CN201825870U - Single-silver-layer low-radiation glass - Google Patents

Single-silver-layer low-radiation glass Download PDF

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Publication number
CN201825870U
CN201825870U CN2010205031198U CN201020503119U CN201825870U CN 201825870 U CN201825870 U CN 201825870U CN 2010205031198 U CN2010205031198 U CN 2010205031198U CN 201020503119 U CN201020503119 U CN 201020503119U CN 201825870 U CN201825870 U CN 201825870U
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layer
dielectric combination
glass
upper strata
combination layer
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Expired - Lifetime
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CN2010205031198U
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Chinese (zh)
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陈可明
曾小绵
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CSG Holding Co Ltd
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CSG Holding Co Ltd
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Abstract

The utility model discloses single-silver-layer low-radiation glass, the membrane layer structure sequentially comprises glass, a base layer, a dielectric combination layer, a first blocking layer, an AgCu layer, a second blocking layer and an upper-layer dielectric combination layer. The single-silver-layer low-radiation glass adopts the unique membrane structure to improve the traditional low-radiation glass, so that the product has the advantages of low reflectivity, low transmissivity, low radiation, good selective coefficient, and the like. The indoor and outdoor colors of a glass chamber are closed to the neutral low-reflection color, and the single-silver-layer low-radiation glass has stable optical property, various colors and good weather resistance, and is convenient to be widely popularized.

Description

Single silver low radiation glass
[technical field]
The utility model relates to the special glass field, relates in particular to a kind of single silver low radiation glass.
[background technology]
Low emissivity glass is a kind of at glass surface deposition one deck infrared reflection material, visible light in the sunlight can be seen through, again as the infrared reflection mirror, the special glass that the infrared rays in the sunlight is foreclosed and simultaneously object secondary rays heat reflection gone back.By using low emissivity glass, can reach the effect of controlling sunlight, save energy, heat regulating and controlling and improving environment.
In traditional single silver low radiation glass processing process, in order to realize U value and selection coefficient Lsg preferably, just must increase the radiant ratio that silver thickness in the rete reduces the glass rete, select coefficient to obtain ideal, just mean that visible reflectance raises, appearance color presents interference color but increase silver thickness, influence the use of glass.
[utility model content]
Based on this, be necessary to provide single silver low radiation glass that a kind of visible reflectance is low, outward appearance does not present interference color.
A kind of single silver low radiation glass, film layer structure is followed successively by: glass, basic unit, dielectric combination layer, first blocking layer, AgCu layer, second blocking layer, upper strata dielectric combination layer.
Preferably, described dielectric combination layer thickness is 40～50nm.
Preferably, described upper strata dielectric combination layer thickness is 40～50nm.
Preferably, described groundwork thickness is 2～3nm.
Preferably, described first barrier layer thickness is 0.5～1.5nm.
Preferably, described second barrier layer thickness is 0.5～1.5nm.
Preferably, described AgCu layer thickness is 15～19nm.
Preferably, described upper strata dielectric combination layer comprises the first upper strata dielectric combination layer that is deposited on described second blocking layer and is deposited on the second upper strata dielectric combination layer on the described first upper strata dielectric combination layer.
Preferably, the thickness of the described first upper strata dielectric combination layer is 10～15nm.
Preferably, the thickness of the described second upper strata dielectric combination layer is 30～35nm.
This single silver low radiation glass substitutes Ag to obtain neutral transmitted colour with AgCu; Dielectric combination layer is an antireflection film layer, by adding dielectric combination layer, has reduced visible reflectance, and outward appearance does not present interference color, has better market prospect.
[description of drawings]
Fig. 1 is the structural representation of single silver low radiation glass of an embodiment;
Fig. 2 is the manufacturing flow chart of single silver low radiation glass of an embodiment.
[embodiment]
A kind of single silver low radiation glass as shown in Figure 1 comprises the following structure that is arranged in order: glass, basic unit, dielectric combination layer, first blocking layer, AgCu layer, second blocking layer, upper strata dielectric combination layer.
Dielectric combination layer, upper strata dielectric combination layer are by TiO 2, ZnSnO x, SnO 2, ZnO, SiO 2, Ta 2O 5, BiO 2, Al 2O 3, ZnAl 2O 4, Nb 2O 5And Si 3N 4In one or more formations; Dielectric combination layer thickness is 40～50nm; Upper strata dielectric combination layer thickness is 40～50nm.
Preferably, dielectric combination layer can be two kinds of different compounds formation of deposits successively.
Basic unit is made of among Ni, Cr, Ti and the NiCr one or more; First blocking layer, the second blocking layer NiCrO xAnd NiCrN xIn one or both formations; Groundwork thickness is 2～3nm; First barrier layer thickness is 0.5～1.5nm; Second barrier layer thickness is 0.5～1.5nm; The AgCu layer by quality ratio of components Ag be 45～55%, Cu is that 55～45% yellow gold constitutes.
Preferably, AgCu layer thickness relation satisfies the color value scope in product appearance color such as the following table:
The monolithic appearance color The glass surface reflected colour Rete face reflected colour Transmitted colour
Y? Less than 10 Less than 6 Less than 53
L*? Less than 37 Less than 27 Less than 79
a*? 0～-1? 18～23? -1～-3?
b*? -1～-3? -10～-16? 1.0～3.5?
Preferred, the AgCu layer thickness is 15～19nm.
Preferably, the upper strata dielectric combination layer comprises first upper strata dielectric combination layer that is deposited on second blocking layer and the second upper strata dielectric combination layer that is deposited on the first upper strata dielectric combination layer; The first upper strata dielectric combination layer is by TiO 2, ZnSnO x, SnO 2, ZnO, SiO 2, Ta 2O 5, BiO 2, Al 2O 3, ZnAl 2O 4, Nb 2O 5And Si 3N 4In one or more formations; The second upper strata dielectric combination layer is by TiO 2, SnO 2, ZnO, SiO 2, Ta 2O 5, BiO 2, Al 2O 3, ZnAl 2O 4, Nb 2O 5And Si 3N 4In one or more formations; The thickness of the first upper strata dielectric combination layer is 10～15nm; The thickness of the second upper strata dielectric combination layer is 30～35nm.
Preferred, first, second upper strata dielectric combination layer is formed with the stack of differing materials alternating sputtering usually.
Particularly preferred, the second upper strata dielectric combination layer outermost material comprises TiO at least 2, SiO 2And Si 3N 4In a kind of.
The manufacture method of above-mentioned single silver low radiation glass as shown in Figure 2 comprises the step that deposits each rete successively, and is specific as follows:
Clean glass, drying is placed on magnetron sputtering area;
Direct supply adds pulse sputtering sedimentation basic unit;
Intermediate frequency power supply utmost point sputtering sedimentation first dielectric combination layer of turning out cloudy of putting english;
Intermediate frequency power supply utmost point sputtering sedimentation second dielectric combination layer of turning out cloudy of putting english;
Direct supply adds pulse sputtering sedimentation first blocking layer;
Direct supply adds pulse sputtering sedimentation AgCu layer;
Direct supply adds pulse sputtering sedimentation second blocking layer;
The intermediate frequency power supply utmost point sputtering sedimentation upper strata dielectric combination layer of turning out cloudy of putting english;
Inspection after construction.
Preferably, during deposition plating, the plated film line disposes the vacuum tightness of maintenance system background vacuum 3 * 10 -6The no oil molecule pump that mbar is above; The contiguous compartment position of silver target disposes the cryopump that is used to absorb moisture; The put english utmost point sputter of turning out cloudy of intermediate frequency power supply is to carry out in power is the argon nitrogen atmosphere of 80～90kW or power is to carry out in the argon oxygen atmosphere of 50～60kW, and frequency is 40kHz; It is to carry out in argon atmosphere that direct supply adds the pulse sputter, and power is 2～3kW.
Wherein, intermediate frequency power supply is put english to turn out cloudy and is carried out in argon oxygen atmosphere when utmost point sputtering sedimentation forms oxide skin, and carries out in argon nitrogen atmosphere during the formation of deposits nitride; Direct supply adds when the pulse sputtering sedimentation forms metal level or alloy layer and carries out in argon atmosphere, and carries out in argon oxygen atmosphere during the formation of deposits oxide skin.
The vacuum magnetic-control sputtering plated film is adopted in the manufacturing of single silver low radiation glass, and each rete can be by the one matter formation of deposits, also can be by several different substancess formation of deposits successively.
Below in conjunction with specific embodiment single silver low radiation glass and manufacture method thereof are further described.
Embodiment 1
The film layer structure of this list silver low radiation glass is followed successively by: glass, NiCr, Si 3N 4, ZnSnO x, NiCrO x, AgCu, NiCrO x, ZnSnO x, Si 3N 4
In the present embodiment, basic unit is the NiCr layer, and thickness is 2nm.
In the present embodiment, dielectric combination layer is by two kinds of compounds formation of deposits first dielectric combination layer and second dielectric combination layer successively; First dielectric combination layer is Si 3N 4Layer, thickness is 30nm; Second dielectric combination layer is ZnSnO xLayer, thickness is 10nm.
In the present embodiment, first blocking layer is NiCrO xLayer, thickness is 2nm.
In the present embodiment, AgCu thickness is 15nm, the AgCu layer by quality ratio of components Ag be 50%, Cu is that 50% yellow gold constitutes; In other embodiment, the quality of Ag is 45～55% than scope.
In the present embodiment, second blocking layer is NiCrO xLayer, thickness is 2nm.
In the present embodiment, the upper strata dielectric combination layer is by the first upper strata dielectric combination layer of two kinds of compounds formation of deposits successively and the second upper strata dielectric combination layer; Wherein, the first upper strata dielectric combination layer is ZnSnO XLayer, thickness is 10nm, the second upper strata dielectric combination layer is Si 3N 4Layer, thickness is 35nm.
The concrete manufacturing process of above-mentioned each rete is:
Si 3N 4Layer deposition adopts the intermediate frequency power supply utmost point sputtering sedimentation in argon nitrogen atmosphere of turning out cloudy of putting english, and the vacuum magnetic-control sputtering plant capacity is 80～90kW, and the intermediate frequency power supply frequency is 40kHz.
ZnSnO xLayer deposition adopts intermediate frequency power supply to put english to turn out cloudy the utmost point to carry out in argon oxygen atmosphere, and the vacuum magnetic-control sputtering plant capacity is 50～60kW, and the intermediate frequency power supply frequency is 40kHz.
NiCrO xLayer deposition adopts DC pulse to carry out in argon atmosphere, and the vacuum magnetic-control sputtering plant capacity is 2kW.
AgCu layer deposition adopts DC pulse to carry out in argon atmosphere, and the vacuum magnetic-control sputtering plant capacity is 2kW.
NiCr layer deposition adopts DC pulse to carry out in argon atmosphere, and the vacuum magnetic-control sputtering plant capacity is 3kW.
This list silver low radiation glass optical property and thermal characteristics are as follows:
Radiant ratio≤0.05, (structure is hollow product: heat transfer coefficient＜1.5W/m 6mm coated glass+12mm gas cloud+6mm common white glass) 2K, transmitance≤50%, reflectivity≤15% is selected coefficient 〉=1.3.
Its each silver-bearing copper layer thickness relation satisfies the color value scope in product appearance color such as the following table:
The monolithic appearance color The glass surface reflected colour Rete face reflected colour Transmitted colour
Y? Less than 10 Less than 6 Less than 53
L*? Less than 37 Less than 27 Less than 79
a*? 0～-1? 18～23? -1～-3?
b*? -1～-3? -10～-16? 1.0～3.5?
Embodiment 2
The film layer structure of this list silver low radiation glass is followed successively by: glass, NiCr, Si 3N 4, ZnSnO x, NiCrO x, AgCu, NiCrO x, ZnSnO x, Si 3N 4
In the present embodiment, basic unit is the NiCr layer, and thickness is 2nm.
In the present embodiment, dielectric combination layer is by two kinds of compounds formation of deposits first dielectric combination layer and second dielectric combination layer successively; First dielectric combination layer is Si 3N 4Layer, thickness is 30nm; Second dielectric combination layer is ZnSnO xLayer, thickness is 15nm.
In the present embodiment, first blocking layer is the NiCr layer, and thickness is 2nm.
In the present embodiment, AgCu thickness is 19nm, the AgCu layer by quality ratio of components Ag be 50%, Cu is that 50% yellow gold constitutes; In other embodiment, the quality of Ag is 45～55% than scope.
In the present embodiment, second blocking layer is the NiCr layer, and thickness is 2nm.
In the present embodiment, the upper strata dielectric combination layer is by the first upper strata dielectric combination layer of two kinds of compounds formation of deposits successively and the second upper strata dielectric combination layer; Wherein, the first upper strata dielectric combination layer is ZnSnO XLayer, thickness is 15nm, the second upper strata dielectric combination layer is Si 3N 4Layer, thickness is 35nm.
The concrete manufacturing process of above-mentioned each rete is:
Si 3N 4Layer deposition adopts the intermediate frequency power supply utmost point sputtering sedimentation in argon nitrogen atmosphere of turning out cloudy of putting english, and the vacuum magnetic-control sputtering plant capacity is 80～90kW, and the intermediate frequency power supply frequency is 40kHz.
ZnSnO xLayer deposition adopts intermediate frequency power supply to put english to turn out cloudy the utmost point to carry out in argon oxygen atmosphere, and the vacuum magnetic-control sputtering plant capacity is 50～60kW, and the intermediate frequency power supply frequency is 40kHz.
NiCrO xLayer deposition adopts DC pulse to carry out in argon atmosphere, and the vacuum magnetic-control sputtering plant capacity is 2kW.
AgCu layer deposition adopts DC pulse to carry out in argon atmosphere, and the vacuum magnetic-control sputtering plant capacity is 2kW.
NiCr layer deposition adopts DC pulse to carry out in argon atmosphere, and the vacuum magnetic-control sputtering plant capacity is 3kW.
This list silver low radiation glass optical property and thermal characteristics are as follows:
Radiant ratio≤0.05, (structure is hollow product: heat transfer coefficient＜1.5W/m 6mm coated glass+12mm gas cloud+6mm common white glass) 2K, transmitance≤50%, reflectivity≤15% is selected coefficient 〉=1.3.
Its each silver-bearing copper layer thickness relation satisfies the color value scope in product appearance color such as the following table:
The monolithic appearance color The glass surface reflected colour Rete face reflected colour Transmitted colour
Y? Less than 10 Less than 6 Less than 53
L * Less than 37 Less than 27 Less than 79
a * 0～-1? 18～23? -1～-3?
b * -1～-3? -10～-16? 1.0～3.5?
This single silver low radiation glass substitutes Ag to obtain neutral transmitted colour with AgCu; Dielectric combination layer is an antireflection film layer, by adding dielectric combination layer, has reduced visible reflectance.
Basic unit is the metal or metal alloy thin film layer, by adding basic unit, improves the rete specific absorption, has slowed down the high-reflectivity that causes because of the thickening of AgCu layer; By the rete design, make the medium layer thin-film refractive index on AgCu layer both sides adopt the low collocation in preceding high back, obtain the toning scope of wideer neutral transmitted colour.
The AgCu layer thickness is 15～19nm, satisfies the color value scope in product appearance color such as the following table:
The monolithic appearance color The glass surface reflected colour Rete face reflected colour Transmitted colour
Y? Less than 10 Less than 6 Less than 53
L * Less than 37 Less than 27 Less than 79
a * 0～-1? 18～23? -1～-3?
b * -1～-3? -10～-16? 1.0～3.5?
Make that like this this argentiferous low emissivity glass outward appearance is better, select coefficient higher.
First, second upper strata dielectric combination layer is formed with the stack of differing materials alternating sputtering usually, is convenient to control membrane uniformity, stability and reasonable optical effect.
The second upper strata dielectric combination layer outermost material comprises TiO at least 2, SiO 2And Si 3N 4In a kind of, make the wear-resisting and weather resistance of product finally meet the physicochemical property standard.
Dispose the no oil molecule pump of high pumping rate during plated film on the plated film line, keep the background vacuum in high vacuum 3 * 10 -6More than the mbar, system has good atmosphere isolation effect between several processing atmosphere sputtering zones, isolating coefficient is greater than 30, have film uniformity and rete composition homogeneity of ingredients preferably simultaneously, under the vacuum acquiring system of big pumping speed, strengthen the pressure of process gas, the cathode power that adopts direct current to add pulse carries out sputter, and at the contiguous compartment position of AgCu target configuration cryopump absorption moisture, improve the quality of forming film of AgCu layer, effectively raised the color saturation and the weathering resistance of the visible light transmissivity and the whole radiation rete of product.
Dielectric combination layer is an antireflection film layer, play a part simultaneously to connect glass and functional layer, and adhesiveproperties is good between the glass, and has alleviated the internal stress of whole low-radiation film.The upper strata dielectric combination layer has directly increased described single silver low radiation glass scratch resistance, wear-resisting and erosion-resisting performance.Dielectric combination layer adopts the intermediate frequency power supply with good arc extinction performance of frequency 40kHz to put english to turn out cloudy utmost point sputter to form, and the specific refractory power matched well makes the reflectivity of product and transmitance reach ideal value.
This list silver low radiation glass adopts unique film layer structure, novel process, novel method to improve traditional low radiation coated glass, makes product have antiradar reflectivity, low transmissivity, low-E and good advantages such as selection coefficient.The inside and outside color of this glass chamber is near neutral low reflected colour, and optical property is stable, various, the good weatherability of color, is convenient to extensive popularization.
The above embodiment has only expressed embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model claim.Should be pointed out that for the person of ordinary skill of the art under the prerequisite that does not break away from the utility model design, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.

Claims (10)

1. single silver low radiation glass is characterized in that, this glass film layer structure is followed successively by: glass, basic unit, dielectric combination layer, first blocking layer, AgCu layer, second blocking layer, upper strata dielectric combination layer.
2. single silver low radiation glass as claimed in claim 1 is characterized in that described dielectric combination layer thickness is 40～50nm.
3. single silver low radiation glass as claimed in claim 1 is characterized in that, described upper strata dielectric combination layer thickness is 40～50nm.
4. single silver low radiation glass as claimed in claim 1 is characterized in that described groundwork thickness is 2～3nm.
5. single silver low radiation glass as claimed in claim 1 is characterized in that described first barrier layer thickness is 0.5～1.5nm.
6. single silver low radiation glass as claimed in claim 1 is characterized in that described second barrier layer thickness is 0.5～1.5nm.
7. as each described single silver low radiation glass in the claim 1～6, it is characterized in that described AgCu layer thickness is 15～19nm.
8. single silver low radiation glass as claimed in claim 1, it is characterized in that described upper strata dielectric combination layer comprises first upper strata dielectric combination layer that is deposited on described second blocking layer and the second upper strata dielectric combination layer that is deposited on the described first upper strata dielectric combination layer.
9. single silver low radiation glass as claimed in claim 8 is characterized in that the thickness of the described first upper strata dielectric combination layer is 10～15nm.
10. single as claimed in claim 8 or 9 silver low radiation glass is characterized in that the thickness of the described second upper strata dielectric combination layer is 30～35nm.
CN2010205031198U 2010-08-24 2010-08-24 Single-silver-layer low-radiation glass Expired - Lifetime CN201825870U (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102372445A (en) * 2010-08-24 2012-03-14 中国南玻集团股份有限公司 Single-silver and low-radiation glass and manufacturing method thereof
CN102501452A (en) * 2011-11-25 2012-06-20 林嘉宏 Temperable low-emissivity coated glass
CN102501451A (en) * 2011-11-25 2012-06-20 林嘉宏 Temperable di-silver low-emissivity coated glass and manufacturing process thereof
CN103144379A (en) * 2011-12-06 2013-06-12 天津南玻节能玻璃有限公司 Low-emissivity coated glass and manufacturing method thereof
CN104710112A (en) * 2014-07-15 2015-06-17 北京冠华东方玻璃科技有限公司 Low-emissivity glass
CN106746733A (en) * 2017-01-19 2017-05-31 吴江南玻华东工程玻璃有限公司 A kind of double silver-layer low-radiation glass of low transmission antiradar reflectivity
CN107117832A (en) * 2017-05-05 2017-09-01 信义节能玻璃（芜湖）有限公司 Low anti-low permeability, tempered single silver low-radiation coated glass and its manufacture method and application

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102372445A (en) * 2010-08-24 2012-03-14 中国南玻集团股份有限公司 Single-silver and low-radiation glass and manufacturing method thereof
CN102372445B (en) * 2010-08-24 2013-09-04 中国南玻集团股份有限公司 Single-silver and low-radiation glass and manufacturing method thereof
CN102501452A (en) * 2011-11-25 2012-06-20 林嘉宏 Temperable low-emissivity coated glass
CN102501451A (en) * 2011-11-25 2012-06-20 林嘉宏 Temperable di-silver low-emissivity coated glass and manufacturing process thereof
CN103144379A (en) * 2011-12-06 2013-06-12 天津南玻节能玻璃有限公司 Low-emissivity coated glass and manufacturing method thereof
CN104710112A (en) * 2014-07-15 2015-06-17 北京冠华东方玻璃科技有限公司 Low-emissivity glass
CN106746733A (en) * 2017-01-19 2017-05-31 吴江南玻华东工程玻璃有限公司 A kind of double silver-layer low-radiation glass of low transmission antiradar reflectivity
CN107117832A (en) * 2017-05-05 2017-09-01 信义节能玻璃（芜湖）有限公司 Low anti-low permeability, tempered single silver low-radiation coated glass and its manufacture method and application
CN107117832B (en) * 2017-05-05 2023-06-16 信义节能玻璃（芜湖）有限公司 Low-reflection low-permeability toughened single-silver low-emissivity coated glass and manufacturing method and application thereof

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