CN206751658U - Low anti-low permeability, tempered single silver low-radiation coated glass - Google Patents
Low anti-low permeability, tempered single silver low-radiation coated glass Download PDFInfo
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- CN206751658U CN206751658U CN201720497503.3U CN201720497503U CN206751658U CN 206751658 U CN206751658 U CN 206751658U CN 201720497503 U CN201720497503 U CN 201720497503U CN 206751658 U CN206751658 U CN 206751658U
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Abstract
The utility model belongs to glass technology field, a kind of specific open low anti-low permeability, tempered single silver low-radiation coated glass.Low anti-low permeability, tempered single silver low-radiation coated glass includes glass substrate, and the first dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers, the second barrier layer and the 3rd dielectric layer including being outwards sequentially depositing from the surface of glass substrate one.Low anti-low permeability, tempered single silver low-radiation coated glass that the utility model obtains, film plating layer and glass substrate adhesion are strong, film plating layer is fine and close, uniform, film layer scratch resistance capability is strong, low anti-low shape is presented in outward appearance, requirement of each big city to light pollution is not only met, also with good appearance, meet the needs of people are to glass colour, and be well positioned to meet requirement of the people to glass properties.
Description
Technical field
The utility model belongs to glass technology field, and in particular to a kind of low anti-low permeability, tempered single silver low-emissivity coated glass
Glass.
Background technology
According to the definition of standard GB/T/18915.2, low radiation coated glass is a kind of red to 4.5 μm~25 mu m wavebands
Outside line has the coated glass compared with high reflectance.Specifically, this glass has preferable heat-proof quality and shading performance, can
Under conditions of indoor lighting abundance is ensured, the solar radiant energy got in is effectively shielded, avoids indoor temperature from raising, saved
The about energy resource consumption of room conditioning.
The film structure of existing single silver low-radiation coated glass is essentially SiNxFilm layer/NiCr film layers/Ag film layers/NiCr
Film layer/SiNxFilm layer.This conventional structure, design is simple, and the reflection of manufactured membrane system and transmission are often complementary, it is,
It is higher or lower through more high reflection through lower reflection, low anti-low effect can not be met simultaneously at all.And present one
The problem of light pollution is considered in a little developed areas, often requires that reflectivity is extremely low, while accomplish the effect of light barrier again
Fruit, of course simultaneously it is contemplated that the performance requirement of glass.Double silver low-emissivity coated and three-silver low radiation plated films can accomplish, but
It is that what is brought is the rising of cost.
Utility model content
The problem of can not realizing low anti-low effect for current low radiation coated glass, the utility model provide a kind of
Low anti-low permeability, tempered single silver low-radiation coated glass.
In order to realize above-mentioned purpose of utility model, the technical scheme of the utility model embodiment is as follows：
A kind of low anti-low permeability, tempered single silver low-radiation coated glass, including glass substrate, and including from the glass
The first dielectric layer that the surface of substrate one is outwards sequentially depositing, reflecting layer, the second dielectric layer, the first barrier layer, infrared ray are anti-
Penetrate layer, the second barrier layer and the 3rd dielectric layer；
First dielectric layer is TiOxFilm layer, SiNxFilm layer, SiNxOyFilm layer, ZnOx film layers or ZnAlOxIn film layer
Any layer is any two layers；
The reflecting layer is NbOxFilm layer, NbNxFilm layer, NiCr film layers, NiCrOxFilm layer, NiCrNxFilm layer or CrNxFilm layer
In any layer；
Second dielectric layer is TiOxFilm layer, SiNxFilm layer, SiNxOyFilm layer, ZnOx film layers, ZnAlOxFilm layer, SnOx
Film layer, ZnSnOxFilm layer or any layer or any two layers in AZO film layers；
First barrier layer, the second barrier layer are NiCr film layers, NiCrOxFilm layer, CrNxAny layer in film layer；
The infrared-reflecting layers are Ag film layers；
3rd dielectric layer is SiNxFilm layer, SiOxFilm layer, SiNxOyFilm layer or TiOxAny layer in film layer is appointed
Two layers of meaning.
Preferably, first dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers,
The thickness of second barrier layer and the 3rd dielectric layer be respectively 32.0nm~58.7nm, 2.4nm~4.5nm, 50.3nm~
79.7nm, 2.3nm~3.1nm, 5.8nm~9.2nm, 2.4nm~3.2nm and 22.5nm~39.9nm.
Preferably, first dielectric layer be silicon nitride film layer, reflecting layer be nichrome film layer, the second dielectric layer
For silicon nitride film layer, the first barrier layer be nichrome film layer, infrared-reflecting layers are silver film, the second barrier layer is that nickel chromium triangle closes
Golden membranous layer, the 3rd dielectric layer are silicon nitride film layer.
Preferably, first dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers,
The thickness of second barrier layer and the 3rd dielectric layer be respectively 58.7nm, 4.5nm, 63.4nm, 2.3nm, 9.2nm, 2.4nm,
39.9nm。
Preferably, first dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers,
The thickness of second barrier layer and the 3rd dielectric layer be respectively 40.9nm, 4.6nm, 79.7nm, 2.6nm, 8.1nm, 2.6nm,
33.1nm。
Preferably, first dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers,
The thickness of second barrier layer and the 3rd dielectric layer be respectively 32.0nm, 1.4nm, 50.3nm, 3.1nm, 5.8nm, 2.9nm,
22.5nm。
Preferably, the glass substrate is float glass.
Low anti-low permeability, tempered single silver low-radiation coated glass in above-described embodiment, substituted for often using seven layers of film plating layer
The single silver film system of rule, film plating layer and glass substrate adhesion are strong, and film plating layer is fine and close, uniform, and film layer scratch resistance capability is strong, and outward appearance is in
Existing low anti-low shape, not only meets requirement of each big city to light pollution, also with good appearance, meets people couple
The demand of glass colour, and it is well positioned to meet requirement of the people to glass properties.
Brief description of the drawings
Below in conjunction with drawings and Examples, the utility model is described in further detail, in accompanying drawing：
Fig. 1 is the structural representation of the low anti-low permeability, tempered single silver low-radiation coated glass of the utility model embodiment；
Fig. 2 is that the glass surface for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 1 provides is anti-
Penetrate the rate curve of spectrum；
Fig. 3 is that the film surface for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 1 provides is anti-
Penetrate the rate curve of spectrum；
Fig. 4 is the transmitance for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 1 provides
The curve of spectrum；
Fig. 5 is that the glass surface for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 2 provides is anti-
Penetrate the rate curve of spectrum；
Fig. 6 is that the film surface for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 2 provides is anti-
Penetrate the rate curve of spectrum；
Fig. 7 is the transmitance for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 2 provides
The curve of spectrum；
Fig. 8 is that the glass surface for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 3 provides is anti-
Penetrate the rate curve of spectrum；
Fig. 9 is that the film surface for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 3 provides is anti-
Penetrate the rate curve of spectrum；
Figure 10 is the transmitance for low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment 3 provides
The curve of spectrum.
Embodiment
In order that the purpose of this utility model, technical scheme and advantage are more clearly understood, below in conjunction with accompanying drawing and implementation
Example, the utility model is further elaborated.It should be appreciated that specific embodiment described herein is only explaining
The utility model, it is not used to limit the utility model.
As shown in figure 1, the example of the utility model provides a kind of low anti-low permeability, tempered single silver low-radiation coated glass.Should
Low anti-low permeability, tempered single silver low-radiation coated glass includes glass substrate 1, and from the surface of glass substrate 1 one outwards according to
Secondary folded the first dielectric layer 2 set, reflecting layer 3, the second dielectric layer 4, the first barrier layer 5, infrared-reflecting layers 6, second hinder
The dielectric layer 8 of barrier 7 and the 3rd.
Wherein, in any embodiment, glass substrate 1 is float glass.
Preferably, the thickness of float glass is 3~19mm.
In any embodiment, the first dielectric layer 2 is TiOxFilm layer, SiNxFilm layer, SiNxOyFilm layer, ZnOxFilm layer or
ZnAlOxAny of film layer, or formed by foregoing any two kinds folded set；
First dielectric layer 2 can prevent the Na in glass substrate 1 between glass substrate 1 and reflecting layer 3+To film
Permeated in layer, increase the absorption affinity between film layer and glass substrate, improve physical and chemical properties, control the optical property of membrane system
And color.
Reflecting layer 3 is NbOxFilm layer, NbNxFilm layer, NiCr film layers, NiCrOxFilm layer, NiCrNxFilm layer or CrNxIn film layer
It is any；
Reflecting layer 3 is reflected and saturating between the second dielectric layer 4 and the first dielectric layer 2 with regulation film layer synthesis
The effect crossed.
Second dielectric layer 4 is TiOxFilm layer, SiNxFilm layer, SiNxOyFilm layer, ZnOxFilm layer, ZnAlOxFilm layer, SnOxFilm
Layer, ZnSnOxFilm layer or any layer in AZO film layers or any two layers it is compound；
Second dielectric layer 4 has the optical property and face of control membrane system between the first barrier layer 5 and reflecting layer 3
The effect of color.
First barrier layer 5 is NiCr film layers, NiCrOxFilm layer, CrNxAny layer in film layer；
First barrier layer 5 is located between the dielectric layer 4 of infrared-reflecting layers 6 and second, has defencive function layer, controls film
The effect of the optical property and color of system.
Infrared-reflecting layers 6 are Ag film layers；
For infrared-reflecting layers 6 between the second barrier layer 7 and the first barrier layer 5, having reduces radiance, enhancing insulation
Or heat-proof quality, the effect of the optical property and color of control membrane system.
Second barrier layer 7 is NiCr film layers, NiCrOxFilm layer, CrNxAny layer in film layer；
Second barrier layer 7 has defencive function layer between the 3rd dielectric layer 8 and infrared-reflecting layers 6, reduces oxygen
Change；Control the effect of the optical property and color of membrane system.
3rd dielectric layer 8 is SiNxFilm layer, SiOxFilm layer, SiNxOyFilm layer or TiOxAny layer in film layer or by foregoing
Any two kinds folded set form；
3rd dielectric layer 8 is located on the second barrier layer 7, has and protects whole film layer structure, reduce oxidation, improve thing
Reason and chemical property；Control the effect of the optical property and color of membrane system.
Above layers combine in order, so as to ensure the globality of low anti-low permeability, tempered single silver low-radiation coated glass
Can, the low anti-low effect of membrane system color can be realized.
Preferably, the thickness of the first dielectric layer 2 is 32.0nm~58.7nm；The thickness in reflecting layer 3 be 2.4nm~
4.5nm；The thickness of second dielectric layer 4 is 50.3nm~79.7nm；The thickness on the first barrier layer 5 is 2.3nm~3.1nm；It is red
The thickness in outside line reflecting layer 6 is 5.8nm~9.2nm；The thickness on the second barrier layer 7 is 2.4nm~3.2nm；3rd dielectric layer 7
Thickness be 22.5nm~39.9nm.
Above layers are combined by said sequence and in the range of above-mentioned limit, low anti-low permeability, tempered single silver low radiation
The overall performance of coated glass is better.The restriction of each thicknesses of layers allows for the low anti-low of whole structure, low
It is anti-it is low on the basis of, appearance color accomplishes neutral gray or slightly indigo plant partially, if beyond the scope of neutral or salubrious color,
It can only realize low anti-low, and good color and luster can not be kept, people can not be met to low anti-low low radiation coated glass
Demand.
Preferably, low anti-low permeability, tempered single silver low-radiation coated glass that the utility model embodiment obtains can pass through
Heat (i.e. tempering is handled).
Tempering processing concrete operations be：Low anti-low permeability, tempered single silver low-radiation coated glass is placed in annealing furnace,
The heating-up temperature of coated surface is 680~690 DEG C, and the heating-up temperature of 1 non-coated surface of glass substrate is low compared with coated surface temperature,
For 670~680 DEG C, because film layer is low-emission coated, its performance determines that the heat absorption capacity of film layer be not as strong as non-coated surface, is
Ensure that coated surface is consistent with non-coated surface face heat absorption, glass is burnt curved when avoiding the tempering from handling, and the temperature of coated surface need to be higher than
Non- coated surface.Tempering processing time is 570~590s, you can obtains low anti-low single silver low-radiation coated glass.
Handled by tempering, each film layer for low anti-low single silver low-radiation coated glass that the utility model embodiment obtains
Combine, the processability of glass is further improved.
Correspondingly, on the basis of low anti-low permeability, tempered single silver low-radiation coated glass described above, this practicality is new
Type embodiment additionally provides one kind side of preparation of the low anti-low permeability, tempered single silver low-radiation coated glass of the utility model embodiment
Method.
As the utility model preferred embodiment, the preparation method of low anti-low permeability, tempered single silver low-radiation coated glass
Comprise the following steps：
Step S01：Pre-treatment, float glass is cleaned, using cleaned float glass as glass substrate 1, and by described in
Float glass after cleaning is sent into vacuum chamber, keeps vacuum degree in vacuum chamber 8 × 10-6More than mbar；
Step S02, film deposition is handled, and it is 2 × 10 to control sputtering vacuum-3Mbar~5 × 10-3Mbar, described floating
The film layer of following thickness is sequentially depositing on method glass substrate：32.0nm~58.7nm the first dielectric layer 2,2.42nm~
4.5nm reflecting layer 3,50.32nm~79.7nm the second dielectric layer 4,2.32nm~3.1nm the first barrier layer 5,
The of 5.82nm~9.2nm infrared-reflecting layers 6,2.42nm~3.2nm the second barrier layer 7 and 22.52nm~39.9nm
Three dielectric layers 8.
Specifically, in above-mentioned steps S01, float glass is cleaned using Benteler cleaning machines.
Specifically, step S02 is during sputter coating, using the magnetron sputtering of that company of German Feng Adeng production
The vacuum of film device control sputtering, and the adjustment of thicknesses of layers is should be noted that, it may be used at line photometer measurement Film color
Parameter, and the adjustment of thicknesses of layers is carried out, make color parameter that low anti-low effect be presented.
Specifically, the glass in above-mentioned steps S02 after film deposition processing, should use HCl solution of the concentration for 1mol/L
With NaOH solution that concentration is 1mol/L as maceration extract, according to《The coated glass part 2s of GBT 18915.2 are low-emission coated
Coating film on glass glass》Detect the acid resistance and alkaline resistance properties of the glass after film deposition processing.At the same time, also using desk-top
It is low that the test of the test analytical instruments such as photometer, grinder, U4100 UV, visible light infrared spectrophotometers obtains low anti-low single silver
The wearability and glass surface reflectivity of radiation film coating glass, film surface reflectivity and through spectrum.
It should be noted that after the determination of each Rotating fields of sputtering target material and plated film, the core of product property is determined
Center portion point is exactly the thickness of each layer, i.e., by adjusting coating process, controls each thickness degree, be finally reached different effects.
In a kind of preferred scheme of the application, the first dielectric layer 2, reflecting layer 3, the second dielectric layer 4, the first barrier layer
5th, infrared-reflecting layers 6, the second barrier layer 7, the thickness of the 3rd dielectric layer 8 be respectively 32.0nm~58.7nm, 2.4nm~
4.5nm, 50.3nm~79.7nm, 2.3nm~3.1nm, 5.8nm~9.2nm, 2.4nm~3.2nm and 22.5nm~39.9nm.
Correspondingly, low anti-low permeability, tempered single silver low-radiation coated glass that prepared by the utility model embodiment, can be applied
In the fields such as building doors and windows, building curtain wall and interior of building decoration.
In order to better illustrate the technical solution of the utility model, this practicality is illustrated below by way of multiple embodiments
The principle of the low anti-low permeability, tempered single silver low-radiation coated glass of new embodiment, the effect of acting on and reaching.
The instrument and equipments being related in following each specific implementation demonstration examples are：VAAT GC330H filming equipments, Benteler are clear
Washing machine, on-line checking photometer, Datacolar CHECK II (portable colour photometer), Color I5 transmittances tester,
U4100 (UV, visible light infrared spectrophotometer), BTA-5000 type abrasion wear test machines.
Embodiment 1
A kind of low anti-low single silver low-radiation coated glass and preparation method thereof.
Wherein, low anti-low single silver low-radiation coated glass including glass substrate 1 and from the surface of glass substrate 1 one to
Outside, folded the first dielectric layer 2, reflecting layer 3, the second dielectric layer 4, the first barrier layer 5, the infrared-reflecting layers set are sequentially depositing
6th, the second barrier layer 7 and the 3rd dielectric layer 8.
Wherein, the first nichrome film layer that dielectric layer 2 is 58.7nm silicon nitride film layer, reflecting layer 3 is 4.5nm,
Second dielectric layer 4 is 63.4nm silicon nitride film layer, the first barrier layer 5 is 2.3nm nichrome film layer, infrared reflection
Layer 6 is 9.2nm silver film, the nitrogen that the nichrome film layer that the second barrier layer 7 is 2.4nm, the 3rd dielectric layer 8 are 39.9nm
SiClx film layer；The glass substrate 1 is 6mm float glass.
The preparation method of low anti-low permeability, tempered single silver low-radiation coated glass comprises the following steps：
1) pre-treatment, float glass is cleaned using Benteler cleaning machines, using cleaned float glass as glass base
Plate 1, and the float glass after the cleaning is sent into vacuum chamber, vacuum degree in vacuum chamber is kept 8 × 10-6More than mbar.
2) film deposition is handled, and the first dielectric is outwards sequentially depositing on the surface treated surface of glass substrate 1 one
Layer 2, reflecting layer 3, the second dielectric layer 4, the first barrier layer 5, infrared-reflecting layers 6, the second barrier layer 7, the 3rd dielectric layer
8.It is specific as follows：
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetron sputtering on glass substrate 1
Silicon nitride film layer (i.e. the first dielectric layer 2), thickness 58.7nm；The mass ratio Si of sial target：Al=92：8, argon gas and nitrogen
Flow-rate ratio be 1：1.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering on silicon nitride film layer
Nichrome film layer (i.e. reflecting layer 3), thickness 4.5nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetic control in nichrome film layer
Sputtered silicon nitride film layer (i.e. the second dielectric layer 4), thickness 63.4nm；The mass ratio Si of sial target：Al=92：8, argon gas with
The flow-rate ratio of nitrogen is 1：1.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering on silicon nitride film layer
Nichrome film layer (i.e. the first barrier layer 5), thickness 2.3nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas is used as working gas, dc source sputtering planar metal silver target, the magnetron sputtering in nichrome film layer
Silver film (i.e. infrared-reflecting layers 6), thickness 9.2nm.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering nickel chromium triangle on silver film
Alloy film layer (i.e. the second barrier layer 7), thickness 2.4nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetic control in nichrome film layer
Sputtered silicon nitride film layer (i.e. the 3rd dielectric layer 8), thickness 39.9nm；The mass ratio Si of sial target：Al=92：8, argon gas with
The flow-rate ratio of nitrogen is 1：1.
After above-mentioned steps terminate, the present embodiment product is measured using on-line checking photometer, Datacolar CHECK II
Appearance color, meanwhile, to the present embodiment 1 use glass substrate carry out identical test compares, the concrete outcome such as institute of table 1
Show.Using the on-line checking photometer measurement curve of spectrum, the obtained curve of spectrum is as shown in accompanying drawing 2,3,4.Obtained in embodiment 1
Low anti-low Low emissivity on the basis of surface glass, it is heated, i.e. tempering processing, specially coated surface adds
Hot temperature is 680 DEG C, and Float Glass Surface heating-up temperature is 670 DEG C, heat time 580s.And using identical method to heating
Glass after processing carries out color detection, as a result shows glass surface in low anti-low effect.
Embodiment 2
A kind of low anti-low single silver low-radiation coated glass and preparation method thereof.
Wherein, low anti-low single silver low-radiation coated glass including glass substrate 1 and from the surface of glass substrate 1 one to
Outside, folded the first dielectric layer 2, reflecting layer 3, the second dielectric layer 4, the first barrier layer 5, the infrared-reflecting layers set are sequentially depositing
6th, the second barrier layer 7 and the 3rd dielectric layer 8.
Wherein, the first nichrome film layer that dielectric layer 2 is 40.9nm silicon nitride film layer, reflecting layer 3 is 4.6nm,
Second dielectric layer 4 is 79.7nm silicon nitride film layer, the first barrier layer 5 is 2.6nm nichrome film layer, infrared reflection
Layer 6 is 8.1nm silver film, the nitrogen that the nichrome film layer that the second barrier layer 7 is 2.6nm, the 3rd dielectric layer 8 are 33.1nm
SiClx film layer；The glass substrate 1 is 6mm float glass.
The preparation method of low anti-low permeability, tempered single silver low-radiation coated glass comprises the following steps：
1) pre-treatment, float glass is cleaned using Benteler cleaning machines, using cleaned float glass as glass base
Plate 1, and the float glass after the cleaning is sent into vacuum chamber, vacuum degree in vacuum chamber is kept 8 × 10-6More than mbar.
2) film deposition is handled, and the first dielectric layer 2 is sequentially depositing on surface treated glass substrate 1, is reflected
The 3, second dielectric layer 4 of layer, the first barrier layer 5, infrared-reflecting layers 6, the second barrier layer 7, the 3rd dielectric layer 8.Specifically such as
Under：
Argon gas and nitrogen are used as working gas, AC power sputtering rotates sial target, on the glass substrate magnetron sputtering
Silicon nitride film layer (i.e. the first dielectric layer 2), thickness 40.9nm；The mass ratio Si of sial target：Al=92：8, argon gas and nitrogen
Flow-rate ratio be 1：1.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering on silicon nitride film layer
Nichrome film layer (i.e. reflecting layer 3), thickness 4.6nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetic control in nichrome film layer
Sputtered silicon nitride film layer (i.e. the second dielectric layer 4), thickness 79.7nm；The mass ratio Si of sial target：Al=92：8, argon gas with
The flow-rate ratio of nitrogen is 1：1.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering on silicon nitride film layer
Nichrome film layer (i.e. the first barrier layer 5), thickness 2.6nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas is used as working gas, dc source sputtering planar metal silver target, the magnetron sputtering in nichrome film layer
Silver film (i.e. infrared-reflecting layers 6), thickness 8.1nm.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering nickel chromium triangle on silver film
Alloy film layer (i.e. the second barrier layer 7), thickness 2.6nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetic control in nichrome film layer
Sputtered silicon nitride film layer (i.e. the 3rd dielectric layer 8), thickness 33.1nm；The mass ratio Si of sial target：Al=92：8, argon gas with
The flow-rate ratio of nitrogen is 1：1.
After above-mentioned steps terminate, the present embodiment product is measured using on-line checking photometer, Datacolar CHECK II
Appearance color, meanwhile, to the present embodiment 2 use glass substrate carry out identical test compares, the concrete outcome such as institute of table 1
Show.Using the on-line checking photometer measurement curve of spectrum, the obtained curve of spectrum is as shown in accompanying drawing 5,6,7.Obtained in embodiment 2
Low anti-low Low emissivity on the basis of surface glass, it is heated, i.e. tempering processing, specially coated surface adds
Hot temperature is 680 DEG C, and Float Glass Surface heating-up temperature is 670 DEG C, heat time 580s.And using identical method to heating
Glass after processing carries out color detection, as a result shows glass surface in low anti-low effect.
Embodiment 3
A kind of low anti-low single silver low-radiation coated glass and preparation method thereof.
Wherein, low anti-low single silver low-radiation coated glass including glass substrate 1 and from the surface of glass substrate 1 one to
Outside, folded the first dielectric layer 2, reflecting layer 3, the second dielectric layer 4, the first barrier layer 5, the infrared-reflecting layers set are sequentially depositing
6th, the second barrier layer 7 and the 3rd dielectric layer 8.
Wherein, the first nichrome film layer that dielectric layer 2 is 32.0nm silicon nitride film layer, reflecting layer 3 is 1.4nm,
Second dielectric layer 4 is 50.3nm silicon nitride film layer, the first barrier layer 5 is 3.1nm nichrome film layer, infrared reflection
Layer 6 is 5.8nm silver film, the nitrogen that the nichrome film layer that the second barrier layer 7 is 2.9nm, the 3rd dielectric layer 8 are 22.5nm
SiClx film layer；The glass substrate 1 is 6mm float glass.
The preparation method of low anti-low permeability, tempered single silver low-radiation coated glass comprises the following steps：
1) pre-treatment, float glass is cleaned using Benteler cleaning machines, using cleaned float glass as glass base
Plate 1, and the float glass after the cleaning is sent into vacuum chamber, vacuum degree in vacuum chamber is kept 8 × 10-6More than mbar.
2) film deposition is handled, and the first dielectric layer 2 is sequentially depositing on surface treated glass substrate 1, is reflected
The 3, second dielectric layer 4 of layer, the first barrier layer 5, infrared-reflecting layers 6, the second barrier layer 7, the 3rd dielectric layer 8.Specifically such as
Under：
Argon gas and nitrogen are used as working gas, AC power sputtering rotates sial target, on the glass substrate magnetron sputtering
Silicon nitride film layer (i.e. the first dielectric layer 2), thickness 32.0nm；The mass ratio Si of sial target：Al=92：8, argon gas and nitrogen
Flow-rate ratio be 1：1.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering on silicon nitride film layer
Nichrome film layer (i.e. reflecting layer 3), thickness 1.4nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetic control in nichrome film layer
Sputtered silicon nitride film layer (i.e. the second dielectric layer 4), thickness 50.3nm；The mass ratio Si of sial target：Al=92：8, argon gas with
The flow-rate ratio of nitrogen is 1：1.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering on silicon nitride film layer
Nichrome film layer (i.e. the first barrier layer 5), thickness 3.1nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas is used as working gas, dc source sputtering planar metal silver target, the magnetron sputtering in nichrome film layer
Silver film (i.e. infrared-reflecting layers 6), thickness 5.8nm.
Argon gas is used as working gas, dc source sputtering plane nichrome target, the magnetron sputtering nickel chromium triangle on silver film
Alloy film layer (i.e. the second barrier layer 7), thickness 2.9nm；The mass ratio Ni of nichrome target：Cr=8：2.
Argon gas and nitrogen are used as working gas, AC power sputtering rotation sial target, the magnetic control in nichrome film layer
Sputtered silicon nitride film layer (i.e. the 3rd dielectric layer 8), thickness 22.5nm；The mass ratio Si of sial target：Al=92：8, argon gas with
The flow-rate ratio of nitrogen is 1：1.
After above-mentioned steps terminate, the present embodiment product is measured using on-line checking photometer, Datacolar CHECK II
Appearance color, meanwhile, to the present embodiment 3 use glass substrate carry out identical test compares, the concrete outcome such as institute of table 1
Show.Using the on-line checking photometer measurement curve of spectrum, the obtained curve of spectrum is as shown in accompanying drawing 8,9,10
On the basis of surface glass, it is heated, i.e. tempering in the low anti-low Low emissivity that embodiment 3 obtains
Processing, specially coated surface heating-up temperature are 680 DEG C, and Float Glass Surface heating-up temperature is 670 DEG C, heat time 580s.
And color detection is carried out to the glass after heating using identical method, as a result show glass surface in low anti-low effect.
Low anti-low single silver low-radiation coated glass appearance color in the embodiment 1~3 of table 1
Wherein, implication alphabetical in upper table 1 is as follows
G represents the glass surface of coated glass, and R*g represents the reflected value of coated glass glass surface；A*g and b*g represents plated film
The color value of the glass surface of glass, a*g is more positive to represent that color is redder, and a*g more negative indication colors are greener, the more positive expression colors of b*g
More yellow, b*g more negative indication colors are more blue；L*g represents the brightness of the glass surface of coated glass.
F represents the coated surface of coated glass；R*f represents the reflected value of coated glass film surface；A*f and b*f represents plated film glass
The color value of glass film surface, a*f is more positive to represent that color is redder, and a*f more negative indication colors are greener；B*f is more positive to represent that color is more yellow, b*
F more negative indication colors are more blue；L*f represents the brightness of coated glass film surface.
T represents the transmission of coated glass；Tr represents the transmitance of coated glass；A*T and b*T represents what coated glass passed through
Color value, a*T is more positive to represent that color is redder, and a*T more negative indication colors are greener；B*T is more positive to represent that color is more yellow, the more negative tables of b*T
Show that color is more blue；L*T represents the brightness that coated glass passes through.
The result of table 1 shows that the reflected value R*g of low anti-low single silver low-radiation coated glass of embodiment is less than substrate,
Through Tr 40 or so, because in order to reach low anti-low effect, reflected value is as far as possible small, in order to meet the requirement of daylighting,
So need to control Tr.Make the hollow back reflection value ＜ 10% of product, through value ＞ 35%.The low anti-low single silver of embodiment 1~3 is low
The color a*g and b*g of radiation film coating glass are between 0~-3, it is contemplated that the color change of toughening process, it is therefore desirable to control
Color before tempering.
In addition, i.e. tempering is heated to low anti-low single silver low-radiation coated glass of embodiment, then to steel
The low anti-low single silver low-radiation coated glass changed carries out color detection, as a result shows, the low anti-low list of the tempering of embodiment
Silver low-radiation coated glass a*g is between -1~0, and b*g is between -2~-4.
Preferred embodiment of the present utility model is the foregoing is only, it is all at this not to limit the utility model
All any modification, equivalent and improvement made within the spirit and principle of utility model etc., all should be included in the utility model
Protection domain within.
Claims (7)
- A kind of 1. low anti-low permeability, tempered single silver low-radiation coated glass, it is characterised in that：Including glass substrate, and including certainly The surface of glass substrate one outwards successively fold set the first dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, Infrared-reflecting layers, the second barrier layer and the 3rd dielectric layer；First dielectric layer is TiOxFilm layer, SiNxFilm layer, SiNxOyFilm layer, ZnOx film layers or ZnAlOxAny in film layer Layer is any two layers；The reflecting layer is NbOxFilm layer, NbNxFilm layer, NiCr film layers, NiCrOxFilm layer, NiCrNxFilm layer or CrNxIn film layer Any layer；Second dielectric layer is TiOxFilm layer, SiNxFilm layer, SiNxOyFilm layer, ZnOx film layers, ZnAlOxFilm layer, SnOxFilm Layer, ZnSnOxFilm layer or any layer or any two layers in AZO film layers；First barrier layer, the second barrier layer are NiCr film layers, NiCrOxFilm layer, CrNxAny layer in film layer；The infrared-reflecting layers are Ag film layers；3rd dielectric layer is SiNxFilm layer, SiOxFilm layer, SiNxOyFilm layer or TiOxAny layer in film layer or any two Layer.
- 2. low anti-low permeability, tempered single silver low-radiation coated glass as claimed in claim 1, it is characterised in that：First electricity Dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers, the second barrier layer and the 3rd dielectric layer Thickness be respectively 32.0nm~58.7nm, 2.4nm~4.5nm, 50.3nm~79.7nm, 2.3nm~3.1nm, 5.8nm~ 9.2nm, 2.4nm~3.2nm and 22.5nm~39.9nm.
- 3. low anti-low permeability, tempered single silver low-radiation coated glass as claimed in claim 1, it is characterised in that：First electricity Dielectric layer is silicon nitride film layer, reflecting layer is nichrome film layer, the second dielectric layer is silicon nitride film layer, the first barrier layer is Nichrome film layer, infrared-reflecting layers are silver film, the second barrier layer is nichrome film layer, the 3rd dielectric layer is nitridation Silicon film.
- 4. low anti-low permeability, tempered single silver low-radiation coated glass as claimed in claim 3, it is characterised in that：First electricity Dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers, the second barrier layer and the 3rd dielectric layer Thickness is respectively 58.7nm, 4.5nm, 63.4nm, 2.3nm, 9.2nm, 2.4nm, 39.9nm.
- 5. low anti-low permeability, tempered single silver low-radiation coated glass as claimed in claim 3, it is characterised in that：First electricity Dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers, the second barrier layer and the 3rd dielectric layer Thickness is respectively 40.9nm, 4.6nm, 79.7nm, 2.6nm, 8.1nm, 2.6nm, 33.1nm.
- 6. low anti-low permeability, tempered single silver low-radiation coated glass as claimed in claim 1, it is characterised in that：First electricity Dielectric layer, reflecting layer, the second dielectric layer, the first barrier layer, infrared-reflecting layers, the second barrier layer and the 3rd dielectric layer Thickness is respectively 32.0nm, 1.4nm, 50.3nm, 3.1nm, 5.8nm, 2.9nm, 22.5nm.
- 7. low anti-low permeability, tempered single silver low-radiation coated glass as claimed in claim 1, it is characterised in that：The glass base Plate is float glass.
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| CN107117832A (en) * | 2017-05-05 | 2017-09-01 | 信义节能玻璃（芜湖）有限公司 | Low anti-low permeability, tempered single silver low-radiation coated glass and its manufacture method and application |
| CN111196683A (en) * | 2020-03-23 | 2020-05-26 | 中山市格兰特实业有限公司 | Three-silver temperable three-property gray Low-E glass |
| CN112225469A (en) * | 2020-11-02 | 2021-01-15 | 湖南旗滨节能玻璃有限公司 | Single-silver low-emissivity glass and preparation method thereof |
| CN114735945A (en) * | 2022-04-15 | 2022-07-12 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
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2017
- 2017-05-05 CN CN201720497503.3U patent/CN206751658U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107117832A (en) * | 2017-05-05 | 2017-09-01 | 信义节能玻璃（芜湖）有限公司 | Low anti-low permeability, tempered single silver low-radiation coated glass and its manufacture method and application |
| CN107117832B (en) * | 2017-05-05 | 2023-06-16 | 信义节能玻璃（芜湖）有限公司 | Low-reflection low-permeability toughened single-silver low-emissivity coated glass and manufacturing method and application thereof |
| CN111196683A (en) * | 2020-03-23 | 2020-05-26 | 中山市格兰特实业有限公司 | Three-silver temperable three-property gray Low-E glass |
| CN112225469A (en) * | 2020-11-02 | 2021-01-15 | 湖南旗滨节能玻璃有限公司 | Single-silver low-emissivity glass and preparation method thereof |
| CN114735945A (en) * | 2022-04-15 | 2022-07-12 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
| CN114735945B (en) * | 2022-04-15 | 2023-09-26 | 深圳南玻应用技术有限公司 | Composite glass and preparation method and application thereof |
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