CN212476547U - Medium-transmittance low-reflection gray double-silver low-emissivity coated glass - Google Patents
Medium-transmittance low-reflection gray double-silver low-emissivity coated glass Download PDFInfo
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- CN212476547U CN212476547U CN202020738634.8U CN202020738634U CN212476547U CN 212476547 U CN212476547 U CN 212476547U CN 202020738634 U CN202020738634 U CN 202020738634U CN 212476547 U CN212476547 U CN 212476547U
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Abstract
The utility model provides a medium-transparent low-reflection gray double-silver low-emissivity coated glass and a preparation method thereof, belonging to the technical field of magnetron sputtering coating; in the utility model, the reflectivity of the product is reduced and the oxidation resistance of the product is improved through the optimized design of the film coating layer of the coated glass; the middle-transmission low-reflection gray double-silver low-radiation coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein the coated layer is sequentially compounded with nine film layers from the glass substrate layer to the outside, the first layer and the second layer are first dielectric medium combined layers, the third layer is a low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer and the sixth layer are second dielectric medium combined layers, the seventh layer is a low-radiation functional layer, the eighth layer is a second blocking protective layer, and the ninth layer is a third dielectric medium layer. The glass of the utility model has the advantages of low reflectivity, strong oxidation resistance and the like.
Description
Technical Field
The utility model belongs to the technical field of magnetron sputtering coating film, concretely relates to two silver low-emissivity coated glass of low anti-grey of well passing through.
Background
As an excellent building material, glass has the functions of light transmission and wind and snow resistance due to good permeability, and is widely applied to buildings. With the development of modern technology level, glass is endowed with various new connotations, wherein the low-E glass is widely applied to the field of building curtain walls by virtue of beautiful and elegant color, better texture and excellent energy-saving characteristic. The Low-E glass is also called Low-emissivity glass, and a magnetron sputtering method is commonly used to deposit a nano film layer on the surface of a glass substrate, so that the optical, electrical, mechanical and chemical properties of the glass are changed, and the purposes of decoration, energy conservation, environmental protection and the like are achieved.
As an energy-saving building material, compared with common glass and heat reflection coated glass, the Low-E glass has the energy-saving characteristic of Low-E glass, and has extremely high reflectivity to far infrared radiation. Can keep the indoor temperature stable, reduce the energy consumption of building heating or refrigeration, play very outstanding energy saving and consumption reduction effect. The middle-transmission low-reflection low-radiation coated glass has gray overall color and is more acceptable to human eyes, the overall radiation rate is close to that of white glass, and the oxidation resistance is higher.
SUMMERY OF THE UTILITY MODEL
The utility model aims at the above-mentioned problem that exists to current technique, provide a well transparent low two silver low-emissivity coated glass of anti-grey and preparation method, the utility model discloses the technical problem that will solve is how to reduce the reflectivity of product through the rete optimal design to coated glass, improves the anti oxidation ability of product simultaneously.
The purpose of the utility model can be realized by the following technical proposal: the middle-transmission low-reflection gray double-silver low-radiation coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein the coated layer is sequentially compounded with nine film layers from the glass substrate layer to the outside, the first layer and the second layer are first dielectric medium combined layers, the third layer is a low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer and the sixth layer are second dielectric medium combined layers, the seventh layer is a low-radiation functional layer, the eighth layer is a second blocking protective layer, and the ninth layer is a third dielectric medium layer.
In the medium-transmission low-reflection gray double-silver low-emissivity coated glass, the first layer is SiNxThe second layer is a ZnAl layer, the third layer is an Ag layer, the fourth layer is a NiCr layer, and the fifth layer is SiNxThe sixth layer is a ZnAl layer, the seventh layer is an Ag layer, the eighth layer is a NiCr layer, and the ninth layer is a SiNx layer.
Because the film layer reflectivity of the low-transmission and low-reflection gray double-silver low-radiation coated glass is low, the overall product is gray when the common white glass sheet is used for production.
A preparation method of medium-transmission low-reflection gray double-silver low-emissivity coated glass is characterized by comprising the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 20-30 nm;
B. magnetron sputtering the second layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: pure argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 20-25 nm;
C. magnetron sputtering the third layer:
number of targetsQuantity: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the plated film is 7-7.5 nm;
D. magnetron sputtering the fourth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 0.2-0.4 nm;
E. performing magnetron sputtering on a fifth layer:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 40-45 nm;
F. magnetron sputtering a sixth layer:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: pure argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 20-25 nm;
G. magnetron sputtering a seventh layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the plated film is 7-7.5 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon gas, the sputtering pressure is 2-3 x 10-3mbar; the thickness of the coating film is 0.2-0.4 nm;
I. magnetron sputtering the ninth layer:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 40-45 nm;
2) the total film thickness is controlled at 154-186nm, and the transmission speed of the sputtering chamber is controlled at 4.0-5.0 m/min.
The utility model discloses the advantage:
1. the transmittance of the 6mm single sheet of the product of the patent technology is 50-58%.
2. 6mm single-chip outdoor reflection Y5, 8, indoor reflection Y2, 10
3. The appearance color is gray, wherein the transmission color a is E < -1.5, -1 >, b is E < -1.5, -1 >; the film surface color a E-8, -7, b E-8.5, -7.5; glass surface color a E [ -0.1, -0.5], b E [ -3, -2.5 ]; the small angle color of the glass surface a E-2.5-2, b E-4.5-3.5.
4. Good oxidation resistance, and the time is more than 70 hours (the humidity is more than or equal to 70 percent, and the temperature is more than or equal to 20 ℃) when the test is placed in a workshop.
Drawings
FIG. 1 is a schematic view of the layered structure of the low-e solar control coated glass.
In the figure, G, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. A fourth layer; 5. a fifth layer, 6, a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. and a ninth layer.
Detailed Description
The following are specific embodiments of the present invention and the accompanying drawings are used to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.
As shown in fig. 1, a medium-transmittance low-reflection gray double-silver low-emissivity coated glass comprises a glass substrate layer G and a coated layer, wherein the coated layer is sequentially compounded with nine film layers from the glass substrate layer G to the outside, wherein the first layer 1 and the second layer 2 are first dielectric combination layers, the third layer 3 is a low-emissivity functional layer, the fourth layer 4 is a first blocking protective layer, the fifth layer 5 and the sixth layer 6 are second dielectric combination layers, the seventh layer 7 is a low-emissivity functional layer, the eighth layer 8 is a second blocking protective layer, and the ninth layer 9 is a third dielectric layer; the first layer 1 is a SiNx layer, the second layer 2 is a ZnAl layer, the third layer 3Ag is a NiCr layer, the fourth layer 4 is a SiNx layer, the fifth layer 5 is a SiNx layer, the sixth layer 6 is a ZnAl layer, the seventh layer 7Ag is a NiCr layer, the eighth layer 8 is a NiCr layer, and the ninth layer 9 is a SiNx layer; because the film layer reflectivity of the low-transmission and low-reflection gray double-silver low-radiation coated glass is low, the overall product is gray when the common white glass sheet is used for production.
A preparation method of medium-transmission low-reflection gray double-silver low-emissivity coated glass comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer 1:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-30 nm;
B. magnetron sputtering of the second layer 2:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: pure argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-25 nm;
C. magnetron sputtering of the third layer 3:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 7-7.5 nm;
D. magnetron sputtering of the fourth layer 4:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 0.2-0.4 nm;
E. magnetron sputtering of the fifth layer 5:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 40-45 nm;
F. magnetron sputtering the sixth layer 6:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: pure argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-25 nm;
G. magnetron sputtering of the seventh layer 7:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the plated film is 7-7.5 nm;
H. magnetron sputtering the eighth layer 8:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the coating film is 0.2-0.4 nm;
I. magnetron sputtering the ninth layer 9:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 40-45 nm;
2) the total film thickness is controlled at 154-186nm, and the transmission speed of the sputtering chamber is controlled at 4.0-5.0 m/min.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications, additions and substitutions for the specific embodiments described herein may be made by those skilled in the art without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
Claims (1)
1. The medium-transmittance low-reflection gray double-silver low-radiation coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein the coated layer is sequentially compounded with nine film layers from the glass substrate layer to the outside, the first layer and the second layer are first dielectric medium combined layers, the third layer is a low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer and the sixth layer are second dielectric medium combined layers, the seventh layer is a low-radiation functional layer, the eighth layer is a second blocking protective layer, and the ninth layer is a third dielectric medium layer; the first layer is SiNxThe second layer is a ZnAl layer, the third layer is an Ag layer, the fourth layer is a NiCr layer, and the fifth layer is SiNxA layer, the sixth layer being a ZnAl layer, aThe seventh Ag layer, the eighth NiCr layer, the ninth SiN layerxAnd (3) a layer.
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| CN111393038A (en) * | 2020-05-08 | 2020-07-10 | 深圳南玻科技有限公司 | Medium-transmittance low-reflection gray double-silver low-emissivity coated glass and preparation method thereof |
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