CN212559995U - Medium-transmittance LOW-reflection temperable double-silver LOW-E glass - Google Patents
Medium-transmittance LOW-reflection temperable double-silver LOW-E glass Download PDFInfo
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Abstract
The utility model provides a middle-transparent LOW-reflection temperable double-silver LOW-E glass, which belongs to the technical field of magnetron sputtering coating, and the utility model improves the phenomenon that temperable products are greenish in color through the optimized design of a glass coating layer, and simultaneously avoids the problem of small-angle color change of a glass surface; the coated glass comprises a glass substrate layer and a coated layer, wherein fifteen film layers are sequentially compounded from the glass substrate layer to the outside, the first layer, the second layer and the third layer are first dielectric medium combined layers, the fourth layer is a LOW-radiation functional layer, the fifth layer is a first blocking protective layer, the sixth layer and the seventh layer are crystal bed dielectric layers, the eighth layer is an alloy layer, the ninth layer and the tenth layer are second dielectric medium combined layers, the eleventh layer is a LOW-radiation functional layer, the twelfth layer is a second blocking protective layer, and the thirteenth layer is a crystal bed dielectric layer. The utility model discloses glass has advantages such as product colour is extensive, wearability is good.
Description
Technical Field
The utility model belongs to the technical field of magnetron sputtering coating film, concretely relates to but two silver-colored LOW-E glass of tempering are passed through to well.
Background
As an excellent building material, glass has the functions of light transmission, ultraviolet protection and wind and snow protection due to good permeability, and is widely applied to buildings. With the development of modern technology level, glass is endowed with various new connotations, wherein the low-E glass is widely applied to the field of building curtain walls by virtue of beautiful and elegant color, better texture and excellent energy-saving characteristic. The Low-E glass is also called Low-emissivity glass, and a magnetron sputtering method is commonly used to deposit a nano film layer on the surface of a glass substrate, so that the optical, electrical, mechanical and chemical properties of the glass are changed, and the purposes of decoration, energy conservation, environmental protection and the like are achieved.
As an energy-saving building material, compared with common glass and heat reflection coated glass, the Low-E glass has the energy-saving characteristic of Low-E glass, and has extremely high reflectivity to far infrared radiation. Under the effect of effectively reducing indoor and outdoor heat transfer, the indoor temperature is kept stable, the energy consumption of heating or refrigerating a building is reduced, and very excellent energy-saving and consumption-reducing effects are achieved. The steel film system is suitable for large-area production, has the most efficient production flow at present, and can be subjected to subsequent cutting, grinding, steel clamping and other processes, so that the steel film system is widely concerned and becomes a great trend of development of low-E glass in the future. Along with the advocation of an energy-saving concept, various policies for encouraging energy conservation and environmental protection come out, the LOW-E glass is used as an energy-saving building product, the market competition is more intense, and how to develop a novel material LOW-E product and achieve good performance is achieved, so that the key for improving the competitiveness of glass deep processing enterprises is to meet the requirements of customers. The prior art has the following disadvantages:
1) the existing steel has wider range of penetrating through a type and has greenish penetrating color;
2) the existing large plate capable of being tempered has small thickness.
Disclosure of Invention
The utility model aims at the above-mentioned problem that prior art exists, provide a but two silver-colored LOW-E glass of tempering and preparation method of middle transparent LOW reflection, the utility model discloses the technical problem that will solve is how to improve but tempering product and see through the greenish brown phenomenon of colour through the design on coating film layer, avoids glass face small-angle discoloration problem simultaneously.
The purpose of the utility model can be realized by the following technical proposal: the middle-transparent LOW-reflection toughened double-silver LOW-E glass is characterized by comprising a glass substrate layer and a coated film layer, wherein the coated film layer is sequentially compounded with fifteen film layers from the glass substrate layer to the outside, the first layer, the second layer and the third layer are first dielectric combined layers, the fourth layer is a LOW-radiation functional layer, the fifth layer is a first blocking protective layer, the sixth layer and the seventh layer are crystal bed dielectric layers, the eighth layer is an alloy layer, the ninth layer and the tenth layer are second dielectric combined layers, the eleventh layer is a LOW-radiation functional layer, the twelfth layer is a second blocking protective layer, the thirteenth layer is a crystal bed dielectric layer, the fourteenth layer is a third dielectric layer, and the fifteenth layer is a wear-resistant layer.
In the above two silver low-emissivity coated glass of panorama grey, the first layer is the SiNx layer, the second layer is the ZnSnO layer, the third ZnO layer, the fourth layer is the Ag layer, the fifth layer is the NiCr layer, the sixth layer is the AZO layer, the seventh layer is the SiNx layer, the eighth layer is the CuNiTi (alloy) layer, the ninth layer is the SiNx layer, the tenth layer is the ZnO layer, the eleventh layer is the Ag layer, the twelfth layer is the NiCr layer, the thirteenth layer is the AZO layer, the fourteenth layer is the SiNx layer, the fifteenth layer is the Zr layer.
The product adopts the alloy as the sandwich layer, has wide color range, and can be used as a curtain wall product for lap-joint flat bending; meanwhile, the outermost layer of the wear-resistant coating is a zirconium (Zr) layer which has good wear resistance, so that the wear-resistant coating has excellent scratch resistance.
A preparation method of medium-transmittance LOW-reflection temperable double-silver LOW-E glass is characterized by comprising the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 20-30 nm;
B. magnetron sputtering the second layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is provided with zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 5-7 nm;
C. magnetron sputtering the third layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 3-5 nm;
D. magnetron sputtering the fourth layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the plated film is 2-6 nm;
E. performing magnetron sputtering on a fifth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); process gas: pure argon gas; sputtering pressure of 2 &3×10-3mbar; the thickness of the coating film is 0.5-1.5 nm;
F. magnetron sputtering a sixth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar; the thickness of the plated film is 7-9 nm;
G. magnetron sputtering a seventh layer:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 5-8 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be cobalt nickel titanium alloy (CuNiTi); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 2-8 nm;
I. magnetron sputtering the ninth layer:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1: 0.8; sputtering pressure of 3 to 5 × 10-3mbar; the thickness of the plated film is 30-40 nm;
J. magnetron sputtering the tenth layer:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas is argon and nitrogen, and the ratio of argon to nitrogen is 1: 2; sputtering pressure of 3 to 5 × 10-3mbar; the thickness of the coating film is 10-15 nm;
K. magnetron sputtering the eleventh layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon gas; the sputtering pressure is as follows: 2 to 3:x10-3mbar; the thickness of the coating film is 3-5 nm;
l, magnetron sputtering a twelfth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar; the thickness of the coating film is 1.5-1.8 nm;
m, magnetron sputtering a thirteenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar; the thickness of the plated film is 6-8 nm;
n, magnetron sputtering a fourteenth layer:
4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas is argon and nitrogen, and the ratio of argon to nitrogen is 1: 0.8; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the coating film is 30-45 nm;
o, magnetron sputtering a fifteenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target is configured as zirconium oxide (Zro); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to oxygen is 1: 0.3; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the plated film is 5-10 nm;
2) the total thickness of the plating layer is controlled to be 175-190 nm.
The method determines the thickness of each film layer and corresponding control parameters through software design, process debugging and experiments; meanwhile, the process gas proportion (particularly, the alloy layer is CuNiTi target and Zrox target) of each target material is determined by repeated experiments, and the software simulation parameters are determined under the condition of corresponding gas proportion; and the low-emissivity coated glass can be produced into a flat-bending matching process.
The utility model discloses the advantage:
1. the 6mm single sheet transmittance T of the product of the patent technology belongs to [ 30%, 50% ].
2. The transmission type a is within-3.
3. The alloy can be processed by a hot working process and resists high temperature of 700 ℃.
4. Is suitable for large plate series products, and can be processed to a thickness of 3-12 mm.
5. The alloy is used as a sandwich layer, the color range of the product is wide, and the alloy can be used for lap-joint, trim and bending of curtain wall products.
Drawings
FIG. 1 is a LOW-transmittance LOW-reflection temperable double-silver LOW-E glass.
In the figure, G, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. the eleventh layer; 12. a twelfth layer; 13. a thirteenth layer; 14. a fourteenth layer; 15. and a tenth five layer.
Detailed Description
The following are specific embodiments of the present invention and the accompanying drawings are used to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.
As shown in fig. 1, the medium-transmittance LOW-reflectivity tempered double-silver LOW-E glass comprises a glass substrate layer G and a plated film layer, wherein the plated film layer is formed by sequentially compounding fifteen film layers from the glass substrate layer G to the outside, wherein a first layer 1, a second layer 2 and a third layer 3 are first dielectric combination layers, a fourth layer 4 is a LOW-radiation functional layer, a fifth layer 5 is a first blocking protective layer, a sixth layer 6 and a seventh layer 7 are crystal bed dielectric layers, an eighth layer 8 is an alloy layer, a ninth layer 9 and a tenth layer 10 are second dielectric combination layers, a eleventh layer 11 is a LOW-radiation functional layer, a twelfth layer 12 is a second blocking protective layer, a thirteenth layer 13 is a crystal bed dielectric layer, a fourteenth layer 14 is a third dielectric layer, and a fifteenth layer 15 is a wear-resistant layer.
The first layer 1 is a SiNx layer, the second layer 2 is a ZnSnO layer, the third layer 3 is a ZnO layer, the fourth layer 4 is an Ag layer, the fifth layer 5 is a NiCr layer, the sixth layer 6 is an AZO layer, the seventh layer 7 is a SiNx layer, the eighth layer 8 is a CuNiTi (alloy) layer, the ninth layer 9 is a SiNx layer, the tenth layer 10 is a ZnO layer, the eleventh layer 11 is an Ag layer, the twelfth layer 12 is a NiCr layer, the thirteenth layer 13 is an AZO layer, the fourteenth layer 14 is a SiNx layer, and the fifteenth layer 15 is a Zr layer.
The product adopts the alloy as the sandwich layer, has wide color range, and can be used as a curtain wall product for lap-joint flat bending; meanwhile, the outermost layer of the wear-resistant coating is a zirconium (Zr) layer which has good wear resistance, so that the wear-resistant coating has excellent scratch resistance.
A preparation method of medium-transmittance LOW-reflection temperable double-silver LOW-E glass is characterized by comprising the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer 1:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-30 nm;
B. magnetron sputtering of the second layer 2:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is provided with zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 5-7 nm;
C. magnetron sputtering of the third layer 3:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 3-5 nm;
D. magnetron sputtering of the fourth layer 4:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the plated film is 2-6 nm;
E. magnetron sputtering of the fifth layer 5:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); process gas: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the coating film is 0.5-1.5 nm;
F. magnetron sputtering the sixth layer 6:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 7-9 nm;
G. magnetron sputtering of the seventh layer 7:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 5-8 nm;
H. magnetron sputtering the eighth layer 8:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be cobalt nickel titanium alloy (CuNiTi); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 2-8 nm;
I. magnetron sputtering the ninth layer 9:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1: 0.8; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the plated film is 30-40 nm;
J. magnetron sputtering the tenth layer 10:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas is argon and nitrogen, and the ratio of argon to nitrogen is 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the coating film is 10-15 nm;
K. magnetron sputtering the eleventh layer 11:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon gas; the sputtering pressure is as follows: 2-3 x 10-3 mbar; the thickness of the coating film is 3-5 nm;
l, magnetron sputtering a twelfth layer 12:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the coating film is 1.5-1.8 nm;
m, magnetron sputtering a thirteenth layer 13:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 6-8 nm;
n, magnetron sputtering a fourteenth layer 14:
4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas is argon and nitrogen, and the ratio of argon to nitrogen is 1: 0.8; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the coating film is 30-45 nm;
o, magnetron sputtering a fifteenth layer 15:
the number of the targets is as follows: 1 alternating current rotating target; the target is configured as zirconium oxide (Zro); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to oxygen is 1: 0.3; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the plated film is 5-10 nm;
2) the total thickness of the plating layer is controlled to be 175-190 nm.
The method determines the thickness of each film layer and corresponding control parameters through software design, process debugging and experiments; meanwhile, the process gas proportion (particularly, the alloy layer is CuNiTi target and Zrox target) of each target material is determined by repeated experiments, and the software simulation parameters are determined under the condition of corresponding gas proportion; and the low-emissivity coated glass can be produced into a flat-bending matching process.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications, additions and substitutions for the specific embodiments described herein may be made by those skilled in the art without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
Claims (2)
1. A middle-transparent LOW-reflection temperable double-silver LOW-E glass is characterized in that the coated glass comprises a glass substrate layer (G) and a coating layer, fifteen film layers are compounded on the film coating layer from the glass substrate layer (G) to the outside in sequence, the first layer (1), the second layer (2) and the third layer (3) are first dielectric medium combined layers, the fourth layer (4) is a low-radiation functional layer, the fifth layer (5) is a first blocking protective layer, the sixth layer (6) and the seventh layer (7) are crystal bed dielectric layers, the eighth layer (8) is an alloy layer, the ninth layer (9) and the tenth layer (10) are second dielectric medium combined layers, the eleventh layer (11) is a low-radiation functional layer, the twelfth layer (12) is a second blocking protective layer, the thirteenth layer (13) is a crystal bed dielectric layer, the fourteenth layer (14) is a third dielectric layer, and the fifteenth layer (15) is a wear-resistant layer.
2. The mid-transparent LOW-reflectivity tempered double-silver LOW-E glass as claimed in claim 1, wherein the first layer (1) is a SiNx layer, the second layer (2) is a ZnSnO layer, the third layer (3) is a ZnO layer, the fourth layer (4) is an Ag layer, the fifth layer (5) is a NiCr layer, the sixth layer (6) is an AZO layer, the seventh layer (7) is a SiNx layer, the eighth layer (8) is a CuNiTi layer, the ninth layer (9) is a SiNx layer, the tenth layer (10) is a ZnO layer, the eleventh layer (11) is an Ag layer, the twelfth layer (12) is a NiCr layer, the tenth layer (13) is an AZO layer, the fourteenth layer (14) is a SiNx layer, and the tenth layer (15) is a Zr layer.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111995258A (en) * | 2020-09-29 | 2020-11-27 | 咸宁南玻节能玻璃有限公司 | Medium-transmittance LOW-reflection temperable double-silver LOW-E glass and preparation method thereof |
| WO2024058746A1 (en) * | 2022-09-16 | 2024-03-21 | Turkiye Sise Ve Cam Fabrikalari A.S. | A low-e coated glass with reduced angular color change |
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2020
- 2020-09-29 CN CN202022194165.0U patent/CN212559995U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111995258A (en) * | 2020-09-29 | 2020-11-27 | 咸宁南玻节能玻璃有限公司 | Medium-transmittance LOW-reflection temperable double-silver LOW-E glass and preparation method thereof |
| WO2024058746A1 (en) * | 2022-09-16 | 2024-03-21 | Turkiye Sise Ve Cam Fabrikalari A.S. | A low-e coated glass with reduced angular color change |
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