28 | 2017-01-25 | Applied Materials Israel Ltd. | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
US8933425B1 (en) | 2011-11-02 | 2015-01-13 | Kla-Tencor Corporation | Apparatus and methods for aberration correction in electron beam based system |
US10184790B2 (en) * | 2014-06-30 | 2019-01-22 | Hitachi High-Technologies Corporation | Pattern measurement method and pattern measurement device |
US9595417B2 (en) * | 2014-12-22 | 2017-03-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | High resolution charged particle beam device and method of operating the same |
US9922799B2 (en) | 2015-07-21 | 2018-03-20 | Hermes Microvision, Inc. | Apparatus of plural charged-particle beams |
EP3869182A1 (en) * | 2020-02-19 | 2021-08-25 | FEI Company | Device and method for determining a property of a sample that is to be used in a charged particle microscope |
JP2022182527A (ja) * | 2021-05-28 | 2022-12-08 | 株式会社ブイ・テクノロジー | 集束イオンビーム装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE898046C (de) * | 1942-03-27 | 1953-11-26 | Siemens Ag | Korpuskularstrahlapparat |
US4694178A (en) * | 1985-06-28 | 1987-09-15 | Control Data Corporation | Multiple channel electron beam optical column lithography system and method of operation |
EP1610358B1 (en) * | 2004-06-21 | 2008-08-27 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Aberration correction device and method for operating same |
JP4851148B2 (ja) | 2005-09-27 | 2012-01-11 | 日本電子株式会社 | 電子顕微鏡 |
JP2007173132A (ja) | 2005-12-26 | 2007-07-05 | Hitachi High-Technologies Corp | 走査透過電子顕微鏡、および走査透過電子顕微鏡の調整方法 |
JP4881661B2 (ja) * | 2006-06-20 | 2012-02-22 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP5537050B2 (ja) * | 2008-04-11 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 集束イオンビーム装置 |
-
2009
- 2009-03-03 JP JP2009049253A patent/JP5307582B2/ja active Active
-
2010
- 2010-02-24 US US12/711,467 patent/US8664599B2/en active Active
- 2010-03-02 EP EP10250366A patent/EP2226831B1/en active Active
- 2010-03-02 AT AT10250366T patent/ATE539444T1/de active
Also Published As
Publication number | Publication date |
---|---|
US8664599B2 (en) | 2014-03-04 |
EP2226831B1 (en) | 2011-12-28 |
ATE539444T1 (de) | 2012-01-15 |
JP2010205539A (ja) | 2010-09-16 |
US20100224781A1 (en) | 2010-09-09 |
EP2226831A1 (en) | 2010-09-08 |
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