CN205501127U - But three silver medal low -emissivity coated glass of tempering - Google Patents
But three silver medal low -emissivity coated glass of tempering Download PDFInfo
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- CN205501127U CN205501127U CN201620114585.4U CN201620114585U CN205501127U CN 205501127 U CN205501127 U CN 205501127U CN 201620114585 U CN201620114585 U CN 201620114585U CN 205501127 U CN205501127 U CN 205501127U
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Abstract
The utility model belongs to the technical field of glass, concretely relates to but three silver medal low -emissivity coated glass of tempering, its structure is: the 3rd compound medium layer third silver layer / third protective layer / fourth compound medium layer zirconia membrane of the 2nd compound medium layer second silver layer / second protective layer / of the first silver layer of a glass substrate compound medium layer / first protective layer /, the utility model discloses a rete can stand 700 DEG C high temperature tempering, and the colour is stable behind the tempering, does not have appearance imperfections behind the rete tempering.
Description
Technical field
This utility model belongs to glass technology field, be specifically related to a kind of can the Three-silver-layer low-radiation coated glass of tempering.
Background technology
Low radiation coated glass is proved to be the most best building energy conservation glass.By improving its performance at surface of ordinary glass plating low-radiation film, effectively limit infrared light, fully reduce the heat exchange of glass both sides so that it is compared with simple glass and tradition coated glass, there is excellent energy-efficient performance, optical property and environmental-protecting performance.Low radiation coated glass oneself be widely used in building all over the world, particularly economy and the relatively advanced countries and regions of science and technology.Itself deeply also updating along with research and development low-emission coated, not only meets the needs that architectural design trend is aesthetic, and energy saving is also further enhanced.Wherein, Three-silver-layer low-radiation coated glass is because it has lower infrared light transmission, radiance and heat transfer coefficient so that it is more energy efficient, thus is widely used.
But, the problems such as Three-silver-layer low-radiation coated glass is complicated because of film layer structure, and after easily producing tempering in toughening process, color is unstable, have color channel, film layer wiping experiment defective.
Utility model content
In order to solve the problems referred to above, the purpose of this utility model be to provide a kind of can the Three-silver-layer low-radiation coated glass of tempering, this glass film layers can stand 700 DEG C High temperature tempered, and colour stable after tempering, without open defect after film layer tempering.
A kind of can the Three-silver-layer low-radiation coated glass of tempering, described can the structure of Three-silver-layer low-radiation coated glass of tempering be: glass substrate/the first compound medium layer/the first silver layer/the first protective layer/the second compound medium layer/the second silver layer/the second protective layer/the 3rd compound medium layer/the 3rd silver layer/the 3rd protective layer/four compound medium layers/zirconium oxide film.
It is preferred that the thickness of described first compound medium layer be 20～50nm, the thickness of the first silver layer be 5～15nm, the thickness of the first protective layer be 1～1-10nm, the thickness of the second compound medium layer be 55～110nm, the thickness of the second silver layer be 5～15nm, the thickness of the second protective layer be 1～10nm, the thickness of the 3rd compound medium layer be 55～110nm, the thickness of the 3rd silver layer be 5～15nm, the thickness of the 3rd protective layer be 1～10nm, the thickness of the 4th compound medium layer be 35～70nm, the thickness of zirconium oxide film be 3～10nm.Thickness, in certain scope, can play minimizing friction, promote adhesion strength.If the thickest, surface is the most coarse, plays reverse effect on the contrary.This film layer can be effectively increased the adhesion strength of film system, improve product can processing characteristic, reduce the defects such as face scuffing.
It is preferred that described first compound medium layer includes silicon nitride, zinc oxide and AZO；The thickness of described silicon nitride is 10～25nm, the thickness of described zinc oxide is 5～15nm, the thickness of described AZO is 5～10nm.It is preferred that described first protective layer, the second protective layer and the 3rd protective layer are nicr layer.
Preferably, described second compound medium layer include silicon nitride, zinc-tin oxide, zinc oxide and AZO, the thickness of described silicon nitride be 20～40nm, the thickness of described zinc-tin oxide be 20～40nm, the thickness of described zinc oxide be 10～20nm, the thickness of described AZO be 5～10nm.
Preferably, described 3rd compound medium layer include silicon nitride, zinc-tin oxide, zinc oxide, AZO, the thickness of described silicon nitride be 20～40nm, the thickness of described zinc-tin oxide be 20～40nm, the thickness of described zinc oxide be 10～20nm, the thickness of described AZO be 5～10nm.
It is preferred that the 4th compound medium layer include AZO, zinc oxide and silicon nitride, the thickness of described AZO be 5～10nm, the thickness of described zinc oxide be 10～20nm, the thickness of described silicon nitride be 20～40nm.Preparation described can the Three-silver-layer low-radiation coated glass of tempering, particularly as follows: glass substrate cleans magnetron sputtering plating cutting edging tempering；
Wherein,
1), the N of bottom SiN2Amount is less；Such as, the basic proportioning of silicon nitride is, argon: nitrogen=1000:900 (unit: SCCM), and bottom nitride silicon atmosphere proportioning is then, argon: nitrogen=1000:700, to form fine and close structure, by increasing capacitance it is possible to increase with the adhesion of glass substrate.
2), it is passed through a small amount of O at the interface that intermediate layer SiN contacts with upper and lower medium of oxides layer2, form the adhesion between SiOxNy structure, and bilevel medium of oxides layer more preferable.Such as, in second compound medium layer, next layer of silicon nitride is zinc-tin oxide, then at that layer of silicon nitride near zinc-tin oxide, atmosphere proportioning is changed into, argon: nitrogen: oxygen=1000:900:50 (unit: SCCM), referring here at the interface between two-layer, the thickness forming SiOxNy is generally 1～5nm.
3), the N of top SiN2Amount wants many, forms the slightly open structure that stress is little.Such as, the basic proportioning of silicon nitride is, argon: nitrogen=1000:900 (unit: SCCM), and bottom nitride silicon atmosphere proportioning is then, argon: nitrogen=800:1100.
4), ZnSnO, ZnAlO film should stoichiometrically or peroxide technique sputter to reduce stress.
5), top protection layer ZrO2High power richness O2Sputtering, the surface coarse to form nano microcrystalline, rough surface then contact surface is little, and coefficient of friction is little, and adhesion strength is strong.Zr target power output is 60～100 kilowatts, rich O2Sputtering, such as Ar:O2=500:1200, oxygen is more.
6), for Seed Layer ZnAlO etc. of Ag film, with high power 60～100 kilowatts, low Ar, rich O2Atmosphere, be readily obtained the crystal structure of column, the growth of beneficially Ag film.
Structure of the present utility model is: glass substrate/the first compound medium layer/the first silver layer/the first protective layer/the second compound medium layer/the second silver layer/the second protective layer/the 3rd compound medium layer/the 3rd silver layer/the 3rd protective layer/four compound medium layers/zirconium oxide film；This utility model can not only effectively promote film layer adhesion strength, and film layer can stand 700 DEG C High temperature tempered, colour stable after tempering, without open defect after film layer tempering, and tested by tempering temperature sensitivity experiments, tempering time delay experiment, the experiment of different-thickness glass substrate tempering, the curved tempering of different-thickness glass substrate.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
Detailed description of the invention
Below in conjunction with detailed description of the invention, the utility model is described in further detail, to help skilled artisan understands that this utility model.
Embodiment 1
nullSee Fig. 1，A kind of can the Three-silver-layer low-radiation coated glass of tempering，Structure is: glass substrate 1/ first compound medium layer 21 [silicon nitride (thickness 10nm)、Zinc oxide (5nm)、AZO (10nm)]/first silver layer 31 (15nm)/nickel chromium triangle 41 (1nm)/second compound medium layer 22 [silicon nitride (20nm)、Zinc-tin oxide (40nm)、Zinc oxide (10nm)、AZO (5nm)] second silver layer 32 (15nm)/nickel chromium triangle 42 (1nm)/3rd compound medium layer 23 [silicon nitride (20nm)、Zinc-tin oxide (20nm)、Zinc oxide (10nm)、AZO (10nm)]/the 3rd silver layer 33 (5nm)/nickel chromium triangle 43 (10nm)/4th compound medium layer 24 [AZO (5nm)、Zinc oxide (20nm)、Silicon nitride (20nm)]/ZrOx5 (10nm).
Embodiment 2
nullA kind of can the Three-silver-layer low-radiation coated glass of tempering，Structure is: glass substrate/the first compound medium layer [silicon nitride (thickness 25nm)、Zinc oxide (15nm)、AZO (5nm)]/the first silver layer (5nm)/nickel chromium triangle (10nm)/second compound medium layer [silicon nitride (40nm)、Zinc-tin oxide (20nm)、Zinc oxide (20nm)、AZO (10nm)] the second silver layer (5nm)/nickel chromium triangle (10nm)/the 3rd compound medium layer [silicon nitride (40nm)、Zinc-tin oxide (40nm)、Zinc oxide (20nm)、AZO (5nm)]/the 3rd silver layer (15nm)/nickel chromium triangle (1nm)/the 4th compound medium layer [AZO (10nm)、Zinc oxide (10nm)、Silicon nitride (40nm)]/ZrOx (3nm).
Embodiment 3
nullA kind of can the Three-silver-layer low-radiation coated glass of tempering，Structure is: glass substrate/the first compound medium layer [silicon nitride (thickness 15nm)、Zinc oxide (8nm)、AZO (8nm)]/the first silver layer (8nm)/nickel chromium triangle (3nm)/second compound medium layer [silicon nitride (25nm)、Zinc-tin oxide (30nm)、Zinc oxide (15nm)、AZO (6nm)] the second silver layer (10nm)/nickel chromium triangle (3nm)/the 3rd compound medium layer [silicon nitride (35nm)、Zinc-tin oxide (30nm)、Zinc oxide (15nm)、AZO (6nm)]/the 3rd silver layer (10nm)/nickel chromium triangle (3nm)/the 4th compound medium layer [AZO (6nm)、Zinc oxide (15nm)、Silicon nitride (25nm)]/ZrOx (5nm).
Embodiment 4
nullA kind of can the Three-silver-layer low-radiation coated glass of tempering，Structure is: glass substrate/the first compound medium layer [silicon nitride (thickness 20nm)、Zinc oxide (10nm)、AZO (7nm)]/the first silver layer (10nm)/nickel chromium triangle (5nm)/second compound medium layer [silicon nitride (30nm)、Zinc-tin oxide (25nm)、Zinc oxide (12nm)、AZO (7nm)] the second silver layer (8nm)/nickel chromium triangle (5nm)/the 3rd compound medium layer [silicon nitride (30nm)、Zinc-tin oxide (35nm)、Zinc oxide (13nm)、AZO (7nm)]/the 3rd silver layer (12nm)/nickel chromium triangle (5nm)/the 4th compound medium layer [AZO (7nm)、Zinc oxide (13nm)、Silicon nitride (30nm)]/ZrOx (4nm).
Embodiment 5
nullA kind of can the Three-silver-layer low-radiation coated glass of tempering，Structure is: glass substrate/the first compound medium layer [silicon nitride (thickness 22nm)、Zinc oxide (12nm)、AZO (6nm)]/the first silver layer (12nm)/nickel chromium triangle (7nm)/second compound medium layer [silicon nitride (35nm)、Zinc-tin oxide (35nm)、Zinc oxide (18nm)、AZO (8nm)] the second silver layer (6nm)/nickel chromium triangle (8nm)/the 3rd compound medium layer [silicon nitride (25nm)、Zinc-tin oxide (25nm)、Zinc oxide (11nm)、AZO (8nm)]/the 3rd silver layer (13nm)/nickel chromium triangle (8nm)/the 4th compound medium layer [AZO (8nm)、Zinc oxide (17nm)、Silicon nitride (35nm)]/ZrOx (8nm).
Above-described embodiment, simply preferred embodiment of the present utility model, not for limiting this utility model practical range, therefore all equivalence changes done with the feature described in this utility model claim and principle or modification, within this utility model right all should be included in.
Test:
1, tempering processing temperature sensitivity experiments (the results are shown in Table 1): inspection film layer is the most stable when tempering processing temperature changes.Experiment condition is as follows: process at dual chamber annealing furnace.Size of sample: 6mm glass substrate, specification 1000mm*1000mm.
Table 1
Conclusion: sample after different furnace temperature tempering, the open defect such as non-oxidation, demoulding.Glass surface maximum aberration Δ L*g=0.3 after tempering, Δ a*g=0.4, Δ b*g=0.5, color change is minimum, and processing temperature sensitivity experiments is qualified.
2, tempering time delay heat time heating time experiment (the results are shown in Table 2): inspection film layer film layer when tempering changes process time is the most stable.Process at dual chamber annealing furnace, top furnace temperature 695 DEG C, bottom furnace temperature 685 DEG C.Size of sample: 6mm glass substrate, specification 1000mm*1000mm.
Table 2
Conclusion: sample after different heat time heating time tempering, the open defect such as non-oxidation, demoulding.Glass surface maximum aberration Δ L*g=0.3 after tempering, Δ a*g=0.2, Δ b*g=0.5, color change is minimum, and heat time heating time, time delay experiment was qualified.
3, different-thickness glass substrate tempering experiment (the results are shown in Table 3): use 6,8,10,12mm sample, dual chamber annealing furnace process, top furnace temperature 695 DEG C, bottom furnace temperature 685 DEG C, adjust by corresponding glass substrate thickness heat time heating time.
Table 3
Conclusion: without open defect after different-thickness glass tempering, it is qualified to test.
4, curved tempering experiment (the results are shown in Table 4): after the curved tempering experiment of inspection different-thickness substrate, film layer is the most intact, stable.Use 6,8,10,12mm sample, curved steel stove process, top furnace temperature 690 DEG C, bottom furnace temperature 685 DEG C.
Table 4
Conclusion: the curved tempering of sample is without demoulding, edge flawless, and outward appearance is good, colour stable；The experiment of different-thickness glass bend tempering is qualified.
Claims (7)
1. one kind can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that described can the three-silver low radiation of tempering
The structure of coated glass is: glass substrate/the first compound medium layer/the first silver layer/the first protective layer/the second is combined
Dielectric layer/the second silver layer/the second protective layer/the 3rd compound medium layer/the 3rd silver layer/the 3rd protective layer/4th is combined
Dielectric layer/zirconium oxide film.
The most as claimed in claim 1 can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that described first is multiple
The thickness closing dielectric layer is 20～50nm, the thickness of the first silver layer is 5～15nm, the thickness of the first protective layer
Be 1～1-10nm, the thickness of the second compound medium layer be 55～110nm, the thickness of the second silver layer be 5～
15nm, the thickness of the second protective layer are 1～10nm, the thickness of the 3rd compound medium layer is 55～110nm,
The thickness of the 3rd silver layer is 5～15nm, the thickness of the 3rd protective layer is 1～10nm, the 4th compound medium layer
Thickness be 35～70nm, the thickness of zirconium oxide film be 3～10nm.
The most as claimed in claim 2 can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that described first is multiple
Close dielectric layer and include silicon nitride, zinc oxide and AZO；The thickness of described silicon nitride is 10～25nm, described oxygen
The thickness changing zinc is 5～15nm, the thickness of described AZO is 5～10nm.
The most as claimed in claim 2 can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that described first protects
Sheath, the second protective layer and the 3rd protective layer are nicr layer.
The most as claimed in claim 2 can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that described second is multiple
Close dielectric layer include silicon nitride, zinc-tin oxide, zinc oxide and AZO, the thickness of described silicon nitride be 20～
40nm, the thickness of described zinc-tin oxide are 20～40nm, the thickness of described zinc oxide is 10～20nm, institute
The thickness stating AZO is 5～10nm.
The most as claimed in claim 2 can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that the described 3rd is multiple
Close dielectric layer include silicon nitride, zinc-tin oxide, zinc oxide, AZO, the thickness of described silicon nitride be 20～40nm,
The thickness of described zinc-tin oxide is 20～40nm, the thickness of described zinc oxide is 10～20nm, described AZO
Thickness be 5～10nm.
The most as claimed in claim 2 can the Three-silver-layer low-radiation coated glass of tempering, it is characterised in that the 4th compound is situated between
Matter layer include AZO, zinc oxide and silicon nitride, the thickness of described AZO be 5～10nm, described zinc oxide
Thickness is 10～20nm, the thickness of described silicon nitride is 20～40nm.
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| CN201620114585.4U CN205501127U (en) | 2016-02-04 | 2016-02-04 | But three silver medal low -emissivity coated glass of tempering |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105565679A (en) * | 2016-02-04 | 2016-05-11 | 东莞南玻工程玻璃有限公司 | Tri-silver low-emissivity coated glass capable of being tempered and preparation method thereof |
| CN110092594A (en) * | 2019-05-31 | 2019-08-06 | 中国建材国际工程集团有限公司 | Three silver coating glass of one kind and preparation method thereof |
-
2016
- 2016-02-04 CN CN201620114585.4U patent/CN205501127U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105565679A (en) * | 2016-02-04 | 2016-05-11 | 东莞南玻工程玻璃有限公司 | Tri-silver low-emissivity coated glass capable of being tempered and preparation method thereof |
| CN105565679B (en) * | 2016-02-04 | 2018-12-11 | 东莞南玻工程玻璃有限公司 | It is a kind of can tempering Three-silver-layer low-radiation coated glass and preparation method thereof |
| CN110092594A (en) * | 2019-05-31 | 2019-08-06 | 中国建材国际工程集团有限公司 | Three silver coating glass of one kind and preparation method thereof |
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