CN107010844A - High-performance can the double silver LOW E glass of steel and its manufacture method - Google Patents
High-performance can the double silver LOW E glass of steel and its manufacture method Download PDFInfo
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- CN107010844A CN107010844A CN201611215619.XA CN201611215619A CN107010844A CN 107010844 A CN107010844 A CN 107010844A CN 201611215619 A CN201611215619 A CN 201611215619A CN 107010844 A CN107010844 A CN 107010844A
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- protective layer
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- 229910052709 silver Inorganic materials 0.000 title claims abstract description 85
- 239000004332 silver Substances 0.000 title claims abstract description 85
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 60
- 239000011521 glass Substances 0.000 title claims abstract description 60
- 238000000034 method Methods 0.000 title claims abstract description 45
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 22
- 239000010959 steel Substances 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000010410 layer Substances 0.000 claims abstract description 181
- 239000011241 protective layer Substances 0.000 claims abstract description 51
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 229910001120 nichrome Inorganic materials 0.000 claims description 28
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 26
- 238000004544 sputter deposition Methods 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- 229910052733 gallium Inorganic materials 0.000 claims description 9
- 229910052738 indium Inorganic materials 0.000 claims description 8
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 4
- 238000005516 engineering process Methods 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 229910052573 porcelain Inorganic materials 0.000 claims 1
- 230000012010 growth Effects 0.000 abstract description 9
- 238000007254 oxidation reaction Methods 0.000 abstract description 6
- 238000012545 processing Methods 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 36
- 229910052581 Si3N4 Inorganic materials 0.000 description 18
- 230000003628 erosive effect Effects 0.000 description 12
- 238000003754 machining Methods 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 230000006378 damage Effects 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000005329 float glass Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/214—Al2O3
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
- C03C2217/256—Ag
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/27—Mixtures of metals, alloys
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/28—Other inorganic materials
- C03C2217/281—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of high-performance can double silver LOW E coated glasses of steel and preparation method thereof, this pair silver LOW E coated glasses are coated with first medium layer thereon successively using glass as substrate; first grown layer, the first protective layer, the first silver layer; second protective layer; second grown layer, second dielectric layer, the 3rd grown layer; 3rd protective layer; second silver layer, the 4th protective layer, the 4th grown layer and the 3rd dielectric layer.The present invention uses Ar, H compared to prior art in the sputter gas for be coated with grown layer2Mix sputter gas and substitute Ar, O2Sputter gas is mixed, O in continuous sputter procedure is solved2Oxidation to coat of metal and silver layer causes the bad problem of film layer processing characteristics.H, which is entrained in be formed in grown layer, in the present invention improves film conductivity, improves infrared reflectivity.In addition, in sputter procedure, H can improve the crystallinity of grown layer, cushion is provided for Ag layers of growths, high-quality Ag layers is obtained, the light thermal property of LOW E glass is improved.
Description
Technical field
, can steel double-silver LOW-E glass and its system in particular to a kind of high-performance the present invention relates to coated glass production technology
Make method.
Background technology
Double silver-colored Low-E coated glasses are a kind of new bloom heat selective building energy conservation glass, with single silver Low-E plated film glass
Glass is compared, on the one hand, its while visible light transmissivity is not reduced with lower shading coefficient, can be to a greater extent by too
Sunlight is filtered into cold light source, on the other hand, and the relatively single silver Low-E of heat transfer coefficient of double silver-colored Low-E coated glasses is lower, further carries
The high heat-insulating property of exterior window, has been really achieved cool in summer and warm in winter.Generally speaking, the relatively single silver Low-E platings of double silver-colored Low-E coated glasses
Film glass improves indoor thermal comfort to a greater degree while good lighting performance is met, and reduces equipment heating system
Cold run time, has saved electric energy, is the good product of economical environment-protective.Because double silver-colored Low-E film on coated glass are more, and have
Double layer of metal silver, the grown layer for being coated with high crystalline is the key for obtaining continuous high-test metal silver layer.But current double-silver LOW-E
Coat of metal and the silver layer oxidation of coated glass are serious, and then make it that film layer machining property is bad, are unfavorable for processor
Use.
The content of the invention
Can steel double-silver LOW-E glass and its manufacture method, the glass present invention aim to provide a kind of high-performance
Machining property is good, and light thermal property is high.
To achieve the above object, the technical solution adopted by the present invention is：A kind of high-performance can steel double-silver LOW-E glass, bag
Substrate of glass and the film plating layer being sputtered in the substrate of glass are included, the film plating layer includes first medium successively from inside to outside
Layer, the first grown layer, the first protective layer, the first silver layer, the second protective layer, the second grown layer, second dielectric layer, the 3rd growth
Layer, the 3rd protective layer, the second silver layer, the 4th protective layer, the 4th grown layer, the 3rd dielectric layer.
Double-silver LOW-E glass produced by the present invention, its coating resistance to chemical corrosion and good mechanical performance, and double silver
LOW-E glass optics properties are excellent, machining property is good, solve the coat of metal and silver of double-silver LOW-E coated glass
Layer oxidation seriously causes the problem of film layer machining property is bad.
Further, first grown layer, second grown layer, the 3rd grown layer and the 4th grown layer
It is the ZnO transparent conductive oxide films of the 3rd main group metal and H codopes, each thickness degree is 5~40nm.Using the 3rd master
ZnO (AZO, GZO, IZO) transparent conductive oxide film of race's metal (Al, Ga or In) and H codopes, not only ensure that ZnO
Crystal structure it is complete, the oxidation of coat of metal and silver layer is it also avoid, so as to greatly improve the machine of double-silver LOW-E glass
Tool processing characteristics and light thermal property.
Further, the first medium layer, the second dielectric layer and the 3rd dielectric layer are Si3N4Film, respectively
Thickness degree is 20~80nm.
Further, first protective layer, second protective layer, the 3rd protective layer and the 4th protective layer
It is NiCr alloy firms, each thickness degree is 0.5~3nm.
Further, the thickness of first silver layer and second silver layer is respectively 8~20nm；First silver layer with
The second silver thickness ratio is 1:1~3.
Above-mentioned high-performance can steel double-silver LOW-E glass manufacture method, be coated with successively from inside to outside on the glass substrate
One dielectric layer, the first grown layer, the first protective layer, the first silver layer, the second protective layer, the second grown layer, second dielectric layer, the 3rd
Grown layer, the 3rd protective layer, the second silver layer, the 4th protective layer, the 4th grown layer, the 3rd dielectric layer.
The present invention is coated with first medium layer, the first grown layer, the first protection successively using continuous vacuum magnetron sputtering technique
Layer, the first silver layer, the second protective layer, the second grown layer, second dielectric layer, the 3rd grown layer, the 3rd protective layer, the second silver layer,
4th protective layer, the 4th grown layer, the 3rd dielectric layer, obtained double-silver LOW-E glass, its coating resistance to chemical corrosion and machinery
Function admirable, and double-silver LOW-E glass optics properties are excellent and machining property is good, solve double-silver LOW-E plated film glass
Coat of metal and the silver layer oxidation of glass seriously cause the problem of film layer machining property is bad.
Further, first grown layer, second grown layer, during three grown layer, using pulse are coated with
DC magnetron sputtering process is coated with, and target is the ZnO ceramic targets of the 3rd main group metal of doping, and target consistency ＞ 99.5% splashes
Atmosphere of emanating is Ar and H2.First grown layer and the second grown layer sputter the 3rd main group metal that adulterates by pulsed dc magnetron
ZnO (such as AZO, GZO, IZO) ceramic target is coated with, H in sputter procedure2Ionize as H+Plasma, is mixed in thin film growth process
In ZnO lattices AZO is collectively forming with doping metals:H, (or GZO:H、IZO:H) transparent conductive oxide, improves its infrared external reflection
Rate and stability；The present invention uses Ar and H2Replace original Ar and O for mixing sputter gas2Sputter gas is mixed, reduces and splashes
O introducing during penetrating, it is to avoid the oxidation of coat of metal and silver layer so that the adhesion of film layer is greatly improved, and is contributed to
LOW-E glass is processed further；In addition, H incorporation forms stable AZO:H (or GZO:H、IZO:H) transparent conductive oxide
Thing causes LOW-E film resistivities further to decline, and infrared external reflection enhancing, light thermal property is further improved.
Further, Al, Ga or In and H codopes AZO are coated with:H, GZO:H or IZO:H transparent conductive oxides are thin
Film, the ZnO ceramics adulterated with Al, Ga or In for target, in AZO Al content be in 1~3wt%, GZO Ga contents be 4~
In contents are 8~15wt% in 8wt%, IZO；Ar and H in sputtering atmosphere2Volume flow ratio be 1~12%.
Further, the first medium layer, the second dielectric layer, the 3rd dielectric layer uses AC magnetic controlled sputtering
Technique is coated with, and target is silico-aluminum target, and weight is than Si/Al=90/10 in target, and sputtering atmosphere is Ar and N2, Ar and N2Body
Product flow-rate ratio is 5：6.
Further, first protective layer, second protective layer, the 3rd protective layer and the 4th protective layer
It is coated with using DC magnetron sputtering process, target is nichrome target, weight is than Ni/Cr=80/20 in target, and sputtering atmosphere is
Ar。
Further, first silver layer and second silver layer are coated with using DC magnetron sputtering process, and target is
Argent, target purity ＞ 99.9%, sputtering atmosphere is Ar.
Brief description of the drawings
Fig. 1 be a kind of high-performance can steel double-silver LOW-E glass structural representation.
Embodiment
The present invention is described in further detail below in conjunction with the accompanying drawings, is easy to more clearly understand the present invention, but they
The present invention is not constituted and limited.
Embodiment 1
Double-silver LOW-E coated glass as shown in Figure 1, including substrate of glass 1 and the various film layers that are coated with thereon, film layer
13 film layers, are followed successively by first medium layer 2, are Si from inside to outside3N4, thickness is 25nm, and main rise is prevented in float glass substrate
Na+,Ca2+Deng the effect of diffusion of the foreign ion into film layer；First grown layer 3 is AZO:H, Al doping are 2wt%,
Thickness is 20nm, and preferable grown buffer layer is provided for the growth of the first silver layer 5；First protective layer 4 is NiCr, and thickness is 1nm, is kept away
Exempt from the film of the first silver layer 5 to suffer erosion in sputter procedure；The thickness of first silver layer 5 is 7nm, is the major function layer of LOW-E films；Second
Protective layer 6 is NiCr, and thickness is 1nm, avoids silverskin from being suffered erosion the oxygen in preventing following process toughening process in sputter procedure
Destruction to silver layer；Second grown layer 7 is AZO:H, Al doping are 2wt%, and thickness is 20nm；Second dielectric layer 8 is
Si3N4, thickness is 80nm, regulates and controls product colour；3rd grown layer 9 is AZO:H, Al doping are 2wt%, and thickness is 20nm,
Preferable grown buffer layer is provided for the growth of the second silver layer 11；3rd protective layer 10 is NiCr, and thickness is 1nm, it is to avoid silverskin exists
Sputter procedure suffers erosion；The thickness of second silver layer 11 is 14nm, is the major function layer of LOW-E films；4th protective layer 12 is
NiCr, thickness is 1.5nm, avoids silverskin from being suffered erosion in sputter procedure, prevents the oxygen in following process toughening process to silver layer
Destruction；4th grown layer 13 is AZO:H, Al doping are 2wt%, and thickness is 20nm；3rd dielectric layer 14 is Si3N4, it is thick
Spend for 55nm, there is very good anti-chemistry and mechanical performance for coating, it assures that whole LOW-E film layers have it is good
Machining property.
This can the structure of the high low radiation coated glass product thoroughly of steel be：
Glass/Si3N4/AZO:H/NiCr/Ag/NiCr/AZO:H/Si3N4/AZO:H/NiCr/Ag/NiCr/AZO:H/
Si3N4
After product 6mm is strengthened and hollow excellent into 6LOW-E+12A+6 product machining properties, light thermal property is shown in
Table 1 below：
Table 1
Embodiment 2
A kind of double-silver LOW-E coated glass, including substrate of glass and the various film layers that are coated with thereon, film layer is from inside to outside
13 film layers, are followed successively by first medium layer Si3N4, thickness is 25nm, main to act the Na prevented in float glass substrate+,Ca2+Deng
The effect of diffusion of the foreign ion into film layer；First grown layer is GZO:H, Ga doping are 5wt%, and thickness is 20nm,
Preferable grown buffer layer is provided for the growth of the first silver layer；First protective layer is NiCr, and thickness is 1nm, it is to avoid the first silverskin exists
Sputter procedure suffers erosion；First silver thickness is 7nm, is the major function layer of LOW-E films；Second protective layer is NiCr, thick
Spend for 1nm, avoid silverskin from being suffered erosion the destruction that prevents the oxygen in following process toughening process to silver layer in sputter procedure；Second
Grown layer is GZO:H, Ga doping are 5wt%, and thickness is 20nm；Second dielectric layer Si3N4, thickness is 80nm, regulates and controls product
Color；3rd grown layer is GZO:H, Ga doping are 5wt%, and thickness is 20nm, are provided preferably for the growth of the second silver layer
Grown buffer layer；3rd protective layer is NiCr, and thickness is 1nm, it is to avoid silverskin suffers erosion in sputter procedure；Second silver thickness
For 14nm, be LOW-E films major function layer；4th protective layer is NiCr, and thickness is 1.5nm, avoids silverskin in sputter procedure
Suffer erosion, prevent destruction of the oxygen in following process toughening process to silver layer；4th grown layer is GZO:H, Ga doping
For 5wt%, thickness is 20nm；3rd dielectric layer Si3N4, thickness is 55nm, has very good anti-chemistry and machine for coating
Tool performance, it assures that whole LOW-E film layers have good machining property.
This can the structure of the high low radiation coated glass product thoroughly of steel be：
Glass/Si3N4/GZO:H/NiCr/Ag/NiCr/GZO:H/Si3N4/GZO:H/NiCr/Ag/NiCr/GZO:H/
Si3N4
After product 6mm is strengthened and hollow excellent into 6LOW-E+12A+6 product machining properties, light thermal property is shown in
Table 2 below：
Table 2
Embodiment 3
A kind of double-silver LOW-E coated glass, including substrate of glass and the various film layers that are coated with thereon, film layer is from inside to outside
13 film layers, are followed successively by first medium layer Si3N4, thickness is 25nm, main to act the Na prevented in float glass substrate+,Ca2+Deng
The effect of diffusion of the foreign ion into film layer；First grown layer is IZO:H, In doping are 10wt%, and thickness is 20nm,
Preferable grown buffer layer is provided for the growth of the first silver layer；First protective layer is NiCr, and thickness is 1nm, it is to avoid the first silverskin exists
Sputter procedure suffers erosion；First silver thickness is 7nm, is the major function layer of LOW-E films；Second protective layer is NiCr, thick
Spend for 1nm, avoid silverskin from being suffered erosion the destruction that prevents the oxygen in following process toughening process to silver layer in sputter procedure；Second
Grown layer is IZO:H, In doping are 10wt%, and thickness is 20nm；Second dielectric layer Si3N4, thickness is 80nm, regulation and control production
Product color；3rd grown layer is IZO:H, In doping are 10wt%, and thickness is 20nm, are provided preferably for the growth of the second silver layer
Grown buffer layer；3rd protective layer is NiCr, and thickness is 1nm, it is to avoid silverskin suffers erosion in sputter procedure；Second silver layer is thick
Spend for 14nm, be LOW-E films major function layer；4th protective layer is NiCr, and thickness is 1.5nm, avoids silverskin from sputtering
Journey suffers erosion, and prevents destruction of the oxygen in following process toughening process to silver layer；4th grown layer is IZO:H, In doping
Measure as 10wt%, thickness is 20nm；3rd dielectric layer Si3N4, thickness is 55nm, has very good anti-chemistry for coating
And mechanical performance, it assures that whole LOW-E film layers have good machining property.
This can the structure of the high low radiation coated glass product thoroughly of steel be：
Glass/Si3N4/IZO:H/NiCr/Ag/NiCr/IZO:H/Si3N4/IZO:H/NiCr/Ag/NiCr/IZO:H/
Si3N4After product 6mm is strengthened and hollow excellent into 6LOW-E+12A+6 product machining properties, photo-thermal see the table below 3：
Table 3
Claims (11)
1. a kind of high-performance can steel double-silver LOW-E glass, including substrate of glass (1) and be sputtered in the substrate of glass (1)
Film plating layer, it is characterised in that：The film plating layer includes first medium layer (2), the first grown layer (3), first successively from inside to outside
Protective layer (4), the first silver layer (5), the second protective layer (6), the second grown layer (7), second dielectric layer (8), the 3rd grown layer
(9), the 3rd protective layer (10), the second silver layer (11), the 4th protective layer (12), the 4th grown layer (13), the 3rd dielectric layer (14).
2. high-performance according to claim 1 can steel double-silver LOW-E glass, it is characterised in that：First grown layer
(3), second grown layer (7), the 3rd grown layer (9) and the 4th grown layer (13) be the 3rd main group metal with
The ZnO transparent conductive oxide films of H codopes, each thickness degree is 5~40nm.
3. high-performance according to claim 1 can steel double-silver LOW-E glass, it is characterised in that：The first medium layer, institute
It is Si to state second dielectric layer and the 3rd dielectric layer3N4Film, each thickness degree is 20~80nm.
4. high-performance according to claim 1 can steel double-silver LOW-E glass, it is characterised in that：First protective layer
(4), second protective layer (6), the 3rd protective layer (10) and the 4th protective layer (12) they are NiCr alloy firms,
Each thickness degree is 0.5~3nm.
5. high-performance according to claim 1 can steel double-silver LOW-E glass, it is characterised in that：First silver layer (5) and
The thickness of second silver layer (11) is respectively 8~20nm；First silver layer (5) is with the second silver layer (11) thickness ratio
1:1~3.
6. performance described in a kind of claim 1 can steel double-silver LOW-E glass manufacture method, it is characterised in that：In substrate of glass
On be coated with successively from inside to outside first medium layer, the first grown layer, the first protective layer, the first silver layer, the second protective layer, second life
Long layer, second dielectric layer, the 3rd grown layer, the 3rd protective layer, the second silver layer, the 4th protective layer, the 4th grown layer, the 3rd medium
Layer.
7. high-performance according to claim 6 can steel double-silver LOW-E glass manufacture method, it is characterised in that：It is coated with institute
The first grown layer is stated, second grown layer during three grown layer, is coated with, target using pulsed dc magnetron sputtering technology
Material is the ZnO ceramic targets of the 3rd main group metal of doping, and target consistency ＞ 99.5%, sputtering atmosphere is Ar and H2。
8. high-performance according to claim 7 can steel double-silver LOW-E glass manufacture method, it is characterised in that：It is coated with Al,
Ga or In and H codopes AZO:H, GZO:H or IZO:H transparent conductive oxide films, are made pottery with Al, Ga or the In ZnO adulterated
Porcelain is that Al content is that Ga contents are that In contents are 8~15wt% in 4~8wt%, IZO in 1~3wt%, GZO in target, AZO；
Ar and H in sputtering atmosphere2Volume flow ratio be 1~12%.
9. high-performance according to claim 6 can steel double-silver LOW-E glass manufacture method, it is characterised in that：Described
One dielectric layer, the second dielectric layer, the 3rd dielectric layer is coated with using AC magnetic controlled sputtering technology, and target is silico-aluminum
Weight is than Si/Al=90/10 in target, target, and sputtering atmosphere is Ar and N2, Ar and N2Volume flow ratio be 5：6.
10. high-performance according to claim 6 can steel double-silver LOW-E glass manufacture method, it is characterised in that：Described
One protective layer, second protective layer, the 3rd protective layer and the 4th protective layer are plated using DC magnetron sputtering process
System, target is nichrome target, and weight is than Ni/Cr=80/20 in target, and sputtering atmosphere is Ar.
11. high-performance according to claim 6 can steel double-silver LOW-E glass manufacture method, it is characterised in that：Described
One silver layer and second silver layer are coated with using DC magnetron sputtering process, and target is argent, and target purity ＞ 99.9% splashes
Atmosphere of emanating is Ar.
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