CN111704369A - Panoramic gray double-silver low-emissivity coated glass and preparation method thereof - Google Patents
Panoramic gray double-silver low-emissivity coated glass and preparation method thereof Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 54
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 30
- 239000004332 silver Substances 0.000 title claims abstract description 30
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000010410 layer Substances 0.000 claims abstract description 225
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 47
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical group [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000011248 coating agent Substances 0.000 claims abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 14
- 239000011247 coating layer Substances 0.000 claims abstract description 13
- 229910004205 SiNX Inorganic materials 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 229910007717 ZnSnO Inorganic materials 0.000 claims abstract description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 104
- 239000013077 target material Substances 0.000 claims description 55
- 229910052786 argon Inorganic materials 0.000 claims description 52
- 239000007789 gas Substances 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 44
- 238000004544 sputter deposition Methods 0.000 claims description 42
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 25
- 229910018487 Ni—Cr Inorganic materials 0.000 claims description 18
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 18
- 239000001301 oxygen Substances 0.000 claims description 18
- 229910052760 oxygen Inorganic materials 0.000 claims description 18
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 239000002346 layers by function Substances 0.000 claims description 10
- 229910000611 Zinc aluminium Inorganic materials 0.000 claims description 9
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 claims description 6
- 239000011241 protective layer Substances 0.000 claims description 6
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims description 6
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 238000002834 transmittance Methods 0.000 abstract description 3
- 229910001120 nichrome Inorganic materials 0.000 abstract 2
- 230000005540 biological transmission Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 239000003086 colorant Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000005034 decoration Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- -1 silver-zinc-aluminum Chemical compound 0.000 description 2
- 238000007792 addition Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Abstract
The invention provides panoramic grey double-silver low-emissivity coated glass and a preparation method thereof, belonging to the technical field of magnetron sputtering coating, wherein the consistency of the appearance color of the coated glass is improved through the optimized design of a glass coating layer; a panoramic grey double-silver low-emissivity coated glass comprises a glass substrate layer and a coated layer, wherein thirteen coating layers are sequentially compounded from the glass substrate layer to the outside, and the first layer is SiNxThe second layer is a ZnSnO layer, the third layer is a ZnO layer, the fourth layer is an Ag layer, the fifth layer is a NiCr layer, the sixth layer is an AZO layer, and the seventh layer is SiNxThe eighth layer is a ZnSnO layer, the ninth layer is a ZnO layer, the tenth layer is an Ag layer, the eleventh layer is a NiCr layer, the twelfth layer is an AZO layer, and the thirteenth layer is SiNxAnd (3) a layer. The glass has the advantages of high transmittance, good appearance color consistency and the like.
Description
Technical Field
The invention belongs to the technical field of magnetron sputtering coating, and particularly relates to panoramic gray double-silver low-emissivity coated glass and a preparation method thereof.
Background
As a novel building and decoration material, the Low-E glass has the characteristics of high visible light transmission and high mid-far infrared ray reflection of a coating layer, so that compared with common glass and traditional coating glass for buildings, the Low-E glass has the following obvious advantages: 1) the heat loss of the outer door and window glass is the main part of the energy consumption of the building, and accounts for more than 50 percent of the energy consumption of the building. Compared with a common-structure white glass door and window, the low-emissivity coated glass can reduce the energy loss of the part by 60-90% according to different film layer structures. 2) Good optical performance. The Low-E glass has high transmittance of visible light in sunlight, and can reach more than 80%. And the reflectance is very low, which makes the optical performance of the coated glass much improved compared with the traditional coated glass. The appearance is more transparent and clear when the glass is seen from the outside. Not only ensures good lighting of buildings, but also avoids the phenomenon of light pollution caused by light reflection of the traditional large-area glass curtain wall and hollow glass door and window, and creates a softer and more comfortable light environment.
According to the analysis of the recent market sales situation, the gray low-emissivity coated glass is more and more approved by the market at present, and the demand of gray products is more and more vigorous. However, with the gradual mature and popularization of the technology, homogenization competition is more and more obvious, and the requirement of customers on the appearance color of the curtain wall is higher and higher. In terms of the actual installation effect of curtain wall glass, because the wall area is large, the building floor is high, the observation angles of the glass at different positions of the curtain wall are different when the curtain wall is observed in a close range, and for double-silver low-radiation coated glass, because of the interference of multilayer films and the influence of transmission colors, the colors of the glass are different when the glass is observed at different angles, the integral color of the curtain wall is inconsistent, the decoration effect is influenced, and meanwhile, the indoor color decoration is poor due to excessive pursuit of outdoor colors of many products, and the difference with the outdoor color exists. The prior art has the following disadvantages:
1) the existing double-silver low-emissivity coated glass mainly deflects to the blue system and the green system.
2) The existing double-silver film system generally has the phenomena of small-angle color change and large difference of indoor and outdoor colors.
Disclosure of Invention
The invention aims to provide panoramic gray double-silver low-emissivity coated glass and a preparation method thereof aiming at the problems in the prior art, and the technical problem to be solved by the invention is how to improve the consistency of the appearance color of the coated glass through the design of a coating layer.
The purpose of the invention can be realized by the following technical scheme: the panoramic grey double-silver low-emissivity coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein thirteen coating layers are sequentially compounded from the glass substrate layer to the outside on the coated layer, and the first layer is SiNxThe second layer is a ZnSnO layer, the third layer is a ZnO layer, the fourth layer is an Ag layer, the fifth layer is a NiCr layer, the sixth layer is an AZO layer, and the seventh layer is SiNxThe eighth layer is a ZnSnO layer, the ninth layer is a ZnO layer, the tenth layer is an Ag layer, the eleventh layer is a NiCr layer, the twelfth layer is an AZO layer, and the thirteenth layer is SiNxAnd (3) a layer.
In the panoramic grey double-silver low-radiation coated glass, the first layer, the second layer and the third layer are a first dielectric medium combined layer, the fourth layer is a low-radiation functional layer, the fifth layer is a blocking protective layer, the sixth layer is a first crystal bed dielectric layer, the seventh layer, the eighth layer and the ninth layer form a second dielectric medium combined layer, the tenth layer is a low-radiation functional layer, the eleventh layer is a second blocking protective layer, the twelfth layer is a second crystal bed dielectric layer, and the thirteenth layer is a third dielectric medium layer.
A preparation method of panoramic gray double-silver low-emissivity coated glass is characterized by comprising the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer:
the number of the target materials is 3-4 of alternating current rotating targets, the target materials are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon and nitrogen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 20-23 nm;
B. magnetron sputtering the second layer:
the number of the target materials is 2-3 alternating current rotating targets, the target materials are provided with zinc tin (ZnSn), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 17.5-19 nm;
C. magnetron sputtering the third layer:
the number of the targets is 1-2 alternating current rotary targets, the targets are configured to be zinc aluminum (ZnAl), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 multiplied by 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 8-9 nm;
D. magnetron sputtering the fourth layer:
the number of the target materials is 1 direct current plane target, the target materials are configured to be silver (Ag), the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 2.5-2.8 nm;
E. performing magnetron sputtering on a fifth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 0.5-1.0 nm;
F. magnetron sputtering a sixth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be zinc aluminum oxide (AZO), the process gas proportion is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 7-9 nm;
G. magnetron sputtering a seventh layer:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured as silicon-aluminum(SiAl), wherein the ratio of the process gas is argon to nitrogen, the ratio of the argon to the nitrogen is 1:1.14, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 32-33 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is 2-3 alternating current rotating targets, the targets are configured to be zinc tin (ZnSn), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 12-13 nm;
I. magnetron sputtering the ninth layer:
the number of the targets is 2-3 alternating current rotary targets, the targets are configured to be silver-zinc-aluminum (ZnAl), the ratio of the process gas to argon to oxygen is 1:2, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 17-19 nm;
J. magnetron sputtering the tenth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be silver (Ag), the process gas ratio is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 3.8-4.2 nm;
the magnetron sputtering tenth layer can also be:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas ratio is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 4.6-4.8 nm;
K. magnetron sputtering the eleventh layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-3mbar; the thickness of the coating film is 1.5-1.8 nm;
l, magnetron sputtering a twelfth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be zinc aluminum oxide (AZO), the process gas proportion is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 6-8 nm;
m, magnetron sputtering a thirteenth layer:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); process gasthe ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 47-49 nm;
2) the total thickness of the coating layer is controlled between 188 nm and 195 nm.
In the panoramic gray double-silver low-radiation coated glass, the thickness of the first dielectric layer is 45.5-51, the thickness of the first low-radiation functional layer is 2.5-2.8, and the thickness of the second low-radiation functional layer is 3.8-4.8, so that the appearance color is gray under multi-angle observation, the consistency is high, and specific color values (CIE1976L a b color space) are realized.
The invention has the advantages that:
1. the glass surface, the film surface and the transmission color of the product of the patent are all grey, and the specific measurement results are as follows: 6mm monolithic transmittance > 55%, transmission color a ∈ [ -2.5, -3], b ∈ [ -3.8, -3.3 ]; and the glass surface color a is from [ -2.0, -2.5], b is from [ -5.0, -4.5], the film surface color a is from [ -0, 0.5], b is from [ -5, -4.5 ].
2. The glass surface small angle color is as follows: a is E < -2.5, -2.0 >, b is E < -5.0, -4.5], the glass surface reflection color contrast of 60 DEG and 10 DEG, delta a < 0.5, and delta b < 0.5.
Drawings
Fig. 1 is a schematic view of the layered structure of the panoramic gray double-silver low-emissivity coated glass.
In the figure, G, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. the eleventh layer; 12. a twelfth layer; 13. and a twelfth layer.
Detailed Description
The following are specific embodiments of the present invention and are further described with reference to the drawings, but the present invention is not limited to these embodiments.
As shown in figure 1, the panoramic gray double-silver low-emissivity coated glass comprises a glass substrate layer and a coating layer, wherein thirteen film layers are compounded on the coating layer from the glass substrate layer G to the outside in sequence, and the first layer 1 isSiNxThe second layer 2 is a ZnSnO layer, the third layer is a ZnO layer, the fourth layer is an Ag layer, the fifth layer is a NiCr layer, the sixth layer is an AZO layer, and the seventh layer is SiNxThe eighth layer is a ZnSnO layer, the ninth layer is a ZnO layer, the tenth layer is an Ag layer, the eleventh layer is a NiCr layer, the twelfth layer is an AZO layer, and the thirteenth layer is SiNxA layer; the first layer 1, the second layer 2 and the third layer are first dielectric medium combined layers, the fourth layer is a low-radiation functional layer, the fifth layer is a blocking protective layer, the sixth layer is a first crystal bed dielectric layer, the seventh layer, the eighth layer and the ninth layer form a second dielectric medium combined layer, the tenth layer is a low-radiation functional layer, the eleventh layer is a second blocking protective layer, the twelfth layer is a second crystal bed dielectric layer, and the thirteenth layer is a third dielectric medium layer.
A preparation method of panoramic gray double-silver low-emissivity coated glass is characterized by comprising the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer 1:
the number of the target materials is 3-4 of alternating current rotating targets, the target materials are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon and nitrogen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 20-23 nm;
B. magnetron sputtering of the second layer 2:
the number of the target materials is 2-3 alternating current rotating targets, the target materials are provided with zinc tin (ZnSn), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 17.5-19 nm;
C. magnetron sputtering the third layer:
the number of the targets is 1-2 alternating current rotary targets, the targets are configured to be zinc aluminum (ZnAl), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 multiplied by 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 8-9 nm;
D. magnetron sputtering the fourth layer:
the number of the target materials is 1 direct current plane target, the target materials are configured to be silver (Ag), the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 2.5-2.8 nm;
E. performing magnetron sputtering on a fifth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 0.5-1.0 nm;
F. magnetron sputtering a sixth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be zinc aluminum oxide (AZO), the process gas proportion is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 7-9 nm;
G. magnetron sputtering a seventh layer:
the number of the target materials is 3-5 alternating current rotary targets, the target materials are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to nitrogen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 32-33 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is 2-3 alternating current rotating targets, the targets are configured to be zinc tin (ZnSn), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 12-13 nm;
I. magnetron sputtering the ninth layer:
the number of the targets is 2-3 alternating current rotary targets, the targets are configured to be silver-zinc-aluminum (ZnAl), the ratio of the process gas to argon to oxygen is 1:2, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 17-19 nm;
J. magnetron sputtering the tenth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be silver (Ag), the process gas ratio is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 3.8-4.2 nm;
the magnetron sputtering tenth layer can also be:
the number of the target materials is 1 direct current plane target, the target material is configured with silver (Ag), the process gas ratio is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; plating ofThe thickness of the film is 4.6-4.8 nm;
K. magnetron sputtering the eleventh layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-3mbar; the thickness of the coating film is 1.5-1.8 nm;
l, magnetron sputtering a twelfth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be zinc aluminum oxide (AZO), the process gas proportion is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 6-8 nm;
m, magnetron sputtering a thirteenth layer:
the number of the target materials is 4-6 of alternating current rotating targets, the target materials are configured to be silicon aluminum (SiAl), the ratio of the process gas to the argon gas to the nitrogen gas is 1:1.14, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 47-49 nm;
2) the total thickness of the coating layer is controlled between 188 nm and 195 nm.
In the panoramic gray double-silver low-radiation coated glass, the thickness of the first dielectric layer is 45.5-51, the thickness of the first low-radiation functional layer is 2.5-2.8, and the thickness of the second low-radiation functional layer is 3.8-4.8, so that the appearance color is gray under multi-angle observation, the consistency is high, and specific color values (CIE1976L a b color space) are realized.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.
Claims (3)
1. The utility model provides a two silver low-emissivity coated glass of panorama grey, its characterized in that, this coated glass includes glass substrate layer (G) and coating film layer, the coating film layer from glass substrate layer (G) outwards compounds thirteen retes in proper order, wherein first layer (1) is the SiNx layer, second layer (2) are the ZnSnO layer, third layer (3) are the ZnO layer, fourth layer (4) are the Ag layer, fifth layer (5) are the NiCr layer, sixth layer (6) are the AZO layer, seventh layer (7) are the SiNx layer, eighth layer (8) are the ZnSnO layer, ninth layer (9) are the ZnO layer, tenth layer (10) are the Ag layer, tenth layer (11) are the NiCr layer, twelfth layer (12) are the AZO layer, tenth layer (13) are the SiNx layer.
2. The double silver low-emissivity coated glass according to claim 1, wherein the first layer (1), the second layer (2) and the third layer (3) are a first dielectric composite layer, the fourth layer (4) is a low-emissivity functional layer, the fifth layer (5) is a barrier protective layer, the sixth layer (6) is a first crystalline bed dielectric layer, the seventh layer (7), the eighth layer (8) and the ninth layer (9) constitute a second dielectric composite layer, the tenth layer (10) is a low-emissivity functional layer, the eleventh layer (11) is a second barrier protective layer, the twelfth layer (12) is a second crystalline bed dielectric layer, and the tenth layer (13) is a third dielectric layer.
3. A method for preparing a full-gray double-silver low-emissivity coated glass according to claim 1 or claim 2, wherein the method comprises the steps of:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer (1):
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-23 nm;
B. magnetron sputtering of the second layer (2):
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is provided with zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 17.5-19 nm;
C. magnetron sputtering third layer (3):
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 8-9 nm;
D. magnetron sputtering fourth layer (4):
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon with sputtering pressure of 2-3 x 10 < -3 > mbar; the thickness of the plated film is 2.5-2.8 nm;
E. magnetron sputtering fifth layer (5):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); process gas: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the coating film is 0.5-1.0 nm;
F. magnetron sputtering sixth layer (6):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 7-9 nm;
G. magnetron sputtering seventh layer (7):
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 32-33 nm;
H. magnetron sputtering eighth layer (8):
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the plated film is 12-13 nm;
I. magnetron sputtering ninth layer (9):
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be silver, zinc and aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the plated film is 17-19 nm;
J. magnetron sputtering tenth layer (10):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas ratio is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 3.8-4.2 nm;
the magnetron sputtering tenth layer (10) may also be:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas ratio is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 4.6-4.8 nm;
K. magnetron sputtering the eleventh layer (11):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); process gas: pure argon gas; the sputtering pressure is as follows: 2-3 x 10-3 mbar; the thickness of the coating film is 1.5-1.8 nm;
l, magnetron sputtering twelfth layer (12):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar; the thickness of the plated film is 6-8 nm;
m, magnetron sputtering a thirteenth layer (13):
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1: 1.14; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the plated film is 47-49 nm;
2) the total thickness of the coating layer is controlled between 188 nm and 195 nm.
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