WO2018099024A1 - Offline temperable 60%-transmittance low-radiation coated glass and method for fabrication thereof - Google Patents
Offline temperable 60%-transmittance low-radiation coated glass and method for fabrication thereof Download PDFInfo
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C03—GLASS; MINERAL OR SLAG WOOL
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
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- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
- C03C2217/256—Ag
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/27—Mixtures of metals, alloys
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Definitions
- the first silicon nitride layer has a thickness of 42 nm
- the first metal nickel chromium layer has a thickness of 15 nm
- the metal silver layer has a thickness of 13 nm.
- the thickness of the two-metal nickel-chromium layer was 15 nm
- the thickness of the second silicon nitride layer was 60 nm.
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Abstract
Provided is an offline temperable 60%-transmittance low-radiation coated glass and a method for fabrication thereof, comprising a glass substrate and a plated film layer; the transmittance is approximately 60%, the plated film layer uses as a protective layer a first silicon nitride film layer having a very low diffusion coefficient, and a first metal nickel chromium layer (2), a metal silver layer (3), a second metal nickel chromium layer (4), and a second silicon nitride layer (5) of corresponding thicknesses are sputtered in sequence.
Description
本发明涉及玻璃及其制备领域,尤其涉及一种离线可钢化六十透过率低辐射镀膜玻璃及其制备方法。The invention relates to the field of glass and its preparation, in particular to an off-line temperable sixty transmittance low-emission coated glass and a preparation method thereof.
低辐射镀膜玻璃是指对红外辐射具有高反射率,对可见光具有良好透射率的平板镀膜玻璃,低辐射镀膜玻璃具有良好的透光,辐射、隔热性能,广泛应用于窗户、冷藏柜门等地方。低辐射镀膜玻璃一般包括玻璃基体和镀膜层,镀膜层在很大程度上决定了低辐射膜的性能。Low-emission coated glass refers to flat-coated glass with high reflectivity for infrared radiation and good transmittance for visible light. Low-emission coated glass has good light transmission, radiation and thermal insulation properties, and is widely used in windows, refrigerator doors, etc. local. Low-emission coated glass generally includes a glass substrate and a coating layer, which largely determines the performance of the low-emission film.
现有的低辐射镀膜玻璃存在透过率与红外线阻隔效果以及隔热效果难以兼顾的缺点,通常存在红外线阻隔效果差,隔热功效不好且异地化后续深加工难以实现的问题。The conventional low-emission coated glass has a disadvantage that the transmittance and the infrared ray blocking effect and the heat insulating effect are difficult to cope with, and generally there is a problem that the infrared ray blocking effect is poor, the heat insulating effect is not good, and the subsequent deep processing is difficult to realize in the case of dissimilarization.
因此,需要一种新的技术方案去解决上述问题。Therefore, a new technical solution is needed to solve the above problems.
发明内容Summary of the invention
发明目的:为了克服现有技术中存在的问题,本发明提出了一种透过率在50%、对红外线阻隔效果好,隔热功效佳,同时能够实现异地化后续深加工的离线可钢化六十透过率镀膜玻璃及其制备方法。OBJECT OF THE INVENTION In order to overcome the problems in the prior art, the present invention proposes an off-line temperable sixty-six with a transmittance of 50%, a good infrared blocking effect, and good heat insulation effect, and at the same time, capable of realizing subsequent deep processing of different geodesicization. Transmissive coated glass and its preparation method.
技术方案:为了解决上述技术问题,本发明所采用的技术方案为:一种离线可钢化六十透过率低辐射镀膜玻璃,包括玻璃基片和镀膜层,所述镀膜层设于玻璃基片上,所述镀膜层依次由第一氮化硅层、第一金属镍铬层、金属银层、第二金属镍铬层、第二氮化硅层组成;所述第一氮化硅层的厚度为35-45nm、所述第一金属镍铬层的厚度为12-17nm、所述金属银层的厚度为8-13nm、所述第二金属镍铬层的厚度为12-17nm、所述第二氮化硅层的厚度为55-65nm。Technical Solution: In order to solve the above technical problem, the technical solution adopted by the present invention is: an off-line temperable sixty transmittance low-emission coated glass, comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate The coating layer is sequentially composed of a first silicon nitride layer, a first metal nickel chromium layer, a metal silver layer, a second metal nickel chromium layer, and a second silicon nitride layer; a thickness of the first silicon nitride layer 35-45 nm, the first metal nickel-chromium layer has a thickness of 12-17 nm, the metal silver layer has a thickness of 8-13 nm, and the second metal-nickel layer has a thickness of 12-17 nm. The thickness of the silicon nitride layer is 55-65 nm.
为了获得更加的性能,所述玻璃基片的厚度为3-15mm。In order to obtain more performance, the glass substrate has a thickness of 3-15 mm.
更进一步的,所述玻璃基片的厚度为6mm。Further, the glass substrate has a thickness of 6 mm.
为获得最优的镀膜玻璃片的品质,所述第一氮化硅层的厚度为42nm、所述第一金属镍铬层的厚度为15nm、所述金属银层的厚度为13nm、所述第二金属镍铬层的厚度为15nm、所述第二氮化硅层的厚度为60nm。In order to obtain an optimum quality of the coated glass sheet, the first silicon nitride layer has a thickness of 42 nm, the first metal nickel chromium layer has a thickness of 15 nm, and the metal silver layer has a thickness of 13 nm. The thickness of the two-metal nickel-chromium layer was 15 nm, and the thickness of the second silicon nitride layer was 60 nm.
本发明还公开了上述离线可钢化六十透过率低辐射镀膜玻璃的制备方法,包括如下步骤:The invention also discloses a preparation method of the above off-line temperable sixty transmittance low-emission coated glass, comprising the following steps:
(1)选择3-15mm厚度的玻璃基片,按预定尺寸切割成玻璃片,用清洗机对玻
璃片进行清洗;(1) Select a glass substrate with a thickness of 3-15mm, cut into glass pieces according to the predetermined size, and use a washing machine to glass
The glass is cleaned;
(2)将高真空磁控溅射镀膜设备的基础真空设置为10-3Pa,线速度设置为3.5m/min;(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 -3 Pa, and setting the line speed to 3.5 m/min;
(3)将玻璃基片送入镀膜室进行镀膜,设置第一高真空磁控溅射镀膜设备的功率为100-120KW,在玻璃基片上溅射第一层厚度为35-45nm的第一氮化硅层;(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 100-120 KW, and the first layer of the first layer having a thickness of 35-45 nm is sputtered on the glass substrate. Silicon layer
(4)设置第二高真空磁控溅射镀膜设备的功率为4-5KW,在玻璃基片上溅射第二层厚度为12-17nm的第一金属镍铬层;(4) setting a second high-vacuum magnetron sputtering coating device with a power of 4-5 KW, sputtering a second layer of a first metal nickel-chromium layer having a thickness of 12-17 nm on the glass substrate;
(5)设置第三真空磁控溅射镀膜设备的功率为3.5-4.5KW,在玻璃基片上溅射第三层厚度为8-13nm的金属银层;(5) setting a power of 3.5-4.5 KW for the third vacuum magnetron sputtering coating device, and sputtering a third metal silver layer having a thickness of 8-13 nm on the glass substrate;
(6)设置第四真空磁控溅射镀膜设备的功率为4-5KW,在玻璃基片上溅射第四层厚度为12-17nm的第二金属镍铬层;(6) setting a power of 4-5 KW of the fourth vacuum magnetron sputtering coating device, and sputtering a fourth second nickel-chromium layer having a thickness of 12-17 nm on the glass substrate;
(7)设置第五真空磁控溅射镀膜设备的功率为155-170KW,在玻璃基片上溅射第五层厚度为55-65nm的第二氮化硅层;即得所需离线可钢化六十透过率低辐射镀膜玻璃。(7) setting the power of the fifth vacuum magnetron sputtering coating device to 155-170 KW, sputtering a fifth layer of the second silicon nitride layer having a thickness of 55-65 nm on the glass substrate; Ten transmittance low-emission coated glass.
更为优选的,所述步骤(1)中选择厚度为6mm的玻璃基片。More preferably, in the step (1), a glass substrate having a thickness of 6 mm is selected.
在一些实施方式中,所述步骤(3)中在玻璃基片上溅射的第一氮化硅层的厚度为42nm、步骤(4)中在玻璃基片上溅射的第一金属镍铬层的厚度为15nm、步骤(5)中在玻璃基片上溅射的金属银层的厚度为13nm、步骤(6)中在玻璃基片上溅射的第二金属镍铬层的厚度为15nm、步骤(7)中在玻璃基片上溅射的第二氮化硅层的厚度为60nm。In some embodiments, the first silicon nitride layer sputtered on the glass substrate in the step (3) has a thickness of 42 nm, and the first metal nickel chromium layer sputtered on the glass substrate in the step (4) The thickness of the metal silver layer sputtered on the glass substrate in step (5) is 13 nm, and the thickness of the second metal nickel chromium layer sputtered on the glass substrate in step (6) is 15 nm, step (7) The thickness of the second silicon nitride layer sputtered on the glass substrate was 60 nm.
更为优选的,所述步骤(3)中设置第一高真空磁控溅射镀膜设备的功率为110KW、步骤(4)设置第二高真空磁控溅射镀膜设备的功率为4.3KW、步骤(5)中设置第三高真空磁控溅射镀膜设备的功率为4KW、步骤(6)中设置第四高真空磁控溅射镀膜设备的功率为4.3KW、步骤(7)中设置第五高真空磁控溅射镀膜设备的功率为160KW。More preferably, in the step (3), the power of the first high vacuum magnetron sputtering coating device is set to 110 KW, and the power of the second high vacuum magnetron sputtering coating device in step (4) is set to 4.3 KW. (5) The power of the third high vacuum magnetron sputtering coating device is set to 4 KW, the power of the fourth high vacuum magnetron sputtering coating device set in step (6) is 4.3 KW, and the fifth step is set in step (7). The power of the high vacuum magnetron sputtering coating equipment is 160 KW.
有益效果:本发明提供的一种离线可钢化六十透过率低辐射镀膜玻璃及其制备方法,包括玻璃基片和镀膜层,透过率在60%左右,镀膜层采用扩散系数很低的氮化硅膜层作为保护层,并依次溅射相应厚度的金属镍铬层、金属银层、金属镍铬层、氮化硅层,有较好的稳定性,针孔密度非常低,磁控溅射沉积的氮化硅
膜层致密、平整且硬度很高,对可动离子有非常强的阻挡能力,在1200℃时不发生氧化,有较好的抗蚀性,膜层在钢化炉中进行高温热处理时而不受损坏,保持了原有的热工性能。实现了离线可钢化六十透过率低辐射镀膜玻璃耐高温、高隔热,强阻隔红外线的性能,并实现远程异地化的切割、磨边、钢化、中空等后续加工。Advantageous Effects: The present invention provides an off-line temperable sixty transmittance low-emission coated glass and a preparation method thereof, comprising a glass substrate and a coating layer, the transmittance is about 60%, and the coating layer has a low diffusion coefficient. The silicon nitride film layer acts as a protective layer and sequentially sputters a corresponding thickness of the metal nickel-chromium layer, the metallic silver layer, the metallic nickel-chromium layer, and the silicon nitride layer, which has good stability, very low pinhole density, and magnetic control. Sputter deposited silicon nitride
The film is dense, flat and has high hardness. It has a strong barrier to mobile ions. It does not oxidize at 1200 ° C. It has good corrosion resistance. The film is not damaged when it is subjected to high temperature heat treatment in a tempering furnace. , maintaining the original thermal performance. It realizes off-line temperable sixty transmittance low-emission coated glass with high temperature resistance, high heat insulation, strong infrared shielding performance, and remote processing, such as cutting, edging, tempering and hollowing.
图1为本发明具体实施方式离线可钢化六十透过率低辐射镀膜玻璃镀膜层截面结构示意图。1 is a schematic cross-sectional view showing an off-line temperable sixty transmittance low-emission coating glass coating layer according to an embodiment of the present invention.
下面结合实施例对本发明作进一步的详细说明:The present invention will be further described in detail below with reference to the embodiments:
实施例1:Example 1:
一种离线可钢化六十透过率低辐射镀膜玻璃,包括玻璃基片和镀膜层,所述镀膜层设于玻璃基片上,所述镀膜层依次由第一氮化硅层1、第一金属镍铬层2、金属银层3、第二金属镍铬层4、第二氮化硅层5组成。所述第一氮化硅层1的厚度为42nm、所述第一金属镍铬层2的厚度为15nm、所述金属银层3的厚度为13nm、所述第二金属镍铬层4的厚度为15nm、所述第二氮化硅层5的厚度为60nm。An off-line temperable sixty transmittance low-emission coated glass comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer 1 and a first metal The nickel-chromium layer 2, the metallic silver layer 3, the second metallic nickel-chromium layer 4, and the second silicon nitride layer 5 are composed. The thickness of the first silicon nitride layer 1 is 42 nm, the thickness of the first metal nickel chromium layer 2 is 15 nm, the thickness of the metal silver layer 3 is 13 nm, and the thickness of the second metal nickel chromium layer 4. The thickness of the second silicon nitride layer 5 is 15 nm, which is 15 nm.
为了获得更加的性能,所述玻璃基片的厚度为6mm。In order to obtain more performance, the glass substrate has a thickness of 6 mm.
上述离线可钢化六十透过率低辐射镀膜玻璃的制备方法,包括如下步骤:The above-mentioned offline temperable sixty transmittance low-emission coated glass preparation method comprises the following steps:
(1)选择6mm厚度的玻璃基片,按预定尺寸切割成玻璃片,用清洗机对玻璃片进行清洗;(1) selecting a glass substrate having a thickness of 6 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;
(2)将高真空磁控溅射镀膜设备的基础真空设置为10-3Pa,线速度设置为3.5m/min;(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 -3 Pa, and setting the line speed to 3.5 m/min;
(3)将玻璃基片送入镀膜室进行镀膜,设置第一高真空磁控溅射镀膜设备的功率为110KW,在玻璃基片上溅射第一层厚度为42nm的第一氮化硅层1;(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 110 KW, and the first layer of the first silicon nitride layer having a thickness of 42 nm is sputtered on the glass substrate. ;
(4)设置第二高真空磁控溅射镀膜设备的功率为4.3KW,在玻璃基片上溅射第二层厚度为15nm的第一金属镍铬层2;(4) setting the power of the second high-vacuum magnetron sputtering coating device to 4.3 KW, sputtering a second layer of the first metal nickel-chromium layer 2 having a thickness of 15 nm on the glass substrate;
(5)设置第三真空磁控溅射镀膜设备的功率为4KW,在玻璃基片上溅射第三层厚度为13nm的金属银层3;(5) setting the power of the third vacuum magnetron sputtering coating device to 4 KW, sputtering a third layer of metal silver layer 3 having a thickness of 13 nm on the glass substrate;
(6)设置第四真空磁控溅射镀膜设备的功率为4.3KW,在玻璃基片上溅射第四层厚度为15nm的第二金属镍铬层4;
(6) setting the power of the fourth vacuum magnetron sputtering coating device to 4.3 KW, sputtering a fourth layer of the second metal nickel chromium layer 4 having a thickness of 15 nm on the glass substrate;
(7)设置第五真空磁控溅射镀膜设备的功率为160KW,在玻璃基片上溅射第五层厚度为60nm的第二氮化硅层5;即得所需离线可钢化六十透过率低辐射镀膜玻璃。(7) setting the power of the fifth vacuum magnetron sputtering coating device to 160 KW, and sputtering a fifth layer of the second silicon nitride layer 5 having a thickness of 60 nm on the glass substrate; Low rate radiation coated glass.
实施例2:Example 2:
一种离线可钢化六十透过率低辐射镀膜玻璃,包括玻璃基片和镀膜层,所述镀膜层设于玻璃基片上,所述镀膜层依次由第一氮化硅层1、第一金属镍铬层2、金属银层3、第二金属镍铬层4、第二氮化硅层5组成。所述第一氮化硅层1的厚度为35nm、所述第一金属镍铬层2的厚度为12nm、所述金属银层3的厚度为8nm、所述第二金属镍铬层4的厚度为12nm、所述第二氮化硅层5的厚度为55nm。An off-line temperable sixty transmittance low-emission coated glass comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer 1 and a first metal The nickel-chromium layer 2, the metallic silver layer 3, the second metallic nickel-chromium layer 4, and the second silicon nitride layer 5 are composed. The first silicon nitride layer 1 has a thickness of 35 nm, the first metal nickel chromium layer 2 has a thickness of 12 nm, the metal silver layer 3 has a thickness of 8 nm, and the second metal nickel chromium layer 4 has a thickness of 8 nm. The thickness of the second silicon nitride layer 5 is 12 nm, which is 12 nm.
为了获得更加的性能,所述玻璃基片的厚度为3mm。In order to obtain more performance, the glass substrate has a thickness of 3 mm.
上述离线可钢化六十透过率低辐射镀膜玻璃的制备方法,包括如下步骤:The above-mentioned offline temperable sixty transmittance low-emission coated glass preparation method comprises the following steps:
(1)选择3mm厚度的玻璃基片,按预定尺寸切割成玻璃片,用清洗机对玻璃片进行清洗;(1) selecting a glass substrate having a thickness of 3 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;
(2)将高真空磁控溅射镀膜设备的基础真空设置为10-3Pa,线速度设置为3.5m/min;(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 -3 Pa, and setting the line speed to 3.5 m/min;
(3)将玻璃基片送入镀膜室进行镀膜,设置第一高真空磁控溅射镀膜设备的功率为100KW,在玻璃基片上溅射第一层厚度为35nm的第一氮化硅层1;(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 100 KW, and the first first silicon nitride layer having a thickness of 35 nm is sputtered on the glass substrate. ;
(4)设置第二高真空磁控溅射镀膜设备的功率为4KW,在玻璃基片上溅射第二层厚度为12nm的第一金属镍铬层2;(4) setting the power of the second high-vacuum magnetron sputtering coating device to 4 KW, sputtering a second layer of the first metal nickel-chromium layer 2 having a thickness of 12 nm on the glass substrate;
(5)设置第三真空磁控溅射镀膜设备的功率为3.5KW,在玻璃基片上溅射第三层厚度为8nm的金属银层3;(5) setting the power of the third vacuum magnetron sputtering coating device to 3.5 KW, sputtering a third layer of metal silver layer 3 having a thickness of 8 nm on the glass substrate;
(6)设置第四真空磁控溅射镀膜设备的功率为4KW,在玻璃基片上溅射第四层厚度为12nm的第二金属镍铬层4;(6) setting the power of the fourth vacuum magnetron sputtering coating device to 4KW, sputtering a fourth layer of the second metal nickel chromium layer 4 having a thickness of 12 nm on the glass substrate;
(7)设置第五真空磁控溅射镀膜设备的功率为155KW,在玻璃基片上溅射第五层厚度为55nm的第二氮化硅层5;即得所需离线可钢化六十透过率低辐射镀膜玻璃。(7) setting the power of the fifth vacuum magnetron sputtering coating device to 155 KW, sputtering a fifth layer of the second silicon nitride layer 5 having a thickness of 55 nm on the glass substrate; Low rate radiation coated glass.
实施例3:Example 3:
一种离线可钢化六十透过率低辐射镀膜玻璃,包括玻璃基片和镀膜层,所述镀膜层设于玻璃基片上,所述镀膜层依次由第一氮化硅层1、第一金属镍铬层2、金属银层3、第二金属镍铬层4、第二氮化硅层5组成。所述第一氮化硅层1的
厚度为45nm、所述第一金属镍铬层2的厚度为17nm、所述金属银层3的厚度为13nm、所述第二金属镍铬层4的厚度为17nm、所述第二氮化硅层5的厚度为65nm。An off-line temperable sixty transmittance low-emission coated glass comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer 1 and a first metal The nickel-chromium layer 2, the metallic silver layer 3, the second metallic nickel-chromium layer 4, and the second silicon nitride layer 5 are composed. The first silicon nitride layer 1
The thickness is 45 nm, the thickness of the first metal nickel chromium layer 2 is 17 nm, the thickness of the metal silver layer 3 is 13 nm, the thickness of the second metal nickel chromium layer 4 is 17 nm, and the second silicon nitride Layer 5 has a thickness of 65 nm.
为了获得更加的性能,所述玻璃基片的厚度为15mm。In order to obtain more performance, the glass substrate has a thickness of 15 mm.
上述离线可钢化六十透过率低辐射镀膜玻璃的制备方法,包括如下步骤:The above-mentioned offline temperable sixty transmittance low-emission coated glass preparation method comprises the following steps:
(1)选择15mm厚度的玻璃基片,按预定尺寸切割成玻璃片,用清洗机对玻璃片进行清洗;(1) selecting a glass substrate having a thickness of 15 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;
(2)将高真空磁控溅射镀膜设备的基础真空设置为10-3Pa,线速度设置为3.5m/min;(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 -3 Pa, and setting the line speed to 3.5 m/min;
(3)将玻璃基片送入镀膜室进行镀膜,设置第一高真空磁控溅射镀膜设备的功率为120KW,在玻璃基片上溅射第一层厚度为45nm的第一氮化硅层1;(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 120 KW, and the first first silicon nitride layer having a thickness of 45 nm is sputtered on the glass substrate. ;
(4)设置第二高真空磁控溅射镀膜设备的功率为5KW,在玻璃基片上溅射第二层厚度为17nm的第一金属镍铬层2;(4) setting the power of the second high vacuum magnetron sputtering coating device to 5 KW, sputtering a second layer of the first metal nickel chrome layer 2 having a thickness of 17 nm on the glass substrate;
(5)设置第三真空磁控溅射镀膜设备的功率为4.5KW,在玻璃基片上溅射第三层厚度为13nm的金属银层3;(5) setting the power of the third vacuum magnetron sputtering coating device to 4.5 KW, sputtering a third layer of metal silver layer 3 having a thickness of 13 nm on the glass substrate;
(6)设置第四真空磁控溅射镀膜设备的功率为5KW,在玻璃基片上溅射第四层厚度为17nm的第二金属镍铬层4;(6) setting the power of the fourth vacuum magnetron sputtering coating device to 5KW, sputtering a fourth layer of the second metal nickel chromium layer 4 having a thickness of 17 nm on the glass substrate;
(7)设置第五真空磁控溅射镀膜设备的功率为170KW,在玻璃基片上溅射第五层厚度为65nm的第二氮化硅层5;即得所需离线可钢化六十透过率低辐射镀膜玻璃。(7) setting the power of the fifth vacuum magnetron sputtering coating device to 170 KW, and sputtering a fifth layer of the second silicon nitride layer 5 having a thickness of 65 nm on the glass substrate; Low rate radiation coated glass.
采用上述实施例1-3的一种离线可钢化六十透过率低辐射镀膜玻璃及其制备方法制备得到的低辐射镀膜玻璃,其透过率在60%左右,镀膜层在钢化炉中进行高温热处理时而不受损坏,保持了原有的热工性能,实现了离线可钢化六十透过率低辐射镀膜玻璃的耐高温、高隔热,强阻隔红外线的性能,并实现远程异地化的切割、磨边、钢化、中空等后续加工。The low-radiation coated glass prepared by using the off-line temperable sixty transmittance low-emission coated glass and the preparation method thereof according to the above embodiments 1-3 has a transmittance of about 60%, and the coating layer is performed in a tempering furnace. High-temperature heat treatment without damage, maintaining the original thermal performance, achieving off-line temperable 60-degree transmittance low-emission coated glass with high temperature resistance, high heat insulation, strong barrier infrared performance, and remote alienation Subsequent processing such as cutting, edging, tempering, and hollowing.
应当指出,以上具体实施方式仅用于说明本发明而不用于限制本发明的范围,在阅读了本发明之后,本领域技术人员对本发明的各种等价形式的修改均落于本申请所附权利要求所限定的范围。
It should be noted that the above specific embodiments are only intended to illustrate the invention and are not intended to limit the scope of the invention, and the modifications of the various equivalents of the invention are The scope defined by the claims.
Claims (8)
- 一种离线可钢化六十透过率低辐射镀膜玻璃,其特征在于包括玻璃基片和镀膜层,所述镀膜层设于玻璃基片上,所述镀膜层依次由第一氮化硅层(1)、第一金属镍铬层(2)、金属银层(3)、第二金属镍铬层(4)、第二氮化硅层(5)组成;所述第一氮化硅层(1)的厚度为35-45nm、所述第一金属镍铬层(2)的厚度为12-17nm、所述金属银层(3)的厚度为8-13nm、所述第二金属镍铬层(4)的厚度为12-17nm、所述第二氮化硅层(5)的厚度为55-65nm。An off-line temperable sixty transmittance low-emission coated glass, characterized by comprising a glass substrate and a coating layer, the coating layer being disposed on a glass substrate, wherein the coating layer is sequentially composed of a first silicon nitride layer (1) a first metal nickel-chromium layer (2), a metal silver layer (3), a second metal nickel-chromium layer (4), and a second silicon nitride layer (5); the first silicon nitride layer (1) a thickness of 35-45 nm, a thickness of the first metallic nickel-chromium layer (2) of 12-17 nm, a thickness of the metallic silver layer (3) of 8-13 nm, and a second metallic nickel-chromium layer ( 4) has a thickness of 12-17 nm, and the second silicon nitride layer (5) has a thickness of 55-65 nm.
- 根据权利要求1所述的离线可钢化六十透过率低辐射镀膜玻璃,其特征在于:所述玻璃基片的厚度为3-15mm。The off-line temperable sixty transmittance low-emission coated glass according to claim 1, wherein the glass substrate has a thickness of 3-15 mm.
- 根据权利要求2所述的离线可钢化六十透过率低辐射镀膜玻璃,其特征在于:所述玻璃基片的厚度为6mm。The off-line temperable sixty transmittance low-emission coated glass according to claim 2, wherein the glass substrate has a thickness of 6 mm.
- 根据权利要求1所述的离线可钢化六十透过率低辐射镀膜玻璃,其特征在于:所述第一氮化硅层(1)的厚度为42nm、所述第一金属镍铬层(2)的厚度为15nm、所述金属银层(3)的厚度为13nm、所述第二金属镍铬层(4)的厚度为15nm、所述第二氮化硅层(5)的厚度为60nm。The off-line temperable sixty transmittance low-emission coated glass according to claim 1, wherein the first silicon nitride layer (1) has a thickness of 42 nm and the first metal nickel-chromium layer (2) a thickness of 15 nm, a thickness of the metallic silver layer (3) of 13 nm, a thickness of the second metallic nickel-chromium layer (4) of 15 nm, and a thickness of the second silicon nitride layer (5) of 60 nm .
- 如权利要求1所述的离线可钢化六十透过率低辐射镀膜玻璃的制备方法,其特征在于包括如下步骤:The method for preparing an off-line temperable sixty transmittance low-emission coated glass according to claim 1, comprising the steps of:(1)选择3-15mm厚度的玻璃基片,按预定尺寸切割成玻璃片,用清洗机对玻璃片进行清洗;(1) selecting a glass substrate having a thickness of 3-15 mm, cutting into a glass piece according to a predetermined size, and cleaning the glass piece with a washing machine;(2)将高真空磁控溅射镀膜设备的基础真空设置为10-3Pa,线速度设置为3.5m/min;(2) setting the basic vacuum of the high vacuum magnetron sputtering coating device to 10 -3 Pa, and setting the line speed to 3.5 m/min;(3)将玻璃基片送入镀膜室进行镀膜,设置第一高真空磁控溅射镀膜设备的功率为100-120KW,在玻璃基片上溅射第一层厚度为35-45nm的第一氮化硅层(1);(3) The glass substrate is sent to the coating chamber for coating, and the power of the first high vacuum magnetron sputtering coating device is set to 100-120 KW, and the first layer of the first layer having a thickness of 35-45 nm is sputtered on the glass substrate. Silicon layer (1);(4)设置第二高真空磁控溅射镀膜设备的功率为4-5KW,在玻璃基片上溅射第二层厚度为12-17nm的第一金属镍铬层(2);(4) setting the power of the second high vacuum magnetron sputtering coating device to 4-5 KW, sputtering a second layer of the first metal nickel chrome layer (2) having a thickness of 12-17 nm on the glass substrate;(5)设置第三真空磁控溅射镀膜设备的功率为3.5-4.5KW,在玻璃基片上溅射第三层厚度为8-13nm的金属银层(3);(5) setting the power of the third vacuum magnetron sputtering coating device to 3.5-4.5 KW, sputtering a third layer of metal silver layer (8) having a thickness of 8-13 nm on the glass substrate;(6)设置第四真空磁控溅射镀膜设备的功率为4-5KW,在玻璃基片上溅射第四层厚度为12-17nm的第二金属镍铬层(4);(6) setting a fourth vacuum magnetron sputtering coating device with a power of 4-5 KW, sputtering a fourth layer of a second metal nickel chrome layer (4) having a thickness of 12-17 nm on the glass substrate;(7)设置第五真空磁控溅射镀膜设备的功率为155-170KW,在玻璃基片上溅 射第五层厚度为55-65nm的第二氮化硅层(5);即得所需离线可钢化六十透过率低辐射镀膜玻璃。(7) Setting the power of the fifth vacuum magnetron sputtering coating equipment to 155-170 KW, splashing on the glass substrate The fifth layer of the second silicon nitride layer (5) having a thickness of 55-65 nm is shot; that is, the off-line temperable sixty transmittance low-emission coated glass is obtained.
- 根据权利要求5所述的离线可钢化六十透过率低辐射镀膜玻璃的制备方法,其特征在于:所述步骤(1)中选择厚度为6mm的玻璃基片。The method for preparing an off-line temperable sixty transmittance low-emission coated glass according to claim 5, wherein a glass substrate having a thickness of 6 mm is selected in the step (1).
- 根据权利要求5所述的离线可钢化六十透过率低辐射镀膜玻璃的制备方法,其特征在于:所述步骤(3)中在玻璃基片上溅射的第一氮化硅层(1)的厚度为42nm、步骤(4)中在玻璃基片上溅射的第一金属镍铬层(2)的厚度为15nm、步骤(5)中在玻璃基片上溅射的金属银层(3)的厚度为13nm、步骤(6)中在玻璃基片上溅射的第二金属镍铬层(4)的厚度为15nm、步骤(7)中在玻璃基片上溅射的第二氮化硅层(5)的厚度为60nm。The method for preparing an off-line temperable sixty transmittance low-emission coated glass according to claim 5, wherein: the first silicon nitride layer (1) sputtered on the glass substrate in the step (3) The thickness of the first metal nickel-chromium layer (2) sputtered on the glass substrate in step (4) is 15 nm, and the metal silver layer (3) sputtered on the glass substrate in the step (5) a second silicon nitride layer (5) having a thickness of 13 nm, a second metal nickel-chromium layer (4) sputtered on the glass substrate in the step (6) of 15 nm, and a sputtering on the glass substrate in the step (7) (5) The thickness is 60 nm.
- 根据权利要求6所述的离线可钢化六十透过率低辐射镀膜玻璃的制备方法,其特征在于:所述步骤(3)中设置第一高真空磁控溅射镀膜设备的功率为110KW、步骤(4)设置第二高真空磁控溅射镀膜设备的功率为4.3KW、步骤(5)中设置第三高真空磁控溅射镀膜设备的功率为4KW、步骤(6)中设置第四高真空磁控溅射镀膜设备的功率为4.3KW、步骤(7)中设置第五高真空磁控溅射镀膜设备的功率为160KW。 The method for preparing an off-line temperable sixty transmittance low-emission coated glass according to claim 6, wherein the power of the first high-vacuum magnetron sputtering coating device in the step (3) is 110 KW, Step (4) setting the power of the second high vacuum magnetron sputtering coating device to be 4.3 KW, setting the power of the third high vacuum magnetron sputtering coating device in step (5) to 4 KW, and setting the fourth in step (6) The power of the high vacuum magnetron sputtering coating device is 4.3 KW, and the power of the fifth high vacuum magnetron sputtering coating device set in step (7) is 160 KW.
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PCT/CN2017/086587 WO2018099024A1 (en) | 2016-11-30 | 2017-05-31 | Offline temperable 60%-transmittance low-radiation coated glass and method for fabrication thereof |
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CN (1) | CN106746727A (en) |
WO (1) | WO2018099024A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108726891A (en) * | 2018-08-17 | 2018-11-02 | 北京汉能光伏投资有限公司 | Low radiation coated glass and preparation method thereof |
CN109291554A (en) * | 2018-09-30 | 2019-02-01 | 平湖市欧文洁具有限公司 | A kind of ground glass for shower house |
CN110255922A (en) * | 2019-06-05 | 2019-09-20 | 福建新福兴玻璃有限公司 | A kind of double-silver low-emissivity coated glass and preparation method thereof |
CN111606578A (en) * | 2020-06-29 | 2020-09-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-radiation coated glass and preparation method thereof |
CN112406222A (en) * | 2020-11-19 | 2021-02-26 | 四川南玻节能玻璃有限公司 | LOW-E coated laminated glass, hollow glass and preparation method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5563734A (en) * | 1993-04-28 | 1996-10-08 | The Boc Group, Inc. | Durable low-emissivity solar control thin film coating |
CN1363530A (en) * | 2001-01-09 | 2002-08-14 | 上海耀华皮尔金顿玻璃股份有限公司 | Absorption-type low-radiation film coated glass |
CN201817409U (en) * | 2010-09-28 | 2011-05-04 | 林嘉宏 | Low-emitting glass capable of being tampered and processed in different places |
CN201864667U (en) * | 2010-10-22 | 2011-06-15 | 格兰特工程玻璃(中山)有限公司 | Single silver LOW-E glass capable of being toughened |
CN102615877A (en) * | 2012-03-29 | 2012-08-01 | 江苏奥蓝工程玻璃有限公司 | Low-radiation coated glass capable of being toughened off line and production method thereof |
CN202576250U (en) * | 2012-03-29 | 2012-12-05 | 江苏奥蓝工程玻璃有限公司 | Offline temperable low-radiation coated glass |
-
2016
- 2016-11-30 CN CN201611092796.3A patent/CN106746727A/en active Pending
-
2017
- 2017-05-31 WO PCT/CN2017/086587 patent/WO2018099024A1/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5563734A (en) * | 1993-04-28 | 1996-10-08 | The Boc Group, Inc. | Durable low-emissivity solar control thin film coating |
CN1363530A (en) * | 2001-01-09 | 2002-08-14 | 上海耀华皮尔金顿玻璃股份有限公司 | Absorption-type low-radiation film coated glass |
CN201817409U (en) * | 2010-09-28 | 2011-05-04 | 林嘉宏 | Low-emitting glass capable of being tampered and processed in different places |
CN201864667U (en) * | 2010-10-22 | 2011-06-15 | 格兰特工程玻璃(中山)有限公司 | Single silver LOW-E glass capable of being toughened |
CN102615877A (en) * | 2012-03-29 | 2012-08-01 | 江苏奥蓝工程玻璃有限公司 | Low-radiation coated glass capable of being toughened off line and production method thereof |
CN202576250U (en) * | 2012-03-29 | 2012-12-05 | 江苏奥蓝工程玻璃有限公司 | Offline temperable low-radiation coated glass |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108726891A (en) * | 2018-08-17 | 2018-11-02 | 北京汉能光伏投资有限公司 | Low radiation coated glass and preparation method thereof |
CN108726891B (en) * | 2018-08-17 | 2024-03-29 | 上海祖强能源有限公司 | Low-emissivity coated glass and preparation method thereof |
CN109291554A (en) * | 2018-09-30 | 2019-02-01 | 平湖市欧文洁具有限公司 | A kind of ground glass for shower house |
CN110255922A (en) * | 2019-06-05 | 2019-09-20 | 福建新福兴玻璃有限公司 | A kind of double-silver low-emissivity coated glass and preparation method thereof |
CN110255922B (en) * | 2019-06-05 | 2023-09-08 | 新福兴玻璃工业集团有限公司 | Double-silver low-emissivity coated glass and preparation method thereof |
CN111606578A (en) * | 2020-06-29 | 2020-09-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-radiation coated glass and preparation method thereof |
CN111606578B (en) * | 2020-06-29 | 2023-12-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-emissivity coated glass and preparation method thereof |
CN112406222A (en) * | 2020-11-19 | 2021-02-26 | 四川南玻节能玻璃有限公司 | LOW-E coated laminated glass, hollow glass and preparation method thereof |
CN112406222B (en) * | 2020-11-19 | 2022-11-29 | 四川南玻节能玻璃有限公司 | LOW-E coated laminated glass, hollow glass and preparation method thereof |
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