CN106431012A - Temperable high-transparency and low-radiation coated glass and manufacturing method thereof - Google Patents
Temperable high-transparency and low-radiation coated glass and manufacturing method thereof Download PDFInfo
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- CN106431012A CN106431012A CN201611054961.6A CN201611054961A CN106431012A CN 106431012 A CN106431012 A CN 106431012A CN 201611054961 A CN201611054961 A CN 201611054961A CN 106431012 A CN106431012 A CN 106431012A
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- tempering
- radiation coated
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- 239000011521 glass Substances 0.000 title claims abstract description 68
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 239000010410 layer Substances 0.000 claims abstract description 191
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 35
- 229910052709 silver Inorganic materials 0.000 claims abstract description 35
- 239000004332 silver Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 21
- 238000004544 sputter deposition Methods 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 239000011241 protective layer Substances 0.000 claims description 41
- 239000007789 gas Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 230000005855 radiation Effects 0.000 claims description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- 229910001120 nichrome Inorganic materials 0.000 claims description 16
- 238000005496 tempering Methods 0.000 claims description 16
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 15
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical group [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 15
- 239000001257 hydrogen Substances 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 229910052786 argon Inorganic materials 0.000 claims description 11
- 229910052733 gallium Inorganic materials 0.000 claims description 11
- 229910052738 indium Inorganic materials 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- 238000000151 deposition Methods 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 239000011247 coating layer Substances 0.000 abstract 2
- 239000010408 film Substances 0.000 description 38
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 23
- 239000011787 zinc oxide Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000005329 float glass Substances 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000005477 sputtering target Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000686 essence Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3655—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing at least one conducting layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Abstract
The invention relates to the technical field of coated glass, in particular to temperable high-transparency and low-radiation coated glass and a manufacturing method of the glass. The glass comprises a glass substrate and a coating layer deposited on the surface of the glass substrate, wherein the coating layer comprises a first medium layer, a first growth layer, a first protection layer, a silver layer, a second protection layer, a second growth layer and a second medium layer. The coated glass comprises the growth layers, the silver layer and the protection layer; Ar and H2 mixed sputtering gas are used to substitute the original Ar and O2 mixed sputtering gas; O introduction is reduced in a sputtering process; oxidization of the protection layers and the silver layer is avoided; a binding force of a film layer is greatly improved; the further processing of the low-radiation coated glass is facilitated; in addition, H is doped to form a stable AZO:H (or GZO:H and IZO:H) transparent conductive oxide to further reduce the resistivity of the low-radiation film layer; the infrared reflection is enhanced; and the light-heat performance is further improved.
Description
Technical field
The present invention relates to coated glass technical field is and in particular to one kind can tempering high low radiation coated glass and its system thoroughly
Make method.
Background technology
LOW-E coated glass, also known as low radiation coated glass, is to be coated with one or more layers tool in common Float Glass Surface
The energy saving building product having the nanometer functional films of infrared external reflection characteristic and constituting.This coated glass product visible light transmissivity
Height, possesses the ultrared feature that by force intercepts very much, can play the double effects of natural lighting and heat-insulating and energy-saving.Can effectively subtract
The outer diffusing of interior heat of few winter is lost, and can intercept the secondary radiation after outdoor objects are subject to sunlight heating in summer, from
And play energy-saving effect.
High-transparency list silver LOW-E coated glass there is higher visible light transmissivity and solar energy light transmission rate so that
Daylighting is natural, and effect is penetrating, utilization rate more and more higher.Due to high LOW-E coated glass thoroughly typically from the ZnO adulterating (such as
AZO, GZO, IZO) transparent conductive oxide, as grown layer, needs to be passed through appropriate O during being coated with2Ensure the crystal of ZnO
Structural integrity, to obtain high-quality Ag layer.But the O being passed through2Often go here and there and cause coat of metal and silver to metal area
The oxidation of layer, causes film layer machining property bad, is unfavorable for that processor uses.
In consideration of it, overcoming above defect of the prior art, provide a kind of new can the high low radiation coated glass thoroughly of tempering
And its manufacture method becomes this area technical problem urgently to be resolved hurrily.
Content of the invention
Present invention aims to the drawbacks described above of prior art, provide one kind can tempering height low-emission coated glass thoroughly
Glass and its manufacture method.
The purpose of the present invention can be realized by following technical measures：
One kind can the high low radiation coated glass thoroughly of tempering, compared with prior art, its difference is, this glass includes
Substrate of glass and the film plating layer being deposited on described glass basic surface, described film plating layer includes first from inside to outside stacking gradually
Dielectric layer, the first grown layer, the first protective layer, silver layer, the second protective layer, the second grown layer and second dielectric layer, wherein, described
First grown layer and the second grown layer are the ZnO film layer that the 3rd main group metal is co-doped with H, described 3rd main group metal be Al,
Ga or In.
Preferably, described first medium layer and second dielectric layer are Si3N4Layer, described first medium layer and second medium
The thickness of layer is 25～60nm.
Preferably, the thickness of described first grown layer and the second grown layer is 5～40nm.
Preferably, described first grown layer and/or the second grown layer adulterate for 2wt% AZO film layer, 5wt% doping
GZO film layer or the IZO film layer of 10wt% doping.
Preferably, described first grown layer and/or the second grown layer are formed by sputtering, and wherein, the target of sputtering is doping
The ZnO of the 3rd main group metal, sputters in argon gas and the mixed-gas atmosphere of hydrogen and carries out, described 3rd main group metal be Al,
Ga or In.
Preferably, described first protective layer and the second protective layer are NiCr layer, described first protective layer and the second protection
The thickness of layer is 0.5～2nm.
Preferably, the thickness of described silver layer is 8～20nm.
Present invention also offers a kind of manufacture as claimed in claim 1 can the high low radiation coated glass thoroughly of tempering side
Method, comprises the steps：
(1) provide substrate of glass；
(2) deposit first medium layer on the glass substrate；
(3) the first grown layer is deposited on first medium layer；
(4) the first protective layer is deposited on the first grown layer；
(5) depositing silver layers on the first protective layer；
(6) the second protective layer is deposited on silver layer；
(7) the second grown layer is deposited on the second protective layer；
(8) second dielectric layer is deposited on the second grown layer；
Wherein, the first grown layer in step (3) and step (7) and the second grown layer are formed by sputtering, wherein, sputtering
Target is the ZnO of doping the 3rd main group metal, sputters in argon gas and the mixed-gas atmosphere of hydrogen and carries out, described 3rd main group
Metal is Al, Ga or In.
Preferably, in the mixed gas of described argon gas and hydrogen, the flow accounting of hydrogen is 1～12%.
The coated glass of the present invention includes grown layer, silver layer and protective layer, using Ar and H2Replace for mixing sputter gas
Original Ar and O2Mixing sputter gas, the introducing decreasing O in sputter procedure avoids the oxidation of protective layer and silver layer so that film
The adhesion of layer greatly improves, and contributes to being processed further of low radiation coated glass；Additionally, the incorporation of H formed stable
AZO:H (or GZO:H、IZO:H) transparent conductive oxide makes low-radiation film layer resistivity decline further, and infrared external reflection increases
By force, light thermal property improves further.
Brief description
Fig. 1 is the structural representation of the coated glass of the present invention.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, below in conjunction with the accompanying drawings and be embodied as
Example is described in further detail to the present invention.It should be appreciated that specific embodiment described herein is only in order to explain the present invention,
It is not intended to limit the present invention.
The coated glass of the present invention includes substrate of glass and is deposited on the film plating layer of described glass basic surface, described plated film
Layer include from inside to outside stack gradually first medium layer, the first grown layer, the first protective layer, silver layer, the second protective layer, second
Grown layer and second dielectric layer, wherein, described first grown layer and the second grown layer are what the 3rd main group metal and H were co-doped with
ZnO film layer, described 3rd main group metal is Al, Ga or In.
H provides free electron in the lattice of AZO presented in hydrogen gap (Hi), and in addition H can eliminate crystal boundary
Defect, promotes the crystallization of crystal.AZO crystallinity improves with the increase of H flow, and resistivity declines simultaneously, works as H2Flow reaches
To optimum when 6%, work as H2When flow increases further, H plasma causes to AZO crystal to corrode, and crystal property is deteriorated on the contrary.
In an embodiment of the invention, the thickness of the first grown layer and the second grown layer is 5～40nm.In the present invention one
In individual preferred embodiment, AZO film layer that the first grown layer and/or the second grown layer adulterate for 2wt%, the GZO of 5wt% doping
Film layer or the IZO film layer of 10wt% doping；AZO is to mix aluminium (Al) zinc oxide (ZnO), and the AZO film layer of 2wt% doping represents aluminium
(Al) doping is 2wt%；GZO is to mix gallium (Ga) zinc oxide (ZnO), and the GZO film layer of 5wt% doping represents mixing of gallium (Ga)
Miscellaneous amount is 5wt%；IZO is indium-doped (In) zinc oxide (ZnO), and the IZO film layer of 10wt% doping represents that the doping of indium (In) is
10wt%.In one of the present invention more preferably embodiment, the first grown layer and/or the second grown layer are formed by sputtering, its
In, the target of sputtering is the ZnO of doping the 3rd main group metal, sputters in argon gas and the mixed-gas atmosphere of hydrogen and carries out, institute
Stating the 3rd main group metal is Al, Ga or In.In a most preferred embodiment of the present invention, the mixed gas of argon gas and hydrogen
The flow accounting of middle hydrogen is 1～12%.
In an embodiment of the invention, the first protective layer and the second protective layer are NiCr layer, the first protective layer
It is 0.5～2nm with the thickness of the second protective layer.
In an embodiment of the invention, the thickness of silver layer is 8～20nm.
In an embodiment of the invention, first medium layer and second dielectric layer are Si3N4Layer, in addition, first Jie
The thickness of matter layer and second dielectric layer is 25～60nm.
Invention accordingly provides above-mentioned can the high low radiation coated glass thoroughly of tempering manufacture method method, including such as
Lower step：
(1) provide substrate of glass；
(2) deposit first medium layer on the glass substrate；
(3) the first grown layer is deposited on first medium layer；
(4) the first protective layer is deposited on the first grown layer；
(5) depositing silver layers on the first protective layer；
(6) the second protective layer is deposited on silver layer；
(7) the second grown layer is deposited on the second protective layer；
(8) second dielectric layer is deposited on the second grown layer.
Wherein, the first grown layer in step (3) and step (7) and the second grown layer are formed by sputtering, wherein, sputtering
Target is the ZnO of doping the 3rd main group metal, sputters in argon gas and the mixed-gas atmosphere of hydrogen and carries out, described 3rd main group
Metal is Al, Ga or In.
Further, in the mixed gas of described argon gas and hydrogen, the flow accounting of hydrogen is 1～12%.
Specifically, the first grown layer and the second grown layer sputter doping the 3rd main group metal by pulsed dc magnetron
ZnO (as AZO, GZO, IZO) ceramic target is coated with, and target consistency is more than 99.5%, and sputtering atmosphere is Ar/H2=1-12%.Splash
During penetrating, H2 ionizes as H plasma, mixes in ZnO lattice and be collectively forming AZO with doping metals in thin film growth process:
H, (or GZO:H、IZO:H) transparent conductive oxide, improves its electric conductivity and stability.
In the present invention, the technological parameter of the depositing operation for dielectric layer, protective layer and silver layer and depositing operation does not have
Specifically limit it is preferable that in the present invention, first medium layer, the first protective layer, silver layer, the second protective layer and second medium
Layer all can be deposited using sputtering method.For multiple deposition process of the prior art, those skilled in the art are according to target
The composition of film layer and thickness select suitable or preferred deposition process parameters, and wherein, what technological parameter included may relate to splashes
Emanate atmosphere, target material, sputtering time.
In an embodiment of the invention, first medium layer and second dielectric layer are passed through AC magnetic controlled sputtering sial and are closed
Gold target is coated with, and in target, than Si/Al=90/10, sputtering atmosphere is Ar and N to weight2, gas flow ratio Ar/N2=5/6.
In an embodiment of the invention, two protective layers are coated with by magnetically controlled DC sputtering nichrome target, target
Than Ni/Cr=80/20, sputtering atmosphere is Ar to middle weight.
In an embodiment of the invention, metallic silver layer is coated with by magnetically controlled DC sputtering metallic silver target, and target is pure
Degree is more than 99.9%.
Embodiment 1：
Present embodiments provide a kind of coated glass, this coated glass is single silver LOW-E coated glass, including substrate of glass
And the various film layers that are coated with thereon, film layer has 7 film layers from inside to outside, is followed successively by first medium layer Si3N4, thickness is 50nm,
Act primarily as the Na stoping in float glass substrate+,Ca2+Deng effect from foreign ion to the diffusion in film layer；First grown layer is
AZO:H, (H2Flow-rate ratio is 6%), the doping of Al is 2wt%, and thickness is 35nm, preferably grows slow for silver layer growth offer
Rush layer；First protective layer is NiCr, and thickness is 1.5nm, it is to avoid silverskin is subject to etch in sputter procedure；Silver thickness be 12nm,
It is the major function layer of LOW-E film；Second protective layer is NiCr, and thickness is 2nm, the oxygen pair preventing in following process toughening process
The destruction of silver layer, having very good anti-chemistry and mechanical performance second grown layer for coating is AZO:H, thickness is
35nm, mainly forms symmetrical structure with the first grown layer, reduces stress in thin film, second dielectric layer is Si3N4, thickness is 55nm,
It assures that whole LOW-E film layer has good machining property.
This can the structure of the high low radiation coated glass product thoroughly of steel be：
Glass/Si3N4/AZO:H/NiCr/Ag/AZO:H/NiCr/Si3N4
Table 1-1. product 6mm is strengthened rear and hollow becomes 6LOW-E+12A+6 product optical property
Table 1-2. product 6mm is strengthened rear and hollow becomes 6LOW-E+12A+6 product optical property
Embodiment 2：
Present embodiments provide a kind of coated glass, this coated glass is single silver LOW-E coated glass, including substrate of glass
And the various film layers that are coated with thereon, film layer has 7 film layers from inside to outside, is followed successively by first medium layer Si3N4, thickness is 50nm,
Act primarily as the Na stoping in float glass substrate+,Ca2+Deng effect from foreign ion to the diffusion in film layer；First grown layer is
GZO:H, (H2Flow-rate ratio is 6%), the doping of Ga is 5wt%, and thickness is 35nm, preferably grows slow for silver layer growth offer
Rush layer；First protective layer is NiCr, and thickness is 1.5nm, it is to avoid silverskin is subject to etch in sputter procedure；Silver thickness be 12nm,
It is the major function layer of LOW-E film；Second protective layer is NiCr, and thickness is 2nm, the oxygen pair preventing in following process toughening process
The destruction of silver layer, having very good anti-chemistry and mechanical performance second grown layer for coating is GZO:H, thickness is
35nm, mainly forms symmetrical structure with the first grown layer, reduces stress in thin film, second dielectric layer is Si3N4, thickness is 55nm,
It assures that whole LOW-E film layer has good machining property.
This can the structure of the high low radiation coated glass product thoroughly of steel be：
Glass/Si3N4/GZO:H/NiCr/Ag/GZO:H/NiCr/Si3N4
Table 2-1. product 6mm is strengthened rear and hollow becomes 6LOW-E+12A+6 product optical property
Table 2-2. product 6mm is strengthened rear and hollow becomes 6LOW-E+12A+6 product optical property
Embodiment 3：
Present embodiments provide a kind of coated glass, this coated glass is single silver LOW-E coated glass, including substrate of glass
And the various film layers that are coated with thereon, film layer has 7 film layers from inside to outside, is followed successively by first medium layer Si3N4, thickness is 50nm,
Act primarily as the Na stoping in float glass substrate+,Ca2+Deng effect from foreign ion to the diffusion in film layer；First grown layer is
IZO:H, (H2Flow-rate ratio is 6%), the doping of In is 10wt%, and thickness is 35nm, provides for silver layer growth and preferably grows
Cushion；First protective layer is NiCr, and thickness is 1.5nm, it is to avoid silverskin is subject to etch in sputter procedure；Silver thickness is
12nm, be LOW-E film major function layer；Second protective layer is NiCr, and thickness is 2nm, prevents in following process toughening process
The destruction to silver layer for the oxygen, having very good anti-chemistry and mechanical performance second grown layer for coating is IZO:H, thickness
For 35nm, mainly form symmetrical structure with the first grown layer, reduce stress in thin film, second dielectric layer is Si3N4, thickness is
55nm, it assures that whole LOW-E film layer has good machining property.
This can the structure of the high low radiation coated glass product thoroughly of steel be：
Glass/Si3N4/IZO:H/NiCr/Ag/IZO:H/NiCr/Si3N4
Table 3-1. product 6mm is strengthened rear and hollow becomes 6LOW-E+12A+6 product optical property
Table 3-2. product 6mm is strengthened rear and hollow becomes 6LOW-E+12A+6 product optical property
The foregoing is only presently preferred embodiments of the present invention, not in order to limit the present invention, all essences in the present invention
Any modification, equivalent and improvement made within god and principle etc., should be included within the scope of the present invention.
Claims (9)
1. one kind can the high low radiation coated glass thoroughly of tempering it is characterised in that this glass includes substrate of glass and is deposited on described
The film plating layer of glass basic surface, first medium layer that described film plating layer includes from inside to outside stacking gradually, the first grown layer,
One protective layer, silver layer, the second protective layer, the second grown layer and second dielectric layer, wherein, described first grown layer and second grows
Layer is the ZnO film layer that the 3rd main group metal is co-doped with H, and described 3rd main group metal is Al, Ga or In.
2. according to claim 1 can the high low radiation coated glass thoroughly of tempering it is characterised in that described first medium layer and
Second dielectric layer is Si3N4Layer, the thickness of described first medium layer and second dielectric layer is 25～60nm.
3. according to claim 1 can the high low radiation coated glass thoroughly of tempering it is characterised in that described first grown layer and
The thickness of the second grown layer is 5～40nm.
4. according to claim 3 can the high low radiation coated glass thoroughly of tempering it is characterised in that described first grown layer
And/or second grown layer adulterate for 2wt% AZO film layer, 5wt% doping GZO film layer or 10wt% doping IZO film layer.
5. according to claim 3 or 4 can the high low radiation coated glass thoroughly of tempering it is characterised in that described first growth
Layer and/or the second grown layer are formed by sputtering, and wherein, the target of sputtering is the ZnO of doping the 3rd main group metal, sputters at argon gas
Carry out with the mixed-gas atmosphere of hydrogen, described 3rd main group metal is Al, Ga or In.
6. according to claim 1 can the high low radiation coated glass thoroughly of tempering it is characterised in that described first protective layer and
Second protective layer is NiCr layer, and the thickness of described first protective layer and the second protective layer is 0.5～2nm.
7. according to claim 1 can the high low radiation coated glass thoroughly of tempering it is characterised in that the thickness of described silver layer is
8～20nm.
8. a kind of manufacture as claimed in claim 1 can the high low radiation coated glass thoroughly of tempering method it is characterised in that including
Following steps：
（1）Substrate of glass is provided；
（2）Deposit first medium layer on the glass substrate；
（3）First grown layer is deposited on first medium layer；
（4）First protective layer is deposited on the first grown layer；
（5）Depositing silver layers on the first protective layer；
（6）Second protective layer is deposited on silver layer；
（7）Second grown layer is deposited on the second protective layer；
（8）Second dielectric layer is deposited on the second grown layer；
Wherein, step（3）And step（7）In the first grown layer and the second grown layer formed by sputtering, wherein, the target of sputtering
For the ZnO of the 3rd main group metal that adulterates, sputter in argon gas and the mixed-gas atmosphere of hydrogen and carry out, described 3rd main group metal
For Al, Ga or In.
9. according to claim 8 can the high low radiation coated glass thoroughly of tempering manufacture method it is characterised in that described argon
In the mixed gas of gas and hydrogen, the flow accounting of hydrogen is 1～12%.
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