CN113060942A - Light-gray three-silver low-emissivity coated glass and preparation method thereof - Google Patents

Light-gray three-silver low-emissivity coated glass and preparation method thereof Download PDF

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CN113060942A
CN113060942A CN202110408775.2A CN202110408775A CN113060942A CN 113060942 A CN113060942 A CN 113060942A CN 202110408775 A CN202110408775 A CN 202110408775A CN 113060942 A CN113060942 A CN 113060942A
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layer
follows
targets
mbar
argon
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熊建
宋宇
蒲军
杨清华
但小龙
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CSG Holding Co Ltd
Xianning CSG Energy Saving Glass Co Ltd
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CSG Holding Co Ltd
Xianning CSG Energy Saving Glass Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Abstract

The invention provides light grey three-silver low-emissivity coated glass and a preparation method thereof, belonging to the technical field of magnetron sputtering coating; according to the invention, through the optimized design of the coating layer of the coated glass, the transmittance, wear resistance and oxidation resistance of the coated glass are improved; the coating layer is formed by sequentially compounding eighteen film layers outwards from the glass substrate layer, wherein the first dielectric combination layer of the first layer and the second layer, the third layer is a first low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer is a first crystal bed dielectric layer, the sixth layer and the seventh layer are second dielectric combination layers, the eighth layer is a second low-radiation functional layer, the ninth layer is a color adjusting layer, the tenth layer and the eleventh layer are second blocking protective layers, the twelfth layer is a second crystal bed dielectric layer, and the thirteenth layer and the fourteenth layer are third dielectric combination layers. The glass has the advantages of high transmittance, wear resistance, oxidation resistance and the like.

Description

Light-gray three-silver low-emissivity coated glass and preparation method thereof
Technical Field
The invention belongs to the technical field of magnetron sputtering coating, and particularly relates to light gray three-silver low-emissivity coated glass and a preparation method thereof.
Background
The Low-E glass production process in the prior art is to plate a multilayer film system which takes Ag as a functional layer and comprises a dielectric layer and other metal layers on a high-quality float substrate. If the functional layers are divided according to the number of the silver layers, the Low-E glass can be divided into single-silver Low-E glass, double-silver Low-E glass and triple-silver Low-E glass. At present, single silver and double silver are mature energy-saving schemes in the field of building glass, the energy-saving effect of the three-silver energy-saving glass is superior to that of the double silver and the single silver, but the three-silver glass has a complex film structure and high process control difficulty, so that the cost is high. In recent years, in the market, a few manufacturers capable of producing the three-silver products in mass production are available, and the three-silver products are not as abundant as the double-silver products and the single-silver products.
Along with the gradual maturity of the market, homogenization competition becomes obvious day by day, and the requirement of customer to the outward appearance colour of curtain is also higher and higher, on the other hand to the city of densely populated how to build more comfortable human environment with the color for the grey series becomes the new sighting rod of building city ecological environment. Therefore, the gray glass becomes the main color of the curtain wall appearance, which is not difficult to understand, but for most Low-e three-silver glasses on the market, the appearance color system is difficult to meet the depth requirement of customers, so the existing gray film system three-silver color is improved.
The prior art has the following disadvantages:
1) although gray three-silver products exist in the market at present, the color is not pure enough, the color tone of the film surface is heavy, and the types of the products are not many.
2) Most of the existing three-silver products are blue-green in color, and the decorative effect is poor.
3) The three-silver Low-E glass film layer has a complex structure and is difficult to debug the process and control the processing and production.
Disclosure of Invention
The invention aims to provide high-transmittance light blue bendable steel three-silver low-emissivity coated glass and a preparation method thereof aiming at the problems in the prior art, and the technical problem to be solved by the invention is how to improve the transmittance, wear resistance and oxidation resistance of the coated glass through the design of a coating layer.
The purpose of the invention can be realized by the following technical scheme: the coated glass is characterized by comprising a glass substrate layer and a coated layer, wherein eighteen film layers are sequentially compounded from the glass substrate layer to the outside on the coated layer, the first dielectric combination layer and the second dielectric combination layer are arranged on the first layer and the second layer, the third layer is a first low-radiation functional layer, the fourth layer is a first blocking protective layer, the fifth layer is a first crystal bed dielectric layer, the sixth layer and the seventh layer are second dielectric combination layers, the eighth layer is a second low-radiation functional layer, the ninth layer is a color adjusting layer, the tenth layer and the eleventh layer are second blocking protective layers, the twelfth layer is a second crystal bed dielectric layer, the thirteenth layer and the fourteenth layer are third dielectric combination layers, the tenth low-radiation functional layer is a third low-radiation functional layer, and the sixteenth layer is a third blocking protective layer, the seventeenth layer and the eighteenth layer are fourth dielectric layers.
In the light gray three-silver low-emissivity coated glass, the first layer is SiNxThe thickness of the film layer is 15-40 nm; the second layer is a ZnAl layer, and the thickness of the film layer is 10-20 nm; the thickness of the third Ag layer is 5-10 nm; the fourth layer is an AZO layer, and the thickness of the film layer is 5-8 nm; the fifth layer is SiNxThe thickness of the film layer is 40-50 nm; the sixth layer is a ZnSn layer, and the thickness of the film layer is 5-15 nm; the seventh layer is a ZnAl layer, and the thickness of the film layer is 5-20 nm; the eighth layer is an Ag layer, and the thickness of the film layer is 10-20 nm; the ninth layer is a Cu layer, and the thickness of the film layer is 1-5 nm; the tenth layer is a NiCr layer, and the thickness of the film layer is 1-3 nm; the eleventh layer is an AZO layer, and the thickness of the film layer is 8-15 nm; the twelfth layer is SiNxThe thickness of the film layer is 25-40 nm; the thirteenth layer is a ZnSn layer, and the thickness of the film layer is 10-25 nm; the fourteenth layer is a ZnAl layer, and the thickness of the film layer is 10-30 nm; the fifth layer is an Ag layer, and the thickness of the film layer is 10-20 nm; the sixteenth layer is an AZO layer with thick film layerThe degree is 5-8 nm; the seventeenth layer is SiNxThe thickness of the film layer is 20-40 nm; the eighteenth layer is ZroxThe thickness of the layer is 10 nm.
The coating film layer of the product adopts zirconium oxide (Zro) as the outermost layer, so that the product has better passing rate, the performance and the color of the product are extremely stable, the wear resistance and the acid and alkali resistance of the product are greatly improved, and the product has better market competitiveness; secondly, the product enables the whole appearance to be light gray through controlling the thickness of each film layer.
In the light gray three-silver low-emissivity coated glass, the preparation method comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer:
the number of the targets is as follows: 2-4 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1.28: 1; sputtering pressure of 3 to 5 × 10-3mbar；
B. Magnetron sputtering the second layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure of 3 to 5 × 10-3mbar；
C. Magnetron sputtering the third layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar；
D. Magnetron sputtering the fourth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
E. performing magnetron sputtering on a fifth layer:
the number of the targets is as follows: 5-7 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1.28: 1; sputtering pressure of 3 to 5 × 10-3mbar；
F. Magnetron sputtering a sixth layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to nitrogen is 1: 2; sputtering pressure of 3 to 5 × 10-3mbar；
G. Magnetron sputtering a seventh layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure of 3 to 5 × 10-3mbar；
H. Magnetron sputtering an eighth layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar；
I. Magnetron sputtering the ninth layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured as copper (Cu); the process gas proportion is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar；
J. Magnetron sputtering the tenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas ratio is as follows: pure argon gas; sputtering pressure of 2 to 3X 10-3mbar；
K. Magnetron sputtering the eleventh layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas; sputtering pressure of 3 to 5 × 10-3mbar；
L, magnetron sputtering a twelfth layer:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and oxygen, the ratio of argon to oxygen being 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
I. magnetron sputtering the thirteenth layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
J. performing magnetron sputtering on the fourteenth layer:
the number of the targets is as follows: 1-3 alternating current rotary targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
K. performing magnetron sputtering on a fifteenth layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
l, magnetron sputtering a sixteenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
m, magnetron sputtering a seventeenth layer:
the number of the targets is as follows: 2-5 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1: 1.14; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
n, magnetron sputtering an eighteenth layer:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target is configured as zirconium oxide (Zro); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to oxygen is 1: 0.3; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
2) the total thickness of the coating layer is controlled between 180 and 380nm, and the transmission speed of the sputtering chamber is controlled between 4.0 and 5.5 m/min.
The invention has the advantages that:
1. the color system of the three-silver product is enriched, and a light gray three-silver film system is provided.
2. The sun-shading coefficient Sc is wide in range, and can meet the requirements of different regions according to the transmission amount of solar energy.
3. The blending film layer reduces the debugging color inflection point, and facilitates the process debugging.
Drawings
FIG. 1 is a schematic view of the layered structure of the light gray three-silver low-emissivity coated glass.
In the figure, G, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. the eleventh layer; 12. a twelfth layer; 13. a thirteenth layer; 14. a fourteenth layer; 15. a fifteenth layer; 16. a sixteenth layer; 17. a seventeenth layer; 18. and an eighteenth layer.
Detailed Description
The following are specific embodiments of the present invention and are further described with reference to the drawings, but the present invention is not limited to these embodiments.
As shown in figure 1, the light grey three-silver low-emissivity coated glass comprises a glass substrate layer G and a coating layer, wherein eighteen film layers are sequentially compounded on the coating layer from the glass substrate layer G to the outside, the first layer 1 and the second layer 2 are first dielectric combined layers, the third layer 3 is a first low-radiation functional layer, the fourth layer 4 is a first blocking protective layer, the fifth layer 5 is a first crystal bed dielectric layer, the sixth layer 6 and the seventh layer 7 are second dielectric combined layers, the eighth layer 8 is a second low-radiation functional layer, the ninth layer 9 is a color adjusting layer, the tenth layer 10 and the eleventh layer 11 are second blocking protective layers, the twelfth layer 12 is a second crystal bed dielectric layer, the thirteenth layer 13 and the fourteenth layer 14 are third dielectric combined layers, the fifteenth layer 15 is a third low-radiation functional layer, and the sixteenth layer 16 is a third blocking protective layer, the seventeenth layer 17 and the eighteenth layer 18 are fourth dielectric layers.
The first layer 1 is a SiNx layer, and the thickness of a film layer is 15-40 nm; the second layer 2 is a ZnAl layer, and the thickness of the film layer is 10-20 nm; a third 3Ag layer, wherein the thickness of the film layer is 5-10 nm; the fourth layer 4 is an AZO layer, and the thickness of the film layer is 5-8 nm; the fifth layer 5 is a SiNx layer, and the thickness of the film layer is 40-50 nm; the sixth layer 6 is a ZnSn layer, and the thickness of the film layer is 5-15 nm; the seventh layer 7 is a ZnAl layer, and the thickness of the film layer is 5-20 nm; the eighth layer 8 is an Ag layer, and the thickness of the film layer is 10-20 nm; the ninth layer 9 is a Cu layer, and the thickness of the film layer is 1-5 nm; the tenth layer 10 is a NiCr layer, and the thickness of the film layer is 1-3 nm; the eleventh layer 11 is an AZO layer, and the thickness of the film layer is 8-15 nm; the twelfth layer 12 is a SiNx layer, and the thickness of the film layer is 25-40 nm; the thirteenth layer 13 is a ZnSn layer, and the thickness of the film layer is 10-25 nm; the fourteenth layer 14 is a ZnAl layer, and the thickness of the film layer is 10-30 nm; the fifteenth layer 15 is an Ag layer, and the thickness of the film layer is 10-20 nm; the sixteenth layer 16 is an AZO layer, and the thickness of the film layer is 5-8 nm; the seventeenth layer 17 is a SiNx layer, and the film layer is 20-40 nm thick; the eighteenth layer 18 is a Zrox layer, and the thickness of the film layer is 10 nm.
The coating film layer of the product adopts zirconium oxide (Zro) as the outermost layer, so that the product has better passing rate, the performance and the color of the product are extremely stable, the wear resistance and the acid and alkali resistance of the product are greatly improved, and the product has better market competitiveness; secondly, the product enables the whole appearance to be light gray through controlling the thickness of each film layer.
In the light gray three-silver low-emissivity coated glass, the preparation method comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer 1:
the number of the targets is as follows: 2-4 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
B. magnetron sputtering of the second layer 2:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
C. magnetron sputtering of the third layer 3:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
D. magnetron sputtering of the fourth layer 4:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
E. magnetron sputtering of the fifth layer 5:
the number of the targets is as follows: 5-7 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
F. magnetron sputtering the sixth layer 6:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to nitrogen is 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
G. magnetron sputtering of the seventh layer 7:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
H. magnetron sputtering the eighth layer 8:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
I. magnetron sputtering the ninth layer 9:
the number of the targets is as follows: 1 direct current plane target; the target material is configured as copper (Cu); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
J. magnetron sputtering the tenth layer 10:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas ratio is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
K. magnetron sputtering the eleventh layer 11:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
l, magnetron sputtering a twelfth layer 12:
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and oxygen, the ratio of argon to oxygen being 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
I. magnetron sputtering the thirteenth layer 13:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
J. magnetron sputtering the fourteenth layer 14:
the number of the targets is as follows: 1-3 alternating current rotary targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
K. magnetron sputtering the fifteenth layer 15:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
l, magnetron sputtering a sixteenth layer 16:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
m, magnetron sputtering a seventeenth layer 17:
the number of the targets is as follows: 2-5 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1: 1.14; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
n, magnetron sputtering of an eighteenth layer 18:
the number of the targets is as follows: 1-2 alternating current rotating targets; the target is configured as zirconium oxide (Zro); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to oxygen is 1: 0.3; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
2) the total thickness of the coating layer is controlled between 180 and 380nm, and the transmission speed of the sputtering chamber is controlled between 4.0 and 5.5 m/min.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.

Claims (3)

1. The light grey three-silver low-emissivity coated glass is characterized by comprising a glass substrate layer (G) and a coated layer, wherein eighteen film layers are sequentially compounded on the coated layer from the glass substrate layer (G) to the outside, a first dielectric combination layer is arranged between a first layer (1) and a second layer (2), a third layer (3) is a first low-emissivity functional layer, a fourth layer (4) is a first blocking protective layer, a fifth layer (5) is a first crystal bed dielectric layer, a sixth layer (6) and a seventh layer (7) are second dielectric combination layers, an eighth layer (8) is a second low-emissivity functional layer, an eighth layer (9) is a color adjusting layer, a tenth layer (10) and a tenth layer (11) are second blocking protective layers, a twelfth layer (12) is a second crystal bed dielectric layer, and a tenth layer (13) and a fourteenth layer (14) are third dielectric combination layers, the fifteenth layer (15) is a third low-radiation functional layer, the sixteenth layer (16) is a third blocking protective layer, and the seventeenth layer (17) and the eighteenth layer (18) are fourth dielectric layers.
2. The light grey three-silver low-emissivity coated glass according to claim 1, wherein the first layer (1) is a SiNx layer, and the thickness of the layer is 15-40 nm; the second layer (2) is a ZnAl layer, and the thickness of the film layer is 10-20 nm; the third layer (3) is an Ag layer, and the thickness of the film layer is 5-10 nm; the fourth layer (4) is an AZO layer, and the thickness of the film layer is 5-8 nm; the fifth layer (5) is a SiNx layer, and the thickness of the film layer is 40-50 nm; the sixth layer (6) is a ZnSn layer, and the thickness of the film layer is 5-15 nm; the seventh layer (7) is a ZnAl layer, and the thickness of the film layer is 5-20 nm; the eighth layer (8) is an Ag layer, and the thickness of the film layer is 10-20 nm; the eighth layer (9) is a Cu layer, and the thickness of the film layer is 1-5 nm; the tenth layer (10) is a NiCr layer, and the thickness of the film layer is 1-3 nm; the eleventh layer (11) is an AZO layer, and the thickness of the film layer is 8-15 nm; the twelfth layer (12) is a SiNx layer, and the thickness of the film layer is 25-40 nm; the thirteenth layer (13) is a ZnSn layer, and the thickness of the film layer is 10-25 nm; the fourteenth layer (14) is a ZnAl layer, and the thickness of the film layer is 10-30 nm; the fifth layer (15) is an Ag layer, and the thickness of the film layer is 10-20 nm; the sixteenth layer (16) is an AZO layer, and the thickness of the film layer is 5-8 nm; the seventeenth layer (17) is a SiNx layer, and the film layer is 20-40 nm thick; the eighteenth layer (18) is a Zrox layer, and the thickness of the film layer is 10 nm.
3. A method of making the light grey, tri-silver, low emissivity coated glass of claim 1, comprising the steps of:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer (1):
the number of the targets is as follows: 2-4 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
B. magnetron sputtering of the second layer (2):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
C. magnetron sputtering third layer (3):
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
D. magnetron sputtering fourth layer (4):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
E. magnetron sputtering fifth layer (5):
the number of the targets is as follows: 5-7 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
F. magnetron sputtering sixth layer (6):
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to nitrogen is 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
G. magnetron sputtering seventh layer (7):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
H. magnetron sputtering eighth layer (8):
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
I. magnetron sputtering eighth layer (9):
the number of the targets is as follows: 1 direct current plane target; the target material is configured as copper (Cu); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
J. magnetron sputtering tenth layer (10):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas ratio is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
K. magnetron sputtering the eleventh layer (11):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
l, magnetron sputtering twelfth layer (12):
the number of the targets is as follows: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and oxygen, the ratio of argon to oxygen being 1.28: 1; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
I. magnetron sputtering a thirteenth layer (13):
the number of the targets is as follows: 1-2 alternating current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
J. magnetron sputtering fourteenth layer (14):
the number of the targets is as follows: 1-3 alternating current rotary targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
K. magnetron sputtering of the fifteenth layer (15):
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: pure argon gas; sputtering pressure is 2-3 multiplied by 10 < -3 > mbar;
l, magnetron sputtering the sixteenth layer (16):
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
m, magnetron sputtering a seventeenth layer (17):
the number of the targets is as follows: 2-5 alternating current rotating targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1: 1.14; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
n, magnetron sputtering eighteenth layer (18):
the number of the targets is as follows: 1-2 alternating current rotating targets; the target is configured as zirconium oxide (Zro); the process gas proportion is as follows: argon and oxygen, wherein the ratio of argon to oxygen is 1: 0.3; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar;
2) the total thickness of the coating layer is controlled between 180 and 380nm, and the transmission speed of the sputtering chamber is controlled between 4.0 and 5.5 m/min.
CN202110408775.2A 2021-04-16 2021-04-16 Light-gray three-silver low-emissivity coated glass and preparation method thereof Pending CN113060942A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114671627A (en) * 2022-04-13 2022-06-28 东莞南玻工程玻璃有限公司 Composite film, coated glass, and preparation method and application thereof

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CN104961355A (en) * 2015-07-30 2015-10-07 咸宁南玻节能玻璃有限公司 Grey three-silver low-emissivity coated glass product
CN111704369A (en) * 2020-06-24 2020-09-25 咸宁南玻节能玻璃有限公司 Panoramic gray double-silver low-emissivity coated glass and preparation method thereof
CN111995258A (en) * 2020-09-29 2020-11-27 咸宁南玻节能玻璃有限公司 Medium-transmittance LOW-reflection temperable double-silver LOW-E glass and preparation method thereof
CN215102876U (en) * 2021-04-16 2021-12-10 咸宁南玻节能玻璃有限公司 Light grey three-silver low-emissivity coated glass

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
CN104961355A (en) * 2015-07-30 2015-10-07 咸宁南玻节能玻璃有限公司 Grey three-silver low-emissivity coated glass product
CN111704369A (en) * 2020-06-24 2020-09-25 咸宁南玻节能玻璃有限公司 Panoramic gray double-silver low-emissivity coated glass and preparation method thereof
CN111995258A (en) * 2020-09-29 2020-11-27 咸宁南玻节能玻璃有限公司 Medium-transmittance LOW-reflection temperable double-silver LOW-E glass and preparation method thereof
CN215102876U (en) * 2021-04-16 2021-12-10 咸宁南玻节能玻璃有限公司 Light grey three-silver low-emissivity coated glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114671627A (en) * 2022-04-13 2022-06-28 东莞南玻工程玻璃有限公司 Composite film, coated glass, and preparation method and application thereof

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