CN108996919A - Through color it is neutral can tempering list silver low-radiation coated glass and preparation method thereof - Google Patents
Through color it is neutral can tempering list silver low-radiation coated glass and preparation method thereof Download PDFInfo
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- CN108996919A CN108996919A CN201810857150.2A CN201810857150A CN108996919A CN 108996919 A CN108996919 A CN 108996919A CN 201810857150 A CN201810857150 A CN 201810857150A CN 108996919 A CN108996919 A CN 108996919A
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- 239000011521 glass Substances 0.000 title claims abstract description 63
- 238000005496 tempering Methods 0.000 title claims abstract description 36
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 29
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 24
- 239000004332 silver Substances 0.000 title claims abstract description 24
- 230000007935 neutral effect Effects 0.000 title claims abstract description 21
- 238000002360 preparation method Methods 0.000 title claims abstract description 6
- 239000002131 composite material Substances 0.000 claims abstract description 40
- 239000011159 matrix material Substances 0.000 claims abstract description 23
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 229910017944 Ag—Cu Inorganic materials 0.000 claims abstract description 19
- 230000005855 radiation Effects 0.000 claims abstract description 19
- 239000010949 copper Substances 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 10
- 238000007747 plating Methods 0.000 claims abstract description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical group [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 26
- 238000004062 sedimentation Methods 0.000 claims description 24
- 238000004544 sputter deposition Methods 0.000 claims description 24
- 238000000151 deposition Methods 0.000 claims description 21
- 230000008021 deposition Effects 0.000 claims description 20
- 229910018316 SbOx Inorganic materials 0.000 claims description 16
- 239000012298 atmosphere Substances 0.000 claims description 15
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 13
- 239000011787 zinc oxide Substances 0.000 claims description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 8
- 229910001120 nichrome Inorganic materials 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- 229910017083 AlN Inorganic materials 0.000 claims description 5
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 5
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 239000010930 yellow gold Substances 0.000 claims description 4
- 229910001097 yellow gold Inorganic materials 0.000 claims description 4
- 229910004205 SiNX Inorganic materials 0.000 claims description 3
- 229910004286 SiNxOy Inorganic materials 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910003087 TiOx Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims description 3
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000003063 flame retardant Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 238000012545 processing Methods 0.000 abstract description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 230000035699 permeability Effects 0.000 abstract description 5
- 230000001681 protective effect Effects 0.000 abstract description 3
- 238000005457 optimization Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 154
- 238000000576 coating method Methods 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 12
- 238000001816 cooling Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000011358 absorbing material Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000000170 cell membrane Anatomy 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000005329 float glass Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3647—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer in combination with other metals, silver being more than 50%
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The present invention relates to it is a kind of through color it is neutral can tempering list silver low-radiation coated glass and preparation method thereof, it is of the invention through color it is neutral can tempering list silver low-radiation coated glass include composite film that glass matrix and plating are set to one side surface of glass matrix, the composite film includes successively plating the first protection dielectric membranous layer set outwardly from the glass matrix, first metal separating film layer, low radiation functions film layer, second metal separating film layer, heat-resistant fireproof film layer and the second protection dielectric membranous layer, the low radiation functions film layer is Ag-Cu alloy-layer, and it is with a thickness of 5-15nm, Ag and Cu is Ag:Cu=80:20-60:40 by mass fraction ratio, the present invention passes through optimization film layer structure and thicknesses of layers parameter, better protective effect can be played to low radiation functions film layer , the heat-resisting ability of composite film entirety is improved, so that final glass product permeability obtained is more preferable, it is more neutral through color, and since copper processing is cheap, production cost can be reduced.
Description
Technical field
The present invention relates to field of glass production technology, and in particular to it is a kind of through color it is neutral can tempering list silver low radiation plate
Film glass and preparation method thereof.
Background technique
Low radiation coated glass, which refers to, deposits one layer of metallic silver as functional layer, in sunlight in Float Glass Surface
Far infrared near infrared ray and living environment plays reflex, so that absorption and radiance of the glass to infrared ray are reduced,
Such glass can be not only used for family's window, it can also be used to shop, the glass curtain wall of office building and high-grade hotel and other needs
Place.
Low radiation coated glass and its hollow product have ideal heat preservation and insulation and reasonable market price at present
Lattice are widely adopted in all kinds of buildings at home and abroad.Can high-temperature heat treatment low radiation coated glass can carry out it is curved
Shape processing, therefore the configuration design theory of building can be preferably expressed, it on the other hand can also significantly reduce production and processing
Cost, thus be a kind of product relatively conventional on the market.Although with can the building of tempering coated glass seeing at a distance
It varies in color when examining, but in short distance, more apparent, the unified bluish-green or yellow green (chromatic value of transmitted light is all presented
A* < -5, b* > 5), it is difficult to show its advanced sense.With the continuous transformation of aesthetic angle, market is to coated product through color
Demand also becomes diversification, it is clear that a kind of transmitted light color be muted color (chromatic value 5 > a* > -5,5 > b* > -5) can
Tempered and low-radiation coated glass product is that have the stronger market demand.
Cause can tempering coated product through color obviously partially green reason is, the composite Nano film layer plated need through
By the high temperature (by taking common single chamber annealing furnace as an example, about 670 DEG C of glass temperature, average 7 minutes of duration of being heated) of long period, because
This film material must protect Low emissivity silver layer using enough protective layers (such as silicon nitride layer or nicr layer).These
Protective layer selectively penetrates green light, cause on the market it is common can tempering coated product through color color in pale green
Color, (penetrating color a* < -5).In order to change this phenomenon, coated glass product can generally pass through choosing in the realization through color
There is special selection absorbing material come being modified through color to product with the material of different refractivity, or/and selection.But with
Into technology when introducing metallic copper or copper alloy alternatively in the case where property absorbing material, although metallic copper or copper alloy layer its
Nanometer film layer is in warm tones through color, can neutralize it is existing can the double silver products of tempering through color, can tempering but still have
The problem of double silver products oxidation resistance deficiency during High temperature tempered, especially when copper has the feelings of multiple prices (+1 and+2)
Under condition, a small amount of oxygen atom migration can also cause the high-temperature oxydation of film layer to destroy.
Summary of the invention
The present invention provide it is a kind of be able to solve the above problem through color it is neutral can tempering list silver low-radiation coated glass.
In order to achieve the above objectives, the technical solution adopted by the present invention is that: it is a kind of through color it is neutral can the low spoke of tempering list silver
Coated glass is penetrated, the composite film of one side surface of glass matrix, the composite film are set to including glass matrix and plating
Including successively plating the set first protection dielectric membranous layer, the first metal separating film layer, Low emissivity function outwardly from the glass matrix
Energy film layer, the second metal separating film layer, heat-resistant fireproof film layer and the second protection dielectric membranous layer, the low radiation functions film layer
For Ag-Cu alloy-layer, and it is Ag:Cu=80:20-60:40 by mass fraction ratio with a thickness of 5-15nm, Ag and Cu.
Further, described first protect dielectric membranous layer multiple for zinc oxide/alumina composite layer, zinc oxide/stancic oxide
Close any one in layer, silicon nitride/aluminium nitride composite layer, niobium oxide layer or silicon nitride/zirconium oxide composite layer.
Further, it is described first protection dielectric membranous layer with a thickness of 25-60nm.
Further, the first metal separating film layer/second metal separating film layer is NiCrOx layers.
Further, the first metal separating film layer with a thickness of 0.5-8nm；The thickness of the second metal separating film layer
Degree is 1-12nm.
Further, the heat-resistant fireproof film layer be SbOx layers, the heat-resistant fireproof film layer with a thickness of 30-
60nm。
Further, described second protect dielectric membranous layer for appointing in SiNx layer, SiOx layers, SiNxOy layers or TiOx layers
Meaning one layer or any two layers of composite layer.
Further, it is described second protection dielectric membranous layer with a thickness of 35-80nm.
Further, the composite film by successively plate the zinc oxide/alumina composite layer on the glass matrix,
NiCrOx layers, Ag-Cu alloy-layer, NiCrOx layers, SbOx layers and Si3N4Layer composition.
The present invention also provides it is a kind of it is above-mentioned can tempering list silver low-radiation coated glass preparation method, including splashed using magnetic control
Penetrating plated film mode, successively plating sets each film layer in the composite film on the glass matrix, specifically comprises the following steps:
(1) zinc oxide/alumina composite layer is coated on the glass matrix: using rotating cathode, in intermediate frequency power supply
Under control, zinc-tin target sputtering sedimentation under oxygen atmosphere, power 48kW；
(2) NiCrOx layers are coated on the zinc oxide/alumina composite layer that step (1) deposition is formed: utilize planar cathode,
Under the control of DC power supply, NiCr target sputtering sedimentation in argon oxygen atmosphere, power 5kW；
(3) Ag-Cu alloy-layer is coated on the NiCrOx layer that step (2) deposition is formed: using planar cathode, in direct current
Under the control in source, yellow gold target sputtering sedimentation in argon atmospher, power 8kW；
(4) it is formed on Ag-Cu alloy-layer in step (3) deposition and is coated with NiCrOx layers: using planar cathode, in DC power supply
Control under, NiCr target sputtering sedimentation in argon oxygen atmosphere, power 6kW；
(5) SbOx layers are coated on the NiCrOx layer that step (4) deposition is formed: using rotating cathode, in intermediate frequency power supply
Under control, Sb target sputtering sedimentation under oxygen atmosphere, power 45kW；
(6) Si is coated on the SbOx layer that step (5) deposition is formed3N4Layer: rotating cathode is utilized, in the control of intermediate frequency power supply
Under system, Si target sputtering sedimentation under nitrogen atmosphere, power 60kW.
After the above technical solution is adopted, the invention has the following advantages over the prior art: the present invention passes through optimization film
Layer structure and thicknesses of layers parameter, better protective effect can be played to low radiation functions film layer, it is whole to improve composite film
The heat-resisting ability of body, so that final glass product permeability obtained is more preferable, it is more neutral through color, and just due to copper processing
Preferably, production cost can be reduced.
Detailed description of the invention
Attached drawing 1 be it is of the invention through color it is neutral can tempering list silver low-radiation coated glass structural schematic diagram.
Wherein,
100, glass matrix；
200, composite film；
201, the first protection dielectric membranous layer；202, the first metal separating film layer；203, low radiation functions film layer；204,
Two metal separating film layers；205, heat-resistant fireproof film layer；206, the second protection dielectric membranous layer.
Specific embodiment
Below in conjunction with the accompanying drawings and embodiment the invention will be further described.
As shown in Figure 1, it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, including glass matrix 100 with
And plating is set to the composite film 200 of 100 1 side surface of glass matrix.Composite film 200 include from glass matrix 100 outwardly successively
Plate set first protection dielectric membranous layer 201, the first metal separating film layer 202, low radiation functions film layer 203, the second metal every
From film layer 204, heat-resistant fireproof film layer 205 and the second protection dielectric membranous layer 206.
Low radiation functions film layer 203 is Ag-Cu alloy-layer, and thickness is preferably 5-15nm, Ag and Cu by mass fraction ratio
For Ag:Cu=80:20-60:40.Low radiation functions film layer 203 of the invention uses Ag-Cu alloy, and Ag and Cu is by above-mentioned
Component proportion is coated with, and can make after tempering that finally obtained glass product permeability is higher, color is limpider and it is beautiful to dazzle, from
And glass curtain wall exterior quality is promoted, Ag-Cu alloy is lower relative to pure Ag price.
First metal separating film layer, 202/ second metal separating film layer 204 is NiCrOx layers.Preferably, the first metal is isolated
Film layer 202 with a thickness of 0.5-8nm；Second metal separating film layer 204 with a thickness of 1-12nm.By in low radiation functions film layer
203 two sides are coated with NiCrOx layers respectively, and when higher temperature carries out tempering processing, NiCrOx layers have the oxygen of partial penetration
Preferable affinity can effectively capture oxygen molecule, low radiation functions film layer 203 preferably be protected, additionally, due to NiCrOx
Part is closed with oxidation, be can be further improved the visible light transmittance of product, is improved the permeability of product.
When being coated with NiCrOx layers using magnetron sputtering coating method, it is preferred to use pure oxygen is sputtered, in this way can be true
The purity for protecting NiCrOx layers reduces the impurity of film layer doping, keeps film layer structure more complete, binding force is higher, to guarantee film
Layer consistency, is effectively ensured the stability of production.
First protection dielectric membranous layer 201 is zinc oxide/alumina composite layer, zinc oxide/stancic oxide composite layer, nitridation
Any one in silicon/aluminium nitride composite layer, niobium oxide layer or silicon nitride/zirconium oxide composite layer.Preferably, the first protection electricity is situated between
Plasma membrane layer 201 with a thickness of 25-60nm.
Second protects dielectric membranous layer 206 as any one layer in SiNx layer, SiOx layers, SiNxOy layers or TiOx layers or appoints
The composite layer that two layers of meaning.Preferably, second protection dielectric membranous layer 206 with a thickness of 35-80nm.
The first protection dielectric membranous layer 201 and second protects film material selected by dielectric membranous layer 206 in the present invention
With excellent physical property and resist chemical performance, there is the film layer for depositing formation very strong anticorrosive, resistance to mechanical to scratch,
Performance resistant to high temperatures, to improve the processing performance and service life of subsequent finished product.
Heat-resistant fireproof film layer 205 is SbOx layers, and the thickness of heat-resistant fireproof film layer 205 is preferably 30-60nm.The present invention
Protective effect to low radiation functions film layer 203 can be improved as the film material of heat-resistant fireproof film layer 205 using SbOx,
Composite film 200 whole heat resistance and high temperature impact resistance ability are improved simultaneously, can effectively reduce after tempering outside glass product
Defect is seen, solves the problems, such as that glass product radiance is higher.
The following are specific embodiments.
Embodiment 1
One side surface of the glass matrix 100 after cleaning and drying, which is successively plated, sets following film layer: zinc oxide/stancic oxide is multiple
Close layer (i.e. ZnSnOx layers), NiCrOx layers, Ag-Cu alloy-layer, NiCrOx layers, SbOx layers and Si3N4Layer, above-mentioned each film layer
Thickness is followed successively by 36.6nm, 4.2nm, 9.6nm, 4.7nm, 37.3nm and 52.7nm.
Above-mentioned composite film 200 is coated with using magnetron sputtering coating method specifically includes the following steps:
(1) it is coated with ZnSnOx layers on glass matrix 100: utilizing rotating cathode, under the control of intermediate frequency power supply, zinc-tin target
(Zn:Al=98:2-95:5 in mass ratio) sputtering sedimentation under oxygen atmosphere, depositional coating is with a thickness of 36.6nm, power 48kW；
(2) NiCrOx layers are coated on the ZnSnOx layer that step (1) deposition is formed: using planar cathode, in DC power supply
Control under, NiCr target sputtering sedimentation in argon oxygen atmosphere, depositional coating is with a thickness of 4.2nm, power 5kW；
(3) Ag-Cu alloy-layer is coated on the NiCrOx layer that step (2) deposition is formed: using planar cathode, in direct current
Under the control in source, yellow gold target (Ag:Au=80:20 in mass ratio) sputtering sedimentation in argon atmospher, depositional coating with a thickness of
9.6nm, power 8kW；
(4) it is formed on Ag-Cu alloy-layer in step (3) deposition and is coated with NiCrOx layers: using planar cathode, in DC power supply
Control under, NiCr target sputtering sedimentation in argon oxygen atmosphere, depositional coating is with a thickness of 4.7nm, power 6kW；
(5) SbOx layers are coated on the NiCrOx layer that step (4) deposition is formed: using rotating cathode, in intermediate frequency power supply
Under control, Sb target sputtering sedimentation under oxygen atmosphere, depositional coating is with a thickness of 37.3nm, power 45kW；
(6) Si is coated on the SbOx layer that step (5) deposition is formed3N4Layer: rotating cathode is utilized, in the control of intermediate frequency power supply
Under system, Si target sputtering sedimentation under nitrogen atmosphere, depositional coating is with a thickness of 52.7nm, power 60kW.
After the completion of being coated with automatically into bringing-up section carry out tempering processing, heated back and forth, after the heating time is up, automatically into
Enter flat steel or curved tempering air blast cooling, after cooling time, automatic running to bottom sheet platform.The following are tempering in the present embodiment to handle
Design parameter: upper temp: 670 DEG C；Temperature of lower: 670 DEG C；Heating time: 460s；Cooling time: 160s；Grid between wind
Away from: 25mm；It blows between delay: 4.0s；Wind pressure transit time: 10s.
Every detection parameters before and after glass product tempering are as shown in table 1 below.
Table 1
Embodiment 2
One side surface of the glass matrix 100 after cleaning and drying, which is successively plated, sets following film layer: silicon nitride/aluminium nitride is multiple
Close layer, NiCrOx layers, Ag-Cu alloy-layer, NiCrOx layers, SbOx layers and Si3N4Layer, the thickness of above-mentioned each film layer are followed successively by
26.3nm, 2.8nm, 14.2nm, 10.1nm, 48nm and 41.3nm.
Above-mentioned composite film 200 is coated with using magnetron sputtering coating method specifically includes the following steps:
(1) silicon nitride/aluminium nitride composite layer is coated on glass matrix 100: using rotating cathode, in the control of intermediate frequency power supply
Under system, sial target (Si:Al=92:8-88:12 in mass ratio) sputtering sedimentation under nitrogen atmosphere, depositional coating with a thickness of
26.3nm, power 65kW；
(2) NiCrOx layers are coated on the ZnSnOx layer that step (1) deposition is formed: using planar cathode, in DC power supply
Control under, NiCr target sputtering sedimentation in argon oxygen atmosphere, depositional coating is with a thickness of 2.8nm, power 3kW；
(3) Ag-Cu alloy-layer is coated on the NiCrOx layer that step (2) deposition is formed: using planar cathode, in direct current
Under the control in source, yellow gold target (Ag:Au=60:40 in mass ratio) sputtering sedimentation in argon atmospher, depositional coating with a thickness of
14.2nm, power 12kW；
(4) it is formed on Ag-Cu alloy-layer in step (3) deposition and is coated with NiCrOx layers: using planar cathode, in DC power supply
Control under, NiCr target sputtering sedimentation in argon oxygen atmosphere, depositional coating is with a thickness of 10.1nm, power 13kW；
(5) SbOx layers are coated on the NiCrOx layer that step (4) deposition is formed: using rotating cathode, in intermediate frequency power supply
Under control, Sb target sputtering sedimentation under oxygen atmosphere, depositional coating is with a thickness of 48nm, power 60kW；
(6) Si is coated on the SbOx layer that step (5) deposition is formed3N4Layer: rotating cathode is utilized, in the control of intermediate frequency power supply
Under system, Si target sputtering sedimentation under nitrogen atmosphere, depositional coating is with a thickness of 41.3nm, power 48kW.
After the completion of being coated with automatically into bringing-up section carry out tempering processing, heated back and forth, after the heating time is up, automatically into
Enter flat steel or curved tempering air blast cooling, after cooling time, automatic running to bottom sheet platform.The following are tempering in the present embodiment to handle
Design parameter: upper temp: 670 DEG C；Temperature of lower: 670 DEG C；Heating time: 460s；Cooling time: 160s；Grid between wind
Away from: 25mm；It blows between delay: 4.0s；Wind pressure transit time: 10s.
Every detection parameters before and after glass product tempering are as shown in table 2 below.
Table 2
By embodiment 1 and embodiment 2 as can be seen that glass product permeability of the invention, more neutral through color.And
Since low radiation functions film layer 203 of the invention uses Ag-Cu alloy, thus cost is relatively low.
The above embodiments merely illustrate the technical concept and features of the present invention, and its object is to allow person skilled in the art
Scholar cans understand the content of the present invention and implement it accordingly, and it is not intended to limit the scope of the present invention.It is all according to the present invention
Equivalent change or modification made by Spirit Essence, should be covered by the protection scope of the present invention.
Claims (10)
1. it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, including glass matrix and plating be set to the glass
The composite film of one side surface of matrix, it is characterised in that: the composite film includes that successively plating is set outwardly from the glass matrix
First protection dielectric membranous layer, the first metal separating film layer, low radiation functions film layer, the second metal separating film layer, high temperature resistant
Fire-retardant film and the second protection dielectric membranous layer, the low radiation functions film layer is Ag-Cu alloy-layer, and it is with a thickness of 5-
15nm, Ag and Cu are Ag:Cu=80:20-60:40 by mass fraction ratio.
2. it is according to claim 1 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
The first protection dielectric membranous layer is zinc oxide/alumina composite layer, zinc oxide/stancic oxide composite layer, silicon nitride/aluminium nitride
Any one in composite layer, niobium oxide layer or silicon nitride/zirconium oxide composite layer.
3. it is according to claim 2 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
It is described first protection dielectric membranous layer with a thickness of 25-60nm.
4. it is according to claim 1 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
The first metal separating film layer/second metal separating film layer is NiCrOx layers.
5. it is according to claim 4 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
The first metal separating film layer with a thickness of 0.5-8nm；The second metal separating film layer with a thickness of 1-12nm.
6. it is according to claim 1 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
The heat-resistant fireproof film layer be SbOx layers, the heat-resistant fireproof film layer with a thickness of 30-60nm.
7. it is according to claim 1 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
Described second protects dielectric membranous layer for any one layer or two layers any in SiNx layer, SiOx layers, SiNxOy layers or TiOx layers
Composite layer.
8. it is according to claim 1 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
It is described second protection dielectric membranous layer with a thickness of 35-80nm.
9. it is according to claim 1 it is a kind of through color it is neutral can tempering list silver low-radiation coated glass, it is characterised in that:
The composite film is by successively plating the zinc oxide/alumina composite layer on the glass matrix, NiCrOx layers, Ag-Cu conjunction
Layer gold, NiCrOx layers, SbOx layers and Si3N4Layer composition.
10. it is a kind of it is as claimed in claim 9 can tempering list silver low-radiation coated glass preparation method, including use magnetron sputtering
Successively plating sets each film layer in the composite film to plated film mode on the glass matrix, which is characterized in that specifically includes
Following steps:
(1) zinc oxide/alumina composite layer is coated on the glass matrix: using rotating cathode, in the control of intermediate frequency power supply
Under, zinc-tin target sputtering sedimentation under oxygen atmosphere, power 48kW；
(2) NiCrOx layers are coated on the zinc oxide/alumina composite layer that step (1) deposition is formed: using planar cathode, straight
Under the control in galvanic electricity source, NiCr target sputtering sedimentation in argon oxygen atmosphere, power 5kW；
(3) Ag-Cu alloy-layer is coated on the NiCrOx layer that step (2) deposition is formed: using planar cathode, in DC power supply
Under control, yellow gold target sputtering sedimentation in argon atmospher, power 8kW；
(4) it is formed on Ag-Cu alloy-layer in step (3) deposition and is coated with NiCrOx layers: using planar cathode, in the control of DC power supply
Under system, NiCr target sputtering sedimentation in argon oxygen atmosphere, power 6kW；
(5) SbOx layers are coated on the NiCrOx layer that step (4) deposition is formed: using rotating cathode, in the control of intermediate frequency power supply
Under, Sb target sputtering sedimentation under oxygen atmosphere, power 45kW；
(6) Si is coated on the SbOx layer that step (5) deposition is formed3N4Layer: utilizing rotating cathode, under the control of intermediate frequency power supply,
Si target sputtering sedimentation under nitrogen atmosphere, power 60kW.
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| CN110028251A (en) * | 2019-05-17 | 2019-07-19 | 咸宁南玻节能玻璃有限公司 | One kind can following process cupric double-silver low-emissivity coated glass and preparation method |
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