The utility model content
The technical purpose of the utility model is to solve the problem that exists in the prior art, and a kind of good product performance is provided, and is wear-resisting, anticorrosive, anti-oxidant, but the four silver low radiation coated glasses that the strange land processes behind plated film.
The technical scheme of the utility model is:
But a kind of strange land processes four silver low radiation coated glasses; Comprise glass substrate and be coated on the rete on the glass substrate; It is characterized in that said rete outwards comprises from glass substrate successively: basic unit's dielectric layer, first dielectric make up layer, first block protective layer, first silver layer, second block protective layer, the first interval dielectric combination layer, the 3rd block protective layer, second silver layer, dielectric combination layer, the 5th block protective layer, the 3rd silver layer, the 6th block protective layer, the 3rd interval dielectric make up layer, the 7th block protective layer, the 4th silver layer, the 8th block protective layer, second dielectric combination layer to the 4th block protective layer, second at interval.Each above-mentioned rete can be to constitute the composite bed that perhaps is made up of a plurality of film layer stacks by homogenous material.
Said basic unit dielectric layer is a silicon base compound, preferred Si
3N
4, SiO
2, a kind of among the SiOxNy.
Said first dielectric combination layer, second dielectric combination layer, first at interval dielectric combination layer, second at interval dielectric combination layer, the 3rd at interval dielectric combination layer by SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3One or more compositions in the film layer.
Rete that said the first, second, third, fourth, the 5th, the 6th, the 7th, the 8th block protective layer is metal, metal oxide or metal nitride materials constitutes, a kind of in preferred Ti, NiCr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx material.
But be used to produce the manufacturing approach that above-mentioned strange land processes four silver low radiation coated glasses, adopt vacuum magnetic-control sputtering plated film mode, specifically may further comprise the steps:
(1), with behind the glass substrate cleaning-drying, be placed on the vacuum sputtering district, carry out the forevacuum transition;
(2); Bottom-up deposition successively forms basic unit's dielectric layer on said glass substrate; First dielectric combination layer; First block protective layer; First silver layer; Second block protective layer; The first interval dielectric combination layer; The 3rd block protective layer; Second layer silver layer; The 4th block protective layer; The second interval dielectric combination layer; The 5th block protective layer; The 3rd layer of silver layer; The 6th block protective layer; The 3rd interval dielectric combination layer; The 7th block protective layer; The 4th silver layer; Eight block protective layer; Second dielectric combination layer;
(3), form product;
Said basic unit dielectric layer, first and second dielectrics combination layer, first to the 3rd wall dielectric combination layer all adopt dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode to deposit; Said first to fourth silver layer, first to the 8th block protective layer all adopt the mode of planar cathode, d.c. sputtering to deposit.
Said dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode are in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere, to carry out; Said magnetically controlled DC sputtering mode is in argon oxygen, argon nitrogen or straight argon atmosphere, to carry out.
The utility model improves traditional low radiation coated glass, and a kind of unique film layer structure is provided, and is but the strange land that is provided processes the beneficial effect of four silver low radiation coated glasses and production technology thereof:
1), traditional with the low radiation coated glass of Ag as the infrared external reflection rete; The basic reason that can not carry out subsequent heat treatment is: the Ag layer is prone to go to pot in heating process; Even lose the function of infrared external reflection; Damage (that rete face resistance significantly raises, face is white in color is vaporific, rete comes off, and face is the retaining layer), Ag layer oxidized (fuzzy vaporific, the full plate pin hole dress small particles of face sheet) etc. like the Ag layer; Therefore be the ruined phenomenon of Ag layer, four traditional silver low radiation coated glasses can't carry out subsequent heat treatment.The utility model is not destroyed in heat treatment process with protection Ag layer through before and after silver layer, increasing block protective layer and increasing resistant to elevated temperatures dielectric layer at the glass bottom, can realize first plated film, back tempering or hot bending;
2), the utility model adopts the high hardness material close with glass material as basic unit's dielectric layer; Not only can between glass substrate and function Ag layer, play good bonding effect; And can offset the internal stress of composite film; Particularly scratch resistance, wear-resisting and anticorrosive aspect effect more obvious, satisfy product behind the plated film in the demand of strange land processing.
The utility model has also solved traditional low emissivity glass silver thickness simultaneously and the number of plies increases problems such as the back visible light transmissive is lower, appearance color presents interference colour, the color selection is limited.Product has very high visible light transmissivity, extremely low radiance, good photo-thermal than LSG, has good optical stability, weatherability, and color is various, can satisfy different clients' demand, suitable vehicle glass and the building glass market of being widely applied to.
The specific embodiment
For technical scheme and the technical purpose of illustrating the utility model, the utility model is done further introduction below in conjunction with the accompanying drawing and the specific embodiment.
As shown in the figure, but the strange land of the utility model processes the film layer structure and the thicknesses of layers of four silver low radiation coated glasses be:
Glass substrate/basic unit's dielectric layer; (10-80nm)/first dielectric makes up layer; (10-80nm)/first block protective layer; (0.5-5nm)/first silver layer; (5-40nm)/second block protective layer/first interval dielectric makes up layer; (10-100nm)/the 3rd block protective layer; (0.5-5nm)/second silver layer; (5-40nm)/the 4th block protective layer; (0.5-5nm)/second dielectric makes up layer at interval; (10-200nm)/the 5th block protective layer; (0.5-5nm)/the 3rd silver layer; (5-40nm)/the 6th block protective layer; (0.5-5nm)/the 3rd dielectric makes up layer at interval; (10-200nm)/the 7th block protective layer; (0.5-5nm)/the 4th silver layer; (5-40nm)/the 8th block protective layer; (0.5-5nm)/second dielectric makes up layer; (10-80nm).
Wherein first dielectric combination layer, second dielectric combination layer and first to the 3rd interval dielectric combination layer are by SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3Deng one or more compositions in the material.
Rete that said the first, second, third, fourth, the 5th, the 6th, the 7th, the 8th block protective layer is metal, metal oxide or metal nitride materials constitutes, a kind of in preferred Ti, Ni Cr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx material.
Be the film layer structure of a concrete application example of the utility model below:
Glass substrate/SiNxOy/ZnO/NiCrOx/Ag/NiCrOx/ZnSnOx/NiCrOx/Ag/NiCrOx/ZnSn Ox/NiCrOx/Ag/NiCrOx/ZnSnOx/NiCrOx/Ag/NiCrOx/ (ZnSnOx/Si
3N
4)
Wherein, basic unit's dielectric layer is silicon oxynitride (SiNxOy), and thicknesses of layers is: 46.0nm;
First dielectric combination layer is zinc oxide (ZnO), and thicknesses of layers is: 10nm;
First block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The first silver layer thicknesses of layers is: 13.9nm;
Second block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The first interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 69.7nm;
The 3rd block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The second silver layer thicknesses of layers is: 15.0nm;
The 4th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The second interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 58.6nm;
The 5th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 3rd silver layer thicknesses of layers is: 9.4nm;
The 6th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 3rd interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 31.4nm;
The 7th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 4th silver layer thicknesses of layers is: 12.7nm;
The 8th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
Second dielectric combination layer is zinc-tin oxide (ZnSnOx) and silicon nitride (Si
3N
4) the rete formation, thickness is respectively: 15.2nm, 18.4nm.
The processing technology of above-mentioned rete is:
All silicon nitride (Si
3N
4) layer use sial (92: 8) target, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, power is 20-80kw, supply frequency is 20-40kHz;
All silicon oxynitrides (SiOxNy) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and supply frequency is 20-40kHz;
Zinc oxide (ZnO) layer uses zinc-aluminium (98: 2) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and supply frequency is 20-40kHz;
Zinc-tin oxide (ZnSnOx) layer uses Zinc-tin alloy (50: 50) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-70kw, and supply frequency is 20-40kHz;
Oxidation nickel chromium triangle (NiCrOx) layer uses the nichrome target, adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw;
All functions layer Ag layer adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere for using silver-colored target, and power is 2-10kw;
The manufacturing approach idiographic flow of the utility model is:
(1), with behind the glass substrate cleaning-drying, be placed on the vacuum sputtering district, carry out the forevacuum transition;
(2), deposition forms basic unit's dielectric layer on said glass body;
(3), deposition first dielectric combination layer on said basic unit dielectric layer;
(4), deposition forms first block protective layer on said first dielectric combination layer;
(5), deposition forms first silver layer on said first block protective layer;
(6), deposition forms second block protective layer on said first silver layer;
(7), deposition forms first wall dielectric combination layer on said second block protective layer;
(8), deposition forms the 3rd block protective layer on said first wall dielectric combination layer;
(9), deposition forms second layer silver layer on said the 3rd block protective layer;
(10), deposition forms the 4th block protective layer on said second layer silver layer;
(11), deposition forms the 3rd interval dielectric combination layer on said the 4th block protective layer;
(12), deposit formation the 5th block protective layer on the dielectric combination layer at interval the said the 3rd;
(13), deposition forms the 3rd layer of silver layer on said the 5th block protective layer;
(14), deposition forms the 6th block protective layer on said the 3rd layer of silver layer;
(15), deposition forms the 4th interval dielectric combination layer on said the 6th block protective layer;
(16), deposit formation the 7th block protective layer on the dielectric combination layer at interval the said the 4th;
(17), deposition forms the 4th silver layer on said the 7th block protective layer;
(18), deposition forms the 8th block protective layer on said the 4th silver layer;
(19), deposition forms second dielectric combination layer on said the 8th block protective layer;
(20), form product;
(21), on-line measurement optical performance parameter;
(22), product inspection;
(22), the packing of product.
Use glass (behind the tempering) optical property that above-mentioned technological parameter makes (glass is 6mm common white glass) as follows:
A, glass visible light transmissivity T=60.8%;
Visible light glass reflectivity=10.2%;
Visible light glass chromaticity coordinates a* value=-2.3;
Visible light glass chromaticity coordinates b* value=-5.2;
Visible light face reflectivity=6.5%;
Visible light face chromaticity coordinates a*=-2.0;
Visible light face chromaticity coordinates b*=-3.0;
Glass radiance E=0.018;
Rete resistance is lower than 1.3 Ω cm
2
B, use the utility model to process the double glazing of 6mm+12A+6mm (rete outdoor inner face) structure, following according to the data of ISO10292 standard test:
Visible light transmissivity T=55.8%;
Visible light glass reflectivity (out)=12.4%;
Visible light glass reflectivity (in)=8.6%;
Solar energy transmitance T=16%;
Solar reflectance (out)=54%;
G-value=0.23;
Shading coefficient SC=0.26;
U value=1.56W/m2K;
Photo-thermal compares LSG=2.44;
Below disclose the utility model with preferred embodiment, so it is not in order to restriction the utility model, and all employings are equal to replacement or the technical scheme that obtained of equivalent transformation mode, all drop within the protection domain of the utility model.