CN102514279A - Four-silver coated glass with low radiation and manufacturing technique thereof - Google Patents

Four-silver coated glass with low radiation and manufacturing technique thereof Download PDF

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CN102514279A
CN102514279A CN2011103816499A CN201110381649A CN102514279A CN 102514279 A CN102514279 A CN 102514279A CN 2011103816499 A CN2011103816499 A CN 2011103816499A CN 201110381649 A CN201110381649 A CN 201110381649A CN 102514279 A CN102514279 A CN 102514279A
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silver
dielectric combination
combination layer
low radiation
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林嘉宏
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Abstract

The invention discloses four-silver coated glass with low radiation and a manufacturing technique thereof, the four-silver coated glass with low radiation is provided with a coating film on a glass substrate; the four-silver coated glass with low radiation is characterized in that the film layer structure of the coating film from the glass substrate to the outside is sequentially as follows: a first dielectric combination layer, a first silver layer, a first isolation dielectric combination layer, a second silver layer, a second isolation dielectric combination layer, a third silver layer, a third isolation dielectric combination layer, a fourth silver layer and a second dielectric combination layer. According to the invention, the unique film layer structure and the manufacturing technique are utilized, and the dielectric layer made of a novel material is further used for replacing the traditional metal blocking layer to greatly improve the visible light transmissivity of the glass, reduce the interference color, increase the color selection range, guarantee high visible light transmissivity, low radiation rate, good photo-thermal ratio, optical stability and weather resistance for the improved products, and to obtain good thermal insulation and heat preservation effects.

Description

Four silver low radiation coated glass and manufacturing process thereof
Technical field
The present invention relates to building and automobile and use the coated glass field, specifically is a kind of four silver low radiation coated glass and manufacturing process thereof.
Background technology
Low radiation coated glass is a kind ofly can let outdoor solar energy, visible light transmissive as simple glass; The coated glass of new generation that can object secondary radiation heat reflection be gone back as ir reflector (especially centering far infrared) again; Under any climatic environment, use, all can reach the effect of controlling light, energy savings heat, control and regulation and improving environment.The tradition low emissivity glass comprises Dan Yin, double silver coating glass; In order to obtain lower U value, SC (shading coefficient) and good photo-thermal than (LSG); Have only thickness, but the increase of silver thickness just means that the reduction, color of visible light transmissive selected limited through continuous increase silver layer; Can't satisfy different clients' demand, so complicated more three silver medals even four silver low radiation coated glasses just occurred.
Summary of the invention
Technical purpose of the present invention solves the problem that exists in the prior art, in the middle of silver layer, sets up dielectric layer at interval, offsets because the visible light transmissivity that the increase of silver thickness reduces through its Overlay.
Technical scheme of the present invention is:
A kind of four silver low radiation coated glasses; On glass substrate, be provided with plated film; It is characterized in that the film layer structure of said plated film outwards is followed successively by from glass substrate: first dielectric combination layer, first silver layer, first wall dielectric combination layer, second silver layer, second wall dielectric combination layer, the 3rd silver layer, the 3rd wall dielectric combination layer, the 4th silver layer, second dielectric combination layer.
As preferably, said first dielectric combination layer, second dielectric combination layer, first wall dielectric combination layer, second wall dielectric combination layer, the 3rd wall dielectric combination layer are by SSTOx, CrNx, CdO, MnO 2, InSbO, TxO, SnO 2, ZnO, ZnSnOx, ZnSnPbOx, ZrO 2, AZO, Si 3N 4, SiO 2, SiOxNy, BiO 2, Al 2O 3, Nb 2O 5, Ta 2O 5, In 2O 3, MoO 3, TiO 2One or more compositions in the film layer.
The thickness of said first dielectric combination layer, second dielectric combination layer is 10-80nm.
The thickness of said first wall dielectric combination layer, second wall dielectric combination layer, the 3rd wall dielectric combination layer is 10-200nm.
The thickness of said first silver layer, second silver layer, the 3rd silver layer, the 4th silver layer is 5-40nm.
A kind of manufacturing process of four silver low radiation coated glasses adopts the vacuum magnetic-control sputtering plated film, it is characterized in that, may further comprise the steps:
On glass substrate, be coated with first dielectric combination layer, first silver layer, first wall dielectric combination layer, second silver layer, second wall dielectric combination layer, the 3rd silver layer, the 3rd wall dielectric combination layer, the 4th silver layer, second dielectric combination layer successively.
Said first dielectric combination layer, second dielectric combination layer, first wall dielectric combination layer, second wall dielectric combination layer, the 3rd wall dielectric combination layer can adopt the mode depositional coating of dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode or planar cathode, magnetically controlled DC sputtering.
Said first silver layer, second silver layer, the 3rd silver layer, the 4th silver layer adopt the mode depositional coating of planar cathode, d.c. sputtering.
The mode of said dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering is carried out in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere.
The mode of said planar cathode, d.c. sputtering is carried out in argon oxygen, argon nitrogen or straight argon atmosphere.
Four silver low radiation coated glass and manufacturing process thereof provided by the present invention; Has the unique film layer structure; Low radiation coated glass to traditional improves; Solve problems such as traditional low emissivity glass reduces at the visible light transmissivity of silver thickness and number of plies increase back generation, appearance color presents interference colour, the color selection is limited; Particularly use the dielectric layer of new material to replace the protective effect that stops of metal barrier, thereby cancelled metal barrier, make visible light transmissive significantly promote.Glass of the present invention has the very high visible light transmissivity of tool, extremely low radiance, good photo-thermal ratio; It is various to have good optical stability, weatherability and color; Can satisfy different clients' demand; Heat insulation and preservation effect is good, and ultraviolet ray stops that rate is high, suitable vehicle glass and the building glass market of being widely applied to.
Description of drawings
Fig. 1 is a structural representation of the present invention.
The specific embodiment
In order to illustrate technical scheme of the present invention and technical purpose, the present invention is done further introduction below in conjunction with the accompanying drawing and the specific embodiment.
As shown in the figure, the structure of four silver low radiation coated glasses of the present invention and thicknesses of layers are:
Glass/first dielectric combination layer (10-80nm)/first silver layer (5-40nm)/first wall dielectric combination layer (10-200nm)/second silver layer (5-40nm)/second wall dielectric combination layer (10-200nm)/3rd silver layer (5-40nm)/the 3rd wall dielectric combination layer (10-200nm)/4th silver layer (5-40nm)/second dielectric combination layer (10-80nm).
Wherein first, second dielectric makes up layer, and first, second, third wall dielectric combination layer is by SSTOx, CrNx, CdO, MnO 2, InSbO, TxO, SnO 2, ZnO, ZnSnOx, ZnSnPbOx, ZrO, AZO, Si 3N 4, SiO, SiOxNy, BiO 2, Al 2O 3, Nb 2O 5, Ta 2O 5, In 2O 3, MoO 3, TiO 2Deng one or more compositions in the rete of material formation.
Embodiment 1:
The magnetron sputtering coater that practical implementation of the present invention is used; Comprise that 23 exchange the Rotating Double negative electrode, 8 direct current planar negative electrodes adopt following table to list technological parameter; Use 17 to exchange the Rotating Double negative electrode; 4 direct current planar negative electrodes are coated with according to the sequencing of rete successively, make the present invention's four silver low radiation coated glasses.Glass substrate will pass through cleaning-drying before plated film, in the vacuum magnetic-control sputtering coating machine, carry out the forevacuum transition then, begins filming process then, and the list of locations of its technological parameter and target is following:
Figure BDA0000112651660000041
Figure BDA0000112651660000051
All silicon nitride (Si of last table 3N 4) layer use sial (92: 8) target, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, power is 20-110kw, supply frequency is 20-40kHz;
Last all silicon oxynitrides of table (SiOxNy) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and supply frequency is 20-40kHz;
Zinc oxide (ZnO) layer uses zinc-aluminium (98: 2) target in the last table, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and supply frequency is 20-40kHz;
All AZO layers of last table use the AZO target, adopt dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw, and supply frequency is 20-40kHz;
The all functional layer Ag layers of last table are the silver-colored target of use, employing planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw.
Use glass optical property that above-mentioned technological parameter makes (glass is 6mm common white glass) as follows:
A, glass visible light transmissivity T=68.1%;
Visible light glass reflectivity=10.1%;
Visible light glass chromaticity coordinates a* value=-3.0;
Visible light glass chromaticity coordinates b* value=-6.0;
Visible light face reflectivity=7.6%;
Visible light face chromaticity coordinates a*=-1.9;
Visible light face chromaticity coordinates b*=-3.0;
Glass radiance E=0.015.
B, use the present invention to process the double glazing of 6mm+12A+6mm (rete outdoor inner face) structure, following according to the data of ISO10292 standard test:
Visible light transmissivity T=62%;
Visible light glass reflectivity (out)=12%;
Visible light glass reflectivity (in)=9.5%;
Solar energy transmitance T=20%;
Solar reflectance (out)=48%;
G-value=0.248;
Shading coefficient SC=0.285;
U value=1.53W/m2K;
Photo-thermal compares LSG=2.5.
Embodiment 2:
Use magnetron sputtering coater, adopt following table to list technological parameter, use 17 to exchange the Rotating Double negative electrode, 4 direct current planar negative electrodes are made the present invention's four silver low radiation coated glasses, and the list of locations of its technological parameter and target is following:
Figure BDA0000112651660000071
Last table niobium oxide (Nb 2O 5) layer use niobium oxide target, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, power is 50-100kw, supply frequency is 20-40kHz;
Last table titanium oxide (TiO 2) the ceramic titanium oxide target of layer use, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, power is 50-100kw, supply frequency is 20-40kHz;
Last table zinc oxide (ZnO) layer uses zinc-aluminium (98: 2) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and supply frequency is 20-40kHz;
Last all silicon nitrides of table (Si3N4) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, and power is 20-110kw, and supply frequency is 20-40kHz;
Last all silicon oxynitrides of table (SiOxNy) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and supply frequency is 20-40kHz;
All AZO layers of last table use the AZO target, adopt dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw, and supply frequency is 20-40kHz;
Last epoxy zinc-tin (ZnSnOx) layer uses zinc-aluminium (50: 50) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and frequency is 20-40kHz;
Last table all functions layer Ag layer adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere for using silver-colored target, and power is 2-10kw.
Use glass optical property that above-mentioned technological parameter makes (glass is 6mm common white glass) as follows:
A, glass visible light transmissivity T=70.8%;
Visible light glass reflectivity=10.0%;
Visible light glass chromaticity coordinates a* value=-2.0;
Visible light glass chromaticity coordinates b* value=-5.0;
Visible light face reflectivity=8.1%;
Visible light face chromaticity coordinates a*=-2.0;
Visible light face chromaticity coordinates b*=-3.0;
Glass radiance E=0.018.
B, use the present invention to process the double glazing of 6mm+12A+6mm (rete outdoor inner face) structure, following according to the data of ISO10292 standard test:
Visible light transmissivity T=65%;
Visible light glass reflectivity (out)=13%;
Visible light glass reflectivity (in)=10%;
Solar energy transmitance T=20%;
Solar reflectance (out)=58%;
G-value=0.25;
Shading coefficient SC=0.287;
U value=1.52W/m2K;
Photo-thermal compares LSG=2.58.
The characteristics and the superiority of the present invention's four silver low radiation coated glasses and production technology thereof are:
1), traditional with the low radiation coated glass of Ag as the infrared external reflection rete, before and after the Ag layer, increase metal barrier usually, be etched to prevent the Ag layer; Yet because the adding of metal barrier makes transmitance obviously reduce; Particularly three silver medals or four silver low radiation coated glasses, along with the increase of Ag layer, transmitance has been subjected to very big influence; If increase the coat of metal of 3-6 layer again, the visible light transmissivity of composite film just more is difficult to be protected.The present invention has cancelled the metal barrier in traditional three silver medals or the four silver low radiation retes, and adopts the dielectric layer (like the AZO layer) of new material that silver layer is protected, just can reduce influence like this to transmitance, thus good thermal property obtained;
2), the present invention is not owing to use metal barrier, thereby avoided the generation of interference colour to a certain extent, add control to the film layer spectrum curve, can guarantee that the color that the plated film product observes 0-45 ° of scope is pure, no red, purple interference;
3) high hardness material that, employing of the present invention and glass material are close is as interval dielectric layer combination layer; Not only can between glass substrate and function Ag layer, play good bonding effect; And can offset the internal stress of composite film, particularly scratch resistance, wear-resisting and anticorrosive aspect effect more obvious;
4), all can reach standard, and be superior to like product according to each item performance indications of the product of present embodiment manufacturing.
Below disclose the present invention with preferred embodiment, so it is not in order to restriction the present invention, and all employings are equal to replacement or the technical scheme that obtained of equivalent transformation mode, all drop within protection scope of the present invention.

Claims (9)

1. silver low radiation coated glass; On glass substrate, be provided with plated film; It is characterized in that the film layer structure of said plated film outwards is followed successively by from glass substrate: first dielectric combination layer, first silver layer, first wall dielectric combination layer, second silver layer, second wall dielectric combination layer, the 3rd silver layer, the 3rd wall dielectric combination layer, the 4th silver layer, second dielectric combination layer.
2. a kind of four silver low radiation coated glasses according to claim 1; It is characterized in that said first dielectric combination layer, second dielectric combination layer, first wall dielectric combination layer, second wall dielectric combination layer, the 3rd wall dielectric combination layer are by SSTOx, CrNx, CdO, MnO 2, InSbO, TxO, SnO 2, ZnO, ZnSnOx, ZnSnPbOx, ZrO 2, AZO, Si 3N 4, SiO 2, SiOxNy, BiO 2, Al 2O 3, Nb 2O 5, Ta 2O 5, In 2O 3, MoO 3, TiO 2One or more compositions in the film layer.
3. a kind of four silver low radiation coated glasses according to claim 1 and 2 is characterized in that, the thickness of said first dielectric combination layer, second dielectric combination layer is 10-80nm.
4. a kind of four silver low radiation coated glasses according to claim 1 and 2 is characterized in that, the thickness of said first wall dielectric combination layer, second wall dielectric combination layer, the 3rd wall dielectric combination layer is 10-200nm.
5. four silver low radiation coated glasses according to claim 1 and 2 is characterized in that the thickness of said first silver layer, second silver layer, the 3rd silver layer, the 4th silver layer is 5-40nm.
6. the manufacturing process of a silver low radiation coated glass adopts the vacuum magnetic-control sputtering plated film, it is characterized in that, may further comprise the steps:
On glass substrate, be coated with first dielectric combination layer, first silver layer, first wall dielectric combination layer, second silver layer, second wall dielectric combination layer, the 3rd silver layer, the 3rd wall dielectric combination layer, the 4th silver layer, second dielectric combination layer successively;
Said first dielectric combination layer, second dielectric combination layer, first wall dielectric combination layer, second wall dielectric combination layer, the 3rd wall dielectric combination layer adopt the mode depositional coating of dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode or planar cathode, magnetically controlled DC sputtering.
7. the manufacturing process of a kind of four silver low radiation coated glasses according to claim 6 is characterized in that, said first silver layer, second silver layer, the 3rd silver layer, the 4th silver layer adopt the mode depositional coating of planar cathode, d.c. sputtering.
8. according to the manufacturing process of claim 6 or 7 described a kind of four silver low radiation coated glasses, it is characterized in that the mode of said dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering is carried out in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere.
9. according to claim 6 or 7 described four silver low radiation coated glasses, it is characterized in that the mode of said planar cathode, d.c. sputtering is carried out in argon oxygen, argon nitrogen or straight argon atmosphere.
CN2011103816499A 2011-11-25 2011-11-25 Four-silver coated glass with low radiation and manufacturing technique thereof Pending CN102514279A (en)

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CN103072341A (en) * 2013-01-22 2013-05-01 福耀玻璃工业集团股份有限公司 Low-emissivity coated glass and sandwich glass product thereof
CN107406308A (en) * 2015-02-03 2017-11-28 Vitro可变资本股份有限公司 Solar control coating with improved sunlight control characteristics
CN111072290A (en) * 2019-11-29 2020-04-28 宁波瑞凌新能源科技有限公司 Low-emissivity colorful film and preparation method thereof
CN116395991A (en) * 2023-03-08 2023-07-07 江苏辛巴新材料科技股份有限公司 High-permeability fireproof coated glass

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CN103072341A (en) * 2013-01-22 2013-05-01 福耀玻璃工业集团股份有限公司 Low-emissivity coated glass and sandwich glass product thereof
CN107406308A (en) * 2015-02-03 2017-11-28 Vitro可变资本股份有限公司 Solar control coating with improved sunlight control characteristics
CN111072290A (en) * 2019-11-29 2020-04-28 宁波瑞凌新能源科技有限公司 Low-emissivity colorful film and preparation method thereof
CN116395991A (en) * 2023-03-08 2023-07-07 江苏辛巴新材料科技股份有限公司 High-permeability fireproof coated glass
CN116395991B (en) * 2023-03-08 2023-12-29 江苏辛巴新材料科技股份有限公司 High-permeability fireproof coated glass

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Application publication date: 20120627