CN113443836A - Glass mirror capable of being tempered in different places and preparation method thereof - Google Patents

Glass mirror capable of being tempered in different places and preparation method thereof Download PDF

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Publication number
CN113443836A
CN113443836A CN202010223327.0A CN202010223327A CN113443836A CN 113443836 A CN113443836 A CN 113443836A CN 202010223327 A CN202010223327 A CN 202010223327A CN 113443836 A CN113443836 A CN 113443836A
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layer
oxide layer
argon
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silicon
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刘华彬
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Shahe Fenghe Glass Technology Co ltd
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Shahe Fenghe Glass Technology Co ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639—Multilayers containing at least two functional metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3642—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing a metal layer

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

The invention provides a glass mirror capable of being tempered in different places and a preparation method thereof, and relates to the technical field of coated glass for buildings. The glass mirror provided by the invention comprises a glass substrate, and a reinforced reflecting layer, a metal layer and a protective layer which are sequentially arranged on the glass substrate from inside to outside; the enhanced reflecting layer is a niobium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside or a titanium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, and the total thickness of the enhanced reflecting layer is 80-170 nm; the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer, and the thickness of the metal layer is 30-75 nm; the protective layer comprises one or two of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer, and the thickness of the protective layer is 40-80 nm. The glass mirror provided by the invention has the advantages of strong oxidation resistance, long service life, no pollution, high film firmness, safety and capability of carrying out remote toughening processing; also has high reflectivity; and the preparation process is simple and convenient.

Description

Glass mirror capable of being tempered in different places and preparation method thereof
Technical Field
The invention relates to the technical field of architectural coated glass, in particular to a glass mirror capable of being tempered in different places and a preparation method thereof.
Background
The prior glass mirror is mainly characterized in that an aluminum film or a silver film is plated on the surface of the glass, but the two metals are easily oxidized in the atmosphere and have short service life. In order to protect the aluminum film or silver film on the glass surface, the common practice is to spray a layer of thick protective paint on the outside of the film layer, and the paint is harmful to human health and causes atmospheric pollution; in addition, due to the existence of the protective paint, the glass mirror cannot be tempered, the strength of the glass mirror is low, safety risks are brought, and once the glass mirror is damaged, injuries to personnel can be brought.
Disclosure of Invention
In view of the above, the present invention aims to provide a remotely tempered glass mirror and a preparation method thereof. The glass mirror provided by the invention has the advantages of strong oxidation resistance, long service life, no pollution, high film firmness, safety and capability of carrying out different-place toughening processing.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides a glass mirror capable of being tempered in different places, which comprises a glass substrate, and a reinforced reflecting layer, a metal layer and a protective layer which are sequentially arranged on the glass substrate from inside to outside;
the enhanced reflecting layer is a niobium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence or a titanium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence; the total thickness of the enhanced reflecting layer is 80-170 nm;
the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30-75 nm;
the protective layer comprises one or two of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40-80 nm.
Preferably, when the reflection enhancing layer is a niobium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, the thicknesses of the niobium oxide layer and the silicon oxide layer are independently 30-85 nm.
Preferably, when the enhanced reflection layer is a titanium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, the thicknesses of the titanium oxide layer and the silicon oxide layer are independently 30-85 nm.
Preferably, the nickel-chromium alloy in the metal layer has a nickel to chromium molar ratio of 20: 80.
Preferably, when the protective layer includes two layers, the protective layer is a silicon oxide layer and a niobium oxide layer, or a titanium oxide layer and a silicon oxide layer, or a niobium oxide layer and a silicon oxide layer, or a silicon oxide layer and a titanium oxide layer, which are sequentially disposed from the inside to the outside.
Preferably, when the protective layer includes two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer, and a silicon nitride layer, the thicknesses of the individual layers of the two layers are independently 20 to 50 nm.
The invention provides a preparation method of a glass mirror capable of being tempered in different places, which comprises the following steps:
and sputtering the enhanced reflecting layer, the metal layer and the protective layer on the glass substrate from inside to outside in sequence by adopting a magnetron sputtering method to obtain the glass mirror capable of being tempered in different places.
Preferably, the degree of vacuum of the sputtering is 1.0 × 10-4Pa～5.0×10-7Pa。
Preferably, when sputtering a niobium oxide layer, the sputtered sputter target is Nb2O5The sputtering gas is argon and oxygen, and the volume ratio of the argon to the oxygen is 1: 0.1;
when a silicon oxide layer is sputtered, the sputtered sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and oxygen, and the volume ratio of the argon to the oxygen is 1: 1;
when sputtering a titanium oxide layer, the sputtered sputter target is TiO2The sputtering gas is argon and oxygen, and the volume ratio of the argon to the oxygen is 1: 0.1;
when the nichrome layer is sputtered, the sputtered sputtering target is a nichrome target, and the sputtering gas is argon;
when a metal titanium layer is sputtered, the sputtered sputtering target is a metal titanium target, and the sputtering gas is argon;
when the metal chromium layer is sputtered, the sputtered sputtering target is a metal chromium target, and the sputtering gas is argon;
when the silicon nitride layer is sputtered, the sputtered sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and nitrogen, and the volume ratio of the argon to the nitrogen is 1.2: 1;
the molar ratio of silicon to aluminum in the silicon-aluminum alloy target is 98:2, and the molar ratio of nickel to chromium in the nickel-chromium alloy target is 20: 80.
The invention provides a glass mirror capable of being tempered in different places, which comprises a glass substrate, and a reinforced reflecting layer, a metal layer and a protective layer which are sequentially arranged on the glass substrate from inside to outside; the enhanced reflecting layer is a niobium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence or a titanium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence; the total thickness of the enhanced reflecting layer is 80-170 nm; the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30-75 nm; the protective layer comprises one or two of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40-80 nm. The glass mirror provided by the invention replaces a common aluminum film or silver film with the nickel-chromium alloy layer, the metal titanium layer or the metal chromium layer, has the effects of increasing density and enhancing hardness, and obviously prolongs the service life of the glass mirror; according to the invention, one or two of the silicon oxide layer, the niobium oxide layer, the titanium oxide layer and the silicon nitride layer are used as protective layers to replace conventional protective paint, so that the glass body is pollution-free and can better protect the metal layer, the glass body is heated to about 700 ℃ in the toughening process and needs to be rapidly cooled, the protective layers can ensure the bonding strength with the metal layer in the toughening process and can effectively isolate the corrosion of oxygen to the metal layer, and the material characteristics of the protective layers are not changed; in addition, the niobium oxide layer or the titanium oxide layer is firstly arranged on the glass substrate, and then the silicon oxide layer is arranged, so that the formed enhanced reflecting layer has the characteristics of enhancing reflection and improving brightness. Therefore, the glass mirror provided by the invention has the advantages of strong oxidation resistance, long service life, no pollution, high strength, safety and capability of carrying out remote toughening processing; and also has high reflectivity and brightness.
The preparation method of the glass mirror capable of being tempered in different places is simple and convenient to operate and easy for large-scale production.
Drawings
Fig. 1 is a structural diagram of a glass mirror capable of being tempered in different places, wherein the glass mirror comprises a glass substrate 1, an enhanced reflecting layer 2, a metal layer 3 and a protective layer 4.
Detailed Description
The invention provides a glass mirror capable of being tempered in different places, which comprises a glass substrate, and a reinforced reflecting layer, a metal layer and a protective layer which are sequentially arranged on the glass substrate from inside to outside;
the enhanced reflecting layer is a niobium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence or a titanium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence; the total thickness of the enhanced reflecting layer is 80-170 nm;
the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30-75 nm;
the protective layer comprises one or two of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40-80 nm.
The glass mirror capable of being tempered in different places comprises a glass substrate. The glass substrate of the present invention has no particular requirement, and a glass substrate known to those skilled in the art may be used, specifically, a common glass substrate, an ultra-white glass substrate.
The glass mirror capable of being tempered in different places comprises an enhanced reflecting layer arranged on a glass substrate. In the invention, the total thickness of the enhanced reflection layer is preferably 98-144 nm. In the invention, when the enhanced reflection layer is a niobium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, the thicknesses of the niobium oxide layer and the silicon oxide layer are preferably 30-85 nm independently, and more preferably 30-72 nm independently; when the enhanced reflection layer is a titanium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, the thicknesses of the titanium oxide layer and the silicon oxide layer are independently 30-85 nm, and more preferably independently 30-72 nm. The invention sets niobium oxide layer or titanium oxide layer on the glass substrate, then sets silicon oxide layer, the formed reinforced reflection layer has the characteristics of reinforced reflection and improved brightness.
The glass mirror capable of being tempered in different places comprises a metal layer arranged on the reinforced reflecting layer, wherein the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer. In the invention, the thickness of the metal layer is preferably 49-70 nm; the molar ratio of nickel to chromium of the nickel-chromium alloy in the metal layer is 20: 80. The invention replaces the commonly used aluminum film or silver film with the nickel-chromium alloy layer, the metal titanium layer or the metal chromium layer, has the functions of increasing compactness and enhancing hardness, and obviously prolongs the service life of the glass mirror.
The glass mirror capable of being tempered in different places comprises a protective layer arranged on the metal layer. In the present invention, the protective layer includes one or two of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer, and a silicon nitride layer; in the present invention, when the protective layer includes two layers, the protective layer is preferably a silicon oxide layer and a niobium oxide layer, which are sequentially provided from the inside to the outside, or a titanium oxide layer and a silicon oxide layer, which are sequentially provided from the inside to the outside, or a niobium oxide layer and a silicon oxide layer, which are sequentially provided from the inside to the outside, or a silicon oxide layer and a titanium oxide layer, which are sequentially provided from the inside to the outside. In the invention, the total thickness of the protective layer is 40-80 nm, preferably 50-60 nm. In the present invention, when the protective layer includes two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer, and a silicon nitride layer, the thicknesses of the two layers are independently preferably 20 to 50nm, and more preferably 25 to 30 nm. According to the invention, one or two of the silicon oxide layer, the niobium oxide layer, the titanium oxide layer and the silicon nitride layer are used as a protective layer to replace conventional protective paint, so that the glass mirror is pollution-free, and can better protect the metal layer, thereby having the characteristics of oxidation resistance and long service life.
The glass mirror provided by the invention has the advantages of strong oxidation resistance, long service life, no pollution, high strength and safety, and can be subjected to remote tempering processing; and also has high reflectivity and brightness.
The invention provides a preparation method of a glass mirror capable of being tempered in different places, which comprises the following steps:
and sputtering the enhanced reflecting layer, the metal layer and the protective layer on the glass substrate from inside to outside in sequence by adopting a magnetron sputtering method to obtain the glass mirror capable of being tempered in different places.
The present invention does not require any particular apparatus for the magnetron sputtering method, and any magnetron sputtering apparatus known to those skilled in the art may be used. The present invention has no special requirement on the specific operation method of the magnetron sputtering method, and the operation method known to those skilled in the art can be adopted. In the present invention, the degree of vacuum of the sputtering is preferably set to1.0×10-4Pa～5.0×10-7Pa, more preferably 5.0X 10-5Pa。
In the present invention, when the niobium oxide layer is sputtered, the sputtered sputtering target is preferably Nb2O5The sputtering gas is preferably argon and oxygen, the volume ratio of the argon to the oxygen is preferably 1:0.1, and in the embodiment of the invention, the introduction amount of the argon and the introduction amount of the oxygen are preferably 500sccm and 50sccm respectively; during sputtering, the argon atoms of the argon gas strike Nb on the target site in an ionized state2O5Target, Nb2O5The niobium oxide layer is formed after the sputtering deposition, and a small amount of oxygen is supplemented because part of the niobium oxide loses oxygen atoms during the sputtering process.
In the present invention, when the silicon oxide layer is sputtered, the sputtered target is preferably a silicon aluminum alloy target, and the sputtering gas is preferably argon gas and oxygen gas. In the present invention, the molar ratio of silicon to aluminum in the silicon-aluminum alloy target is preferably 98: 2; the volume ratio of the argon gas to the oxygen gas is preferably 1:1, and in the embodiment of the invention, the flow rates of the argon gas and the oxygen gas are respectively preferably 500 sccm. During sputtering, argon atoms of argon gas impact the silicon-aluminum alloy on a target under an ionization state, Si atoms in the silicon-aluminum alloy are sputtered to encounter oxygen and are oxidized into silicon oxide, and a silicon oxide layer is formed after deposition (the content of aluminum in the silicon-aluminum alloy target is low, generally, during oxidation, the content of aluminum is ignored, and the content of aluminum in a film layer is low, so that the silicon-aluminum alloy target hardly works).
In the present invention, when the titanium oxide layer is sputtered, the sputtered sputtering target is preferably TiO2The target and the sputtering gas are preferably argon and oxygen, the volume ratio of the argon to the oxygen is preferably 1:0.1, and in the embodiment of the invention, the argon and the oxygen are preferably introduced in the amount of 500sccm and 50sccm respectively. During sputtering, argon atoms of the argon gas strike TiO targets in an ionized state2，TiO2The titanium oxide layer is formed after being sputtered and deposited, and a small amount of oxygen is supplemented because oxygen atoms are lost from part of the titanium oxide during sputtering.
In the present invention, when the nichrome layer is sputtered, the sputtered target is preferably a nichrome target, and the sputtering gas is preferably argon gas. In the present invention, the molar ratio of nickel to chromium in the nichrome target is preferably 20: 80. In the embodiment of the present invention, the amount of argon gas introduced is preferably 1000 sccm. In the sputtering process, argon atoms of argon gas impact the nickel-chromium alloy on a target position in an ionization state, Ni atoms and Cr atoms in the nickel-chromium alloy are sputtered out, and a nickel-chromium alloy layer is formed after deposition.
In the present invention, when the metallic titanium layer is sputtered, the sputtered target is a metallic titanium target, and the sputtering gas is argon gas. In the present invention, the amount of argon gas introduced is preferably 1000 sccm. During sputtering, argon atoms of argon gas impact the metallic titanium on the target position in an ionized state, titanium atoms are sputtered out, and a metallic titanium layer is formed after deposition.
In the present invention, when sputtering a metallic chromium layer, the sputtering target to be sputtered is a metallic chromium target, and the sputtering gas is argon gas. In the present invention, the amount of argon gas introduced is preferably 1000 sccm. During sputtering, argon atoms of the argon gas impact the metallic chromium on the target position in an ionized state, the chromium atoms are sputtered out, and a metallic chromium layer is formed after deposition.
In the present invention, when sputtering a silicon nitride layer, the sputtering target to be sputtered is preferably a silicon aluminum alloy target, and the sputtering gas is preferably argon gas and nitrogen gas. In the present invention, the molar ratio of silicon to aluminum in the silicon-aluminum alloy target is preferably 98: 2; the volume ratio of the argon gas to the nitrogen gas is preferably 1.2:1, and in the embodiment of the invention, the introduction amount of the argon gas and the introduction amount of the oxygen gas are preferably 600sccm and 500sccm respectively. During sputtering, argon atoms of argon gas impact the silicon-aluminum alloy on a target under an ionization state, Si atoms in the silicon-aluminum alloy are sputtered to meet nitrogen gas to form silicon nitride, and a silicon nitride layer is formed after deposition (the content of aluminum in the silicon-aluminum alloy target is low, generally, during nitriding, the content of aluminum nitride is ignored, and the content of aluminum nitride in a film layer is low, so that the silicon-aluminum alloy target hardly works).
The preparation method of the glass mirror capable of being tempered in different places, provided by the invention, is simple and convenient to operate and is easy for large-scale production.
The present invention will be described in detail with reference to the following examples, but they should not be construed as limiting the scope of the present invention.
Example 1
Putting the glass substrate into a cavity of a magnetron sputtering device, and pumping the cavity to a vacuum degree of 1.0 multiplied by 10-4Pa, first plating a niobium oxide target (Nb) as the first target2O5) Adding argon and oxygen in a volume ratio of 1:0.1 (argon of 500sccm and oxygen of 50sccm), wherein the thickness of the film layer is 35 nm; plating a second target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), adding argon and oxygen in a volume ratio of 1:1 (argon is 500sccm and oxygen is 500sccm), wherein the thickness of a film layer is 70nm, and forming a reinforced reflecting layer on the glass substrate;
plating a third target, namely a nichrome target (the molar ratio of Ni to Cr is 20:80), on the enhanced reflecting layer, adding pure argon (1000sccm), wherein the thickness of the film layer is 70nm, and forming a metal layer on the enhanced reflecting layer;
plating a fourth target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), on the metal layer, adding argon and oxygen in a volume ratio of 1:1 (argon of 500sccm and oxygen of 500sccm), wherein the thickness of the film layer is 20 nm; plating a fifth target, niobium oxide target (Nb)2O5) Argon and oxygen are added according to the volume ratio of 1:0.1 (argon is 500sccm and oxygen is 50sccm), the thickness of the film layer is 20nm, a protective layer is formed on the metal layer, and finally the glass mirror capable of being tempered in different places is obtained.
Example 2
Putting the glass substrate into a cavity of a magnetron sputtering device, and pumping the cavity to a vacuum degree of 1.0 multiplied by 10-4Pa, first plating a first titanium oxide Target (TiO)2) Adding argon and oxygen in a volume ratio of 1:0.1 (argon of 500sccm and oxygen of 50sccm), wherein the thickness of the film layer is 35 nm; plating a second target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), adding argon and oxygen in the volume ratio of 1:1 (argon is 500sccm and oxygen is 500sccm), wherein the thickness of a film layer is 70nm, so that a reinforced reflecting layer is formed on the glass substrate;
plating a third target, namely a nichrome target (the molar ratio of Ni to Cr is 20:80), on the enhanced reflecting layer, adding pure argon (1000sccm), wherein the thickness of the film layer is 70nm, and forming a metal layer on the enhanced reflecting layer;
plating a fourth target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), on the metal layer, adding argon and oxygen in a volume ratio of 1:1 (argon of 500sccm and oxygen of 500sccm), wherein the thickness of the film layer is 20 nm; plating a fifth target, niobium oxide target (Nb)2O5) Argon and oxygen are added according to the volume ratio of 1:0.1 (argon is 500sccm and oxygen is 50sccm), the thickness of the film layer is 20nm, a protective layer is formed on the metal layer, and finally the glass mirror capable of being tempered in different places is obtained.
Example 3
Putting the glass substrate into a cavity of a magnetron sputtering device, and pumping the cavity to a vacuum degree of 1.0 multiplied by 10-4Pa, first plating a first niobium oxide target (Nb)2O5) Adding argon and oxygen in a volume ratio of 1:0.1 (argon of 500sccm and oxygen of 50sccm), wherein the thickness of the film layer is 35 nm; plating a second target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), adding argon and oxygen in the volume ratio of 1:1 (argon is 500sccm and oxygen is 500sccm), wherein the thickness of a film layer is 70nm, so that a reinforced reflecting layer is formed on the glass substrate;
plating a third target, namely a nichrome target (the molar ratio of Ni to Cr is 20:80), on the enhanced reflecting layer, adding pure argon (1000sccm), controlling the thickness of the film layer to be 70nm, and forming a metal layer on the enhanced reflecting layer;
plating a fourth target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), on the metal layer, adding argon and nitrogen in a volume ratio of 1.2:1 (argon of 600sccm and oxygen of 500sccm), wherein the thickness of the silicon nitride film layer is 50 nm; and forming a protective layer on the metal layer to finally obtain the glass mirror capable of being tempered in different places.
Example 4
Putting the glass substrate into a cavity of a magnetron sputtering device, and pumping the cavity to a vacuum degree of 1.0 multiplied by 10-4Pa, first plating a first niobium oxide target (Nb)2O5) Adding argon and oxygen in a volume ratio of 1:0.1 (argon of 500sccm and oxygen of 50sccm), wherein the thickness of the film layer is 35 nm; plating a second target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), adding argon and oxygen in the volume ratio of 1:1 (argon is 500sccm, oxygen is 500sccm), and forming a filmThe layer thickness was 70nm, thereby forming an enhanced reflection layer on the glass substrate;
plating a third target, namely a metal titanium target (Ti), on the enhanced reflecting layer, adding pure argon (1000sccm), wherein the thickness of the film layer is 60nm, and forming a metal layer on the enhanced reflecting layer;
plating a fourth target, namely a silicon-aluminum alloy target (the molar ratio of Si to Al is 98:2), on the metal layer, adding argon and oxygen in a volume ratio of 1:1 (argon of 500sccm and oxygen of 500sccm), wherein the thickness of the film layer is 20 nm; plating a fifth target, niobium oxide target (Nb)2O5) Argon and oxygen are added according to the volume ratio of 1:0.1 (argon is 500sccm and oxygen is 50sccm), the thickness of the film layer is 20nm, a protective layer is formed on the metal layer, and finally the glass mirror capable of being tempered in different places is obtained.
The glass mirror prepared in the embodiment 1-4 is subjected to performance test before and after tempering, wherein the tempering conditions are as follows: the heating temperature is 680-700 ℃, the heating time is 240-270 s, and the cooling air pressure is 1.8KPa/cm2And the cooling time is 160-200 s, and the performance test result is shown in table 1:
TABLE 1 Performance test results before and after tempering of glass mirrors prepared in examples 1-4
Content of the experiment Example 1 Example 2 Example 3 Example 4
Reflectivity before tempering,% 73.2 73.5 73.4 65.2
After tempering, reflectance% 71.4 58 62 52
Salt spray test after tempering Grade 10 Grade 10 Stage 8 Stage 8
Test for Baige before tempering 5B 5B 5B 5B
Test for hundred cells after tempering 5B 4B 4B 4B
In table 1, the reflectance measurement adopts a reflectance detection instrument, which is a GSTR spectrum transmission and reflection online scanning measurement system; according to the reflectivity test result, the reflectivity of the toughened glass mirror is still high, which shows that the toughened glass mirror provided by the invention can be toughened and has a good toughening effect;
the salt spray test is based on the standards GB/6458-86 (neutral salt spray test standard) and GB/T6461-2002 (the grades of samples and test pieces on a metal substrate and other inorganic covering layers after corrosion tests), the test time is 950 hours, and the salt spray test shows that the glass mirror provided by the invention can be toughened, and the service life of the toughened glass mirror is longer (more than 8 grades are qualified, and 10 grades are excellent);
the hundred-grid test is based on GB/9286-1998 (Baige test standard), and the hundred-grid test shows that the film layer firmness of the glass mirror provided by the invention is good before and after toughening, the metal reflecting layer can be effectively protected (5B is judged to be excellent, and 4B is qualified).
The glass mirror provided by the invention has the advantages of strong oxidation resistance, long service life, high film firmness, safety, capability of carrying out different-place toughening processing and no pollution; and also has a high reflectance.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

Claims (9)

1. A glass mirror capable of being tempered in different places comprises a glass substrate, and a reinforced reflecting layer, a metal layer and a protective layer which are sequentially arranged on the glass substrate from inside to outside;
the enhanced reflecting layer is a niobium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence, or a titanium oxide layer and a silicon oxide layer which are arranged from inside to outside in sequence; the total thickness of the enhanced reflecting layer is 80-170 nm;
the metal layer is a nickel-chromium alloy layer, a metal titanium layer or a metal chromium layer; the thickness of the metal layer is 30-75 nm;
the protective layer comprises one or two of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer; the thickness of the protective layer is 40-80 nm.
2. The allopatry tempered glass mirror of claim 1, wherein when the enhanced reflection layer is a niobium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, the thicknesses of the niobium oxide layer and the silicon oxide layer are independently 30-85 nm.
3. The allopatry tempered glass mirror of claim 1, wherein when the enhanced reflection layer is a titanium oxide layer and a silicon oxide layer which are sequentially arranged from inside to outside, the thicknesses of the titanium oxide layer and the silicon oxide layer are independently 30-85 nm.
4. The allopatry temperable glass mirror of claim 1, wherein when the metal layer is a nichrome layer, the molar ratio of nickel to chromium in the nichrome is 20: 80.
5. The variably tempered glass mirror of claim 1, wherein when the protective layer comprises two layers, the protective layer is a silicon oxide layer and a niobium oxide layer, or a titanium oxide layer and a silicon oxide layer, or a niobium oxide layer and a silicon oxide layer, or a silicon oxide layer and a titanium oxide layer, in this order from the inside to the outside.
6. The allopatry tempered glass mirror of claim 1 or 5, wherein when the protective layer comprises two layers of a silicon oxide layer, a niobium oxide layer, a titanium oxide layer and a silicon nitride layer, the thickness of each single layer of the two layers is independently 20 to 50 nm.
7. The method for preparing the remotely tempered glass mirror as claimed in any one of claims 1 to 6, which is characterized by comprising the following steps:
and sputtering the enhanced reflecting layer, the metal layer and the protective layer on the glass substrate from inside to outside in sequence by adopting a magnetron sputtering method to obtain the glass mirror capable of being tempered in different places.
8. The production method according to claim 7, wherein the degree of vacuum of the sputtering is 1.0 x 10-4Pa～5.0×10-7Pa。
9. The production method according to claim 7 or 8, wherein, when the niobium oxide layer is sputtered, the sputtered sputtering target is Nb2O5The sputtering gas is argon and oxygen, and the volume ratio of the argon to the oxygen is 1: 0.1;
when a silicon oxide layer is sputtered, the sputtered sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and oxygen, and the volume ratio of the argon to the oxygen is 1: 1;
when sputtering a titanium oxide layer, the sputtered sputter target is TiO2The sputtering gas is argon and oxygen, and the volume ratio of the argon to the oxygen is 1: 0.1;
when the nichrome layer is sputtered, the sputtered sputtering target is a nichrome target, and the sputtering gas is argon;
when a metal titanium layer is sputtered, the sputtered sputtering target is a metal titanium target, and the sputtering gas is argon;
when the metal chromium layer is sputtered, the sputtered sputtering target is a metal chromium target, and the sputtering gas is argon;
when the silicon nitride layer is sputtered, the sputtered sputtering target is a silicon-aluminum alloy target, the sputtering gas is argon and nitrogen, and the volume ratio of the argon to the nitrogen is 1.2: 1;
the molar ratio of silicon to aluminum in the silicon-aluminum alloy target is 98:2, and the molar ratio of nickel to chromium in the nickel-chromium alloy target is 20: 80.
CN202010223327.0A 2020-03-26 2020-03-26 Glass mirror capable of being tempered in different places and preparation method thereof Pending CN113443836A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114214590A (en) * 2021-12-16 2022-03-22 西湖大学 Preparation method of metal reflector and metal reflector
CN114879284A (en) * 2022-05-05 2022-08-09 广东轻工职业技术学院 Anti-dazzle light reflecting mirror plated by sputtering method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114214590A (en) * 2021-12-16 2022-03-22 西湖大学 Preparation method of metal reflector and metal reflector
CN114214590B (en) * 2021-12-16 2024-04-05 西湖大学 Preparation method of metal reflector and metal reflector
CN114879284A (en) * 2022-05-05 2022-08-09 广东轻工职业技术学院 Anti-dazzle light reflecting mirror plated by sputtering method

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