CN106746727A - It is a kind of offline can the transmitance low radiation coated glass of tempering 60 and preparation method thereof - Google Patents
It is a kind of offline can the transmitance low radiation coated glass of tempering 60 and preparation method thereof Download PDFInfo
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- CN106746727A CN106746727A CN201611092796.3A CN201611092796A CN106746727A CN 106746727 A CN106746727 A CN 106746727A CN 201611092796 A CN201611092796 A CN 201611092796A CN 106746727 A CN106746727 A CN 106746727A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
- C03C2217/256—Ag
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/27—Mixtures of metals, alloys
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
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- Surface Treatment Of Glass (AREA)
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Abstract
The invention discloses it is a kind of offline can the transmitance low radiation coated glass of tempering 60 and preparation method thereof, including glass substrate and film plating layer, transmitance is 60% or so, film plating layer is using the very low silicon nitride film layer of diffusion coefficient as protective layer, and the metal nicr layer of respective thickness is sputtered successively, metallic silver layer, metal nicr layer, silicon nitride layer, there is preferable stability, pinhold density is very low, the silicon nitride film layer of magnetron sputtering deposition is fine and close, it is smooth and hardness is very high, there is very strong blocking capability to mobile ion, do not aoxidized at 1200 DEG C, there is preferable corrosion stability, it is when film layer carries out high-temperature heat treatment in annealing furnace and without damage, maintain original thermal property.Realize offline can the transmitance low radiation coated glass high temperature resistant of tempering 60, high heat-insulated, intercept ultrared performance by force, and realize the following process such as the cutting in long-range strange land, edging, tempering, hollow.
Description
Technical field
The present invention relates to glass and its preparation field, more particularly to one kind offline can the transmitance of tempering 60 it is low-emission coated
Glass and preparation method thereof.
Background technology
Low radiation coated glass refers to have high reflectance to infra-red radiation, the flat board to visible ray with good transmissivity
Coated glass, low radiation coated glass has good printing opacity, and radiation, heat-proof quality are widely used in window, refrigeration cabinet door etc.
Place.Low radiation coated glass generally comprises glass basis and film plating layer, and film plating layer largely determines low-radiation film
Performance.
There is transmitance and be difficult to what is taken into account with infrared ray barriering effect and effect of heat insulation in existing low radiation coated glass
Shortcoming, generally has that infrared ray barriering effect is poor, the problem that insulative effectiveness is bad and the follow-up deep processing of strange landization is difficult to.
Accordingly, it would be desirable to a kind of new technical scheme goes to solve the above problems.
The content of the invention
Goal of the invention:In order to overcome problems of the prior art, the present invention propose a kind of transmitance 50%, it is right
Infrared ray barriering effect is good, and insulative effectiveness is good, while can realize that the offline of the follow-up deep processing of strange landization can the transmission of tempering 60
Rate coated glass and preparation method thereof.
Technical scheme:In order to solve the above-mentioned technical problem, the technical solution adopted in the present invention is:One kind offline can tempering
60 transmitance low radiation coated glass, including glass substrate and film plating layer, the film plating layer are located in glass substrate, the plating
Film layer is successively by the first silicon nitride layer, the first metal nicr layer, metallic silver layer, the second metal nicr layer, the second silicon nitride layer group
Into;The thickness of first silicon nitride layer is 35-45nm, the thickness of the first metal nicr layer is 12-17nm, the metal
The thickness of silver layer is 8-13nm, the thickness of the second metal nicr layer is 12-17nm, the thickness of second silicon nitride layer is
55-65nm。
In order to obtain more performance, the thickness of the glass substrate is 3-15mm.
Further, the thickness of the glass substrate is 6mm.
To obtain the quality of optimal coated glass piece, the thickness of first silicon nitride layer is 42nm, first gold medal
The thickness of category nicr layer is 15nm, the thickness of the metallic silver layer is 13nm, the thickness of the second metal nicr layer is 15nm,
The thickness of second silicon nitride layer is 60nm.
The invention also discloses it is above-mentioned offline can the transmitance low radiation coated glass of tempering 60 preparation method, including such as
Lower step:
(1) glass substrate of 3-15mm thickness is selected, sheet glass is cut into by preliminary dimension, sheet glass is entered with cleaning machine
Row cleaning;
(2) base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10-3Pa, linear velocity is set to 3.5m/
min;
(3) glass substrate feeding coating chamber is carried out into plated film, the power of the first high vacuum magnetic-controlled sputtering coating equipment is set
It is 100-120KW, it is first silicon nitride layer of 35-45nm that ground floor thickness is sputtered on a glass substrate;
(4) power for setting the second high vacuum magnetic-controlled sputtering coating equipment is 4-5KW, and the second layer is sputtered on a glass substrate
Thickness is the first metal nicr layer of 12-17nm;
(5) power for setting the 3rd vacuum magnetron sputtering coating film equipment is 3.5-4.5KW, and the 3rd is sputtered on a glass substrate
Thickness degree is the metallic silver layer of 8-13nm;
(6) power for setting the 4th vacuum magnetron sputtering coating film equipment is 4-5KW, and the 4th thickness is sputtered on a glass substrate
Spend the second metal nicr layer for 12-17nm;
(7) power for setting the 5th vacuum magnetron sputtering coating film equipment is 155-170KW, and the 5th is sputtered on a glass substrate
Thickness degree is second silicon nitride layer of 55-65nm;Offline can the transmitance low radiation coated glass of tempering 60 needed for obtaining final product.
It is more highly preferred to, selection thickness is the glass substrate of 6mm in the step (1).
In some embodiments, the thickness of the first silicon nitride layer for being sputtered on a glass substrate in the step (3) is
The thickness of the first metal nicr layer sputtered on a glass substrate in 42nm, step (4) be 15nm, step (5) in glass base
The thickness of the metallic silver layer sputtered on piece is the thickness of the second metal nicr layer sputtered on a glass substrate in 13nm, step (6)
Spend for the thickness of the second silicon nitride layer sputtered on a glass substrate in 15nm, step (7) is 60nm.
Be more highly preferred to, set in the step (3) power of the first high vacuum magnetic-controlled sputtering coating equipment for 110KW,
The power that step (4) sets the second high vacuum magnetic-controlled sputtering coating equipment is 4.3KW, step (5) is middle sets the 3rd high vacuum magnetic
Control the power of sputtering coating equipment is to set the power of the 4th high vacuum magnetic-controlled sputtering coating equipment in 4KW, step (6)
The power that the 5th high vacuum magnetic-controlled sputtering coating equipment is set in 4.3KW, step (7) is 160KW.
Beneficial effect:One kind that the present invention is provided offline can the transmitance low radiation coated glass of tempering 60 and its preparation side
Method, including glass substrate and film plating layer, transmitance 60% or so, using the very low silicon nitride film layer of diffusion coefficient made by film plating layer
It is protective layer, and sputters metal nicr layer, metallic silver layer, metal nicr layer, the silicon nitride layer of respective thickness successively, has preferably
Stability, pinhold density is very low, and the silicon nitride film layer of magnetron sputtering deposition is fine and close, smooth and hardness is very high, to mobile ion
There is very strong blocking capability, do not aoxidized at 1200 DEG C, there is preferable corrosion stability, film layer carries out high temperature in annealing furnace
It is without damage during heat treatment, maintain original thermal property.Realize offline can the transmitance of tempering 60 it is low-emission coated
It is glass high temperature resistant, high heat-insulated, intercept ultrared performance by force, and realize the cutting in long-range strange land, edging, tempering, hollow etc.
Following process.
Brief description of the drawings
Fig. 1 offline can the transmitance low radiation coated glass plated film layer cross section knot of tempering 60 for the specific embodiment of the invention
Structure schematic diagram.
Specific embodiment
With reference to embodiment, the present invention is described in further detail:
Embodiment 1:
It is a kind of offline can the transmitance low radiation coated glass of tempering 60, including glass substrate and film plating layer, the plated film
In glass substrate, the film plating layer is successively by the first silicon nitride layer 1, the first metal nicr layer 2, metallic silver layer 3, second for layer
Metal nicr layer 4, the second silicon nitride layer 5 are constituted.The thickness of first silicon nitride layer 1 is 42nm, the first metal nickel chromium triangle
The thickness of layer 2 is 15nm, the thickness of the metallic silver layer 3 is 13nm, the thickness of the second metal nicr layer 4 is 15nm, institute
The thickness for stating the second silicon nitride layer 5 is 60nm.
In order to obtain more performance, the thickness of the glass substrate is 6mm.
It is above-mentioned offline can the transmitance low radiation coated glass of tempering 60 preparation method, comprise the following steps:
(1) glass substrate of 6mm thickness is selected, sheet glass is cut into by preliminary dimension, sheet glass is carried out with cleaning machine
Cleaning;
(2) base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10-3Pa, linear velocity is set to 3.5m/
min;
(3) glass substrate feeding coating chamber is carried out into plated film, the power of the first high vacuum magnetic-controlled sputtering coating equipment is set
It is 110KW, it is first silicon nitride layer 1 of 42nm that ground floor thickness is sputtered on a glass substrate;
(4) power for setting the second high vacuum magnetic-controlled sputtering coating equipment is 4.3KW, and the second layer is sputtered on a glass substrate
Thickness is the first metal nicr layer 2 of 15nm;
(5) power for setting the 3rd vacuum magnetron sputtering coating film equipment is 4KW, and third layer thickness is sputtered on a glass substrate
It is the metallic silver layer 3 of 13nm;
(6) power for setting the 4th vacuum magnetron sputtering coating film equipment is 4.3KW, and the 4th thickness is sputtered on a glass substrate
Spend the second metal nicr layer 4 for 15nm;
(7) power for setting the 5th vacuum magnetron sputtering coating film equipment is 160KW, layer 5 is sputtered on a glass substrate thick
Spend the second silicon nitride layer 5 for 60nm;Offline can the transmitance low radiation coated glass of tempering 60 needed for obtaining final product.
Embodiment 2:
It is a kind of offline can the transmitance low radiation coated glass of tempering 60, including glass substrate and film plating layer, the plated film
In glass substrate, the film plating layer is successively by the first silicon nitride layer 1, the first metal nicr layer 2, metallic silver layer 3, second for layer
Metal nicr layer 4, the second silicon nitride layer 5 are constituted.The thickness of first silicon nitride layer 1 is 35nm, the first metal nickel chromium triangle
The thickness of layer 2 is 12nm, the thickness of the metallic silver layer 3 is 8nm, the thickness of the second metal nicr layer 4 is 12nm, described
The thickness of the second silicon nitride layer 5 is 55nm.
In order to obtain more performance, the thickness of the glass substrate is 3mm.
It is above-mentioned offline can the transmitance low radiation coated glass of tempering 60 preparation method, comprise the following steps:
(1) glass substrate of 3mm thickness is selected, sheet glass is cut into by preliminary dimension, sheet glass is carried out with cleaning machine
Cleaning;
(2) base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10-3Pa, linear velocity is set to 3.5m/
min;
(3) glass substrate feeding coating chamber is carried out into plated film, the power of the first high vacuum magnetic-controlled sputtering coating equipment is set
It is 100KW, it is first silicon nitride layer 1 of 35nm that ground floor thickness is sputtered on a glass substrate;
(4) power for setting the second high vacuum magnetic-controlled sputtering coating equipment is 4KW, and the second thickness is sputtered on a glass substrate
Spend the first metal nicr layer 2 for 12nm;
(5) power for setting the 3rd vacuum magnetron sputtering coating film equipment is 3.5KW, third layer is sputtered on a glass substrate thick
Spend the metallic silver layer 3 for 8nm;
(6) power for setting the 4th vacuum magnetron sputtering coating film equipment is 4KW, and the 4th thickness degree is sputtered on a glass substrate
It is the second metal nicr layer 4 of 12nm;
(7) power for setting the 5th vacuum magnetron sputtering coating film equipment is 155KW, layer 5 is sputtered on a glass substrate thick
Spend the second silicon nitride layer 5 for 55nm;Offline can the transmitance low radiation coated glass of tempering 60 needed for obtaining final product.
Embodiment 3:
It is a kind of offline can the transmitance low radiation coated glass of tempering 60, including glass substrate and film plating layer, the plated film
In glass substrate, the film plating layer is successively by the first silicon nitride layer 1, the first metal nicr layer 2, metallic silver layer 3, second for layer
Metal nicr layer 4, the second silicon nitride layer 5 are constituted.The thickness of first silicon nitride layer 1 is 45nm, the first metal nickel chromium triangle
The thickness of layer 2 is 17nm, the thickness of the metallic silver layer 3 is 13nm, the thickness of the second metal nicr layer 4 is 17nm, institute
The thickness for stating the second silicon nitride layer 5 is 65nm.
In order to obtain more performance, the thickness of the glass substrate is 15mm.
It is above-mentioned offline can the transmitance low radiation coated glass of tempering 60 preparation method, comprise the following steps:
(1) glass substrate of 15mm thickness is selected, sheet glass is cut into by preliminary dimension, sheet glass is carried out with cleaning machine
Cleaning;
(2) base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10-3Pa, linear velocity is set to 3.5m/
min;
(3) glass substrate feeding coating chamber is carried out into plated film, the power of the first high vacuum magnetic-controlled sputtering coating equipment is set
It is 120KW, it is first silicon nitride layer 1 of 45nm that ground floor thickness is sputtered on a glass substrate;
(4) power for setting the second high vacuum magnetic-controlled sputtering coating equipment is 5KW, and the second thickness is sputtered on a glass substrate
Spend the first metal nicr layer 2 for 17nm;
(5) power for setting the 3rd vacuum magnetron sputtering coating film equipment is 4.5KW, third layer is sputtered on a glass substrate thick
Spend the metallic silver layer 3 for 13nm;
(6) power for setting the 4th vacuum magnetron sputtering coating film equipment is 5KW, and the 4th thickness degree is sputtered on a glass substrate
It is the second metal nicr layer 4 of 17nm;
(7) power for setting the 5th vacuum magnetron sputtering coating film equipment is 170KW, layer 5 is sputtered on a glass substrate thick
Spend the second silicon nitride layer 5 for 65nm;Offline can the transmitance low radiation coated glass of tempering 60 needed for obtaining final product.
A kind of using above-described embodiment 1-3 offline can the transmitance low radiation coated glass of tempering 60 and preparation method thereof
The low radiation coated glass for preparing, its transmitance 60% or so, when film plating layer carries out high-temperature heat treatment in annealing furnace
And it is without damage, maintain original thermal property, realize offline can the transmitance low radiation coated glass of tempering 60 it is resistance to
It is high temperature, high heat-insulated, intercept ultrared performance by force, and realize that the cutting in long-range strange land, edging, tempering, hollow etc. subsequently add
Work.
It should be pointed out that above specific embodiment is only illustrative of the invention and is not intended to limit the scope of the invention,
Read after the present invention, modification of the those skilled in the art to the various equivalent form of values of the invention falls within and weighed appended by the application
Profit requires limited range.
Claims (8)
1. one kind offline can the transmitance low radiation coated glass of tempering 60, it is characterised in that including glass substrate and film plating layer,
In glass substrate, the film plating layer is successively by the first silicon nitride layer (1), the first metal nicr layer (2), gold for the film plating layer
Category silver layer (3), the second metal nicr layer (4), the second silicon nitride layer (5) composition;The thickness of first silicon nitride layer (1) is
35-45nm, the thickness of the first metal nicr layer (2) are 12-17nm, the thickness of the metallic silver layer (3) is 8-13nm, institute
The thickness of the second metal nicr layer (4) is stated for the thickness of 12-17nm, second silicon nitride layer (5) is 55-65nm.
2. according to claim 1 offline can the transmitance low radiation coated glass of tempering 60, it is characterised in that:The glass
The thickness of glass substrate is 3-15mm.
3. according to claim 2 offline can the transmitance low radiation coated glass of tempering 60, it is characterised in that:The glass
The thickness of glass substrate is 6mm.
4. according to claim 1 offline can the transmitance low radiation coated glass of tempering 60, it is characterised in that:Described
The thickness of one silicon nitride layer (1) is 42nm, the thickness of the first metal nicr layer (2) is 15nm, the metallic silver layer (3)
Thickness is 13nm, the thickness of the second metal nicr layer (4) is 15nm, the thickness of second silicon nitride layer (5) is 60nm.
5. it is as claimed in claim 1 offline can the transmitance low radiation coated glass of tempering 60 preparation method, its feature exists
In comprising the following steps:
(1) glass substrate of 3-15mm thickness is selected, sheet glass is cut into by preliminary dimension, sheet glass is carried out clearly with cleaning machine
Wash;
(2) base vacuum of high vacuum magnetic-controlled sputtering coating equipment is set to 10-3Pa, linear velocity is set to 3.5m/min;
(3) glass substrate feeding coating chamber is carried out into plated film, the power for setting the first high vacuum magnetic-controlled sputtering coating equipment is
100-120KW, it is first silicon nitride layer (1) of 35-45nm that ground floor thickness is sputtered on a glass substrate;
(4) power for setting the second high vacuum magnetic-controlled sputtering coating equipment is 4-5KW, and second layer thickness is sputtered on a glass substrate
It is the first metal nicr layer (2) of 12-17nm;
(5) power for setting the 3rd vacuum magnetron sputtering coating film equipment is 3.5-4.5KW, third layer is sputtered on a glass substrate thick
Spend the metallic silver layer (3) for 8-13nm;
(6) power for setting the 4th vacuum magnetron sputtering coating film equipment is 4-5KW, the 4th thickness degree is sputtered on a glass substrate and is
The second metal nicr layer (4) of 12-17nm;
(7) power for setting the 5th vacuum magnetron sputtering coating film equipment is 155-170KW, layer 5 is sputtered on a glass substrate thick
Spend the second silicon nitride layer (5) for 55-65nm;Offline can the transmitance low radiation coated glass of tempering 60 needed for obtaining final product.
6. it is according to claim 5 offline can the transmitance low radiation coated glass of tempering 60 preparation method, its feature
It is:Selection thickness is the glass substrate of 6mm in the step (1).
7. it is according to claim 5 offline can the transmitance low radiation coated glass of tempering 60 preparation method, its feature
It is:The thickness of the first silicon nitride layer (1) sputtered on a glass substrate in the step (3) be 42nm, step (4) in glass
The thickness of the first metal nicr layer (2) sputtered on glass substrate is the argent sputtered on a glass substrate in 15nm, step (5)
The thickness of layer (3) is 15nm, walks for the thickness of the second metal nicr layer (4) sputtered on a glass substrate in 13nm, step (6)
The thickness of the second silicon nitride layer (5) for being sputtered on a glass substrate in (7) suddenly is 60nm.
8. it is according to claim 6 offline can the transmitance low radiation coated glass of tempering 60 preparation method, its feature
It is:The power that the first high vacuum magnetic-controlled sputtering coating equipment is set in the step (3) is 110KW, step (4) sets second
The power of high vacuum magnetic-controlled sputtering coating equipment is the 3rd high vacuum magnetic-controlled sputtering coating equipment of setting in 4.3KW, step (5)
Power is 4KW, the middle power for setting the 4th high vacuum magnetic-controlled sputtering coating equipment of step (6) is 4.3KW, the middle setting of step (7)
The power of the 5th high vacuum magnetic-controlled sputtering coating equipment is 160KW.
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CN201611092796.3A CN106746727A (en) | 2016-11-30 | 2016-11-30 | It is a kind of offline can the transmitance low radiation coated glass of tempering 60 and preparation method thereof |
PCT/CN2017/086587 WO2018099024A1 (en) | 2016-11-30 | 2017-05-31 | Offline temperable 60%-transmittance low-radiation coated glass and method for fabrication thereof |
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CN108726891B (en) * | 2018-08-17 | 2024-03-29 | 上海祖强能源有限公司 | Low-emissivity coated glass and preparation method thereof |
CN109291554A (en) * | 2018-09-30 | 2019-02-01 | 平湖市欧文洁具有限公司 | A kind of ground glass for shower house |
CN110255922B (en) * | 2019-06-05 | 2023-09-08 | 新福兴玻璃工业集团有限公司 | Double-silver low-emissivity coated glass and preparation method thereof |
CN113443836A (en) * | 2020-03-26 | 2021-09-28 | 沙河市峰禾玻璃科技有限公司 | Glass mirror capable of being tempered in different places and preparation method thereof |
CN111606578B (en) * | 2020-06-29 | 2023-12-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-emissivity coated glass and preparation method thereof |
CN112406222B (en) * | 2020-11-19 | 2022-11-29 | 四川南玻节能玻璃有限公司 | LOW-E coated laminated glass, hollow glass and preparation method thereof |
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CN201864667U (en) * | 2010-10-22 | 2011-06-15 | 格兰特工程玻璃(中山)有限公司 | Single silver LOW-E glass capable of being toughened |
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US5563734A (en) * | 1993-04-28 | 1996-10-08 | The Boc Group, Inc. | Durable low-emissivity solar control thin film coating |
CN1363530A (en) * | 2001-01-09 | 2002-08-14 | 上海耀华皮尔金顿玻璃股份有限公司 | Absorption-type low-radiation film coated glass |
CN201817409U (en) * | 2010-09-28 | 2011-05-04 | 林嘉宏 | Low-emitting glass capable of being tampered and processed in different places |
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