CN212559993U - High-transmittance low-reflection steel three-silver low-emissivity glass - Google Patents
High-transmittance low-reflection steel three-silver low-emissivity glass Download PDFInfo
- Publication number
- CN212559993U CN212559993U CN202021046077.XU CN202021046077U CN212559993U CN 212559993 U CN212559993 U CN 212559993U CN 202021046077 U CN202021046077 U CN 202021046077U CN 212559993 U CN212559993 U CN 212559993U
- Authority
- CN
- China
- Prior art keywords
- layer
- low
- azo
- dielectric layer
- glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
The utility model discloses a high anti-three silver low-emissivity glass that can steel of passing through low, high anti-three silver low-emissivity glass that can steel of passing through low includes the glass substrate and plates the compound rete of establishing on the glass substrate, compound rete comprises the first dielectric layer, first AZO layer, first functional layer, second AZO layer, second dielectric layer, third AZO layer, second functional layer, fourth AZO layer, third dielectric layer, fifth AZO layer, third functional layer, sixth AZO layer, fourth dielectric layer, the outermost protective layer that sets gradually on the glass substrate, first dielectric layer and fourth dielectric layer are SiNxA layer, the second dielectric layer andthe third dielectric layer is ZnOxAnd the first functional layer, the second functional layer and the third functional layer are Ag layers. The glass product of the utility model has the advantages of low reflectivity, high transmittance, low radiation, good mechanical property and the like.
Description
Technical Field
The utility model relates to a but three silver low-emissivity glass of steel make technical field, in particular to but three silver low-emissivity glass of high transparent low reflection steel.
Background
With the advancement of technology and the increase of economic level, glass becomes an indispensable component in the building and automobile industries, and has a lot of important functions, such as: beautify buildings, meet the requirements of automobile appearance and lighting, bring a wide visual field to the interior, and the like. However, the solar transmittance of ordinary glass is high, the infrared reflectance is low, and most of solar energy and radiation energy can be transmitted through the glass, so that the heat insulation performance is poor. The Low-Emissivity (Low-E) film has a high reflection effect on solar energy, so that the heat transfer coefficient of the Low-E glass is greatly reduced, and the heat insulation performance of the glass is effectively improved.
However, the existing LOW-E glass has a plurality of defects due to the unreasonable structural design of a film system: the visible light transmittance is low; the transmitted color is heavier; the reflectivity is higher; the machinability is poor.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a high low anti-three silver low emissivity glass of steel that passes through aims at solving current low emissivity glass and has that visible light transmission is low, the colour of permeating is heavy, the reflectivity is high, machining performance is poor scheduling problem.
The embodiment of the utility model provides a high anti-three silver low-emissivity glass of steel that pass through lowly, it includes the glass substrate and plates the compound rete of establishing on the glass substrate, compound rete is by first dielectric layer, first AZO layer, first functional layer, second AZO layer, second dielectric layer, third AZO layer, second AZO layer that set gradually on the glass substrateThe first and the fourth dielectric layers are SiNxThe second dielectric layer and the third dielectric layer are ZnOxAnd the first functional layer, the second functional layer and the third functional layer are Ag layers.
Further, the outermost protective layer is a SiC layer.
Further, the thickness of the SiC layer is 5-8 nm.
Furthermore, the thickness of the first dielectric layer is 20-30 nm, and the thickness of the fourth dielectric layer is 20-45 nm.
Furthermore, the thickness of the second dielectric layer is 57-67 nm.
Furthermore, the thickness of the third dielectric layer is 65-75 nm.
Furthermore, the thickness of the first functional layer is 5-9 nm, the thickness of the second functional layer is 8-13 nm, and the thickness of the third functional layer is 10-15 nm.
Furthermore, the thicknesses of the first AZO layer, the second AZO layer, the third AZO layer, the fourth AZO layer, the fifth AZO layer and the sixth AZO layer are all 1-5 nm.
Furthermore, the refractive index ranges of the first dielectric layer and the fourth dielectric layer are both 1.74-1.98.
Furthermore, the refractive index ranges of the second medium layer and the third medium layer are both 1.9-2.
The embodiment of the utility model provides a high anti-three silver low-emissivity glass that can steel of passing through low, high anti-three silver low-emissivity glass that can steel of passing through low includes the glass substrate and plates the compound rete of establishing on the glass substrate, compound rete comprises the first dielectric layer, first AZO layer, first functional layer, second AZO layer, second dielectric layer, third AZO layer, second functional layer, fourth AZO layer, third dielectric layer, fifth AZO layer, third functional layer, sixth AZO layer, fourth dielectric layer, the outermost protective layer that sets gradually on the glass substrate, first dielectric layer and fourth dielectric layer are SiNxA layer, the second dielectric layer and a third dielectric layerIs ZnOxAnd the first functional layer, the second functional layer and the third functional layer are Ag layers. The embodiment of the utility model provides an optimize and improve the membrane system structure, adopt SiNxThe AZO layer is used as a protective dielectric layer, the Ag layer is used as a core functional layer of the Low-E glass, and the ZnO layer is used as a first dielectric layer and a fourth dielectric layerxAs the seed layer, the prepared glass product has the advantages of low reflectivity, high transmittance, low radiation, good mechanical property and the like.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without any creative effort.
Fig. 1 is a schematic structural view of a high-transmittance low-reflection tempered three-silver low-emissivity glass provided by an embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, of the embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
It will be understood that the terms "comprises" and/or "comprising," when used in this specification and the appended claims, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
It is also to be understood that the terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in the specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be further understood that the term "and/or" as used in the specification and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes such combinations.
Referring to fig. 1, an embodiment of the present invention provides a high-transmittance low-reflectivity steel three-silver low-emissivity glass, which includes a glass substrate 101 and a composite film layer plated on the glass substrate 101, wherein the composite film layer includes a first dielectric layer 102, a first AZO layer 103, a first functional layer 104, a second AZO layer 105, a second dielectric layer 106, a third AZO layer 107, a second functional layer 108, a fourth AZO layer 109, a third dielectric layer 110, a fifth AZO layer 111, a third functional layer 112, a sixth AZO layer 113, a fourth dielectric layer 114, and an outermost protective layer 115, and the first dielectric layer 102 and the fourth dielectric layer 114 are SiNxThe second dielectric layer 106 and the third dielectric layer 110 are ZnOxThe first functional layer 104, the second functional layer 108, and the third functional layer 112 are Ag layers.
In the film system structure of glass provided by the embodiment of the utility model, SiNxAs the first dielectric layer 102 functioning as a base film, SiNxAs the fourth dielectric layer 114 functioning as a top film, SiN is usedxThe material can improve the hardness of the film layer, prevent sodium ions in the glass substrate from diffusing into the film system to damage the Ag layer during high-temperature tempering, so that the whole film system has better heat resistance and better machining performance under a high-temperature condition, and the phenomenon that the three-silver LOW-E glass film layer is softer is improved. Further, the thickness of the first dielectric layer 102 is 20 to 30nm, and the thickness of the fourth dielectric layer 114 is 20 to 45 nm. The glass can be further improved in the machining performance and the heat resistance by adopting the thickness. Furthermore, the refractive index of the first dielectric layer 102 and the refractive index of the fourth dielectric layer 114 are both in the range of 1.74-1.98, and in this range, the final refractive index can be achievedThe prepared glass product has better machining performance and heat resistance.
The first AZO layer 103, the second AZO layer 105, the third AZO layer 107, the fourth AZO layer 109, the fifth AZO layer 111 and the sixth AZO layer 113 are made of AZO materials (Al is doped in a ZnO system to obtain ZnO: Al), the AZO layers are used as protective dielectric layers, the AZO layers have a good oxygen isolation effect, can well protect functional layer silver elements, and meanwhile can be more beneficial to surface color control of the three-silver LOW-E glass by controlling the thickness of the AZO layers, so that the surface color cast problem is avoided. In the embodiment of the utility model provides an in, first AZO layer 103, second AZO layer 105, third AZO layer 107, fourth AZO layer 109, fifth AZO layer 111, sixth AZO layer 113's thickness is preferred to be 1 ~ 5nm, control surface color and luster that like this can be better.
The first functional layer 104, the second functional layer 108 and the third functional layer 112 are made of Ag materials, the three functional layers are used as core functional layers of the three-silver LOW-E glass, the effects of environmental protection and energy conservation are achieved, and the metal Ag provides LOW radiance. Preferably, the thicknesses of the first functional layer 104, the second functional layer 108 and the third functional layer 112 are gradually increased, for example, the thickness of the first functional layer 104 is 5 to 9nm, the thickness of the second functional layer 108 is 8 to 13nm, and the thickness of the third functional layer 112 is 10 to 15nm, so that the emissivity can be further improved.
The second dielectric layer 106 and the third dielectric layer 110 both adopt ZnOxThe materials, the second dielectric layer 106 and the third dielectric layer 110, can be used as seed layers to improve the flatness of the film layer and provide a better growth platform for the functional layer, and if the functional layer is deposited on other dielectric film layer materials, the quality of the obtained functional layer will be poor, which will result in the performance degradation of the low-radiation glass. At the same time ZnOxThe extinction coefficient K value is the lowest, ZnO is added into the dielectric layerxThe transmittance of the film layer can be relatively improved, and the visible light reflectivity can be reduced. Furthermore, the thickness of the second dielectric layer 106 is 57-67 nm, and the thickness of the third dielectric layer 110 is 65-75 nm, so that the functional layer can grow better and the quality of the functional layer can be improved. Further, the second dielectric layer 106 and the third dielectric layer 110The refractive index ranges are all 1.9-2, and in the range, the finally prepared glass product can be ensured to have the effects of low radiation, low reflectivity and high transmittance.
The outermost protection layer 115 is a SiC layer, that is, a SiC material is used. The fourth dielectric layer 114 (SiN)x) And the outermost protective layer 115(SiC) as the top dielectric protective material, since these two materials have superior physical properties and chemical resistance. The plated film has strong corrosion resistance, mechanical scratch resistance and high temperature resistance, thereby improving the subsequent processing performance and the service life of the glass product. Preferably, the thickness of the SiC layer is 5-8 nm, so that the performance of the product is further improved.
The embodiment of the utility model provides a preparation method of high transparent low anti-steel three silver low emissivity glass, it includes step S101 ~ S114:
s101, plating a first dielectric layer on the top surface of the glass substrate, wherein the first dielectric layer is SiNxA layer;
s102, plating a first AZO layer on the top surface of the first dielectric layer;
s103, plating a first functional layer on the top surface of the first AZO layer, wherein the first functional layer is an Ag layer;
s104, plating a second AZO layer on the top surface of the first functional layer;
s105, plating a second dielectric layer on the top surface of the second AZO layer, wherein the second dielectric layer is ZnOxA layer;
s106, plating a third AZO layer on the top surface of the second dielectric layer;
s107, plating a second functional layer on the top surface of the third AZO layer, wherein the second functional layer is an Ag layer;
s108, plating a fourth AZO layer on the top surface of the second functional layer;
s109, plating a third dielectric layer on the top surface of the fourth AZO layer, wherein the third dielectric layer is ZnOxA layer;
s110, plating a fifth AZO layer on the top surface of the third dielectric layer;
s111, plating a third functional layer on the top surface of the fifth AZO layer, wherein the third functional layer is an Ag layer;
s112, plating a sixth AZO layer on the top surface of the third functional layer;
s113, plating a fourth dielectric layer on the top surface of the sixth AZO layer, wherein the fourth dielectric layer is SiNxA layer;
and S114, plating an outermost protective layer on the top surface of the fourth dielectric layer, and finally obtaining the high-transmittance low-reflection steel three-silver low-emissivity glass.
In each step, the plating is performed by a magnetron sputtering process.
Further, the magnetron sputtering process comprises the following steps:
the coating chamber is vacuumized to the background vacuum degree of 5 multiplied by 10-4Below Pa, filling process gas, then switching on a sputtering power supply, starting sputtering the target material, and depositing target material atoms or compounds thereof on the surface of the glass when the glass passes through the target material.
The process gas is different for different steps, for example, the process gas may be one of argon, nitrogen, and oxygen.
In addition, the glass enters the vacuum chamber after being cleaned by the cleaning machine, and target atoms or compounds thereof can be deposited on the surface of the glass when passing through the target.
Aiming at the step S101, an alternating current medium-frequency power supply, argon gas as process gas and nitrogen gas as reaction gas are adopted during plating, an SiAl target with the purity of 99.9% is sputtered, and Si: the Al content is 90:10 wt%.
Aiming at the step S102, an alternating current medium frequency power supply and argon are adopted as process gases during plating, an oxide ceramic aluminum-doped zinc oxide target is sputtered, and ZnO in the target material is Al2O3Is 98:2 wt%.
In step S103, a dc power supply and argon gas are used as process gases to sputter Ag.
Aiming at the step S104, an alternating current intermediate frequency power supply and argon are adopted as process gases during plating, an oxide ceramic aluminum-doped zinc oxide target is sputtered, and ZnO in the target material is Al2O3Is 98:2 wt%.
Aiming at the step S105, an alternating current medium-frequency power supply, argon gas as process gas and oxygen gas as reaction gas are adopted during plating, a ZnAl target with the purity of 99.9 percent is sputtered, and the content of Zn in the ZnAl target is as follows: al is 98:2 wt%.
Aiming at the step S106, an alternating current intermediate frequency power supply and argon are adopted as process gases during plating, an oxide ceramic aluminum-doped zinc oxide target is sputtered, and ZnO in the target material is Al2O3Is 98:2 wt%.
In step S107, a dc power supply and argon gas are used as process gases to sputter Ag.
Aiming at the step S108, an alternating current medium frequency power supply and argon are adopted as process gases during plating, an oxide ceramic aluminum-doped zinc oxide target is sputtered, and ZnO in the target material is Al2O3Is 98:2 wt%.
Aiming at the step S109, an alternating current medium frequency power supply, argon gas as process gas and oxygen gas as reaction gas are adopted during plating, a ZnAl target with the purity of 99.9 percent is sputtered, and the content of Zn in the ZnAl target is as follows: al is 98:2 wt%.
Aiming at the step S110, an alternating current medium frequency power supply and argon are adopted as process gases during plating, an oxide ceramic aluminum-doped zinc oxide target is sputtered, and ZnO in the target material is Al2O3Is 98:2 wt%.
And aiming at the step S111, sputtering metal Ag by using a direct current power supply and argon as process gases during plating.
Aiming at the step S112, an alternating current intermediate frequency power supply and argon are adopted as process gases during plating, an oxide ceramic aluminum-doped zinc oxide target is sputtered, and ZnO in the target material is Al2O3Is 98:2 wt%.
Aiming at the step S113, an alternating current medium-frequency power supply, argon gas as process gas and nitrogen gas as reaction gas are adopted during plating, an SiAl target with the purity of 99.9% is sputtered, and Si: the Al content is 90:10 wt%.
Aiming at the step S114, an alternating current medium-frequency power supply and argon are adopted as process gases during plating, a ceramic SiC target with the purity of 99.9% is sputtered, and Si: c is 70:30 wt%; and finally obtaining the high-transmittance low-reflection steel three-silver low-emissivity glass.
Reference is made to the description of the preceding embodiments with regard to the thickness and other aspects of the respective film layers.
The specific embodiment is as follows:
the following film layers were sequentially plated on a 6mm thick glass substrate (white glass) according to the above method: first dielectric layer (SiN)x25.5nm), a first AZO layer (AZO 2nm), a first functional layer (Ag 7.3nm), a second AZO layer (AZO 2nm), a second dielectric layer (ZnO)x62.2nm), a third AZO layer (AZO 2nm), a second functional layer (Ag 10.6nm), a fourth AZO layer (AZO 2nm), and a third dielectric layer (ZnO)x70.3nm), a fifth AZO layer (AZO 2nm), a third functional layer (Ag 12.76nm), a sixth AZO layer (AZO 2nm), and a fourth dielectric layer (SiN)x30.3nm) and an outermost protective layer (SiC 6.8nm), the color before tempering is shown in table 1, and the color after tempering is shown in table 2. In table 1, "glass surface before tempering" refers to a surface of the prepared low-emissivity glass that is not coated before tempering, "membrane surface before tempering" refers to a surface of the prepared low-emissivity glass that is coated before tempering, "transmission before tempering" refers to a visible light transmittance (color is transmitted, for example, a colorless or white object is seen through the coated glass, the object will appear color) of the prepared low-emissivity glass before tempering, and "side surface before tempering" refers to a side surface of the prepared low-emissivity glass before tempering. Where R denotes the visible light reflectance and g is the abbreviation for glass, here glass, for example: r% g refers to the visible reflectance of the glass side, f is an abbreviation for film, here the film side, for example: r% f refers to the visible light reflectance of the film surface, T refers to the visible light transmittance, c refers to the side surface, for example: r% c refers to the visible light reflectivity of the side face, L is the metric lightness and the size is between 0 and 100; and a, b, axis is yellow-blue axis, and positive is yellow and negative is blue. Correspondingly, the data in table 2 are all the test data after tempering.
TABLE 1
| Toughened glass surface | R％g | L*g | a*g | b*g |
| 6.77 | 31.28 | -2.38 | -6.37 | |
| Film surface before tempering | R％f | L*f | a*f | b*f |
| 5.04 | 26.84 | -2.03 | -9.14 | |
| Penetration before tempering | T | L*t | a*t | b*t |
| 73.54 | 88.71 | -4.87 | 0.42 | |
| Toughened front side | R％c | L*c | a*c | b*c |
| 11.28 | 40.05 | -0.16 | -5.9 |
TABLE 2
The emissivity of the single piece of low emissivity glass prior to tempering is 0.035; after tempering, the emissivity of the single piece of low emissivity glass is 0.032.
According to GB9656-2003, the toughened film layer is wiped without demoulding, and an impact experiment, an irradiation resistance experiment, a damp-heat cycle experiment and the like can meet the requirements. The detection result shows that the knocking experiment grade is 4.
The low-emissivity glass prepared by the embodiment has greatly improved sunlight performance, and can reduce the reflectivity to a low value, namely the heat transfer coefficient to a low value; and it can reduce solar energy and keep high visible light transmission, so the low radiation glass has good selectivity in sunlight property.
The low-emissivity glass prepared by the embodiment of the utility model has high visible light transmittance, and the visible light transmittance of single glass sheet with 6mm after tempering can reach 82%; the low-emissivity glass prepared by the embodiment of the utility model has relatively neutral transmission color, is fresh and natural, and avoids the phenomenon of greenish transmission color; the low-emissivity glass prepared by the embodiment of the utility model has lower visible light reflectivity, the visible light reflectivity of the single glass sheet with 6mm after tempering is lower than 6%, and the light pollution to the environment is small; the embodiment of the utility model provides a low radiation glass of preparation, rete hardness is high, and the heat resistance is good under the high temperature.
The embodiments are described in a progressive manner in the specification, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. It should be noted that, for those skilled in the art, without departing from the principle of the present invention, the present invention can be further modified and modified, and such modifications and modifications also fall within the protection scope of the appended claims.
It is further noted that, in the present specification, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
Claims (10)
1. The high-transmittance low-reflection steel three-silver low-emissivity glass is characterized by comprising glassThe glass substrate and the composite film layer plated on the glass substrate are sequentially arranged on the glass substrate, the composite film layer is composed of a first dielectric layer, a first AZO layer, a first functional layer, a second AZO layer, a second dielectric layer, a third AZO layer, a second functional layer, a fourth AZO layer, a third dielectric layer, a fifth AZO layer, a third functional layer, a sixth AZO layer, a fourth dielectric layer and an outermost protective layer, and the first dielectric layer and the fourth dielectric layer are made of SiNxThe second dielectric layer and the third dielectric layer are ZnOxAnd the first functional layer, the second functional layer and the third functional layer are Ag layers.
2. The high-transmittance low-reflection three-silver low-emissivity glass according to claim 1, wherein the outermost protective layer is a SiC layer.
3. The high-transmittance low-reflection three-silver low-emissivity glass according to claim 2, wherein the thickness of the SiC layer is 5-8 nm.
4. The high-transmittance low-reflection three-silver low-emissivity glass according to claim 1, wherein the thickness of the first dielectric layer is 20-30 nm, and the thickness of the fourth dielectric layer is 20-45 nm.
5. The high-transmittance low-reflection three-silver low-emissivity glass according to claim 1, wherein the thickness of the second dielectric layer is 57-67 nm.
6. The high-transmittance low-reflection three-silver low-emissivity glass according to claim 1, wherein the thickness of the third dielectric layer is 65-75 nm.
7. The high-transmittance low-reflection three-silver low-emissivity glass according to claim 1, wherein the thickness of the first functional layer is 5-9 nm, the thickness of the second functional layer is 8-13 nm, and the thickness of the third functional layer is 10-15 nm.
8. The high-transmittance low-reflectivity steel-type three-silver low-emissivity glass according to claim 1, wherein the thicknesses of the first AZO layer, the second AZO layer, the third AZO layer, the fourth AZO layer, the fifth AZO layer and the sixth AZO layer are all 1-5 nm.
9. The high-transmittance low-reflectivity three-silver low-emissivity glass according to claim 1, wherein the refractive index of each of the first dielectric layer and the fourth dielectric layer is in a range of 1.74-1.98.
10. The high-transmittance low-reflectivity steel-type tri-silver low-emissivity glass according to claim 1, wherein the refractive index of the second dielectric layer and the refractive index of the third dielectric layer are both in the range of 1.9-2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021046077.XU CN212559993U (en) | 2020-06-09 | 2020-06-09 | High-transmittance low-reflection steel three-silver low-emissivity glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202021046077.XU CN212559993U (en) | 2020-06-09 | 2020-06-09 | High-transmittance low-reflection steel three-silver low-emissivity glass |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212559993U true CN212559993U (en) | 2021-02-19 |
Family
ID=74629216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202021046077.XU Active CN212559993U (en) | 2020-06-09 | 2020-06-09 | High-transmittance low-reflection steel three-silver low-emissivity glass |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212559993U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111517669A (en) * | 2020-06-09 | 2020-08-11 | 吴江南玻华东工程玻璃有限公司 | High-transmittance low-reflection steel three-silver low-emissivity glass and preparation method thereof |
-
2020
- 2020-06-09 CN CN202021046077.XU patent/CN212559993U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111517669A (en) * | 2020-06-09 | 2020-08-11 | 吴江南玻华东工程玻璃有限公司 | High-transmittance low-reflection steel three-silver low-emissivity glass and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA3047603C (en) | Low-emissivity coating for a glass substrate | |
| CN108975726B (en) | ultra-LOW reflection toughened LOW-E glass | |
| US10000412B2 (en) | Heat treatable coated glass pane | |
| EP1546055A1 (en) | Heat treatable low-e coated articles and methods of making same by sputtering ag in oxygen inclusive atmosphere | |
| CN111606578B (en) | Temperable low-reflection double-silver low-emissivity coated glass and preparation method thereof | |
| WO2008157148A9 (en) | Appliance transparency | |
| CN110028251B (en) | Copper-containing double-silver low-emissivity coated glass capable of being subsequently processed and preparation method thereof | |
| CN109305763A (en) | A kind of high-transparency list silver low-radiation coated glass | |
| CN110255922B (en) | Double-silver low-emissivity coated glass and preparation method thereof | |
| EP4058417B1 (en) | Coated glass substrate | |
| CN103144379A (en) | Low-emissivity coated glass and manufacturing method thereof | |
| CN104230182A (en) | Preparation method of high-transmittance tempered low-emissivity coated glass | |
| CN110746123A (en) | Temperable double-silver coated glass and preparation method thereof | |
| CN212559993U (en) | High-transmittance low-reflection steel three-silver low-emissivity glass | |
| CN108101383B (en) | Temperable Low-E energy-saving glass | |
| CN107117832B (en) | Low-reflection low-permeability toughened single-silver low-emissivity coated glass and manufacturing method and application thereof | |
| CN111517669A (en) | High-transmittance low-reflection steel three-silver low-emissivity glass and preparation method thereof | |
| CN112679109A (en) | Passive LOW-energy-consumption offline temperable LOW-E coated glass and preparation process thereof | |
| CN212559994U (en) | Temperable low-reflection double-silver low-radiation coated glass | |
| TW201402497A (en) | Reinforceable triple-silver low-E coated glass | |
| CN210656698U (en) | High-transmittance light blue bendable steel three-silver low-emissivity coated glass | |
| CN114368919A (en) | Light-transmission-color hot-processable energy-saving LOW-E product | |
| CN210030460U (en) | Copper-containing double-silver low-emissivity coated glass capable of being subsequently processed | |
| CN112321173A (en) | Gray low-emissivity coated glass | |
| CN212770486U (en) | Gray low-emissivity coated glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |