CN202576250U - Offline temperable low-radiation coated glass - Google Patents

Abstract

The utility model relates to offline temperable low-radiation coated glass which comprises a glass substrate. A first silicon nitride Si3N4 layer, a metal nickel-chromium NiCr layer, a metal silver Ag layer, a metal nickel-chromium NiCr layer and a second silicon nitride Si3N4 layer are sequentially arranged on the glass substrate; the glass substrate has the thickness of 3mm to 15mm; the first silicon nitride Si3N4 layer has the thickness of 35nm to 45nm; the former metal nickel-chromium NiCr layer has the thickness of 1.5 to 2.5nm; the metal silver Ag layer has the thickness of 6 to 10nm; the latter metal nickel-chromium NiCr layer has the thickness of 2 to 2.5nm; and the second silicon nitride Si3N4 layer has the thickness of 55 to 65nm. The offline temperable low-radiation coated glass has the advantage that on the basis of implementing the low radiance and the low heat transfer property of a coating, the deep processing such as remote heat treatment and the like can also be implemented.

Description

An off-line steelable low-emissivity coated glass

technical field

The utility model relates to a glass, in particular to an off-line steelable low-radiation coated glass. the

Background technique

The existing common off-line low-emissivity coated glass adopts other materials for the film system configuration, the weather resistance, acid and alkali resistance of the film layer are poor, the film layer is soft, easy to oxidize, and it is difficult to realize off-site processing. Off-line steelable low-emissivity coated glass, using silicon nitride Si ₃ N ₄ film as a protective layer, which has a very low diffusion coefficient for oxygen, good stability, and a very low pinhole density. The silicon nitride film deposited by magnetron sputtering is dense, flat and has high hardness. It has a very strong blocking ability for mobile ions. It does not oxidize at 1200 ° C and has good corrosion resistance. Therefore, Si _{The 3} N ₄ film layer is used as the top protective film of the offline steelable low-emissivity coated glass to realize the high temperature resistance of the off-line steelable low-emissivity coated glass, so as to realize the subsequent processing such as cutting, edging, tempering and hollowing in remote locations.

Contents of the invention

The purpose of this utility model is to overcome the deficiency that ordinary off-line low-radiation coated glass cannot be heat-treated, and to provide a kind of off-line steel that is strong enough to block infrared rays, has good heat insulation effect, and can also realize off-site subsequent deep processing. Low-E coated glass. the

The purpose of this utility model is achieved by the following technical solutions: an off-line steelable low-emissivity coated glass, comprising a glass substrate, _the glass substrate is successively provided with a first silicon nitride _Si3N4 layer, a metal nickel-chromium NiCr layer, Metal silver Ag layer, metal nickel chromium NiCr layer, second silicon nitride Si ₃ N ₄ layer. The thickness of the glass substrate is 3mm-15mm, the thickness of the first silicon nitride Si ₃ N ₄ layer is 35nm-45nm, the thickness of the metal nickel-chromium NiCr layer is 1.5-2.5nm, and the thickness of the metal silver Ag layer is 6-10nm , the thickness of the metal nickel chromium NiCr layer is 2-2.5nm, and the thickness of the second silicon nitride Si ₃ N ₄ layer is 55-65nm.

The further improvement of the utility model is that: the thickness of the glass substrate is 3 mm to 15 mm, the thickness of the first silicon nitride Si ₃ N ₄ layer is 37 nm, the thickness of the metal nickel chromium NiCr layer is 1.9 nm, and the metal silver The thickness of the Ag layer is 8 nm, the thickness of the metal nickel chromium NiCr layer is 2.1 nm, and the thickness of the second silicon nitride Si ₃ N ₄ layer is 57 nm.

Compared with the prior art, the utility model has the following advantages: the top layer of off-line steelable low-emissivity coated glass adopts silicon nitride Si ₃ N ₄ with a very low diffusion coefficient as the protective layer, which can make the film layer heat-treated in the tempering furnace It does not damage the film layer, and maintains the original thermal performance. At the same time, the original film is also tempered, and the produced offline steelable low-emissivity coated glass can strongly block infrared rays and has good heat insulation effect. , At the same time, it can also realize the follow-up deep processing of off-site.

Description of drawings:

Fig. 1 is the structural representation of the utility model;

Symbols in the figure: 1-glass substrate, 2-first silicon nitride Si ₃ N ₄ layer, 3-metal nickel chromium NiCr layer, 4-metal silver Ag layer, 5-metal nickel chromium NiCr layer, 6-second Silicon nitride Si ₃ N ₄ layer.

Detailed ways:

    In order to deepen the understanding of the invention, the utility model will be further described below in conjunction with the examples, which are only used to explain the utility model, and do not constitute a limitation to the protection scope of the utility model.

As shown in Figure 1, an embodiment of the off-line steelable low-emissivity coated glass of the present invention is: the off-line steelable low-emissivity coated glass comprises a glass substrate 1, and the first silicon nitride Si is sequentially arranged on the glass substrate 1 ₃ N ₄ layer 2, metal nickel chromium NiCr layer 3, metal silver Ag layer 4, metal nickel chromium NiCr layer 5, second silicon nitride Si ₃ N ₄ layer 6. The thickness of the glass substrate 1 is 3mm-15mm, the thickness of the first silicon nitride Si ₃ N ₄ layer 2 is 35nm-45nm, the optimum thickness is 37nm, the thickness of the metal nickel-chromium NiCr layer 3 is 1.5-2.5nm, the optimum The optimum thickness is 1.9nm, the thickness of the metal silver Ag layer 4 is 6-10nm, the optimum thickness is 8nm, the thickness of the metal nickel-chromium NiCr layer 5 is 2-2.5nm, the optimum thickness is 2.1nm, the second silicon nitride The thickness of the Si ₃ N ₄ layer 6 is 55-65 nm, and the optimum thickness is 57 nm.

Example 1:

In the double-ended off-line high-vacuum magnetron sputtering coating equipment, make the basic vacuum reach 10?3Pa, and when the line speed is 3.5 m/min, sequentially sputter on a 6mm glass substrate: 37nm silicon nitride Si ₃ N ₄ , 1.9nm metallic nickel chromium NiCr, 8nm metallic silver Ag, 2.1nm metallic nickel chromium NiCr, 57nm silicon nitride Si ₃ N ₄ .

The top layer of the utility model adopts silicon nitride Si ₃ N ₄ with a very low diffusion coefficient as the protective layer, which can make the film layer heat-treated in the tempering furnace without damaging the film layer, and maintains the original thermal performance. The original film has also been tempered, and the produced off-line steelable low-emissivity coated glass can strongly block infrared rays and has good heat insulation effect, and can also realize subsequent deep processing in different places.

Claims (3)

1. An off-line steelable low-emissivity coated glass, comprising a glass substrate (1), characterized in that: the glass substrate (1) is sequentially provided with a first silicon nitride Si ₃ N ₄ layer (2), Metal nickel chromium NiCr layer (3), metal silver Ag layer (4), metal nickel chromium NiCr layer (5), second silicon nitride Si ₃ N ₄ layer (6). 2. An off-line steelable low-emissivity coated glass according to claim 1, characterized in that: the thickness of the glass substrate (1) is 3 mm to 15 mm, and the first silicon nitride Si ₃ N ₄ layer ( 2) has a thickness of 35nm-45nm, the metal nickel-chromium NiCr layer (3) has a thickness of 1.5-2.5nm, the metal silver Ag layer (4) has a thickness of 6-10nm, and the metal nickel-chromium NiCr layer (5) has a thickness of 2-2.5 nm, and the second silicon nitride Si ₃ N ₄ layer (6) has a thickness of 55-65 nm. 3. An off-line steelable low-emissivity coated glass according to claim 1 or 2, characterized in that: the thickness of the glass substrate is 3 mm to 15 mm, and the first silicon nitride Si ₃ N ₄ layer (2 ) thickness is 37nm, the metal nickel chromium NiCr layer (3) has a thickness of 1.9nm, the metal silver Ag layer (4) has a thickness of 8nm, and the metal nickel chromium NiCr layer (5) has a thickness of 2.1 nm, the thickness of the second silicon nitride Si ₃ N ₄ layer (6) is 57 nm.

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