CN110092594A - Three silver coating glass of one kind and preparation method thereof - Google Patents
Three silver coating glass of one kind and preparation method thereof Download PDFInfo
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- CN110092594A CN110092594A CN201910472800.6A CN201910472800A CN110092594A CN 110092594 A CN110092594 A CN 110092594A CN 201910472800 A CN201910472800 A CN 201910472800A CN 110092594 A CN110092594 A CN 110092594A
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- glass
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- 239000011521 glass Substances 0.000 title claims abstract description 70
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 62
- 239000004332 silver Substances 0.000 title claims abstract description 62
- 239000011248 coating agent Substances 0.000 title claims abstract description 39
- 238000000576 coating method Methods 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title abstract description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229910003087 TiOx Inorganic materials 0.000 claims abstract description 11
- 229910006852 SnOy Inorganic materials 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 16
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 12
- 230000005540 biological transmission Effects 0.000 claims description 5
- 239000004035 construction material Substances 0.000 claims description 2
- 238000006124 Pilkington process Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 141
- 239000007789 gas Substances 0.000 description 32
- 238000000151 deposition Methods 0.000 description 28
- 230000008021 deposition Effects 0.000 description 28
- 239000012495 reaction gas Substances 0.000 description 26
- 239000011787 zinc oxide Substances 0.000 description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000002346 layers by function Substances 0.000 description 6
- 239000005344 low-emissivity glass Substances 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- KMWBBMXGHHLDKL-UHFFFAOYSA-N [AlH3].[Si] Chemical compound [AlH3].[Si] KMWBBMXGHHLDKL-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 229910007717 ZnSnO Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 2
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention provides a kind of three silver coating glass and preparation method thereof, three silver coating glass from side to other side successively include glass substrate layer, first medium layer, the first silver layer, second dielectric layer, the second silver layer, third dielectric layer, third silver layer and the 4th dielectric layer；The first medium layer, the second dielectric layer, the third dielectric layer and the 4th dielectric layer are multilayer dielectricity layer, and are respectively selected from Si3N4Layer, TiOxLayer, SnOyLayer, ZnOzLayer, ZnSnOa+bAt least two in layer and AZO layers；Wherein 0 < x≤2,0 < y≤2,0 < z≤1,0 < b≤2,0 a≤1 <.The present invention provides a kind of three silver coating glass, not only has good optically and thermally performance, is also equipped with appearance looks elegant and the small advantage of misalignment.
Description
Technical field
The present invention relates to glass material fields, more particularly to a kind of preparation method of three silver coating glass.
Background technique
Low radiation coated glass is one or more layers metal of coating, alloy or metal compound film on glass, to change
The optical property for becoming glass meets certain particular requirement, for example reduces thermal emissivity rate, reduces the purpose of thermal losses.
With the raising of building energy conservation requirement, low radiation coated glass is fast-developing, from initial single Silver-based low emissivity
Glass develops as double Silver-based low emissivity glass.
Low emissivity glass be usually used vacuum magnetron sputtering coating film equipment glass surface plate multiple layer metal or other
The product of compound film.Single Silver-based low emissivity glass only has 1 layer of metallic silver layer, structure be glass/dielectric layer/barrier layer/
Silver layer/barrier layer/dielectric layer；Double Silver-based low emissivity glass have 2 layers of silver layer, and structure is glass/dielectric layer/barrier layer/the 1st silver medal
Layer/barrier layer/dielectric layer/barrier layer/2 silver layers/barrier layer/dielectric layer.
Three silver coating glass have a more low heat transfer coefficient, but due to factors, the face such as film layer structure is complicated, silver layer is more
Color is not easy to control, transmitance is lower.
Summary of the invention
In view of the foregoing deficiencies of prior art, the purpose of the present invention is to provide a kind of three silver coating glass and its systems
Preparation Method, for solving the problems of the prior art.
In order to achieve the above objects and other related objects, the present invention is by including that following technical scheme obtains.
Present invention firstly provides a kind of three silver coating glass, three silver coating glass is successively wrapped from side to other side
Include glass substrate layer, first medium layer, the first silver layer, second dielectric layer, the second silver layer, third dielectric layer, third silver layer and
Four dielectric layers；
The first medium layer, the second dielectric layer, the third dielectric layer and the 4th dielectric layer are multilayer
Dielectric layer, and it is respectively selected from Si3N4Layer, TiOxLayer, SnOyLayer, ZnOzLayer, ZnSnOa+bAt least two in layer and AZO layers；
Wherein, 0 < x≤2,0 < y≤2,0 < z≤1,0 < b≤2,0 a≤1 <.
AZO described herein is the zinc oxide of aluminium doping.
Preferably, glass is float glass in the glass substrate layer.
Preferably, the first medium layer successively includes Si by side to the other side3N4Layer, TiOxLayer and ZnOzLayer；Or institute
It successively includes Si that first medium layer, which is stated, by side to the other side3N4Layer and AZO layers.
Preferably, the second dielectric layer successively includes AZO layers, Si by side to the other side3N4Layer and ZnOzLayer；Or institute
It successively includes AZO layers, Si that second dielectric layer, which is stated, by side to the other side3N4Layer and AZO layers.
Preferably, the third dielectric layer successively includes AZO layers, Si by side to the other side3N4Layer and ZnOzLayer；Or institute
It successively includes AZO layers, Si that third dielectric layer, which is stated, by side to the other side3N4Layer and AZO layers.
Preferably, the 4th dielectric layer successively includes AZO layers, ZnSnO by side to the other sidea+bLayer and Si3N4Layer；Or
4th dielectric layer successively includes AZO layers and Si by side to the other side3N4Layer.
Preferably, the glass substrate layer with a thickness of 5mm~12mm.
Preferably, first medium layer with a thickness of 10nm~50nm.
Preferably, the first silver layer with a thickness of 5nm~15nm.
Preferably, second dielectric layer with a thickness of 50nm~120nm.
Preferably, the second silver layer with a thickness of 5nm~15nm.
Preferably, third dielectric layer with a thickness of 20nm~100nm.
Preferably, third silver layer with a thickness of 10nm~20nm.
Preferably, the 4th dielectric layer with a thickness of 20nm~80nm.
Preferably, the Si3N4Layer with a thickness of 5nm~85nm.
Preferably, the TiOxLayer with a thickness of 5nm~15nm.
Preferably, the SnOyLayer with a thickness of 5nm~15nm.
Preferably, the ZnOzLayer with a thickness of 5nm~15nm.
Preferably, the ZnaSnbOa+bLayer with a thickness of 5nm~15nm.
Preferably, described AZO layers with a thickness of 5nm~15nm.
Preferably, the light transmission rate of three silver coating glass is more than 70%.
Preferably, the radiance of three silver coating glass is less than 0.03.
A method of three silver coating glass as described above being prepared, using vacuum magnetron sputtering coating film technique in glass base
Successively plated film obtains on plate.
Preferably, the sputter gas used in vacuum magnetron sputtering coating film technique is argon gas.It is highly preferred that the flow velocity of argon gas
For 400~1000sccm.
Preferably, Si is being prepared using vacuum magnetron sputtering coating film technique3N4Layer when, including one of following feature or
It is a variety of:
Cathode targets are silico-aluminum；
Reaction gas is nitrogen；
The flow velocity of nitrogen is 500~1000sccm.
Preferably, when preparing AZO layers using vacuum magnetron sputtering coating film technique, including one of following feature or more
Kind:
Cathode targets are AZO；
Reaction gas is oxygen；
The flow velocity of oxygen is 50~200sccm.
Preferably, the first silver layer, the second silver layer, third silver layer and the 4th are being prepared using vacuum magnetron sputtering coating film technique
When silver layer, cathode targets Ag.
Preferably, TiO is being prepared using vacuum magnetron sputtering coating film techniquexLayer when, including one of following feature or
It is a variety of:
Cathode targets are titanium dioxide；
Reaction gas is oxygen；
The flow velocity of oxygen is 50~200sccm.
Preferably, ZnO is being prepared using vacuum magnetron sputtering coating film techniquezLayer when, including one of following feature or
It is a variety of:
Cathode targets are allumen；
Reaction gas is oxygen；
The flow velocity of oxygen is 500~1000sccm.
Preferably, vacuum magnetron sputtering coating film technique ZnSnO is being useda+bLayer when, including one of following feature or
It is a variety of:
Cathode targets are Zinc-tin alloy；
Reaction gas is oxygen；
The flow velocity of oxygen is 50~200sccm.
The invention also discloses the purposes that three silver coating glass as described above are used as construction material.
Above-mentioned technical proposal has the advantages that in the present invention
The present invention provides a kind of three silver coating glass, light transmission rate with higher, and Low emissivity, is also equipped with appearance
The beautiful and small advantage of misalignment.
Detailed description of the invention
Fig. 1 is shown as the structural schematic diagram of three silver coating glass of the invention.
Component label instructions in Fig. 1
Specific embodiment
Embodiments of the present invention are illustrated by particular specific embodiment below, those skilled in the art can be by this explanation
Content disclosed by book is understood other advantages and efficacy of the present invention easily.
Before further describing the specific embodiments of the present invention, it should be appreciated that protection scope of the present invention is not limited to down
State specific specific embodiment；It is also understood that term used in the embodiment of the present invention is specific specific in order to describe
Embodiment, rather than limiting the scope of protection of the present invention.The test method of actual conditions is not specified in the following example,
Usually according to normal condition, or according to condition proposed by each manufacturer.
When embodiment provides numberical range, it should be appreciated that except non-present invention is otherwise noted, two ends of each numberical range
Any one numerical value can be selected between point and two endpoints.Unless otherwise defined, the present invention used in all technologies and
Scientific term is identical as the normally understood meaning of those skilled in the art of the present technique.Except specific method, equipment used in embodiment,
Outside material, grasp and record of the invention according to those skilled in the art to the prior art can also be used and this
Any method, equipment and the material of the similar or equivalent prior art of method described in inventive embodiments, equipment, material come real
The existing present invention.
Embodiment 1
As shown in Figure 1, disclose a kind of three silver coating glass in the present embodiment, three silver coating glass is from side to another
Outer side successively includes glass substrate layer 1, first medium layer 21, the first silver layer 31, second dielectric layer 22, the second silver layer 32,
Three dielectric layers 23, third silver layer 33 and the 4th dielectric layer 24；
The first medium layer 21, the second dielectric layer 22, the third dielectric layer 23 and the 4th dielectric layer 24
It is multilayer dielectricity layer, and is respectively selected from Si3N4Layer, TiOxLayer, SnOyLayer, ZnOzLayer, ZnSnOa+bLayer and AZO layers at least
Two kinds；
In one specific embodiment of the application, glass is float glass in the glass substrate layer.
Glass substrate with a thickness of 5~12mm.In one specific embodiment of the application, the thickness of the glass substrate layer
Degree is 6mm.
Embodiment 2
The multilayer dielectricity layer 21,22,23,24 of the present embodiment selects Si respectively3N4+TiOx+ZnOz、AZO+Si3N4+ZnOz、
AZO+Si3N4+ZnOz、AZO+ZnSnOa+b+Si3N4。
Specific film layer structure are as follows:
Substrate/Si3N4/TiOx/ZnOz/Ag/AZO/Si3N4/ZnOz/Ag/AZO/Si3N4/ZnOz/Ag/AZO/ZnSnOa+b/
Si3N4。
The production technology of three silvered glasses in the present embodiment are as follows:
(1) cleaning glass substrate；
(2) after dry, into surge chamber, transfer chamber, magnetron sputtering area；
(3) rotating cathode installs silicon-aluminium alloy target material, prepares Si3N4Dielectric layer, sputter gas Ar are 800sccm, reaction gas
Body N2For 1000sccm, deposition thickness 10nm.
(4) rotating cathode installs titanium dioxide target, prepares TiOxDielectric layer, sputter gas Ar are 600sccm, reaction gas
Body O2For 70sccm, deposition thickness 5nm.
(5) rotating cathode installs allumen target, prepares ZnOzDielectric layer, sputter gas Ar are 400sccm, reaction gas
Body O2For 700sccm, deposition thickness 10nm.
(6) planar cathode installs Ag target, prepares Ag functional layer, and sputter gas Ar is 800sccm, deposition thickness 8nm.
(7) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 600sccm, reaction gas O2For
150sccm, deposition thickness 12nm.
(8) rotating cathode installs SiAl target, prepares Si3N4Dielectric layer, sputter gas Ar are 700sccm, reaction gas N2
For 700sccm, deposition thickness 40nm.
(9) rotating cathode installs allumen target, prepares ZnOzDielectric layer, sputter gas Ar are 600sccm, reaction gas
Body O2For 700sccm, deposition thickness 8nm.
(10) planar cathode installs Ag target, prepares Ag functional layer, and sputter gas Ar is 900sccm, and deposition thickness is
12nm。
(11) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 600sccm, reaction gas O2
For 50sccm, deposition thickness 5-10nm.
(12) rotating cathode installs silicon-aluminium alloy target material, prepares Si3N4Dielectric layer, sputter gas Ar are 600sccm, reaction
Gas N2For 7006sccm, deposition thickness 30nm.
(13) rotating cathode installs allumen target, prepares ZnOzDielectric layer, sputter gas Ar are 4003sccm, reaction
Gas O2For 850sccm, deposition thickness 10nm.
(14) planar cathode installs Ag target, prepares Ag functional layer, and sputter gas Ar is 800sccm, and deposition thickness is
10nm。
(15) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 900sccm, reaction gas O2
For 50sccm, deposition thickness 5nm.
(16) rotating cathode installs Zinc-tin alloy target, prepares ZnSnOa+bDielectric layer, sputter gas Ar are 500sccm, instead
Answer gas O2For 700sccm, deposition thickness 5nm.
(17) rotating cathode installs silicon-aluminium alloy target material, prepares Si3N4Dielectric layer, sputter gas Ar are 600sccm, reaction
Gas N2For 900sccm, deposition thickness 25nm.
By above-mentioned film structure and production technology, the high-performance high transmission three prepared on the glass substrate of 6mm thickness
Silver low-emissivity coated is detected transmitance 74.6%, and it be -1.76, b* is -5.61,45 ° that 8 ° of detection glass surface L*, which are 30.19, a*,
It is -5.42 that detection glass surface a*, which is -1.13, b*, and a*, b* differ very little, is virtually free from color difference, and using building glass half
Spherical radiation rate detector testing radiation rate < 0.02.The three-dimensional space illustraton of model and plan view of Lab color space.It is to use
Tri- mutually perpendicular reference axis of L*, a*, b* indicate a color space, and L* axis indicates lightness, black in bottom end, Bai Ding
End.+ a* indicates magenta, and-a* indicates green, and+b* indicates yellow, and-b* indicates blue, and a* axis is red-green colour axis, and b* axis is
The blue axis of Huang one.8 ° of detections described herein refer to the transmitance using spectrophotometer test glass surface, wherein incident light
Angle between line and the vertical line of glass surface is 8 °.Similarly, when 45 ° of detections between incident ray and the vertical line of glass surface
Angle be 45 °.
Embodiment 3
Multilayer dielectricity layer 21,22,23,24 of the invention selects Si respectively3N4+AZO、AZO+Si3N4+AZO、AZO+Si3N4+
AZO、AZO+Si3N4。
Specific film layer structure are as follows:
Substrate/Si3N4/AZO/Ag/AZO/Si3N4/AZO/Ag/AZO/Si3N4/AZO/Ag/AZO/Si3N4。
The present embodiment production technology are as follows:
(1) cleaning glass substrate；
(2) after dry, into surge chamber, transfer chamber, magnetron sputtering area；
(3) rotating cathode installs SiAl target, prepares Si3N4Dielectric layer, sputter gas Ar are 600sccm, reaction gas N2
For 800sccm, deposition thickness 10nm.
(4) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 900sccm, reaction gas O2For
150sccm, deposition thickness 8nm.
(5) planar cathode installs Ag target, prepares Ag functional layer, and sputter gas Ar is 800sccm, and deposition thickness is
10nm。
(6) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 700sccm, reaction gas O2For
50sccm, deposition thickness 5nm.
(7) rotating cathode installs SiAl target, prepares Si3N4Dielectric layer, sputter gas Ar are 600sccm, reaction gas N2
For 900sccm, deposition thickness 70nm.
(8) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 900sccm, reaction gas O2For
200sccm, deposition thickness 8nm.
(9) planar cathode installs Ag target, prepares Ag functional layer, and sputter gas Ar is 900sccm, and deposition thickness is
15nm。
(10) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 600sccm, reaction gas O2
For 50sccm, deposition thickness 10nm.
(11) rotating cathode installs SiAl target, prepares Si3N4Dielectric layer, sputter gas Ar are 500sccm, reaction gas
N2For 700sccm, deposition thickness 70nm.
(12) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 700sccm, reaction gas O2
For 150sccm, deposition thickness 8nm.
(13) planar cathode installs Ag target, prepares Ag functional layer, and sputter gas Ar is 800sccm, and deposition thickness is
15nm。
(14) rotating cathode installs AZO target, prepares AZO dielectric layer, and sputter gas Ar is 900sccm, reaction gas O2
For 200sccm, deposition thickness 5nm.
(15) rotating cathode installs silicon-aluminium alloy target material, prepares Si3N4Dielectric layer, sputter gas Ar are 500sccm, reaction
Gas N2For 800sccm, deposition thickness 30nm.
By above-mentioned film structure and production technology, the high-performance high transmission three prepared on the glass substrate of 6mm thickness
Silver low-emissivity coated is detected transmitance 72.6%, and it be -2.21, b* is -6.5,45 ° that 8 ° of detection glass surface L*, which are 32.98, a*,
It is -6.29 that detection glass surface a*, which is -1.80, b*, and a*, b* differ very little, is virtually free from color difference, and radiance < 0.03.
The above-described embodiments merely illustrate the principles and effects of the present invention, and is not intended to limit the present invention.It is any ripe
The personage for knowing this technology all without departing from the spirit and scope of the present invention, carries out modifications and changes to above-described embodiment.Cause
This, institute is complete without departing from the spirit and technical ideas disclosed in the present invention by those of ordinary skill in the art such as
At all equivalent modifications or change, should be covered by the claims of the present invention.
Claims (10)
1. a kind of three silver coating glass, which is characterized in that three silver coating glass from side to other side successively include glass
Glass substrate layer, first medium layer, the first silver layer, second dielectric layer, the second silver layer, third dielectric layer, third silver layer and the 4th are situated between
Matter layer；
The first medium layer, the second dielectric layer, the third dielectric layer and the 4th dielectric layer are multilayer dielectricity
Layer, and it is respectively selected from Si3N4Layer, TiOxLayer, SnOyLayer, ZnOzLayer, ZnSnOa+bAt least two in layer and AZO layers；Wherein 0 < x
≤ 2,0 < y≤2,0 < z≤1,0 < b≤2,0 a≤1 <.
2. three silver coating glass according to claim 1, which is characterized in that glass is float glass process glass in the glass substrate layer
Glass.
3. three silver coating glass according to claim 1, which is characterized in that the first medium layer is by side to the other side
It successively include Si3N4Layer, TiOxLayer and ZnOzLayer；Or the first medium layer successively includes Si by side to the other side3N4Layer and
AZO layers.
4. three silver coating glass according to claim 1, which is characterized in that the second dielectric layer is by side to the other side
It successively include AZO layers, Si3N4Layer and ZnOzLayer；Or the second dielectric layer successively includes AZO layers, Si by side to the other side3N4
Layer and AZO layers.
5. three silver coating glass according to claim 1, which is characterized in that the third dielectric layer is by side to the other side
It successively include AZO layers, Si3N4Layer and ZnOzLayer；Or the third dielectric layer successively includes AZO layers, Si by side to the other side3N4
Layer and AZO layers.
6. three silver coating glass according to claim 1, which is characterized in that the 4th dielectric layer is by side to the other side
It successively include AZO layers, ZnSnOa+bLayer and Si3N4Layer；Or the 4th dielectric layer by side to the other side successively include AZO layers and
Si3N4Layer.
7. three silver coating glass according to claim 1, which is characterized in that including one of following feature or a variety of:
The glass substrate layer with a thickness of 5mm~12mm；
First medium layer with a thickness of 10nm~50nm；
First silver layer with a thickness of 5nm~15nm；
Second dielectric layer with a thickness of 50nm~120nm；
Second silver layer with a thickness of 5nm~15nm；
Third dielectric layer with a thickness of 20nm~100nm；
Third silver layer with a thickness of 10nm~20nm；
4th dielectric layer with a thickness of 20nm~80nm；
The Si3N4Layer with a thickness of 5nm~85nm；
The TiOxLayer with a thickness of 5nm~15nm；
The SnOyLayer with a thickness of 5nm~15nm；
The ZnOzLayer with a thickness of 5nm~15nm；
The ZnSnOa+bLayer with a thickness of 5nm~15nm；
Described AZO layers with a thickness of 5nm~15nm.
8. three silvered glass according to claim 1, which is characterized in that the light transmission rate of three silver coating glass is more than
70%.
9. a kind of method for preparing three silvered glass as described in any one of claims 1 to 8, using vacuum magnetron sputtering coating film
Successively plated film obtains technique on the glass substrate.
10. the purposes that three silver coating glass as described in any one of claims 1 to 8 is used as construction material.
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| CN112047642A (en) * | 2020-09-17 | 2020-12-08 | 山东金晶科技股份有限公司 | Yellow cover plate glass for building integrated photovoltaic and preparation method thereof |
| CN112047641A (en) * | 2020-09-17 | 2020-12-08 | 山东金晶科技股份有限公司 | Gray cover plate glass for building integrated photovoltaic and preparation method thereof |
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Application publication date: 20190806 |