CN107986639A - A kind of purple double-silver low-emissivity coated glass and preparation method - Google Patents

A kind of purple double-silver low-emissivity coated glass and preparation method Download PDF

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Publication number
CN107986639A
CN107986639A CN201711212790.XA CN201711212790A CN107986639A CN 107986639 A CN107986639 A CN 107986639A CN 201711212790 A CN201711212790 A CN 201711212790A CN 107986639 A CN107986639 A CN 107986639A
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layer
target
magnetron sputtering
argon
3mbar
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熊建
宋宇
黄家鸿
江维
但小龙
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Xianning CSG Energy Saving Glass Co Ltd
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Xianning CSG Energy Saving Glass Co Ltd
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Priority to CN201711212790.XA priority Critical patent/CN107986639A/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3639—Multilayers containing at least two functional metal layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

The present invention provides a kind of purple double-silver low-emissivity coated glass and preparation method, belong to magnetron sputtering technology field.The technology, by film layer optimization design, reaches appearance color for this beautiful color of purple, while properties reach double silver products standards on the basis of double silverskin Rotating fields.A kind of purple double-silver low-emissivity coated glass, including glass substrate layer and film plating layer, film plating layer includes nine film layers outwards conformed to successively from glass substrate layer, and wherein first layer is SiNx layer, the second layer is ZnO layer, third layer is Ag layers, and the 4th layer is NiCr layers, and layer 5 is SiNx layer, layer 6 is ZnO layer, layer 7 is Ag layers, and the 8th layer is NiCr layers, and the 9th layer is SiNx layer.Each film plating layer is plated on glass substrate layer successively by way of magnetron sputtering.Product of the present invention has the advantages that color is pure, Low emissivity.

Description

A kind of purple double-silver low-emissivity coated glass and preparation method
Technical field
The invention belongs to magnetron sputtering technology field, and in particular to a kind of purple double-silver low-emissivity coated glass and system Preparation Method.
Background technology
Low-E glass has to visible ray high transmission and centering as a kind of novel building and ornament materials, its film plating layer The characteristic of far infrared high reflection, makes it compared with simple glass and traditional coated glass for building, has following obvious excellent Gesture：1) excellent hot property, the heat loss of outer door glass is the major part of building energy consumption, accounts for the 50% of building energy consumption More than.Low radiation coated glass is according to different film layer structures compared to the white glass door and window of ordinary construction, it is possible to reduce the position energy The 60%-90% of loss；2) good optical property.Low-E glass has visible ray in sunlight high transmittance, reachable More than 80%.And reflectivity is then very low, this makes it, and optical property is greatly taken on a new look compared with traditional coated glass.From outdoor sight See, appearance is more transparent, clear.It ensure that the good daylighting of building, turn avoid conventional large-area glass curtain wall, hollow glass Light pollution phenomenon caused by glass door and window light reflection, builds more soft, comfortable luminous environment.
As market is gradually ripe, homogeneous competition becomes clear day by day, and client is in diversified demand to the appearance color of curtain wall, How to develop cater to the market demand product it is very crucial, purple is formed by warm red and calm blue coloured compound, Lucky and wealth is represent, is influenced by the preference of Film Design early stage, face is with green, blueness, muted color outside Low emissivity membrane system room In the majority, there is presently no a pure violet Low emissivity product..
The shortcomings that prior art：
1) blue series and green system are mainly inclined in face outside existing low radiation coated glass room, without pure violet product.
2) the general purple in face outside part muted color Low emissivity membrane system room, purple is variegated that it is impure to instead result in glass surface color at this time Only, overall color expression is influenced.
The content of the invention
In view of the above problems existing in the prior art, the purpose of the present invention is to provide a kind of double silver low-emissivity coateds of purple Glass and preparation method, the technical problems to be solved by the invention be how by the design of film plating layer, design it is a purely Violet Low emissivity coated glass.
The purpose of the present invention can be realized by following technical proposal：A kind of purple double-silver low-emissivity coated glass, including Glass substrate layer and film plating layer, the film plating layer include nine film layers outwards conformed to successively from the glass substrate layer, wherein First layer is SiNx layer, and the second layer is ZnO layer, and third layer is Ag layer, and the 4th layer is NiCr layers, and layer 5 is SiNx layer, the 6th Layer is ZnO layer, and layer 7 is Ag layers, and the 8th layer is NiCr layers, and the 9th layer is SiNx layer.
Wherein, first layer, the second layer are the first dielectric combination layer, and third layer is low radiation functions layer, and the 4th layer is the One block protective layer, layer 5, layer 6 are the second dielectric combination layer, and layer 7 is low radiation functions layer, and the 8th layer is the Two block protective layers, the 9th layer is the 3rd dielectric layer.
A kind of preparation method of purple double-silver low-emissivity coated glass, it is characterised in that this method includes the following steps：
1), magnetron sputtering film layer；
A, magnetron sputtering first layer：
Target quantity：Exchange rotary target 3~4；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
B, the magnetron sputtering second layer：
Target quantity：Exchange rotary target 1；Target is configured to zinc-aluminium (ZnAl)；Process gas ratio：Argon gas and oxygen, The ratio of argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 5~8nm；
C, magnetron sputtering third layer：
Target quantity：Direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas：Pure argon, sputtering pressure for 2~ 3×10-3mbar；Coating film thickness is 8~12nm；
D, the 4th layer of magnetron sputtering：
Target quantity：Exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas：Pure argon, sputtering pressure For 2~3 × 10-3mbar；Coating film thickness is 0.5~1.5nm；
E, magnetron sputtering layer 5：
Target quantity：Exchange rotary target 4~6；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 40~43nm；
F, magnetron sputtering layer 6：
Target quantity：Exchange rotary target 2~3；Target configuration zinc-aluminium (ZnAl)；Process gas ratio：Argon gas and oxygen, The ratio of argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 17~20nm；
G, magnetron sputtering layer 7：
Target quantity：Direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas：Pure argon, sputtering pressure for 2~ 3×10-3mbar；Coating film thickness is 7~10nm；
H, the 8th layer of magnetron sputtering：
Target quantity：Direct current planar target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio：Pure argon, sputtering Air pressure is 2~3 × 10-3mbar；；Coating film thickness is 0.1~0.5nm；
I, the 9th layer of magnetron sputtering：
Target quantity：Exchange rotary target 4~6；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 36~48nm；
2), the control of film plating layer gross thickness is between 140~145nm, and sputtering chamber transmission walking speed control is in 4.5-5.0m/min.
The wherein every specific color value (the CIE1976L*a*b* colour spaces) of the double silverskin systems of purple.
Advantage of the present invention：
1st, the art of this patent product glass surface Side Color is purple, and specific measurement result is as follows：Glass surface color a* ∈ [0.5,1.5], b* ∈ [- 20, -18]；Glass surface low-angle color is as follows：A* ∈ [- 2, -1], b* ∈ [- 13, -11].
2nd, film surface color is blue-green, a*f ∈ [- 8, -6], b*f ∈ [- 24, -22]；6mm single transmittances ＞ 50%, thoroughly Cross color a* ∈ [- 8, -7], b* ∈ [- 14, -12].
Brief description of the drawings
Fig. 1 is this purple double-silver low-emissivity coated glass layer structure schematic diagram.
In figure, G, glass substrate layer；1st, first layer；2nd, the second layer；3rd, third layer；4th, the 4th layer；5th, layer 5；6th, the 6th Layer；7th, layer 7；8th, the 8th layer；9th, the 9th layer.
Embodiment
It is the specific embodiment of the present invention and with reference to attached drawing below, technical scheme is further described, But the present invention is not limited to these embodiments.
As shown in Figure 1, this purple double-silver low-emissivity coated glass, including glass substrate layer G and film plating layer, film plating layer is from institute State glass substrate layer G and be outwards compounded with nine film layers successively, wherein first layer 1 is SiNx layer, and the second layer 2 is ZnO layer, third layer 3 be Ag layers, and the 4th layer 4 is NiCr layers, and layer 55 is SiNx layer, and layer 66 is ZnO layer, and layer 77 is Ag layers, the 8th layer 8 For NiCr layers, the 9th layer 9 is SiNx layer.Wherein first layer 1, the second layer 2 are the first dielectric combination layer, and third layer 3 is low spoke Functional layer is penetrated, the 4th layer 4 is the first block protective layer, and layer 55, layer 66 are the second dielectric combination layer, and layer 77 is Low radiation functions layer, the 8th layer 8 is the second block protective layer, and the 9th layer 9 is the 3rd dielectric layer.
A kind of preparation method of purple double-silver low-emissivity coated glass, its preparation method include the following steps：
1), magnetron sputtering film layer；
A, magnetron sputtering first layer 1：
Target quantity：Exchange rotary target 3~4；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
B, the magnetron sputtering second layer 2：
Target quantity：Exchange rotary target 1；Target is configured to zinc-aluminium (ZnAl)；Process gas ratio：Argon gas and oxygen, The ratio of argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 5~8nm；
C, magnetron sputtering third layer 3：
Target quantity：Direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas：Pure argon, sputtering pressure for 2~ 3×10-3mbar；Coating film thickness is 8~12nm；
D, the 4th layer 4 of magnetron sputtering：
Target quantity：Exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas：Pure argon, sputtering pressure For 2~3 × 10-3mbar；Coating film thickness is 0.5~1.5nm；
E, magnetron sputtering layer 55：
Target quantity：Exchange rotary target 4~6；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 40~43nm；
F, magnetron sputtering layer 66：
Target quantity：Exchange rotary target 2~3；Target configuration zinc-aluminium (ZnAl)；Process gas ratio：Argon gas and oxygen, The ratio of argon gas and oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 17~20nm；
G, magnetron sputtering layer 77：
Target quantity：Direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas：Pure argon, sputtering pressure for 2~ 3×10-3mbar；Coating film thickness is 7~10nm；
H, the 8th layer 8 of magnetron sputtering：
Target quantity：Direct current planar target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio：Pure argon, sputtering Air pressure is 2~3 × 10-3mbar；；Coating film thickness is 0.1~0.5nm；
I, the 9th layer 9 of magnetron sputtering：
Target quantity：Exchange rotary target 4~6；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen The ratio of gas, argon gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 36~48nm；
2), the control of film plating layer gross thickness is between 140~145nm, and sputtering chamber transmission walking speed control is in 4.5-5.0m/min.
The wherein every specific color value (the CIE1976L*a*b* colour spaces) of the double silverskin systems of purple.It is described herein Specific embodiment is only to spirit explanation for example of the invention.Those skilled in the art can be to being retouched The specific embodiment stated does various modifications or additions or substitutes in a similar way, but without departing from the present invention's Spirit or beyond the scope of the appended claims.

Claims (2)

1. a kind of purple double-silver low-emissivity coated glass, including glass substrate layer G and film plating layer, the film plating layer is included described in Nine film layers that glass substrate layer outwards conforms to successively, wherein first layer (1) are SiNx layer, and the second layer (2) is ZnO layer, the 3rd Layer (3) is Ag layers, and the 4th layer (4) are NiCr layers, and layer 5 (5) is SiNx layer, and layer 6 (6) is ZnO layer, and layer 7 (7) is Ag layers, the 8th layer (8) are NiCr layers, and the 9th layer (9) are SiNx layer；Wherein, first layer (1), the second layer (2) are the first dielectric Combination layer, third layer (3) are low radiation functions layer, and the 4th layer (4) are the first block protective layer, layer 5 (5), layer 6 (6) For the second dielectric combination layer, layer 7 (7) is low radiation functions layer, and the 8th layer (8) are the second block protective layer, the 9th layer (9) it is the 3rd dielectric layer.
2. a kind of preparation method of purple double-silver low-emissivity coated glass, it is characterised in that this method includes the following steps：
1), magnetron sputtering film layer；
A, magnetron sputtering first layer (1)：
Target quantity：Exchange rotary target 3~4；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen, argon The ratio of gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
B, the magnetron sputtering second layer (2)：
Target quantity：Exchange rotary target 1；Target is configured to zinc-aluminium (ZnAl)；Process gas ratio：Argon gas and oxygen, argon gas Ratio with oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 5~8nm；
C, magnetron sputtering third layer (3)：
Target quantity：Direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas：Pure argon, sputtering pressure for 2~3 × 10-3mbar；Coating film thickness is 8~12nm；
D, the 4th layer of magnetron sputtering (4)：
Target quantity：Exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas：Pure argon, sputtering pressure for 2~ 3×10-3mbar；Coating film thickness is 0.5~1.5nm；
E, magnetron sputtering layer 5 (5)：
Target quantity：Exchange rotary target 4~6；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen, argon The ratio of gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 40~43nm；
F, magnetron sputtering layer 6 (6)：
Target quantity：Exchange rotary target 2~3；Target configuration zinc-aluminium (ZnAl)；Process gas ratio：Argon gas and oxygen, argon gas Ratio with oxygen is 1:2, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 17~20nm；
G, magnetron sputtering layer 7 (7)：
Target quantity：Direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas：Pure argon, sputtering pressure for 2~3 × 10-3mbar；Coating film thickness is 7~10nm；
H, the 8th layer of magnetron sputtering (8)：
Target quantity：Direct current planar target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio：Pure argon, sputtering pressure For 2~3 × 10-3mbar；；Coating film thickness is 0.1~0.5nm；
I, the 9th layer of magnetron sputtering (9)：
Target quantity：Exchange rotary target 4~6；Target is configured to sial (SiAl)；Process gas ratio：Argon gas and nitrogen, argon The ratio of gas and nitrogen is 1:1.14, sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 36~48nm；
2), the control of film plating layer gross thickness is between 140~145nm, and sputtering chamber transmission walking speed control is in 4.5-5.0m/min.
CN201711212790.XA 2017-11-28 2017-11-28 A kind of purple double-silver low-emissivity coated glass and preparation method Pending CN107986639A (en)

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Cited By (5)

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Publication number Priority date Publication date Assignee Title
CN109987857A (en) * 2019-04-29 2019-07-09 布勒莱宝光学设备（北京）有限公司 Novel Low emissivity energy conservation membrane system and its preparation method and application
CN110282882A (en) * 2019-07-02 2019-09-27 咸宁南玻节能玻璃有限公司 A kind of Low emissivity sunlight controlling coated glass and preparation method thereof
CN110436794A (en) * 2019-08-16 2019-11-12 镇江爱豪科思电子科技有限公司 A kind of energy-saving solar control film glass and preparation method thereof
CN111072290A (en) * 2019-11-29 2020-04-28 宁波瑞凌新能源科技有限公司 Low-emissivity colorful film and preparation method thereof
CN111393038A (en) * 2020-05-08 2020-07-10 深圳南玻科技有限公司 Medium-transmittance low-reflection gray double-silver low-emissivity coated glass and preparation method thereof

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CN109987857A (en) * 2019-04-29 2019-07-09 布勒莱宝光学设备（北京）有限公司 Novel Low emissivity energy conservation membrane system and its preparation method and application
CN110282882A (en) * 2019-07-02 2019-09-27 咸宁南玻节能玻璃有限公司 A kind of Low emissivity sunlight controlling coated glass and preparation method thereof
CN110436794A (en) * 2019-08-16 2019-11-12 镇江爱豪科思电子科技有限公司 A kind of energy-saving solar control film glass and preparation method thereof
CN111072290A (en) * 2019-11-29 2020-04-28 宁波瑞凌新能源科技有限公司 Low-emissivity colorful film and preparation method thereof
CN111393038A (en) * 2020-05-08 2020-07-10 深圳南玻科技有限公司 Medium-transmittance low-reflection gray double-silver low-emissivity coated glass and preparation method thereof

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Application publication date: 20180504