WO2018099023A1

WO2018099023A1 - Offline temperable 50%-transmittance low-radiation coated glass and method for fabrication thereof

Info

Publication number: WO2018099023A1
Application number: PCT/CN2017/086586
Authority: WO
Inventors: 黄林冲; 顾海波; 徐庆; 周京; 陈俊; 单志刚
Original assignee: 江苏奥蓝工程玻璃有限公司
Priority date: 2016-11-30
Filing date: 2017-05-31
Publication date: 2018-06-07
Also published as: CN106746726A

Abstract

Provided is an offline temperable 50%-transmittance low-radiation coated glass and a method for fabrication thereof, comprising a glass substrate and a plated film layer; the plated film layer uses as a protective layer a first silicon nitride film layer having a very low diffusion coefficient, and a first metal nickel chromium layer (2), a metal silver layer (3), a second metal nickel chromium layer (4), and a second silicon nitride layer (5) of corresponding thicknesses are sputtered in sequence.

Description

Off-line temperable fifty-transmittance low-emission coated glass and preparation method thereof

Technical field

The invention relates to the field of glass and its preparation, in particular to an off-line temperable fifty-transmission low-emission coated glass and a preparation method thereof.

Background technique

Low-emission coated glass refers to flat-coated glass with high reflectivity for infrared radiation and good transmittance for visible light. Low-emission coated glass has good light transmission, radiation and thermal insulation properties, and is widely used in windows, refrigerator doors, etc. local. Low-emission coated glass generally includes a glass substrate and a coating layer, which largely determines the performance of the low-emission film.

The conventional low-emission coated glass has a disadvantage that the transmittance and the infrared ray blocking effect and the heat insulating effect are difficult to cope with, and generally there is a problem that the infrared ray blocking effect is poor, the heat insulating effect is not good, and the subsequent deep processing is difficult to realize in the case of dissimilarization.

Therefore, a new technical solution is needed to solve the above problems.

Summary of the invention

OBJECT OF THE INVENTION In order to overcome the problems in the prior art, the present invention proposes an off-line tempering 50 with a transmittance of 50%, a good infrared ray blocking effect, good heat insulation effect, and the ability to realize different processing and subsequent deep processing. Transmissive coated glass and its preparation method.

Technical Solution: In order to solve the above technical problem, the technical solution adopted by the present invention is: an off-line temperable 50-transmitt low-emission coated glass, comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate The coating layer is sequentially composed of a first silicon nitride layer, a first metal nickel chromium layer, a metal silver layer, a second metal nickel chromium layer, and a second silicon nitride layer; a thickness of the first silicon nitride layer 30-40 nm, the first metal nickel chromium layer has a thickness of 15-20 nm, the metal silver layer has a thickness of 10-15 nm, and the second metal nickel chromium layer has a thickness of 15-20 nm, the first The thickness of the silicon nitride layer is 55-65 nm.

In order to obtain more performance, the glass substrate has a thickness of 3-15 mm.

Further, the glass substrate has a thickness of 6 mm.

In order to obtain an optimum quality of the coated glass sheet, the first silicon nitride layer has a thickness of 38 nm, the first metal nickel chromium layer has a thickness of 18 nm, and the metal silver layer has a thickness of 15 nm. The thickness of the two-metal nickel-chromium layer was 18 nm, and the thickness of the second silicon nitride layer was 60 nm.

The invention also discloses a preparation method of the above off-line temperable fifty-transmission low-emission coated glass, comprising the following steps:

(1) Select a glass substrate with a thickness of 3-15mm, cut into glass pieces according to the predetermined size, and use a washing machine to glass The glass is cleaned;

(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 ^-3 Pa, and setting the line speed to 3.5 m/min;

(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 85-100 KW, and the first layer of the first layer having a thickness of 30-40 nm is sputtered on the glass substrate. Silicon layer

(4) setting a second high vacuum magnetron sputtering coating device with a power of 5-6 KW, sputtering a second layer of a first metal nickel chromium layer having a thickness of 15-20 nm on the glass substrate;

(5) setting a power of 4-5 KW of the third vacuum magnetron sputtering coating device, and sputtering a third metal silver layer having a thickness of 10-15 nm on the glass substrate;

(6) setting a power of the fourth vacuum magnetron sputtering coating device to 5-6 KW, and sputtering a fourth layer of a second metal nickel chromium layer having a thickness of 15-20 nm on the glass substrate;

(7) setting the power of the fifth vacuum magnetron sputtering coating device to 155-170 KW, and sputtering a fifth layer of the second silicon nitride layer having a thickness of 55-65 nm on the glass substrate; Ten transmittance low-emission coated glass.

More preferably, in the step (1), a glass substrate having a thickness of 6 mm is selected.

In some embodiments, the first silicon nitride layer sputtered on the glass substrate in the step (3) has a thickness of 38 nm, and the first metal nickel chromium layer sputtered on the glass substrate in the step (4) The thickness of the layer is 18 nm, the thickness of the metal silver layer sputtered on the glass substrate in the step (5) is 15 nm, and the thickness of the second metal nichrome layer sputtered on the glass substrate in the step (6) is 18 nm, and the step (7) The thickness of the second silicon nitride layer sputtered on the glass substrate was 60 nm.

More preferably, in the step (3), the power of the first high vacuum magnetron sputtering coating device is set to 90 KW, and the step (4) is set to the power of the second high vacuum magnetron sputtering coating device is 5 KW, and the step ( 5) The power of the third high vacuum magnetron sputtering coating device is set to 4.5 KW, the power of the fourth high vacuum magnetron sputtering coating device set in step (6) is 5 KW, and the fifth highest is set in step (7). The power of the vacuum magnetron sputtering coating equipment is 160 KW.

Advantageous Effects: The present invention provides an off-line temperable fifty-transmittance low-emission coated glass and a preparation method thereof, comprising a glass substrate and a coating layer, the transmittance is about 50%, and the coating layer has a low diffusion coefficient. The silicon nitride film layer acts as a protective layer and sequentially sputters a corresponding thickness of the metal nickel-chromium layer, the metallic silver layer, the metallic nickel-chromium layer, and the silicon nitride layer, which has good stability, very low pinhole density, and magnetic control. The sputter deposited silicon nitride film layer is dense, flat and high in hardness, and has a strong blocking ability for movable ions, not at 1200 ° C. Oxidation occurs, and it has good corrosion resistance. The film layer is not damaged when subjected to high-temperature heat treatment in a tempering furnace, and the original thermal performance is maintained. It realizes off-line temperable 50-transmission low-emission coated glass with high temperature resistance, high heat insulation, strong infrared shielding performance, and remote processing, such as cutting, edging, tempering and hollowing.

DRAWINGS

1 is a schematic cross-sectional view showing an off-line temperable fifty-transmission low-emission coated glass coating layer according to an embodiment of the present invention.

detailed description

The present invention will be further described in detail below with reference to the embodiments:

Example 1:

An off-line temperable fifty-transmission low-emission coated glass comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer 1 and a first metal The nickel-chromium layer 2, the metallic silver layer 3, the second metallic nickel-chromium layer 4, and the second silicon nitride layer 5 are composed.

In order to obtain more performance, the glass substrate has a thickness of 6 mm.

In order to obtain an optimum quality of the coated glass sheet, the first silicon nitride layer 1 has a thickness of 38 nm, the first metal nickel chromium layer 2 has a thickness of 18 nm, and the metal silver layer 3 has a thickness of 15 nm. The second metallic nickel-chromium layer 4 has a thickness of 18 nm, and the second silicon nitride layer 5 has a thickness of 60 nm.

The above-mentioned offline temperable 50-transmission low-emission coated glass preparation method comprises the following steps:

(1) selecting a glass substrate having a thickness of 6 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;

(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 90 KW, and the first first silicon nitride layer having a thickness of 38 nm is sputtered on the glass substrate. ;

(4) setting the power of the second high vacuum magnetron sputtering coating device to 5 KW, sputtering a second layer of the first metal nickel chrome layer 2 having a thickness of 18 nm on the glass substrate;

(5) setting the power of the third vacuum magnetron sputtering coating device to 4.5 KW, sputtering a third layer of metal silver layer 3 having a thickness of 15 nm on the glass substrate;

(6) setting the power of the fourth vacuum magnetron sputtering coating device to 5KW, sputtering a fourth layer of the second metal nickel chromium layer 4 having a thickness of 18 nm on the glass substrate;

(7) setting the power of the fifth vacuum magnetron sputtering coating device to 160 KW, sputtering a fifth layer of the second silicon nitride layer 5 having a thickness of 60 nm on the glass substrate; Low rate radiation coated glass.

Example 2:

In order to obtain more performance, the glass substrate has a thickness of 3 mm.

In order to obtain an optimum quality of the coated glass sheet, the thickness of the first silicon nitride layer 1 is 30 nm, the thickness of the first metal nickel chromium layer 2 is 15 nm, and the thickness of the metal silver layer 3 is 10 nm. The second metal nickel chromium layer 4 has a thickness of 15 nm, and the second silicon nitride layer 5 has a thickness of 55 nm.

(1) selecting a glass substrate having a thickness of 3 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;

(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 85 KW, and the first first silicon nitride layer having a thickness of 30 nm is sputtered on the glass substrate. ;

(4) setting the power of the second high vacuum magnetron sputtering coating device to 5.5 KW, sputtering a second layer of the first metal nickel chromium layer 2 having a thickness of 15 nm on the glass substrate;

(5) setting the power of the third vacuum magnetron sputtering coating device to 4 KW, sputtering a third layer of metal silver layer 3 having a thickness of 10 nm on the glass substrate;

(6) setting the power of the fourth vacuum magnetron sputtering coating device to 5.5 KW, sputtering a fourth layer of the second metal nickel chromium layer 4 having a thickness of 15 nm on the glass substrate;

(7) setting the power of the fifth vacuum magnetron sputtering coating device to 155 KW, sputtering a fifth layer of the second silicon nitride layer 5 having a thickness of 55 nm on the glass substrate; Low rate radiation coated glass.

Example 3:

An off-line temperable fifty-transmission low-emission coated glass comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer 1 and a first metal Nickel chrome layer 2 The metal silver layer 3, the second metal nickel chromium layer 4, and the second silicon nitride layer 5 are composed.

In order to obtain more performance, the glass substrate has a thickness of 15 mm.

In order to obtain an optimum quality of the coated glass sheet, the first silicon nitride layer 1 has a thickness of 40 nm, the first metal nickel chromium layer 2 has a thickness of 20 nm, and the metal silver layer 3 has a thickness of 13 nm. The second metallic nickel-chromium layer 4 has a thickness of 20 nm, and the second silicon nitride layer 5 has a thickness of 65 nm.

(1) selecting a glass substrate having a thickness of 15 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;

(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 100 KW, and the first first silicon nitride layer having a thickness of 40 nm is sputtered on the glass substrate. ;

(4) setting the power of the second high vacuum magnetron sputtering coating device to 6 KW, sputtering a second layer of the first metal nickel chromium layer 2 having a thickness of 20 nm on the glass substrate;

(5) setting the power of the third vacuum magnetron sputtering coating device to 5 KW, sputtering a third layer of metal silver layer 3 having a thickness of 13 nm on the glass substrate;

(6) setting the power of the fourth vacuum magnetron sputtering coating device to 6KW, sputtering a fourth layer of the second metal nickel chromium layer 4 having a thickness of 20 nm on the glass substrate;

(7) setting the power of the fifth vacuum magnetron sputtering coating device to 170 KW, sputtering a fifth layer of the second silicon nitride layer 5 having a thickness of 65 nm on the glass substrate; Low rate radiation coated glass.

The low-radiation coated glass prepared by using the off-line temperable fifty-transmission low-emission coated glass and the preparation method thereof according to the above embodiments 1-3 has a transmittance of about 50%, and the coating layer is performed in a tempering furnace. High-temperature heat treatment without damage, maintaining the original thermal performance, achieving off-line temperable 50-transmitt low-emission coated glass with high temperature resistance, high heat insulation, strong barrier infrared performance, and remote alienation Subsequent processing such as cutting, edging, tempering, and hollowing.

It should be noted that the above specific embodiments are only intended to illustrate the invention and are not intended to limit the scope of the invention, and the modifications of the various equivalents of the invention are The scope defined by the claims.

Claims

An off-line temperable fifty-transmission low-emission coated glass characterized by comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer (1) a first metal nickel-chromium layer (2), a metal silver layer (3), a second metal nickel-chromium layer (4), and a second silicon nitride layer (5); the first silicon nitride layer (1) a thickness of 30-40 nm, a thickness of the first metallic nickel-chromium layer (2) of 15-20 nm, a thickness of the metallic silver layer (3) of 10-15 nm, and a second metallic nickel-chromium layer ( 4) has a thickness of 15-20 nm, and the second silicon nitride layer (5) has a thickness of 55-65 nm.
The off-line temperable fifty-transmission low-emission coated glass according to claim 1, wherein the glass substrate has a thickness of 3-15 mm.
The off-line temperable fifty-transmission low-emission coated glass according to claim 2, wherein the glass substrate has a thickness of 6 mm.
The off-line temperable fifty-transmission low-emission coated glass according to claim 1, wherein the first silicon nitride layer (1) has a thickness of 38 nm and the first metal nickel-chromium layer (2) a thickness of 18 nm, a thickness of the metallic silver layer (3) of 15 nm, a thickness of the second metallic nickel-chromium layer (4) of 18 nm, and a thickness of the second silicon nitride layer (5) of 60 nm .
The method for preparing an off-line temperable fifty-transmission low-emission coated glass according to claim 1, comprising the steps of:

(1) selecting a glass substrate having a thickness of 3-15 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;

(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 -3 Pa, and setting the line speed to 3.5 m/min;

(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 85-100 KW, and the first layer of the first layer having a thickness of 30-40 nm is sputtered on the glass substrate. Silicon layer (1);

(4) setting a second high-vacuum magnetron sputtering coating device with a power of 5-6 KW, sputtering a second layer of a first metal nickel-chromium layer (2) having a thickness of 15-20 nm on the glass substrate;

(5) setting the power of the third vacuum magnetron sputtering coating device to 4-5KW, sputtering a third layer of metal silver layer (3) having a thickness of 10-15 nm on the glass substrate;

(6) setting the power of the fourth vacuum magnetron sputtering coating device to 5-6 KW, sputtering a fourth layer of a second metal nickel-chromium layer (4) having a thickness of 15-20 nm on the glass substrate;

(7) setting the power of the fifth vacuum magnetron sputtering coating device to 155-170 KW, and sputtering a fifth layer of the second silicon nitride layer (5) having a thickness of 55-65 nm on the glass substrate; Tempered tempering rate Low-emission coated glass.
The method for preparing an off-line temperable fifty-transmittance low-emission coated glass according to claim 5, wherein in the step (1), a glass substrate having a thickness of 6 mm is selected.
The method for preparing an off-line temperable fifty-transmittance low-emission coated glass according to claim 5, wherein: the first silicon nitride layer (1) sputtered on the glass substrate in the step (3) The thickness of the first metal nickel-chromium layer (2) sputtered on the glass substrate in step (4) is 18 nm, and the metal silver layer (3) sputtered on the glass substrate in the step (5) a second silicon nitride layer (5) having a thickness of 15 nm, a second metal nickel-chromium layer (4) sputtered on the glass substrate in the step (6) and having a thickness of 18 nm, and a sputtering on the glass substrate in the step (7) (5) The thickness is 60 nm.
The method for preparing an off-line temperable fifty-transmittance low-emission coated glass according to claim 5, wherein the power of the first high-vacuum magnetron sputtering coating device in the step (3) is 90 KW, Step (4) setting the power of the second high vacuum magnetron sputtering coating device to 5 KW, setting the power of the third high vacuum magnetron sputtering coating device in step (5) to 4.5 KW, and setting the fourth in step (6) The power of the high vacuum magnetron sputtering coating device is 5 KW, and the power of the fifth high vacuum magnetron sputtering coating device set in step (7) is 160 KW.