CN210656698U - High-transmittance light blue bendable steel three-silver low-emissivity coated glass - Google Patents
High-transmittance light blue bendable steel three-silver low-emissivity coated glass Download PDFInfo
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Abstract
The utility model provides a high-transmittance light blue bendable steel three-silver low-emissivity coated glass, belonging to the technical field of magnetron sputtering coating; the utility model provides a high-transmittance light blue bendable steel three silver low-emissivity coated glass, includes glass substrate layer and coating film layer, the coating film layer from glass substrate layer outwards has compounded fifteen retes in proper order, wherein the first layer is first dielectric layer, the second floor is the low-emissivity functional layer, third layer and fourth layer are first barrier protection layer, fifth layer and sixth layer are the second dielectric layer, the seventh layer is the low-emissivity functional layer, eighth layer and ninth layer are the second barrier protection layer, tenth layer and eleventh layer are the third dielectric layer, the twelfth layer is the low-emissivity functional layer, thirteenth layer and fourteenth layer are the third barrier protection layer, the fifteenth layer is the fourth dielectric layer. The glass of the utility model has the advantages of high transmittance, oxidation resistance and the like.
Description
Technical Field
The utility model belongs to the technical field of magnetron sputtering coating film, concretely relates to high-transparency light blue bendable steel three-silver low-emissivity coated glass.
Background
As an excellent building material, glass has the functions of light transmission, ultraviolet protection and wind and snow protection due to good permeability, and is widely applied to buildings. With the development of modern technology level, glass is endowed with various new connotations, wherein the low-E glass is widely applied to the field of building curtain walls by virtue of beautiful and elegant color, better texture and excellent energy-saving characteristic. The Low-E glass is also called Low-emissivity glass, and a magnetron sputtering method is commonly used to deposit a nano film layer on the surface of a glass substrate, so that the optical, electrical, mechanical and chemical properties of the glass are changed, and the purposes of decoration, energy conservation, environmental protection and the like are achieved.
As an energy-saving building material, compared with common glass and heat reflection coated glass, the Low-E glass has the energy-saving characteristic of Low-E glass, and has extremely high reflectivity to far infrared radiation. Under the effect of effectively reducing indoor and outdoor heat transfer, the indoor temperature is kept stable, the energy consumption of heating or refrigerating a building is reduced, and very excellent energy-saving and consumption-reducing effects are achieved. The steel-capable film system is suitable for large-area production, has the most efficient production flow at present, and can be subjected to subsequent cutting, grinding, steel clamping and other process processing, so that the steel-capable film system is widely concerned and becomes a great trend of development of low-E glass in the future, but the steel-capable single-silver film system is relatively mature in technology, the steel-capable three-silver film system still has a relatively large technical blank, and the mature film system is relatively few and is mostly concentrated in the middle-low transmittance field.
The prior art has the following disadvantages:
1) the transmittance of the existing steel-able three-silver low-emissivity coated glass is low (lower than 50 percent), and the requirement of customers is difficult to meet.
2) The existing steel-available three-silver film system is often unclear in outdoor color, dark green, bright yellow and the like in indoor color, and has larger difference with outdoor color.
3) The existing steel-available three-silver film system often has insufficient alloy or film bonding force in subsequent production.
SUMMERY OF THE UTILITY MODEL
The utility model aims at the above-mentioned problem that prior art exists, provide a high transparent light blue bendable steel three silver low-emissivity coated glass and preparation method, the utility model discloses the technical problem that will solve is how to improve coated glass transmissivity, oxidation resistance through the design on coating film layer.
The purpose of the utility model can be realized by the following technical proposal: the utility model provides a high-transmittance light blue bendable steel three silver low-emissivity coated glass, its characterized in that, this coated glass includes glass substrate layer and coating film layer, the coating film layer from glass substrate layer outwards has compounded fifteen retes in proper order, and wherein the first layer is first dielectric layer, and the second floor is the low-emissivity functional layer, and third layer and fourth layer are first barrier protection layer, and fifth layer and sixth layer are the second dielectric layer, and the seventh layer is the low-emissivity functional layer, and eighth layer and ninth layer are the second barrier protection layer, and tenth layer and eleventh layer are the third dielectric layer, and the twelfth layer is the low-emissivity functional layer, and the thirteenth layer and fourteenth layer are the third barrier protection layer, and the fifteenth layer is the fourth dielectric layer.
In the above medium-transparent gray temperable double-silver low-emissivity coated glass, the first layer is SiNxA second layer of Ag and a third layer of NiCrOxThe fourth layer is an AZO layer, and the fifth layer is ZnSnOxThe sixth layer is a ZnAlO layer, the seventh layer is an Ag layer, and the eighth layer is NiCrOxA ninth layer of AZO and a tenth layer of ZnSnOxThe eleventh layer is a ZnAlO layer, the twelfth layer is an Ag layer, and the thirteenth layer is NiCrOxA fourteenth layer of AZO and a fifteenth layer of SiNxAnd (3) a layer.
Due to SiNxThe layer has excellent wear resistance, so that SiN is used as the initial layer (i.e., the first layer) and the final layer (i.e., the fifth layer) of the whole film systemxThe AZO layer has the characteristic of high visible light transmittance, so that the coated glass has the transmittanceGreatly improves the quality.
In the high-transmittance light blue bendable steel three-silver low-emissivity coated glass, the preparation method comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 multiplied by 10-3mbar; the thickness of the coating film is 20-25 nm;
B. magnetron sputtering the second layer:
the number of the targets is as follows: 1 direct current plane target; silver (Ag) is configured in the target material; the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, and a sputtering pressure of 2-3 × 10-3mbar; the thickness of the coating film is 2-3 nm;
C. magnetron sputtering the third layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 2-3 nm;
D. magnetron sputtering the fourth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon with sputtering pressure of 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3 nm; E. performing magnetron sputtering on the fifth layer;
E. performing magnetron sputtering on a fifth layer:
the number of the targets is as follows: 4-5 alternating current rotary targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 20-30 nm;
F. magnetron sputtering a sixth layer:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 20～30nm；
G. Magnetron sputtering a seventh layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, and a sputtering pressure of 2-3 × 10-3mbar; the thickness of the plated film is 5.6-5.8 nm;
H. magnetron sputtering an eighth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, and sputtering pressure of 3-5 × 10-3mbar; the thickness of the coating film is 2.8-3.0 nm;
I. magnetron sputtering the ninth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon gas; sputtering pressure of 3 to 5 × 10-3mbar; the thickness of the coating film is 2-3 nm;
J. magnetron sputtering the tenth layer:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas ratio is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure of 3 to 5 × 10-3mbar; the thickness of the coating film is 20 nm;
K. magnetron sputtering the eleventh layer:
the number of the targets is as follows: 4-5 alternating current rotary targets; the target material is configured to be zinc tin (ZnSn); process gas: argon and oxygen in a ratio of 1: 2; sputtering pressure of 3 to 5 × 10-3mbar; the thickness of the coating film is 2-3 nm;
l, magnetron sputtering a twelfth layer:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 2-3 x 10 < -3 > mbar; the thickness of the coating film is 2.3-3.0 nm;
I. magnetron sputtering the thirteenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3.0 nm;
J. performing magnetron sputtering on the fourteenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon with sputtering pressure of 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3.0 nm;
K. performing magnetron sputtering on the fourteenth layer:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 40-50 nm; (ii) a
2) The total thickness of the coating layer is controlled between 246 nm and 318nm, and the transmission running speed of the sputtering chamber is controlled between 4.0 m/min and 5.0 m/min.
It is particularly emphasized that during sputtering of the Nicr target, the residual compressive stress in the thin film will increase (critical range between 0.1% and 0.9% O2) at low oxygen partial pressure compared to pure argon, while the residual compressive stress in the thin film will decrease at high oxygen partial pressure, which is beneficial to improve the grain quality of the thin film, reduce defects in the thin film, and improve the visible light transmittance of the thin film. In addition, NicroxIn the subsequent toughening production, the Ag layer can be prevented from being combined into alloy, and the adsorption force of the adjacent film layer is improved. Secondly, silver which is generally used as a functional layer in the Ag-based low-radiation film layer is most easily corroded and oxidized, and in a workshop oxidation resistance experiment, the film layer structure is usually thoroughly destroyed due to partial silver layer oxidation, so that punctiform or even massive demoulding occurs. In a toughening experiment of a steel film system, the problem of color mutation caused by complete oxidation of a silver layer sometimes occurs; in order to further improve the oxidation resistance of the film layer, the surface layer of the silver layer is oxidized in the sputtering process, the upper and lower structures of the silver layer are not damaged, the surface smoothness is good, and thus the low-radiation performance is maintained and the oxidation resistance is improved.
In the intermediate-transmission gray temperable double-silver low-emissivity coated glass, SiN is arranged between the fourth layer and the fifth layer and between the ninth layer and the tenth layerxAnd (3) a layer.
When the SiNx layer is arranged between the fourth layer and the fifth layer and between the ninth layer and the tenth layer, the magnetron sputtering (namely, the step B, the step G and the step L) conditions of the low-radiation functional layer can be correspondingly adjusted, the process gas strain is more pure argon, and other conditions are not changed.
The utility model discloses the advantage:
1. the 6mm single sheet transmittance T of the product of the patent technology belongs to [ 70% -75% ].
2. The glass surface is light blue, wherein the transmission colors are a from the element to the element-5 and-6, b from the element to the element [2.59 and 2.8 ]; glass surface color a E [0.6, 1.0], b E [ 5, -7 ]; the film surface color a belongs to [15, 16], b belongs to [ 23.5, -23.0 ]; the glass surface small angle color a E [ -0.1,0], b E [ -3.8, -3.5 ].
3. The processing technology of subsequent cutting, grinding, steel, interlayer and the like can be carried out, the large-area production is convenient to realize, and the problems of difficult scratching, oxidation and the like in the long-term transportation and storage processes can be ensured.
Drawings
FIG. 1 is a schematic view of the layered structure of the high-transmittance neutral-color double-silver low-emissivity coated glass.
In the figure, G, a glass substrate layer; 1. a first layer; 2. a second layer; 3. a third layer; 4. a fourth layer; 5. a fifth layer; 6. a sixth layer; 7. a seventh layer; 8. an eighth layer; 9. a ninth layer; 10. a tenth layer; 11. the eleventh layer; 12. a twelfth layer; 13. a thirteenth layer; 14. a fourteenth layer; 15. a fifteenth layer; A. SiN between the fourth layer and the fifth layerxA layer; B. SiN between the ninth layer and the tenth layerxAnd (3) a layer.
Detailed Description
The following are specific embodiments of the present invention and the accompanying drawings are used to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.
As shown in fig. 1, a high-transmittance light blue bendable steel three-silver low-emissivity coated glass comprises a glass substrate layer G and a coated layer, wherein fifteen film layers are sequentially compounded on the coated layer from the glass substrate layer G to the outside, wherein the first layer 1 is a first dielectric layer, the second layer 2 is a low-emissivity functional layer, the third layer 3 and the fourth layer 4 are first barrier protective layers, the fifth layer 5 and the sixth layer 6 are second dielectric layers, the seventh layer 7 is a low-emissivity functional layer, the eighth layer 8 and the ninth layer 9 are second barrier protective layers, the tenth layer 10 and the eleventh layer 11 are third dielectric layers, the twelfth layer 12 is a low-emissivity functional layer, the thirteenth layer 13 and the fourteenth layer 14 are third barrier protective layers, and the fifteenth layer 15 is a fourth dielectric layer.
The first layer 1 is a SiNx layer, the second layer 2 is an Ag layer, the third layer 3 is a NiCrOx layer, the fourth layer 4 is an AZO layer, the fifth layer 5 is a ZnSnOx layer, the sixth layer 6 is a ZnAlO layer, the seventh layer 7 is an Ag layer, the eighth layer 8 is a NiCrOx layer, the ninth layer 9 is an AZO layer, the tenth layer 10 is a ZnSnOx layer, the eleventh layer 11 is a ZnAlO layer, the twelfth layer 12 is an Ag layer, the thirteenth layer 13 is a NiCrOx layer, the fourteenth layer 14 is an AZO layer, and the fifteenth layer 15 is a SiNx layer.
Because the SiNx layer has excellent abrasion resistance, the SiNx layer is adopted as the initial layer (i.e. the first layer 1) and the finishing layer (i.e. the fifteenth layer 15) of the whole film system, and the AZO layer has the characteristic of high visible light transmittance, so that the transmittance of the coated glass is greatly improved.
In the high-transmittance light blue bendable steel three-silver low-emissivity coated glass, the preparation method comprises the following steps:
1) forming a magnetron sputtering coating layer;
A. magnetron sputtering of the first layer 1:
the number of the targets is as follows: 3-4 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-25 nm;
B. magnetron sputtering of the second layer 2:
the number of the targets is as follows: 1 direct current plane target; silver (Ag) is configured in the target material; the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 2-3 x 10 < -3 > mbar; the thickness of the coating film is 2-3 nm;
C. magnetron sputtering of the third layer 3:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3 nm;
D. magnetron sputtering of the fourth layer 4:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon with sputtering pressure of 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3 nm; E. magnetron sputtering a fifth layer 5;
E. magnetron sputtering of the fifth layer 5:
the number of the targets is as follows: 4-5 alternating current rotary targets; the target material is configured to be zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-30 nm;
F. magnetron sputtering the sixth layer 6:
the number of the targets is as follows: 2-3 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:2, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 20-30 nm;
G. magnetron sputtering of the seventh layer 7:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 2-3 x 10 < -3 > mbar; the thickness of the plated film is 5.6-5.8 nm;
H. magnetron sputtering the eighth layer 8:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2.8-3.0 nm;
I. magnetron sputtering the ninth layer 9:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon gas; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the coating film is 2-3 nm;
J. magnetron sputtering the tenth layer 10:
the number of the targets is as follows: 4-6 alternating-current rotating targets; the target material is configured to be zinc tin (ZnSn); the process gas ratio is as follows: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the coating film is 20 nm;
K. magnetron sputtering the eleventh layer 11:
the number of the targets is as follows: 4-5 alternating current rotary targets; the target material is configured to be zinc tin (ZnSn); process gas: argon and oxygen in a ratio of 1: 2; sputtering pressure is 3-5 multiplied by 10 < -3 > mbar; the thickness of the coating film is 2-3 nm;
l, magnetron sputtering a twelfth layer 12:
the number of the targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 2-3 x 10 < -3 > mbar; the thickness of the coating film is 2.3-3.0 nm;
I. magnetron sputtering the thirteenth layer 13:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas proportion is as follows: argon and oxygen in a ratio of 100:1, wherein the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3.0 nm;
J. magnetron sputtering the fourteenth layer 14:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to AZO; the process gas proportion is as follows: pure argon with sputtering pressure of 3-5 x 10 < -3 > mbar; the thickness of the coating film is 2-3.0 nm;
K. magnetron sputtering the fourteenth layer 14:
the number of the targets is as follows: 1 alternating current rotating target; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:1.14, and the sputtering pressure is 3-5 x 10 < -3 > mbar; the thickness of the coating film is 40-50 nm; (ii) a
2) The total thickness of the coating layer is controlled between 246 nm and 318nm, and the transmission running speed of the sputtering chamber is controlled between 4.0 m/min and 5.0 m/min.
It is particularly emphasized that during sputtering of the Nicr target, the residual compressive stress in the thin film will increase (critical range between 0.1% and 0.9% O2) at low oxygen partial pressure compared to pure argon, while the residual compressive stress in the thin film will decrease at high oxygen partial pressure, which is beneficial to improve the grain quality of the thin film, reduce defects in the thin film, and improve the visible light transmittance of the thin film. In addition, Nicrox can be prevented from being combined with an Ag layer to form alloy in the subsequent tempering production, and the adsorption force of the adjacent film layer is improved. Secondly, silver which is generally used as a functional layer in the Ag-based low-radiation film layer is most easily corroded and oxidized, and in a workshop oxidation resistance experiment, the film layer structure is usually thoroughly destroyed due to partial silver layer oxidation, so that punctiform or even massive demoulding occurs. In a toughening experiment of a steel film system, the problem of color mutation caused by complete oxidation of a silver layer sometimes occurs; in order to further improve the oxidation resistance of the film layer, the surface layer of the silver layer is oxidized in the sputtering process, the upper and lower structures of the silver layer are not damaged, the surface smoothness is good, and thus the low-radiation performance is maintained and the oxidation resistance is improved.
In the intermediate-transmission gray steel double-silver low-emissivity coated glass, the SiNx layer is arranged between the fourth layer 4 and the fifth layer 5, and between the ninth layer 9 and the tenth layer 10.
When the SiNx layer is arranged between the fourth layer 4 and the fifth layer 5 and between the ninth layer 9 and the tenth layer 10, the magnetron sputtering (i.e. step B, step G and step L) conditions of the low-emissivity functional layer can be adjusted accordingly, the process gas strain is more pure argon, and other conditions are not changed.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications, additions and substitutions for the specific embodiments described herein may be made by those skilled in the art without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
Claims (2)
1. A high-transmittance light blue bendable steel three-silver low-emissivity coated glass is characterized by comprising a glass substrate layer (G) and a coating layer, fifteen film layers are compounded on the film coating layer from the glass substrate layer (G) to the outside in sequence, the first layer (1) is a first dielectric layer, the second layer (2) is a low-radiation functional layer, the third layer (3) and the fourth layer (4) are first blocking protective layers, the fifth layer (5) and the sixth layer (6) are second dielectric layers, the seventh layer (7) is a low-radiation functional layer, the eighth layer (8) and the ninth layer (9) are second blocking protective layers, the tenth layer (10) and the eleventh layer (11) are third dielectric layers, the twelfth layer (12) is a low-radiation functional layer, the thirteenth layer (13) and the fourteenth layer (14) are third blocking protective layers, and the fifteenth layer (15) is a fourth dielectric layer; the solar cell comprises a first layer (1), a second layer (2), a third layer (3), a NiCrOx layer, a fourth layer (4), a fifth layer (5), a ZnSnOx layer, a sixth layer (6), a ZnAlO layer, a seventh layer (7), an Ag layer, an eighth layer (8), a NiCrOx layer, a ninth layer (9), a tenth layer (10), a ZnSnOx layer, a eleventh layer (11), a twelfth layer (12), an Ag layer, a thirteenth layer (13), a NiCrOx layer, a fourteenth layer (14), an AZO layer and a fifteenth layer (15), wherein the first layer (1) is a SiNx layer, the fourth layer (4) is an AZO layer, the ninth layer (9) is an AZnOx layer, the tenth layer (10) is a ZnSnOx layer, the eleventh layer (11) is a ZnAlO layer, the twelfth layer (12) is an Ag layer, the thirteenth layer (13).
2. The high-transmittance light blue bendable steel three-silver low-emissivity coated glass according to claim 1, characterized in that a SiNx layer is arranged between the fourth layer (4) and the fifth layer (5) and between the ninth layer (9) and the tenth layer (10).
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| CN110510891A (en) * | 2019-09-24 | 2019-11-29 | 咸宁南玻节能玻璃有限公司 | A kind of high light blue bendable steel Three-silver-layer low-radiation coated glass and preparation method |
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| CN110510891A (en) * | 2019-09-24 | 2019-11-29 | 咸宁南玻节能玻璃有限公司 | A kind of high light blue bendable steel Three-silver-layer low-radiation coated glass and preparation method |
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