CN107382093B - Orange double-silver low-emissivity coated glass and preparation method thereof - Google Patents

Orange double-silver low-emissivity coated glass and preparation method thereof Download PDF

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CN107382093B
CN107382093B CN201710787562.9A CN201710787562A CN107382093B CN 107382093 B CN107382093 B CN 107382093B CN 201710787562 A CN201710787562 A CN 201710787562A CN 107382093 B CN107382093 B CN 107382093B
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CN107382093A (en
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熊建
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Xianning CSG Energy Saving Glass Co Ltd
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Xianning CSG Energy Saving Glass Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3697—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one metallic layer at least being obtained by electroless plating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Abstract

The invention provides orange double-silver low-emissivity coated glass and a preparation method thereof, and belongs to the technical field of magnetron sputtering coating. The coated glass solves the technical problems of large reflectivity, low definition and the like of the existing coated glass. The orange double-silver low-radiation coated glass comprises a glass substrate layer and a coating layer, wherein the coating layer is sequentially compounded with eleven film layers from the glass substrate layer to the outside, the first layer is a SiNx layer, the second layer is ZnO, the third layer is an Ag layer, the fourth layer is a Cu layer, the fifth layer is a NiCr layer, the sixth layer is an AZO layer, the seventh layer is a SiNx layer, the eighth layer is a ZnSnO/ZnO or a mixed layer of the ZnSnO/ZnO and the ZnO, the ninth layer is an Ag layer, the tenth layer is a NiCr layer, and the eleventh layer is a SiNx layer; sputtering the coating layers layer by layer through magnetron sputtering. The invention has the advantages of small reflectivity, high definition and the like.

Description

Orange double-silver low-emissivity coated glass and preparation method thereof
Technical Field
The invention belongs to the technical field of magnetron sputtering coating, and relates to orange double-silver low-emissivity coated glass and a preparation method thereof.
Background
The coated glass (reflective glass) is also called as reflective glass, wherein L ow-E energy-saving coated glass can effectively block ultraviolet rays and infrared rays, has higher transmittance for visible light, has low radiance and can effectively reduce heat transfer, and is an energy-saving building material with the widest application range at present.
As the market is gradually mature, the demands of customers on the appearance color of the curtain wall are gradually diversified, and meanwhile, the demands of customers on the integration of the color and the performance of the curtain wall are higher, but for most L ow-e double silver in the market, the color system is mainly focused on three aspects, namely a blue color system, a green color system and a gray color system, the color in other aspects is less, and the color controllability in the production process is poor.
The prior art has the following disadvantages:
1) at present, although double-silver neutral color products exist, the total color is still not clear enough, and the problem of yellowing/greening of the transmitted color exists.
2) At present, the double-silver products mostly have the phenomenon of small-angle color change, the color controllability of batches is poor, and macroscopic color difference exists in close observation.
3) The medium-low transparent film has the problems of high reflectivity, poor visual effect, insufficient overall sense turbidity and purity and the like.
Disclosure of Invention
The invention aims to provide orange double-silver low-emissivity coated glass aiming at the problems in the prior art, and the technical problem to be solved by the invention is how to reduce the reflectivity and improve the definition through the design of a coating layer.
The purpose of the invention can be realized by the following technical scheme: the orange double-silver low-radiation coated glass is characterized by comprising a glass substrate layer and coating layers, wherein the coating layers are sequentially compounded with eleven layers from the glass substrate layer to the outside, the first layer is a SiNx layer, the second layer is ZnO, the third layer is an Ag layer, the fourth layer is a Cu layer, the fifth layer is a NiCr layer, the sixth layer is an AZO layer, the seventh layer is a SiNx layer, the eighth layer is a ZnSnO/ZnO or a mixed layer of the ZnSnO/ZnO and the ZnO, the ninth layer is an Ag layer, the tenth layer is a NiCr layer, and the eleventh layer is a SiNx layer;
the first layer and the second layer are a first dielectric medium combined layer, the third layer is a low-radiation functional layer, the fourth layer is a transmission color improving layer, the fifth layer is a first blocking protective layer, the sixth layer is a crystal bed dielectric layer, the seventh layer and the eighth layer are second dielectric medium combined layers, the ninth layer is a low-radiation functional layer, the tenth layer is a second blocking protective layer, and the eleventh layer is a third dielectric medium layer.
The preparation method of the orange double-silver low-emissivity coated glass is characterized by comprising the following steps of:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer:
the number of the targets is 2-3 alternating current rotary targets, the targets are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 30-35 nm;
B. magnetron sputtering the second layer:
the number of the targets is 1-2 alternating current rotating targets, the targets are configured to be zinc aluminum (ZnAl), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 1:2, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 8-10 nm;
C. magnetron sputtering the third layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon gas at a sputtering pressure of2～3×10-3mbar; the thickness of the coating film is 1-2 nm;
D. magnetron sputtering the fourth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be copper (Cu), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 10-13 nm;
E. performing magnetron sputtering on a fifth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 0.5-1 nm;
F. magnetron sputtering a sixth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be zinc aluminum oxide (AZO), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 2-5 nm;
G. magnetron sputtering a seventh layer:
the number of the targets is 2-3 alternating current rotary targets, the targets are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 20-25 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is 2-3 alternating current rotating targets, the targets are configured to be zinc tin (ZnSn), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 12-16 nm;
the magnetron sputtering of the eighth layer can also be a process as follows:
the number of the targets is 1, the alternating current rotating targets are arranged, the targets are zinc aluminum (ZnAl), the ratio of process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10-3mbar; the thickness of the plated film is 6-8 nm;
I. magnetron sputtering the ninth layer:
the number of the target materials is 1, the target materials are configured to be silver (Ag), the process gas is pure argon, the sputtering pressure is 2-3 × 10 mbar, and the coating thickness is 0.5-2 nm;
the magnetron sputtering of the ninth layer can also be a process as follows:
the number of the target materials is 1 direct current plane target, the target materials are configured to be silver (Ag), the process gas is pure argon, the sputtering pressure is 2-3 × 10 mbar and 10-3mbar, and the coating thickness is 4-6 nm;
J. magnetron sputtering the tenth layer:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 1-2.5 nm;
K. magnetron sputtering the eleventh layer:
the number of the target materials is 4-5 of alternating current rotating targets, the target materials are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 40-45 nm;
2) the total thickness of the coating layer is controlled to be 150-170 nm.
On the premise of meeting the color requirement, the color sensitivity of the external film layer is increased and the debugging efficiency is improved by controlling the proportion adjustment of the key metal layer, so that the industrial production is facilitated; determining the thickness of each film layer through software design, process debugging and experiments; and determining simulation parameters of the film design software under the condition of corresponding gas proportion through the stable process gas proportion of each target determined by repeated experiments.
The invention has the advantages that:
1. the appearance color is orange red, and the color is beautiful when the outdoor observation is carried out.
2. L ab color space results were obtained for 6mm single sheet transmission colors T ∈ [35, 38], a × ∈ [1.0, 2.0], b × ∈ [2.0, 3.5], film face colors a × ∈ [0,1], b × ∈ [7, 9], glass face colors a × ∈ [13,15], b × ∈ [18, 20],
3. small angle color change, and multi-angle (10-75) color difference △ a < 3.0 on the glass surface.
4. The glass has surface radiance E less than 0.05, excellent low-radiation performance, heat transfer coefficient K less than 1.8, sun-shading coefficient SC ∈ [0.23,0.24] and selection coefficient r greater than 1.35.
Drawings
FIG. 1 is a schematic view of the layered structure of the orange double-silver low-emissivity coated glass.
In the figure, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. the eleventh layer.
Detailed Description
The following are specific embodiments of the present invention and are further described with reference to the drawings, but the present invention is not limited to these embodiments.
As shown in fig. 1, the double-silver low-emissivity coated glass comprises a glass substrate layer a and coating layers, wherein the coating layers are sequentially compounded with eleven layers from the glass substrate layer a to the outside, wherein the first layer 1 is a SiNx layer, the second layer 2 is ZnO, the third layer 3 is an Ag layer, the fourth layer 4 is a Cu layer, the fifth layer 5 is a NiCr layer, the sixth layer 6 is an AZO layer, the seventh layer 7 is a SiNx layer, the eighth layer 8 is a ZnSnO/ZnO or a mixed layer of the ZnSnO/ZnO and the ZnSnO layer, the ninth layer 9 is an Ag layer, the tenth layer 10 is a NiCr layer, and the eleventh layer 11 is a SiNx layer;
the first layer 1 and the second layer 2 are first dielectric combined layers, the third layer 3 is a low-radiation functional layer, the fourth layer 4 is a transmission color improving layer, the fifth layer 5 is a first blocking protective layer, the sixth layer 6 is a crystal bed dielectric layer, the seventh layer 7 and the eighth layer 8 are second dielectric combined layers, the ninth layer 9 is a low-radiation functional layer, the tenth layer 10 is a second blocking protective layer, and the eleventh layer 11 is a third dielectric layer.
A preparation method of orange double-silver low-emissivity coated glass comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer 1:
the number of the targets is 2-3, the targets are configured by silicon-aluminum SiAl, the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 30-35 nm;
B. magnetron sputtering of the second layer 2:
the number of the targets is 1-2 alternating current rotating targets, the targets are configured to be zinc-aluminum-ZnAl), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 1:2, and the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 8-10 nm;
C. magnetron sputtering of the third layer 3:
the number of the target materials is 1 direct current plane target, the target material is configured to be silver Ag, the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 1-2 nm;
D. magnetron sputtering of the fourth layer 4:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be copper Cu, the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 10-13 nm;
E. magnetron sputtering of the fifth layer 5:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium NiCr, the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 0.5-1 nm;
F. magnetron sputtering the sixth layer 6:
the number of the target materials is 1, the target materials are zinc aluminum oxide AZO, the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 2-5 nm;
G. magnetron sputtering of the seventh layer 7:
the number of the targets is 2-3, the targets are configured by silicon-aluminum SiAl, the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 20-25 nm;
H. magnetron sputtering the eighth layer 8:
the number of the targets is 2-3 alternating current rotating targets, the targets are configured to be zinc tin ZnSn, the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 12-16 nm;
the magnetron sputtering of the eighth layer 8 may also be a process as follows:
the number of the targets is as follows: AC rotary1 target is rotated, the target material is configured to be zinc-aluminum-ZnAl), the process gas proportion is argon and oxygen, the proportion of argon and oxygen is 1:2, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the plated film is 6-8 nm;
I. magnetron sputtering the ninth layer 9:
the number of the target materials is 1, the target materials are configured to be silver Ag, the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar, and the coating thickness is 0.5-2 nm;
the magnetron sputtering of the ninth layer 9 may also be a process as follows:
the number of the target materials is 1 direct current plane target, the target material is configured to be silver Ag), the process gas is pure argon, the sputtering pressure is 2-3 × 10 mbar, and the coating thickness is 4-6 nm;
J. magnetron sputtering the tenth layer 10:
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium NiCr, the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 1-2.5 nm;
K. magnetron sputtering the eleventh layer 11:
the number of the target materials is 4-5 of alternating current rotating targets, the target materials are configured to be silicon-aluminum SiAl, the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 40-45 nm;
2) the total thickness of the coating layer is controlled to be 150-170 nm.
The invention has the advantages that:
1. the appearance color is orange red, and the color is beautiful when the outdoor observation is carried out.
2. L ab color space results were obtained for 6mm single sheet transmission colors T ∈ [35, 38], a × ∈ [1.0, 2.0], b × ∈ [2.0, 3.5], film face colors a × ∈ [0,1], b × ∈ [7, 9], glass face colors a × ∈ [13,15], b × ∈ [18, 20],
3. small angle color change, and multi-angle (10-75) color difference △ a < 3.0 on the glass surface.
4. The glass has surface radiance E less than 0.05, excellent low-radiation performance, heat transfer coefficient K less than 1.8, sun-shading coefficient SC ∈ [0.23,0.24] and selection coefficient r greater than 1.35.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.

Claims (1)

1. The preparation method of the orange double-silver low-radiation coated glass is characterized by comprising a glass substrate layer (a) and coating layers, wherein the coating layers are sequentially compounded with eleven film layers from the glass substrate layer (a) to the outside, wherein the first layer (1) is a SiNx layer, the second layer (2) is ZnO, the third layer (3) is an Ag layer, the fourth layer (4) is a Cu layer, the fifth layer (5) is a NiCr layer, the sixth layer (6) is an AZO layer, the seventh layer (7) is a SiNx layer, the eighth layer (8) is a ZnSnO/ZnO layer or a mixed layer of the ZnSnO/ZnO layer, the ninth layer (9) is an Ag layer, the tenth layer (10) is a NiCr layer, and the eleventh layer (11) is a SiNx layer;
the first layer (1) and the second layer (2) are a first dielectric medium combined layer, the third layer (3) is a low-radiation functional layer, the fourth layer (4) is a transmission color improving layer, the fifth layer (5) is a first blocking protective layer, the sixth layer (6) is a crystal bed dielectric layer, the seventh layer (7) and the eighth layer (8) are second dielectric medium combined layers, the ninth layer (9) is a low-radiation functional layer, the tenth layer (10) is a second blocking protective layer, and the eleventh layer (11) is a third dielectric medium layer;
the preparation method comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer (1):
the number of the targets is 2-3 alternating current rotary targets, the targets are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 30-35 nm;
B. magnetron sputtering of the second layer (2):
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon to oxygen, ratio of argon to oxygenFor example, 1:2, sputtering pressure is 3 to 5 × 10-3mbar; the thickness of the coating film is 8-10 nm;
C. magnetron sputtering third layer (3):
the number of the target materials is 1 direct current plane target, the target materials are configured to be silver (Ag), the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 1-2 nm;
D. magnetron sputtering fourth layer (4):
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be copper (Cu), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 10-13 nm;
E. magnetron sputtering fifth layer (5):
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 0.5-1 nm;
F. magnetron sputtering sixth layer (6):
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be zinc aluminum oxide (AZO), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 2-5 nm;
G. magnetron sputtering seventh layer (7):
the number of the targets is 2-3 alternating current rotary targets, the targets are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 20-25 nm;
H. magnetron sputtering eighth layer (8):
the number of the targets is 2-3 alternating current rotating targets, the targets are configured to be zinc tin (ZnSn), the ratio of the process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10, and the sputtering pressure is 3-5-3mbar; the thickness of the plated film is 12-16 nm;
the magnetron sputtering of the eighth layer (8) can also be a process as follows:
the number of the targets is 1, the alternating current rotating targets are arranged, the targets are zinc aluminum (ZnAl), the ratio of process gas to argon to oxygen is 1:2, the ratio of argon to oxygen is 3-5 × 10-3mbar; the thickness of the plated film is 6-8 nm;
I. magnetron sputtering ninth layer (9):
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be silver (Ag), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 0.5-2 nm;
the magnetron sputtering of the ninth layer (9) can also be a process as follows:
the number of the target materials is 1 direct current plane target, the target materials are configured to be silver (Ag), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the plated film is 4-6 nm;
J. magnetron sputtering tenth layer (10):
the number of the target materials is 1 alternating current rotating target, the target materials are configured to be nickel chromium (NiCr), the process gas is pure argon, and the sputtering pressure is 2-3 × 10-3mbar; the thickness of the coating film is 1-2.5 nm;
K. magnetron sputtering the eleventh layer (11):
the number of the target materials is 4-5 of alternating current rotating targets, the target materials are configured to be silicon aluminum (SiAl), the ratio of the process gas to argon to oxygen is 1:1.14, the sputtering pressure is 3-5 × 10-3mbar; the thickness of the coating film is 40-45 nm;
2) the total thickness of the coating layer is controlled to be 150-170 nm.
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CN207143121U (en) * 2017-09-04 2018-03-27 咸宁南玻节能玻璃有限公司 A kind of Chinese red double-silver low-emissivity coated glass

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