CN103770403B - A kind of can the heat-reflection coated glass of tempering - Google Patents
A kind of can the heat-reflection coated glass of tempering Download PDFInfo
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- CN103770403B CN103770403B CN201310750319.1A CN201310750319A CN103770403B CN 103770403 B CN103770403 B CN 103770403B CN 201310750319 A CN201310750319 A CN 201310750319A CN 103770403 B CN103770403 B CN 103770403B
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Abstract
The present invention relates to coated glass technical field, particularly relate to a kind of can the heat-reflection coated glass of tempering, including glass substrate and the film plating layer that is plated in described glass substrate surface, described film plating layer includes first medium layer, heat-reflecting layer and second dielectric layer the most successively from described glass substrate side, described first medium layer and second dielectric layer are silicon nitride layer, and described heat-reflecting layer is metal and/or metal nitride layer.Film plating layer of the present invention is heat-resist, stable in properties；Can flat tempering, also can curved tempering, and tempering caudacoria layer smooths, without cracking, the oxidation defect such as demoulding.
Description
Technical field
The present invention relates to coated glass technical field, particularly relate to a kind of can the heat-reflection coated glass of tempering.
Background technology
The basic structure of traditional heat-reflection coated glass is glass substrate and the plating being plated in glass substrate surface
Film layer, film plating layer includes metal or metal nitride layer, oxide skin(coating) the most successively from glass substrate side,
Wherein oxide skin(coating) is generally titanium oxide layer, and its character when high-temperature process is unstable, causes this kind of structure plating
The film layer thermostability toughness poor, film layer of film glass is not high enough, and glass tempering needs through high-temperature process,
Particularly when carrying out curved tempering and glass substrate is thicker, the high-temperature time that tempering processes is the longest, to film layer
Thermostability, toughness and membrane stress require the highest, cause when making the coated glass of this kind of structure, typically
First glass substrate can only be carried out tempering, the most again the glass substrate after tempering be carried out plated film；But, first
The preparation technology of tempering plated film more not only work efficiency is relatively low, and causes production waste, at glass
On glass coating wire, glass substrate specification is relatively big, and its production efficiency is higher, does not easily cause waste；On the other hand
After curved tempering, the making of plated film is more complicated again, technique is loaded down with trivial details for glass substrate, and production efficiency is low.On solving
Stating problem, existing coated glass all uses the technique of first plated film tempering again, and film layer is required higher by it, existing
Be badly in need of a kind of can the heat-reflection coated glass of tempering, the film occurred after glass substrate elder generation plated film tempering again can be solved
Layer is due to thermostability with toughness is poor and membrane stress is too high, and the film plating layer cracking that causes, oxidation demoulding etc. are no
Good defect.
Summary of the invention
For above-mentioned the deficiencies in the prior art, object of the present invention is to provide a kind of film layer thermostability high,
Toughness is high and stress in thin film is relatively low can the heat-reflection coated glass of tempering.
To achieve these goals, technical scheme is as follows:
A kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in described glass substrate surface
Film plating layer, described film plating layer includes first medium layer, heat reflection the most successively from described glass substrate side
Layer and second dielectric layer, described first medium layer and second dielectric layer are silicon nitride layer, described heat-reflecting layer
For metal and/or metal nitride layer.
It is preferred that described film plating layer also includes between described glass substrate and described first medium layer
One protective layer, described film plating layer also includes second between described heat-reflecting layer and described second dielectric layer
Protective layer；Wherein said first protective layer and described second protective layer are the oxide skin(coating) of silicon, described silicon
Oxide skin(coating) is SiO2Layer.
It is preferred that described metal level is the one in layers of chrome, nickel dam, nickel-chrome alloy layer, described nitride metal
Nitride layer is the one in chromium nitration case and nickel nitration case.
It is preferred that the described preferred scope of first medium layer thickness is 10～50nm, second medium layer thickness is preferred
Scope is 20～70nm, and the described preferred scope of heat-reflecting layer thickness is 5～30nm, described first protection thickness
Spending preferred scope is 5～20nm, and the described second preferred scope of protective layer thickness is 5～20nm.
In the film plating layer of the present invention, the first protective layer is silicon oxide layer, is plated on glass, close with glass material,
Can effective adhesion between reinforcing membrane layer and glass substrate；First medium layer is one layer of fine and close silicon nitride layer,
The firmness between film layer flatness and film layer can be effectively improved, the ion penetration of glass can also be stoped,
Avoid the injury to heat-reflecting layer；Second dielectric layer is positioned at film layer outermost layer, and general requirement has high rigidity,
Ensure that film layer has a good wear-resisting scratch resistant characteristic, the covering effect to heat-reflecting layer of the upper and lower two layer medium layer,
Improve film layer thermostability, increase film plating layer stability, make this coated glass can flat tempering, also can curved tempering,
And after tempering, film layer smooths, without defects such as film layer cracking, demouldings.
A kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in described glass substrate surface
Film plating layer；It is characterized in that: described film plating layer includes first Jie the most successively from described glass substrate side
Matter layer, the first heat-reflecting layer, second dielectric layer, the second heat-reflecting layer and the 3rd dielectric layer, wherein first is situated between
Matter layer, second dielectric layer and the 3rd dielectric layer are silicon nitride layer, described first heat-reflecting layer and described second
Heat-reflecting layer is metal and/or metal nitride layer.
It is preferred that described metal level is the one in layers of chrome, nickel dam, nickel-chrome alloy layer, described nitride metal
Nitride layer is the one in chromium nitration case and nickel nitration case.
It is preferred that described film plating layer also includes between described glass substrate and described first medium layer
One protective layer, described film plating layer also includes between described first heat-reflecting layer and described second dielectric layer
Second protective layer, described film plating layer also includes between described second dielectric layer and described second reflecting layer
3rd protective layer, described film plating layer also includes between described second reflecting layer and described 3rd dielectric layer
4th protective layer；Wherein said first protective layer, described second protective layer, described 3rd protective layer and described
4th protective layer is the oxide skin(coating) of silicon, and the oxide skin(coating) of described silicon is SiO2Layer.
It is preferred that the described preferred scope of first medium layer thickness is 5～30nm, the preferred model of second medium layer thickness
Enclosing is 20～60nm, and the 3rd preferred scope of thickness of dielectric layers is 10～50nm, described first heat-reflecting layer thickness
Preferably scope is 5～20nm, and the described first preferred scope of heat-reflecting layer thickness is 5～20nm, and described second protects
The preferred scope of covering thickness is 5～20nm, and the described second preferred scope of protective layer thickness is 5～20nm, described
The 3rd preferred scope of protective layer thickness is 5～20nm, and the described 4th preferred scope of protective layer thickness is 5～20nm.
In the film plating layer of the present invention, the first protective layer is silicon oxide layer, is plated on glass, close with glass material,
Can effective adhesion between reinforcing membrane layer and glass substrate；First medium layer is one layer of fine and close silicon nitride layer,
The firmness between film layer flatness and film layer can be effectively improved, the ion penetration of glass can also be stoped,
Avoid the injury to heat-reflecting layer；Second dielectric layer between the first heat-reflecting layer and the second heat-reflecting layer,
Can effectively protect the first heat-reflecting layer, and improve between the first heat-reflecting layer and the second heat-reflecting layer firm
Degree；3rd dielectric layer is positioned at film layer outermost layer, and general requirement has high rigidity, it is ensured that film layer has well
Wear-resisting scratch resistant characteristic, the covering effect to heat-reflecting layer of the upper and lower two layer medium layer, improve film layer thermostability,
Increase membranous layer stability, make this coated glass can flat tempering, also can curved tempering, and after tempering, film layer is put down
Sliding, without defects such as film layer cracking, demouldings.
This kind the heat-reflection coated glass of tempering can use magnetically controlled sputter method at the plated surface of described glass substrate
Film forms, and is specially and described glass substrate is put into the target room of vacuum magnetron sputtering coating film equipment from glass base
Outwards successively plated film, described metal or metal nitride layer are coated with under the atmosphere of noble gas in sheet side.
It is preferred that described noble gas is argon, in the mixed gas of described nitrogen and noble gas, described
Nitrogen content is the 20～60% of described mixed gas total content.Described oxygen and the mixed gas of noble gas
In, described oxygen content is the 20～60% of described mixed gas total content.
The target of described target room includes at least one in chromium target, nickel chromium triangle target, sial target.
Described chromium target purity is 99.900%～99.999%.
Described nickel chromium triangle target be chromium nickel weight ratio be the nichrome target of 20%～30%, nickel, chromium purity are
99.900%～99.999%.
Described sial target be aluminum weight ratio be the sial target of 5%～30%, silicon, the purity of aluminum are
99.900%-99.999%。
The target type of described sputtering target material includes rotary target, flat target.
Accompanying drawing explanation
Fig. 1, the structural representation of the embodiment of the present invention 1；
Fig. 2, the structural representation of the embodiment of the present invention 2；
Fig. 3, the structural representation of the embodiment of the present invention 3；
Fig. 4, the structural representation of the embodiment of the present invention 4；
Fig. 5, the structural representation of the embodiment of the present invention 5；
Fig. 6, the structural representation of the embodiment of the present invention 6；
Fig. 7, the structural representation of the embodiment of the present invention 7.
Detailed description of the invention
Below in conjunction with the accompanying drawings embodiments of the present invention are described in further detail.
Embodiment 1
See Fig. 1, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by SiO2Layer, thickness range is 5～20nm；Si3N4Layer, thickness range is 10～50nm；
CrN layer, thickness range is 5～30nm；SiO2Layer, thickness range is 5～20nm；Si3N4Layer, thickness is excellent
Selecting scope is 20～70nm.
The structure of glass is: Glass/SiO2/Si3N4/CrN/SiO2/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 25%, and glass surface reflectance is 15%, and radiation value E is 0.05, shading coefficient Sc=0.60.
Embodiment 2
See Fig. 2, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by SiO2Layer, the preferred scope of thickness is 5～20nm；Si3N4Layer, the preferred scope of thickness
It is 10～50nm；NiCr layer, the preferred scope of thickness is 5～30nm；Si3N4Layer, the preferred scope of thickness be 20～
70nm。
The structure of glass is: Glass/SiO2/Si3N4/NiCr/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 30%, and glass surface reflectance is 20%, and radiation value E is 0.05, shading coefficient Sc=0.50.
Embodiment 3
See Fig. 3, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by Si3N4Layer, the preferred scope of thickness is 10～50nm；NiCr layer, the preferred scope of thickness
It is 5～30nm；CrN layer, the preferred scope of thickness is 5～30nm；Si3N4Layer, the preferred scope of thickness be 20～
70nm。
The structure of glass is: Glass/Si3N4/NiCr/CrN/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 20%, and glass surface reflectance is 20%, and radiation value E is 0.05, shading coefficient Sc=0.50.
Embodiment 4
See Fig. 4, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by Si3N4Layer, the preferred scope of thickness is 5～30nm；Cr layer, the preferred scope of thickness is
5～20nm；Si3N4Layer, the preferred scope of thickness is 20～60nm；CrN layer, the preferred scope of thickness is 5～20nm；
Si3N4Layer, the preferred scope of thickness is 10～50nm.
The structure of glass is: Glass/Si3N4/Cr/Si3N4/CrN/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 30%, and glass surface reflectance is 15%, and radiation value E is 0.05, shading coefficient Sc=0.50.
Embodiment 5
See Fig. 5, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by SiO2Layer, the preferred scope of thickness is 5～20nm；Si3N4Layer, the preferred scope of thickness
It is 5～30nm；NiCr layer, the preferred scope of thickness is 5～20nm；Si3N4Layer, the preferred scope of thickness be 20～
60nm；NiCr layer, the preferred scope of thickness is 5～20nm；SiO2Layer, the preferred scope of thickness is 5～20nm,
Si3N4Layer, the preferred scope of thickness is 10～50nm.
The structure of glass is: Glass/SiO2/Si3N4/NiCr/Si3N4/NiCr/SiO2/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 20%, and glass surface reflectance is 25%, and radiation value E is 0.05, shading coefficient Sc=0.50.
Embodiment 6
See Fig. 6, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by SiO2Layer, the preferred scope of thickness is 5～20nm；Si3N4Layer, the preferred scope of thickness
It is 5～30nm；NiCr layer, the preferred scope of thickness is 5～20nm；SiO2Layer, the preferred scope of thickness be 5～
20nm、Si3N4Layer, the preferred scope of thickness is 20～60nm；SiO2Layer, the preferred scope of thickness is 5～20nm；
NiCr layer, the preferred scope of thickness is 5～20nm；SiO2Layer, the preferred scope of thickness is 5～20nm, Si3N4
Layer, the preferred scope of thickness is 10～50nm.
The structure of glass is: Glass/SiO2/Si3N4/NiCr/SiO2/Si3N4/SiO2/NiCr/SiO2
/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 20%, and glass surface reflectance is 25%, and radiation value E is 0.05, shading coefficient Sc=0.50.
Embodiment 7
See Fig. 7, a kind of can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate table
The film plating layer in face, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate, by glass base
Sheet side is outwards followed successively by SiO2Layer, the preferred scope of thickness is 5～20nm, Si3N4Layer, the preferred scope of thickness
It is 5～30nm；CrN layer, the preferred scope of thickness is 5～20nm；NiCr layer, the preferred scope of thickness be 5～
20nm；Si3N4Layer, the preferred scope of thickness is 20～60nm；NiCr layer, the preferred scope of thickness is 5～20nm；
SiO2Layer, the preferred scope of thickness is 5～20nm；Si3N4Layer, the preferred scope of thickness is 10～50nm.
The structure of glass is: Glass/SiO2/Si3N4/CrN/NiCr/Si3N4/NiCr/SiO2/Si3N4。
Curved tempering processes caudacoria layer and without cracking and aoxidizes demoulding, meets glass appearance requirement, after testing, product
Visible light transmissivity is 20%, and glass surface reflectance is 25%, and radiation value E is 0.05, shading coefficient Sc=0.50.
The performance detection that product in embodiment is correlated with:
1. wearability experiment: with coated surface as wearing course, product sample is arranged on the level of abrasiometer
Spinning sample on rotary table；Sample rotates for 200 times, and before and after test, visible transmission is than the difference of meansigma methods
Definitely less than value 4%, meet GB/T18915.1～18915.2-2002 coated glass national standard.
2. acid resistance experiment: the product choosing 25mm*50mm is sample, sample is immersed in (23 ± 2) DEG C,
In 1mol/L concentration hydrochloric acid, dip time 24h, exhausted than the difference of meansigma methods of visible transmission before and after test
To value less than 4%, meet GB/T18915.1～18915.2-2002 coated glass national standard.
3. alkali resistance experiment: the product choosing 25mm*50mm is sample, sample is immersed in (23 ± 2) DEG C,
In 1mol/L sodium hydroxide solution, dip time 24h, before and after test, visible transmission is than meansigma methods
The absolute value of difference is less than 4%, meets GB/T18915.1～18915.2-2002 coated glass national standard.
Above-described embodiment, simply presently preferred embodiments of the present invention, be not used for limiting the scope of the present invention,
Therefore all with the structure described in the claims in the present invention, feature and principle done equivalence change or modify, all should
Within being included in scope of the invention as claimed.
Claims (1)
1. can the heat-reflection coated glass of tempering, including glass substrate and be plated in glass substrate surface
Film plating layer, film plating layer uses magnetically controlled sputter method to form at the surface coating of glass substrate；It is characterized in that:
Described film plating layer includes a SiO the most successively from described glass substrate side2Layer, a Si3N4Layer, first
CrN layer, a NiCr layer, the 2nd Si3N4Layer, the 2nd NiCr layer, the 2nd SiO2Layer and the 3rd Si3N4
Layer；A described S iO2Layer thickness is 5～20nm, a Si3N4Layer thickness is 5～30nm, a CrN
Thickness is 5～20nm, and a NiCr layer thickness is 5～20nm, the 2nd Si3N4Layer thickness is 20～60nm,
2nd NiCr layer thickness is 5～20nm, the 2nd SiO2Layer thickness is 5～20nm, the 3rd Si3N4Layer thickness is
10～50nm.
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| CN109336413A (en) * | 2018-12-18 | 2019-02-15 | 浙江旗滨节能玻璃有限公司 | A kind of ocean blue colour thermal reflection coated glass and preparation method thereof |
| CN110395914A (en) * | 2019-06-27 | 2019-11-01 | 福建西河卫浴科技有限公司 | It is a kind of can tempering two-sided chromium mirror |
| CN110395915A (en) * | 2019-08-02 | 2019-11-01 | 福建西河卫浴科技有限公司 | Two-sided golden ambetti of one kind and preparation method thereof |
| CN112010569A (en) * | 2020-08-18 | 2020-12-01 | 衡山兄弟金属制品有限公司 | Method for coating toughened glass |
| CN115073019A (en) * | 2022-07-11 | 2022-09-20 | 咸宁南玻节能玻璃有限公司 | High-anti-gold sunlight-control coated glass and preparation method thereof |
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| CN101497500A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass capable of being subsequently processed |
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