CN110510891A - A kind of high light blue bendable steel Three-silver-layer low-radiation coated glass and preparation method - Google Patents
A kind of high light blue bendable steel Three-silver-layer low-radiation coated glass and preparation method Download PDFInfo
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- CN110510891A CN110510891A CN201910902242.2A CN201910902242A CN110510891A CN 110510891 A CN110510891 A CN 110510891A CN 201910902242 A CN201910902242 A CN 201910902242A CN 110510891 A CN110510891 A CN 110510891A
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- 239000011521 glass Substances 0.000 title claims abstract description 49
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 26
- 239000010959 steel Substances 0.000 title claims abstract description 26
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000010410 layer Substances 0.000 claims abstract description 323
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 56
- 230000005855 radiation Effects 0.000 claims abstract description 15
- 238000007747 plating Methods 0.000 claims abstract description 14
- 239000011241 protective layer Substances 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 170
- 239000007789 gas Substances 0.000 claims description 128
- 229910052786 argon Inorganic materials 0.000 claims description 85
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 61
- 239000001301 oxygen Substances 0.000 claims description 61
- 229910052760 oxygen Inorganic materials 0.000 claims description 61
- 238000000034 method Methods 0.000 claims description 58
- 238000004544 sputter deposition Methods 0.000 claims description 52
- 230000008569 process Effects 0.000 claims description 51
- 239000011248 coating agent Substances 0.000 claims description 45
- 238000000576 coating method Methods 0.000 claims description 45
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 30
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 18
- 229910004205 SiNX Inorganic materials 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 15
- 229910018487 Ni—Cr Inorganic materials 0.000 claims description 9
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims description 9
- 229910000611 Zinc aluminium Inorganic materials 0.000 claims description 6
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 claims description 3
- 241000446313 Lamella Species 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 17
- 238000007254 oxidation reaction Methods 0.000 abstract description 17
- 238000005516 engineering process Methods 0.000 abstract description 5
- 238000013461 design Methods 0.000 abstract description 2
- 238000005457 optimization Methods 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 description 18
- 239000004332 silver Substances 0.000 description 18
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 12
- 239000012528 membrane Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000002346 layers by function Substances 0.000 description 4
- 238000005496 tempering Methods 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000004134 energy conservation Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000005344 low-emissivity glass Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
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- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of high light blue bendable steel Three-silver-layer low-radiation coated glass and preparation methods, belong to magnetron sputtering technology field；In the present invention, by the optimization design to coated glass film plating layer, coated glass transmitance, oxidation resistance are improved；A kind of high light blue bendable steel Three-silver-layer low-radiation coated glass, including glass substrate layer and film plating layer, film plating layer is successively compounded with 15 film layers from the glass substrate layer outward, wherein first layer is the first dielectric layer, the second layer is low radiation functions layer, third layer and the 4th layer are the first block protective layer, layer 5 and layer 6 are the second dielectric layer, layer 7 is low radiation functions layer, 8th layer and the 9th layer is the second block protective layer, tenth layer and eleventh floor are third dielectric layer, Floor 12 is low radiation functions layer, 13rd layer and the 14th layer is third block protective layer, 15th layer is the 4th dielectric layer.Glass of the present invention has many advantages, such as transmitance height, resistance to oxidation.
Description
Technical field
The invention belongs to magnetron sputtering technology fields, and in particular to a kind of high light blue bendable steel three-silver low radiation
Coated glass and preparation method.
Background technique
As a kind of excellent construction material, glass has light transmission, antiultraviolet and radix saposhnikoviae due to its good permeability
The function of snow, is widely used in building.With the development of modern science and technology level, glass is endowed various new intensions,
Middle low-E glass with its color beautiful and generous, preferable texture and excellent energy conservation characteristic, building curtain wall field by
To extensive use.Low-E glass is also known as low emissivity glass, is often used magnetron sputtering method in glass substrate surface and deposits nanometer film
Layer, and then change the optics of glass, electricity, performance mechanically and chemically etc., reach the purpose of decoration, energy-saving and environmental protection.
As energy saving building material, the energy conservation characteristic of low-E glass compared with simple glass and heat-reflection coated glass,
Low-E glass has high reflectivity to far infrared radiation.Under the action of effectively reducing the heat transmitting of indoor and outdoor, room is kept
Interior temperature is stablized, and reduces the energy consumption of building heating or refrigeration, plays very outstanding effect of energy.It wherein can steel membrane system
Produced due to being suitable for large area, have current most efficient production procedure, can carry out it is subsequent cut, grind, steel clamp, etc. techniques add
Work, therefore be widely noticed, becomes the main trend of the following low-E glass development, but can steel single silver film system technology it is more mature, can steel
Still there are a larger technological gap in three silverskin systems, and mature membrane system is less and the low field in that focuses mostly on.
The shortcomings that prior art:
1) it is existing can steel Three-silver-layer low-radiation coated glass transmitance it is relatively low (be lower than 50%), it is difficult to meet customer need.
2) it is existing can three silverskin system of steel often outdoor color is not clear, indoor color is mostly bottle green glassy yellow etc., with room
Outer color difference is larger.
3) it is existing can three silverskin of steel tie up in subsequent production that often to will appear alloy or membranous layer binding force insufficient.
Summary of the invention
In view of the above problems existing in the prior art, the purpose of the present invention is to provide a kind of high light blue bendable steel three
Silver low-radiation coated glass and preparation method, the technical problem to be solved by the present invention is to mention how by the design of film plating layer
High coated glass transmitance, oxidation resistance.
Object of the invention can be realized by the following technical scheme: a kind of high light blue bendable steel three-silver low radiation plating
Film glass, which is characterized in that this coated glass includes glass substrate layer and film plating layer, and the film plating layer is from the glass substrate layer
15 film layers are successively compounded with outward, wherein first layer is the first dielectric layer, and the second layer is low radiation functions layer, third layer
It is the first block protective layer with the 4th layer, layer 5 and layer 6 are the second dielectric layer, and layer 7 is low radiation functions layer, the
Eight layers and the 9th layer are the second block protective layer, and the tenth layer and eleventh floor are third dielectric layer, and Floor 12 is Low emissivity
Functional layer, the 13rd layer and the 14th layer is third block protective layer, and the 15th layer is the 4th dielectric layer.
Grey can be in steel double-silver low-emissivity coated glass thoroughly in above-mentioned one kind, and the first layer is SiNxLayer, described the
Two layers are Ag layers, the third layer NiCrOxLayer, described 4th layer is AZO layers, and the layer 5 is ZnSnOxLayer, the described 6th
Layer is ZnAlO layers, and the layer 7 is Ag layers, and described 8th layer is NiCrOxLayer, described 9th layer be AZO layers, the described tenth
Layer is ZnSnOxLayer, the eleventh floor are ZnAlO layers, and the Floor 12 is Ag layers, and described 13rd layer is NiCrOxLayer,
Described 14th layer is AZO layers, and described 15th layer is SiNxLayer.
Due to SiNxThe wear resistance of layer is superior, therefore the initial layers (i.e. first layer) of entire membrane system and end layer (i.e. the
15 layers) it is all made of SiNxLayer, and the AZO layers of characteristic with visible light high transmission, mention the transmitance of this coated glass substantially
It is high.
In a kind of above-mentioned high light blue bendable steel Three-silver-layer low-radiation coated glass, preparation method includes following step
It is rapid:
1), magnetron sputtering film layer；
A, magnetron sputtering first layer:
Target quantity: exchange rotary target 3~4；Target is configured to sial (SiAl)；Process gas ratio: argon gas and nitrogen
The ratio of gas, argon gas and nitrogen is 1:1.14, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~25nm；
B, the magnetron sputtering second layer:
Target quantity: direct current planar target 1；Target configures silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas and
The ratio of oxygen is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 2~3nm；
C, magnetron sputtering third layer:
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3nm；
D, the 4th layer of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: pure argon, sputtering pressure 3
~5 × 10-3mbar；Coating film thickness is 2~3nm；E, magnetron sputtering layer 5；
E, magnetron sputtering layer 5:
Target quantity: exchange rotary target 4~5；Target is configured to zinc-tin (ZnSn)；Process gas ratio: argon gas and oxygen
The ratio of gas, argon gas and oxygen is 1:2, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
F, magnetron sputtering layer 6:
Target quantity: exchange rotary target 2~3；Target is configured to zinc-aluminium (ZnAl)；Process gas ratio: argon gas and oxygen
The ratio of gas, argon gas and nitrogen is 1:2, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
G, magnetron sputtering layer 7:
Target quantity: direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 5.6~5.8nm；
H, the 8th layer of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2.8~3.0nm；
I, the 9th layer of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: pure argon；Sputtering pressure is 3
~5 × 10-3mbar；Coating film thickness is 2~3nm；
J, the tenth layer of magnetron sputtering:
Target quantity: exchange rotary target 4~6；Target is configured to zinc-tin (ZnSn)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 1:2；Sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20nm；
K, magnetron sputtering eleventh floor:
Target quantity: exchange rotary target 4~5；Target is configured to zinc-tin (ZnSn)；Process gas: argon gas and oxygen, argon
The ratio of gas and oxygen is 1:2；Sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3nm；
L, magnetron sputtering Floor 12:
Target quantity: direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 2.3~3.0nm；
I, the 13rd layer of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3.0nm；
J, the 14th layer of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: straight argon, sputtering pressure are 3~5
×10-3mbar；Coating film thickness is 2~3.0nm；
K, the 14th layer of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to sial (SiAl)；Process gas ratio: argon gas and nitrogen,
The ratio of argon gas and nitrogen is 1:1.14, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 40~50nm；；
2), for the control of film plating layer overall thickness between 246-318nm, sputtering chamber is driven walking speed control in 4.0-5.0m/min.
Need special emphasis be in the sputtering process of Nicr target, it is thin under low partial pressure of oxygen compared with the condition of straight argon
Residual compressive stress in film will increase (critical section is in 0.1%-0.9%O2), and the remnants under high partial pressure of oxygen in film
Compression will reduce, and residual compressive stress, which reduces, to be conducive to improve film crystal grain quality, reduces the defects of film, and that improves film can
Light-exposed transmitance.In addition, NicrOxIn the production of subsequent tempering, it can be combined into alloy to avoid with Ag layers, improved close to film
The adsorption capacity of layer.Secondly the silver in Ag base Low emissivity film layer usually as functional layer is easiest to the oxidation that is corroded, in workshop
In resistance to oxidation experiment, the silver layer oxidation often caused by part thoroughly destroys so as to cause film layer structure, and then appearance is dotted very
To blocky demoulding.And can also will appear silver layer complete oxidation sometimes in the tempering experiment of steel membrane system, lead to asking for color change
Topic；To further increase film layer oxidation resistent susceptibility, silver layer is made superficial oxidation occur in sputtering process, guarantees silver layer up-down structure
It is not destroyed, surface smoothness is good, had so not only maintained low radiance but also had improved oxidation resistance.
Grey can be in steel double-silver low-emissivity coated glass thoroughly in above-mentioned one kind, and described 4th layer between layer 5, the
SiN is equipped between nine layers and the tenth layerxLayer.
When the 4th layer between layer 5, when being equipped with SiNx layer between the 9th layer and the tenth layer, for its low radiation functions
Magnetron sputtering (i.e. step B, step G and step L) condition of layer can be adjusted accordingly, and process gas should be changed to pure argon,
And other conditions are constant.
The invention has the advantages that
1, the art of this patent product 6mm single transmittance T ∈ [70%-75%].
2, glass surface is light blue, wherein ∈ -5 color a* are penetrated, -6], b* ∈ [2.59,2.8]；Glass surface color a* ∈ [0.6,
1.0], [- 5, -7] b* ∈；Film surface color a* ∈ [15,16], b* ∈ [- 23.5, -23.0]；Glass surface low-angle color a* ∈ [-
0.1,0], [- 3.8, -3.5] b* ∈.
3, can carry out it is subsequent cut, grind, the techniques processing such as steel, interlayer, be easy to implement large area production and can guarantee long-term
The problems such as scratching, aoxidizing is not easy during transport, storage.
Detailed description of the invention
Fig. 1 is this high transmission muted color double-silver low-emissivity coated glass layer structure schematic diagram.
In figure, G, glass substrate layer；1, first layer；2, the second layer；3, third layer；4, the 4th layer；5, layer 5；6, the 6th
Layer；7, layer 7；8, the 8th layer；9, the 9th layer；10, the tenth layer；11, eleventh floor；12, Floor 12；13, the 13rd layer；
14, the 14th layer；15, the 15th layer；A, positioned at the 4th layer of SiN between layer 5xLayer；B, it is located at the 9th layer and the tenth layer
Between SiNxLayer.
Specific embodiment
Following is a specific embodiment of the present invention in conjunction with the accompanying drawings, technical scheme of the present invention will be further described,
However, the present invention is not limited to these examples.
As shown in Figure 1, a kind of high light blue bendable steel Three-silver-layer low-radiation coated glass, including glass substrate layer G and plating
Film layer, film plating layer are successively compounded with 15 film layers from the glass substrate layer G outward, and wherein first layer 1 is the first dielectric
Layer, the second layer 2 are low radiation functions layer, and third layer 3 and the 4th layer 4 are the first block protective layer, and layer 55 and layer 66 are
Second dielectric layer, layer 77 be low radiation functions layer, the 8th layer 8 and the 9th layer 9 be the second block protective layer, the tenth layer 10
It is third dielectric layer with eleventh floor 11, Floor 12 12 is low radiation functions layer, and the 13rd layer 13 and the 14th layers 14 are
Third block protective layer, the 15th layer 15 is the 4th dielectric layer.
First layer 1 is SiNx layer, and the second layer 2 is Ag layers, and 3NiCrOx layers of third layer, the 4th layer 4 is AZO layers, layer 55
It is ZnSnOx layers, layer 66 is ZnAlO layers, and layer 77 is Ag layers, and the 8th layer 8 is NiCrOx layers, and the 9th layer 9 is AZO layers, the
Ten layer 10 is ZnSnOx layers, and eleventh floor 11 is ZnAlO layers, and Floor 12 12 is Ag layers, and the 13rd layer 13 is NiCrOx layers, the
14 layer 14 is AZO layers, and the 15th layer 15 is SiNx layer.
Since the wear resistance of SiNx layer is superior, therefore the initial layers (i.e. first layer 1) of entire membrane system and end layer (i.e. the
15) 15 layers are all made of SiNx layer, and the AZO layers of characteristic with visible light high transmission, make the transmitance of this coated glass substantially
It improves.
In a kind of above-mentioned high light blue bendable steel Three-silver-layer low-radiation coated glass, preparation method includes following step
It is rapid:
1), magnetron sputtering film layer；
A, magnetron sputtering first layer 1:
Target quantity: exchange rotary target 3~4；Target is configured to sial (SiAl)；Process gas ratio: argon gas and nitrogen
The ratio of gas, argon gas and nitrogen is 1:1.14, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~25nm；
B, the magnetron sputtering second layer 2:
Target quantity: direct current planar target 1；Target configures silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas and
The ratio of oxygen is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 2~3nm；
C, magnetron sputtering third layer 3:
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3nm；
D, the 4th layer 4 of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: pure argon, sputtering pressure 3
~5 × 10-3mbar；Coating film thickness is 2~3nm；E, magnetron sputtering layer 55；
E, magnetron sputtering layer 55:
Target quantity: exchange rotary target 4~5；Target is configured to zinc-tin (ZnSn)；Process gas ratio: argon gas and oxygen
The ratio of gas, argon gas and oxygen is 1:2, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
F, magnetron sputtering layer 66:
Target quantity: exchange rotary target 2~3；Target is configured to zinc-aluminium (ZnAl)；Process gas ratio: argon gas and oxygen
The ratio of gas, argon gas and nitrogen is 1:2, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
G, magnetron sputtering layer 77:
Target quantity: direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 5.6~5.8nm；
H, the 8th layer 8 of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2.8~3.0nm；
I, the 9th layer 9 of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: pure argon；Sputtering pressure is 3
~5 × 10-3mbar；Coating film thickness is 2~3nm；
J, the tenth layer 10 of magnetron sputtering:
Target quantity: exchange rotary target 4~6；Target is configured to zinc-tin (ZnSn)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 1:2；Sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20nm；
K, magnetron sputtering eleventh floor 11:
Target quantity: exchange rotary target 4~5；Target is configured to zinc-tin (ZnSn)；Process gas: argon gas and oxygen, argon
The ratio of gas and oxygen is 1:2；Sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3nm；
L, magnetron sputtering Floor 12 12:
Target quantity: direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 2.3~3.0nm；
I, the 13rd layer 13 of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen,
The ratio of argon gas and oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3.0nm；
J, the 14th layer 14 of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: straight argon, sputtering pressure are 3~5
×10-3mbar；Coating film thickness is 2~3.0nm；
K, the 14th layer 14 of magnetron sputtering:
Target quantity: exchange rotary target 1；Target is configured to sial (SiAl)；Process gas ratio: argon gas and nitrogen,
The ratio of argon gas and nitrogen is 1:1.14, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 40~50nm；；
2), for the control of film plating layer overall thickness between 246-318nm, sputtering chamber is driven walking speed control in 4.0-5.0m/min.
Need special emphasis be in the sputtering process of Nicr target, it is thin under low partial pressure of oxygen compared with the condition of straight argon
Residual compressive stress in film will increase (critical section is in 0.1%-0.9%O2), and the remnants under high partial pressure of oxygen in film
Compression will reduce, and residual compressive stress, which reduces, to be conducive to improve film crystal grain quality, reduces the defects of film, and that improves film can
Light-exposed transmitance.In addition, NicrOx in the production of subsequent tempering, can be combined into alloy to avoid with Ag layers, improve close to film
The adsorption capacity of layer.Secondly the silver in Ag base Low emissivity film layer usually as functional layer is easiest to the oxidation that is corroded, in workshop
In resistance to oxidation experiment, the silver layer oxidation often caused by part thoroughly destroys so as to cause film layer structure, and then appearance is dotted very
To blocky demoulding.And can also will appear silver layer complete oxidation sometimes in the tempering experiment of steel membrane system, lead to asking for color change
Topic；To further increase film layer oxidation resistent susceptibility, silver layer is made superficial oxidation occur in sputtering process, guarantees silver layer up-down structure
It is not destroyed, surface smoothness is good, had so not only maintained low radiance but also had improved oxidation resistance.
In above-mentioned one kind thoroughly grey can in steel double-silver low-emissivity coated glass, described 4th layer between 4 and layer 55,
SiNx layer is equipped between 9th layer 9 and the tenth layer 10.
When being equipped with SiNx layer between the 4th layer between 4 and layer 55, the 9th layer 9 and the tenth layer 10, for its Low emissivity
Magnetron sputtering (i.e. step B, step G and step L) condition of functional layer can be adjusted accordingly, and process gas should be changed to straight argon
Gas, and other conditions are constant.
Specific embodiment described herein is only an example for the spirit of the invention.The neck of technology belonging to the present invention
The technical staff in domain can make various modifications or additions to the described embodiments or replace by a similar method
In generation, however, it does not deviate from the spirit of the invention or beyond the scope of the appended claims.
Claims (3)
1. a kind of high light blue bendable steel Three-silver-layer low-radiation coated glass, which is characterized in that this coated glass includes glass base
Lamella (G) and film plating layer, the film plating layer are successively compounded with 15 film layers outward from the glass substrate layer (G), wherein the
One layer (1) is the first dielectric layer, and the second layer (2) is low radiation functions layer, and third layer (3) and the 4th layer (4) stop for first
Protective layer, layer 5 (5) and layer 6 (6) be the second dielectric layer, layer 7 (7) be low radiation functions layer, the 8th layer (8) and
9th layer (9) is the second block protective layer, and the tenth layer (10) and eleventh floor (11) are third dielectric layer, Floor 12 (12)
For low radiation functions layer, the 13rd layer (13) and the 14th layer (14) is third block protective layer, and the 15th layer (15) is the 4th
Dielectric layer；The first layer (1) is SiNx layer, and the second layer (2) is Ag layers, NiCrOx layers of the third layer (3), described the
Four layers (4) are AZO layers, and the layer 5 (5) is ZnSnOx layers, and the layer 6 (6) is ZnAlO layers, and the layer 7 (7) is
Ag layers, described 8th layer (8) are NiCrOx layers, and described 9th layer (9) are AZO layers, and the described ten layer (10) is ZnSnOx layers, institute
Stating eleventh floor (11) is ZnAlO layers, and the Floor 12 (12) is Ag layers, and described 13rd layer (13) are NiCrOx layers, institute
Stating the 14th layer (14) is AZO layers, and described 15th layer (15) are SiNx layer.
2. a kind of high light blue bendable steel Three-silver-layer low-radiation coated glass according to claim 1, which is characterized in that described
Between 4th layer (4) and layer 5 (5), SiNx layer is equipped between the 9th layer (9) and the tenth layer (10).
3. a kind of method for preparing high light blue bendable steel Three-silver-layer low-radiation coated glass thoroughly as described in claim 1, special
Sign is, includes the following steps:
1), magnetron sputtering film layer；
A, magnetron sputtering first layer (1):
Target quantity: exchange rotary target 3~4；Target is configured to sial (SiAl)；Process gas ratio: argon gas and nitrogen, argon
The ratio of gas and nitrogen is 1:1.14, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~25nm；
B, the magnetron sputtering second layer (2):
Target quantity: direct current planar target 1；Target configures silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas and oxygen
Ratio be 100:1, sputtering pressure be 2~3 × 10-3mbar；Coating film thickness is 2~3nm；
C, magnetron sputtering third layer (3):
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3nm；
D, the 4th layer of magnetron sputtering (4):
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: pure argon, sputtering pressure be 3~5 ×
10-3mbar；Coating film thickness is 2~3nm；
E, magnetron sputtering layer 5 (5)；
E, magnetron sputtering layer 5 (5):
Target quantity: exchange rotary target 4~5；Target is configured to zinc-tin (ZnSn)；Process gas ratio: argon gas and oxygen, argon
The ratio of gas and oxygen is 1:2, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
F, magnetron sputtering layer 6 (6):
Target quantity: exchange rotary target 2~3；Target is configured to zinc-aluminium (ZnAl)；Process gas ratio: argon gas and oxygen, argon
The ratio of gas and nitrogen is 1:2, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20~30nm；
G, magnetron sputtering layer 7 (7):
Target quantity: direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas and oxygen
The ratio of gas is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 5.6~5.8nm；
H, the 8th layer of magnetron sputtering (8):
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2.8~3.0nm；
I, the 9th layer of magnetron sputtering (9):
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: pure argon；Sputtering pressure be 3~5 ×
10-3mbar；Coating film thickness is 2~3nm；
J, the tenth layer of magnetron sputtering (10):
Target quantity: exchange rotary target 4~6；Target is configured to zinc-tin (ZnSn)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 1:2；Sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 20nm；
K, magnetron sputtering eleventh floor (11):
Target quantity: exchange rotary target 4~5；Target is configured to zinc-tin (ZnSn)；Process gas: argon gas and oxygen, argon gas and
The ratio of oxygen is 1:2；Sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3nm；
L, magnetron sputtering Floor 12 (12):
Target quantity: direct current planar target 1；Target is configured to silver-colored (Ag)；Process gas ratio: argon gas and oxygen, argon gas and oxygen
The ratio of gas is 100:1, and sputtering pressure is 2~3 × 10-3mbar；Coating film thickness is 2.3~3.0nm；
I, the 13rd layer of magnetron sputtering (13):
Target quantity: exchange rotary target 1；Target is configured to nickel chromium triangle (NiCr)；Process gas ratio: argon gas and oxygen, argon gas
Ratio with oxygen is 100:1, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 2~3.0nm；
J, the 14th layer of magnetron sputtering (14):
Target quantity: exchange rotary target 1；Target is configured to AZO；Process gas ratio: straight argon, sputtering pressure be 3~5 ×
10-3mbar；Coating film thickness is 2~3.0nm；
K, the 14th layer of magnetron sputtering (14):
Target quantity: exchange rotary target 1；Target is configured to sial (SiAl)；Process gas ratio: argon gas and nitrogen, argon gas
Ratio with nitrogen is 1:1.14, and sputtering pressure is 3~5 × 10-3mbar；Coating film thickness is 40~50nm；；
2), for the control of film plating layer overall thickness between 246-318nm, sputtering chamber is driven walking speed control in 4.0-5.0m/min.
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| CN114634314A (en) * | 2022-03-21 | 2022-06-17 | 新福兴玻璃工业集团有限公司 | Functional temperable low-emissivity coated glass and preparation method thereof |
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