CN209242943U - Double silver glass - Google Patents
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- CN209242943U CN209242943U CN201821825828.0U CN201821825828U CN209242943U CN 209242943 U CN209242943 U CN 209242943U CN 201821825828 U CN201821825828 U CN 201821825828U CN 209242943 U CN209242943 U CN 209242943U
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Abstract
The utility model embodiment discloses a kind of double silver-colored glass, including substrate of glass and the first medium layer being sequentially located in substrate of glass, first seed layer, first functional layer, first protective layer, second compound medium layer, second of sublayer, second functional layer, second protective layer, third compound medium layer, wherein, second compound medium layer include second under sub- dielectric layer, second middle layer, sub- dielectric layer on second, sub- dielectric layer is adjacent with the first protective layer under second, sub- dielectric layer is adjacent with second of sublayer on second, under second middle layer is located at second on sub- dielectric layer and second between sub- dielectric layer, sub- dielectric layer under the third that third compound medium layer includes, third middle layer, sub- dielectric layer in third, sub- dielectric layer is adjacent with the second protective layer under third, third middle layer be located under third on sub- dielectric layer and third sub- dielectric layer it Between, and the second middle layer and third middle layer include metal layer.This pair silver glass can promote the optical property after its tempering.
Description
Technical field
The utility model relates to a kind of energy-saving glass, especially a kind of double silver-colored glass.
Background technique
With the reinforcement that the implementation dynamics of national energy conservation and emission reduction policy increases and people realize low-carbon environment-friendly, with low spoke
Penetrate glass be representative energy-saving glass in door and window, glass curtain wall using more and more extensive.In low emissivity glass family, energy conservation
The double silver-layer low-radiation glass haveing excellent performance are widely applied.However, the optical property of existing double silver-layer low-radiation glass is also deposited
In certain deficiency, therefore also need further to promote its optical property to adapt to higher requirement.
Utility model content
The utility model embodiment provides a kind of double silver-colored glass now for above-mentioned, can promote its optical property.
The utility model embodiment provides a kind of double silver-colored glass, including substrate of glass, and double silver-colored glass further include successively
First medium layer, the first seed layer, the first functional layer, the first protective layer, the second complex media in the substrate of glass
Layer, second of sublayer, the second functional layer, the second protective layer, third compound medium layer, wherein the second compound medium layer packet
Sub- dielectric layer under second included, the second middle layer, sub- dielectric layer on second, sub- dielectric layer and first protection under described second
Layer is adjacent, and sub- dielectric layer is adjacent with second of sublayer on described second, and second middle layer is located at the described second lower son
On dielectric layer and described second between sub- dielectric layer, sub- dielectric layer under the third that the third compound medium layer includes, in third
Sub- dielectric layer on interbed, third, sub- dielectric layer is adjacent with second protective layer under the third, and the third middle layer is located at
Under the third in sub- dielectric layer and the third between sub- dielectric layer, and second middle layer and the third middle layer
Include metal layer.
In one embodiment of the utility model, the metal layer includes simple substance or the conjunction of niobium, iron, tantalum, nickel, chromium or zirconium
Gold.
It is sub- dielectric layer under described second, sub- dielectric layer on described second, described in one embodiment of the utility model
Sub- dielectric layer separately includes metal or nonmetallic oxide or nitride in sub- dielectric layer and the third under third.
It is sub- dielectric layer under described second, sub- dielectric layer on described second, described in one embodiment of the utility model
Sub- dielectric layer separately includes silicon nitride, zinc tin oxide, Zinc-aluminium, oxidation in sub- dielectric layer and the third under third
Silicon, titanium oxide or niobium oxide.
In one embodiment of the utility model, first protective layer and second protective layer separately include nickel chromium triangle
Alloy or nickel chromium triangle oxide, first seed layer and second of sublayer separately include zinc oxide, Zinc-aluminium or zinc
Tin-oxide.
In one embodiment of the utility model, double silver-colored glass further include be located at first protective layer with it is described
The steady dielectric layer of the first heat between second compound medium layer and/or it is located at second protective layer and the third compound medium layer
Between the second steady dielectric layer of heat.
In one embodiment of the utility model, under described second on sub- dielectric layer and described second sub- dielectric layer thickness
Degree is respectively 0~100nm, and the thickness of sub- dielectric layer is respectively 0~100nm in sub- dielectric layer and the third under the third.
In one embodiment of the utility model, first seed layer, first protective layer, the second seed
Layer or second protective layer with a thickness of 0~20nm.
In one embodiment of the utility model, first functional layer and second functional layer separately include silver or
The thickness of Kufil, first functional layer and second functional layer is respectively 0~40nm.
Above-mentioned technical proposal can have following advantage: double silver-colored glass provided by the embodiment of the utility model are using unique
The absorption intensity that each layer corresponds to different spectral bands is adjusted in the film layer structure of double compound medium layers, promotes double silver-colored glass reinforced plastics
Optical property after change.
Detailed description of the invention
It, below will be to required in embodiment description in order to illustrate more clearly of the technical solution of the utility model embodiment
The attached drawing used is briefly described, it should be apparent that, the accompanying drawings in the following description is only some implementations of the utility model
Example, for those of ordinary skill in the art, without creative efforts, can also obtain according to these attached drawings
Obtain other attached drawings.
Fig. 1 is a kind of structural schematic diagram of double silver-colored glass provided by the embodiment of the utility model；
Fig. 2 is the further structural schematic diagram of double silver-colored glass in Fig. 1.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without creative efforts
Every other embodiment obtained belongs to the range of the utility model shield.
As shown in Figure 1, an embodiment of the present invention provides a kind of double silver-colored glass 200, including substrate of glass 10 with successively
First medium layer 11, the first seed layer 12, the first functional layer 13, the first protective layer 14, second being formed in substrate of glass 10
Compound medium layer 15, second of sublayer 16, the second functional layer 17, the second protective layer 18 and third compound medium layer 19.First
Dielectric layer 11, the first seed layer 12, the first functional layer 13, the first protective layer 14, the second compound medium layer 15, second of sublayer
16, the second functional layer 17, the second protective layer 18 and third compound medium layer 19 can be made of solid material.
Wherein, substrate of glass 10 can be simple glass, coloured glass, ultra-clear glasses or other glass, thickness can for 3~
10 millimeters (mm), preferably 6mm.
First medium layer 11 is for example comprising metal or nonmetallic oxide or nitride, such as silicon nitride (Si3N4), zinc
Tin-oxide (ZnSnOx), Zinc-aluminium (AZO), silica (SiO2), titanium oxide (TiO2) or niobium oxide (Nb2O5) etc..The
One dielectric layer 11 with a thickness of 0~100nm.
Second compound medium layer 15 is situated between for example including son in sub- dielectric layer 151 under second, the second middle layer 152 and second
Matter layer 153.Sub- dielectric layer 151 is adjacent with the first protective layer 14 under second, sub- dielectric layer 153 and second of 16 phase of sublayer on second
Neighbour, under the second middle layer 152 is located at second on sub- dielectric layer 151 and second between sub- dielectric layer 153.Third compound medium layer 19
For example including sub- dielectric layer 193 in dielectric layer 191 sub- under third, third middle layer 192 and third.Sub- dielectric layer under third
191 is adjacent with the second protective layer 18, and sub- dielectric layer 193 is top layer in third, and third middle layer 192 is located at sub- dielectric layer under third
191 and third between sub- dielectric layer 193.
Sub- medium in sub- dielectric layer 191 and third under sub- dielectric layer 153, third on sub- dielectric layer 151, second under second
Layer 193 for example separately includes metal or nonmetallic oxide and nitride, such as silicon nitride (Si3N4), zinc tin oxide
(ZnSnOx), Zinc-aluminium (AZO), silica (SiO2), titanium oxide (TiO2) or niobium oxide (Nb2O5) etc..Second lower son is situated between
The thickness of sub- dielectric layer 153 is respectively 0~100nm on matter layer 151 and second.Son is situated between in sub- dielectric layer 191 and third under third
The thickness of matter layer 193 is respectively 0~100nm.Second middle layer 152 and third middle layer 192 are respectively metal layer.Specifically
Ground, the second middle layer 152 and third middle layer 192 for example separately include the simple substance or alloy example of niobium, iron, tantalum, nickel, chromium or zirconium
Such as nichrome (NiCr).The thickness of second middle layer 152 and third middle layer 192 is respectively 0~30nm.In this way,
Double compound medium layer film layer structures can double silver Low-E (Low-Emissivity, the low emissivity glass) products of tempering can be free
The absorption intensity of each layer is adjusted, to promote the optical property of double silver-colored glass.
In addition, the first seed layer 12, the first protective layer 14, second of sublayer 16 and the second protective layer 18 for example separately include
Metal, metal alloy or metal alloy oxide, such as nichrome (NiCr) or nickel chromium triangle oxide (NiCrOx) etc..Further
Ground, the first seed layer 12 and second of sublayer 16 for example separately include zinc oxide (ZnO or ZnAlOx), Zinc-aluminium (AZO)
Or zinc tin oxide (ZnSnOx) etc..First seed layer 12, the first protective layer 14, second of sublayer 16 and the second protective layer 18
Thickness be respectively 0~20nm.
First functional layer 13 and the second functional layer 17 are for example comprising silver-colored (Ag) or silver-colored (AgCu) alloy of copper.First functional layer 13
Thickness with the second functional layer 17 is respectively 0~40nm.
In addition, as shown in Fig. 2, double silver glass 200 are also for example including positioned at the first protective layer 14 and the second compound medium layer
The steady dielectric layer 21 of the first heat under the second of 15 between sub- dielectric layer 151 and/or it is located at the second protective layer 18 and compound Jie of third
The steady dielectric layer 22 of the second heat between matter layer 19.Double silver-colored glass can be improved in the steady dielectric layer 21 of first heat and the steady dielectric layer 22 of the second heat
200 thermal stability.Specifically, the steady dielectric layer 21 of the first heat and/or the steady dielectric layer 22 of the second heat are by metal oxide ceramic target
Sputtering obtains, such as includes Zinc-aluminium (AZO, ZnAlOx), zinc tin oxide (ZnSnOx), titanium oxide (TiOx).In steel
Change in process, the steady dielectric layer of heat is conducive to be promoted the thermal stability of Low-E film layer and product, enables product film layer more preferable
Tolerance tempering test without being destroyed.In addition, the use of the steady dielectric layer of heat, in addition to can be improved product thermal stability with
Outside, the optical property of product can also be promoted.Furthermore due to oxygen be influence product thermal stability an important factor for,
In film layer preparation process, not oxygenation or few oxygenation when the steady dielectric layer of heat is sputtered using metal oxide ceramic target, it is possible to reduce oxygen
Gas promotes the thermal stability of product to the diffusion of adjacent target position.In general, the steady dielectric layer 21 of the first heat and the second steady dielectric layer of heat
22 thickness is respectively 0-50nm.
In conclusion all film layers of double silver-colored glass 200 provided by the embodiment of the utility model can be by solid material structure
At, and using the film layer structure of unique double compound medium layers, improve the optical property of double silver-colored glass.With single Jie of tradition
Matter layer film layer structure can the double silver of tempering compare, using double compound medium layer film layer structures can the double silver Low-E product energy of tempering
Enough absorption intensities for freely adjusting each layer, and the corresponding different spectral band of the absorption of these different zones.It is wanted according to Low-E
The difference for the appearance color asked can be adjusted flexibly to obtain desired spectrum form, be market in the appearance color for guaranteeing glass
In the case where mainstream appearance color, better visible light-transmissive color can get.Specifically, traditional Single Medium layer can steel it is double
Silver-colored structure and film thickness is successively are as follows: substrate of glass (6mm)/Si3N4(33.4nm)/ZnO(10.8nm)/Ag(3.3nm)/NiCr
(1nm)/Si3N4(74.2nm)/NiCr(2.2nm)/Ag(21.5nm)/NiCr(0.8nm)/Si3N4Double silver-colored glass of (49.7nm)
Glass, optic test result after tempering processing are as follows: visible light transmittance 48.2%, through color a*:-5.2, b*:0.6, glass surface reflection
Navy blue is presented in rate 23.1%, reflected colour a*:-1.9, b*:-14.9, outdoor observation, and interior is yellow green.And the utility model
A kind of double compound medium layers that embodiment provides can the double silver of steel structure and film thickness successively are as follows: substrate of glass (6mm)/Si3N4
(25.6nm)/NiCr(1.4nm)/Ag(17.5nm)/NiCr(1.4nm)/Si3N4(37.5nm)/NiCr(1.9nm)/Si3N4
(48.8nm)/NiCr(1nm)/Ag(16.6nm)/NiCr(1nm)/Si3N4(25nm)/NiCr(1nm)/Si3N4(10nm's) is double
Silver-colored glass, optic test result after tempering processing are as follows: visible light transmittance 49.5%, through color a*:-2.096, b*:-0.173,
Pewter is presented in glass surface reflectivity 22.6%, reflected colour a*:-2.17, b*:-3.7, outdoor observation, and indoor observation presents light green
Color.As it can be seen that no matter outdoor observation or indoor observation, double compound medium layer film layer structures provided by the embodiment of the utility model
Can the double silver Low-E of tempering color it is all more neutral, natural, comfortably.In addition, the first functional layer 13 and the second functional layer 17 are
Silver layer, energy extra reflection infrared heat, prevents heat from passing through.Furthermore because double silver glass 200 can be anti-only with magnetic control when producing
It answers sputtering method that can form each layer, therefore can avoid repeatedly passing in and out filming equipment in production process, simplify production technology,
To can also reduce production cost, production efficiency is improved.
In addition, another embodiment of the utility model provides a kind of preparation method of double silver-colored glass also to prepare above-mentioned double silver-colored glass
Glass 200.Substrate of glass 10 is provided first.The usual needs of substrate of glass 10 are cleaned up, are dried, and then pass to vacuum chamber plating
Diaphragm area.Then, first medium layer 11, the first seed are successively deposited in substrate of glass 10 by way of magnetron sputtering plating
The 12, first functional layer 13 of layer, the first protective layer 14, the second compound medium layer 15, second of sublayer 16, the second functional layer 17, the
Two protective layers 18 and third compound medium layer 19.Each layer carries out magnetron sputtering plating at room temperature and deposits to be formed, but
It needs to post-process the substrate of glass 10 for being formed with each layer after having deposited each layer.The mode of post-processing is for example including to formation
There is the substrate of glass 10 of each layer to carry out tempering processing, wherein the temperature of tempering processing is 650~700 DEG C, about 1~10 point of the time
Clock；It or include being made annealing treatment to the substrate of glass 10 for being formed with each layer, wherein the temperature of annealing is 400~650 DEG C,
Annealing time is 20 minutes to 2 hours.The preparation process of double silver-colored glass 200 is described in detail below by two specific embodiments.
Specific embodiment 1
A kind of double silver-colored glass, film layer structure is successively outward by substrate of glass: Si3N4(25.6nm)/NiCr(1.4nm)/
Ag(17.5nm)/NiCr(1.4nm)/Si3N4(37.5nm)/NiCr(1.9nm)/Si3N4(48.8nm)/NiCr(1nm)/Ag
(16.6nm)/NiCr(1nm)/Si3N4(25nm)/NiCr(1nm)/Si3N4(10nm)。
The method for preparing this double silver-colored glass is successively:
(1) substrate of glass is cleaned up and is dried up, and is placed in vacuum sputtering area；
(2) Si is deposited by the way of magnetron sputtering on the glass substrate3N4Layer, target used are SiAl rotary target, power supply
For intermediate frequency power supply, power is 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, is deposited at room temperature；
(3) in Si3N4The mode that magnetron sputtering is used above in layer deposits NiCr layers, and target used is metal NiCr flat target,
Power supply is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(4) mode that magnetron sputtering is used above at NiCr layers deposits Ag layers, and target used is Ag flat target, and power supply is straight
Stream plus the pulse power, power are 1~10KW, and process gas is pure argon, is deposited at room temperature；
(5) mode that magnetron sputtering is used above at Ag layers deposits NiCr layers, and target used is metal NiCr flat target, electricity
Source is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(6) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, and power supply is
Intermediate frequency power supply, power are 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, are deposited at room temperature；
(7) in Si3N4The mode that magnetron sputtering is used above in layer deposits NiCr layers, and target used is metal NiCr flat target,
Power supply is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(8) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, and power supply is
Intermediate frequency power supply, power are 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, are deposited at room temperature；
(9) in Si3N4The mode that magnetron sputtering is used above in layer deposits NiCr layers, and target used is metal NiCr flat target,
Power supply is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(10) mode that magnetron sputtering is used above at NiCr layers deposits Ag layers, and target used is Ag flat target, and power supply is
Direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(11) mode that magnetron sputtering is used above at Ag layers deposits NiCr layers, and target used is metal NiCr flat target,
Power supply is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(12) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, power supply
For intermediate frequency power supply, power is 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, is deposited at room temperature.
(13) in Si3N4The mode that magnetron sputtering is used above in layer deposits NiCr layers, and target used is metal NiCr plane
Target, power supply are that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(14) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, power supply
For intermediate frequency power supply, power is 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, is deposited at room temperature.
Specific embodiment 2
A kind of double silver-colored glass, film layer structure is successively outward by substrate of glass: Si3N4(33.4nm)/ZnAlOx
(8.2nm)/Ag(10nm)/NiCr(1nm)/Si3N4(50nm)/NiCr(0.8nm)/Si3N4(20.4nm)/ZnAlOx(8nm)/Ag
(15nm)/NiCr(0.8nm)/AZO(10nm)/Si3N4(10nm)/NiCr(0.8nm)/Si3N4(21.2nm)。
The method for preparing this double silver-colored glass is successively:
(1) substrate of glass is cleaned up and is dried up, and is placed in vacuum sputtering area；
(2) Si is deposited by the way of magnetron sputtering on the glass substrate3N4Layer, target used are SiAl rotary target, power supply
For intermediate frequency power supply, power is 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, is deposited at room temperature；
(3) in Si3N4The mode that magnetron sputtering is used above in layer deposits ZnAlOxLayer, target used are ZnAl rotary target, electricity
Source is intermediate frequency power supply, and power is 10~100KW, and process gas is the mixed gas of argon gas and oxygen, is deposited at room temperature.
(4) in ZnAlOxThe mode that magnetron sputtering is used above in layer deposits Ag layers, and target used is Ag flat target, and power supply is
Direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature.
(5) mode that magnetron sputtering is used above at Ag layers deposits NiCr layers, and target used is metal NiCr flat target, electricity
Source is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(6) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, and power supply is
Intermediate frequency power supply, power are 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, are deposited at room temperature；
(7) in Si3N4The mode that magnetron sputtering is used above in layer deposits NiCr layers, and target used is metal NiCr flat target,
Power supply is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(8) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, and power supply is
Intermediate frequency power supply, power are 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, are deposited at room temperature；
(9) in Si3N4The mode that magnetron sputtering is used above in layer deposits ZnAlOxLayer, target used are ZnAl rotary target, electricity
Source is intermediate frequency power supply, and power is 10~100KW, and process gas is the mixed gas of argon gas and oxygen, is deposited at room temperature；
(10) in ZnAlOxThe mode that magnetron sputtering is used above in layer deposits Ag layers, and target used is Ag flat target, power supply
For direct current plus the pulse power, power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(11) mode that magnetron sputtering is used above at Ag layers deposits NiCr layers, and target used is metal NiCr flat target,
Power supply is that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(12) mode that magnetron sputtering is used above at NiCr layers deposits AZO layers, and target used is ceramics AZO rotary target,
Power supply is intermediate frequency power supply, and power is 10~100KW, and process gas is the mixed gas of pure argon or argon gas and oxygen, in room
The lower deposition of temperature.
(13) Si is deposited by the way of magnetron sputtering on AZO layer3N4Layer, target used are SiAl rotary target, and power supply is
Intermediate frequency power supply, power are 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, are deposited at room temperature.
(14) in Si3N4The mode that magnetron sputtering is used above in layer deposits NiCr layers, and target used is metal NiCr plane
Target, power supply are that direct current adds the pulse power, and power is 1~10KW, and process gas is pure argon, is deposited at room temperature；
(15) Si is deposited by the way of magnetron sputtering on NiCr layer3N4Layer, target used are SiAl rotary target, power supply
For intermediate frequency power supply, power is 10~100KW, and process gas is the mixed gas of argon gas and nitrogen, is deposited at room temperature.
(16) manufactured glass is subjected to tempering processing.
Finally, it should be noted that above embodiments are only to illustrate the technical solution of the utility model, rather than its limitations；
Although the utility model is described in detail with reference to the foregoing embodiments, those skilled in the art should understand that:
It is still possible to modify the technical solutions described in the foregoing embodiments, or part of technical characteristic is carried out etc.
With replacement；And these are modified or replaceed, various embodiments of the utility model technology that it does not separate the essence of the corresponding technical solution
The spirit and scope of scheme.
Claims (9)
1. a kind of double silver-colored glass, including substrate of glass, which is characterized in that double silver-colored glass further include being sequentially located at the glass
First medium layer, the first seed layer, the first functional layer, the first protective layer, the second compound medium layer, second seed in substrate
Layer, the second functional layer, the second protective layer, third compound medium layer, wherein the second lower son that second compound medium layer includes
Dielectric layer, the second middle layer, sub- dielectric layer on second, sub- dielectric layer is adjacent with first protective layer under described second, described
Sub- dielectric layer is adjacent with second of sublayer on second, second middle layer be located at described second under sub- dielectric layer with it is described
On second between sub- dielectric layer, sub- dielectric layer under the third that the third compound medium layer includes, third middle layer, son in third
Dielectric layer, sub- dielectric layer is adjacent with second protective layer under the third, and the third middle layer is located under the third sub
On dielectric layer and the third between sub- dielectric layer, and second middle layer and the third middle layer include metal layer.
2. double silver-colored glass as described in claim 1, which is characterized in that the metal layer includes niobium, iron, tantalum, nickel, chromium or zirconium
Simple substance or alloy.
3. glass as described in claim 1 double silver-colored, which is characterized in that sub- dielectric layer under described second, son is situated between on described second
Sub- dielectric layer separately includes metal or nonmetallic oxide or nitrogen in sub- dielectric layer and the third under matter layer, the third
Compound.
4. glass as claimed in claim 3 double silver-colored, which is characterized in that sub- dielectric layer under described second, son is situated between on described second
Sub- dielectric layer separately includes silicon nitride, zinc tin oxide, zinc-aluminium oxygen in sub- dielectric layer and the third under matter layer, the third
Compound, silica, titanium oxide or niobium oxide.
5. double silver-colored glass as described in claim 1, which is characterized in that first protective layer and second protective layer difference
Comprising nichrome or nickel chromium triangle oxide, first seed layer and second of sublayer separately include zinc oxide, zinc-aluminium oxygen
Compound or zinc tin oxide.
6. double silver-colored glass as described in claim 1, which is characterized in that double silver-colored glass further include being located at first protection
The steady dielectric layer of the first heat between layer and second compound medium layer and/or it is located at second protective layer and the third is multiple
Close the second steady dielectric layer of heat between dielectric layer.
7. double silver-colored glass as described in claim 1, which is characterized in that son is situated between on sub- dielectric layer and described second under described second
The thickness of matter layer is respectively 0~100nm, and the thickness of sub- dielectric layer is respectively 0 in sub- dielectric layer and the third under the third
~100nm.
8. glass as described in claim 1 double silver-colored, which is characterized in that first seed layer, first protective layer, described
Second of sublayer or second protective layer with a thickness of 0~20nm.
9. double silver-colored glass as described in claim 1, which is characterized in that first functional layer and second functional layer difference
Comprising silver or Kufil, the thickness of first functional layer and second functional layer is respectively 0~40nm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201821825828.0U CN209242943U (en) | 2018-11-06 | 2018-11-06 | Double silver glass |
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| CN201821825828.0U CN209242943U (en) | 2018-11-06 | 2018-11-06 | Double silver glass |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111138089A (en) * | 2018-11-06 | 2020-05-12 | 中国南玻集团股份有限公司 | Double silver glass |
| CN112777945A (en) * | 2019-11-07 | 2021-05-11 | 中国南玻集团股份有限公司 | Three-silver glass |
| CN112777946A (en) * | 2019-11-07 | 2021-05-11 | 中国南玻集团股份有限公司 | Three-silver glass |
| WO2023191738A1 (en) * | 2022-03-31 | 2023-10-05 | Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi | A low-e coating for glass surfaces and a glass with a low-e coating |
-
2018
- 2018-11-06 CN CN201821825828.0U patent/CN209242943U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111138089A (en) * | 2018-11-06 | 2020-05-12 | 中国南玻集团股份有限公司 | Double silver glass |
| CN112777945A (en) * | 2019-11-07 | 2021-05-11 | 中国南玻集团股份有限公司 | Three-silver glass |
| CN112777946A (en) * | 2019-11-07 | 2021-05-11 | 中国南玻集团股份有限公司 | Three-silver glass |
| WO2023191738A1 (en) * | 2022-03-31 | 2023-10-05 | Turkiye Sise Ve Cam Fabrikalari Anonim Sirketi | A low-e coating for glass surfaces and a glass with a low-e coating |
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