CN108328942A - High low anti-double-silver low-emissivity coated glass and preparation method thereof thoroughly - Google Patents
High low anti-double-silver low-emissivity coated glass and preparation method thereof thoroughly Download PDFInfo
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- CN108328942A CN108328942A CN201810460546.3A CN201810460546A CN108328942A CN 108328942 A CN108328942 A CN 108328942A CN 201810460546 A CN201810460546 A CN 201810460546A CN 108328942 A CN108328942 A CN 108328942A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3636—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing silicon, hydrogenated silicon or a silicide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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Abstract
The present invention relates to a kind of high low anti-double-silver low-emissivity coated glass and preparation method thereof.Including glass-base; glass-base side has film plating layer; film plating layer includes from first medium layer, the first functional layer, the first protection transition zone, second dielectric layer, the second functional layer, the second protection transition zone and the third dielectric layer being arranged outward successively close to glass-base side; first medium layer includes SiNx layer and ZnAlOx layers; first functional layer and the second functional layer include Ag layers; first protection transition zone includes NiCr layers and AZO layers; second dielectric layer includes ZnSnOx layers and ZnAlOx layers, and third dielectric layer is SiNx layer.Since ZnSnOx or ZnAlOx is higher than SiNx layer as the transmitance of dielectric layer, by using thicker ZnAlOx and ZnSnOx so that coated glass product obtains higher transmitance.Neutral grey color is presented in coated glass product of the present invention, clear beautiful, has visible light transmittance and very low visible reflectance, and light thermal property is excellent, is that one kind not only having taken into account appearance but also focused on energy-saving and environment-friendly construction material.
Description
Technical field
The invention belongs to glass processing manufacturing technology fields, more particularly, to a kind of high low anti-double silver low-emissivity coated glass
Glass and preparation method thereof.
Background technology
Low radiation coated glass is a kind of construction material of environmental protection and energy saving.Low radiation coated glass has using its film plating layer
There is the characteristic to far red light high reflectance, summer in winter can be greatly reduced to ensure room temperature and the energy that is consumed using air-conditioning
Source.And high low radiation coated glass thoroughly also retains simple glass to visible light with the spy compared with high transmittance on this basis
Property, it can guarantee the daylighting of Indoor environment.In addition to this, in weighing coated glass indices content, there is " selection a system
Number " is by recognition of state, and equation is：Select coefficient=transmitance/shading coefficient.Generally common pair of silver-colored shading coefficients are
0.2~0.5, it is seen that the double-silver low-emissivity coated glass of a high transmittance, energy-efficient performance is relatively preferable, more joyous by market
It meets.And in modern urban construction, many skyscraper are rised sheer from level ground, and " light pollution " is low anti-as one of the problem of can not ignoring
Penetrating glass fundamentally upper can reduce " light pollution ".Low radiation coated glass transmitance in the prior art is usually less than 70%,
In order to accomplish high transmittance, it is necessary to which the thickness for reducing Ag layers and NiCr layers thereby results in the radiance and reflectivity of this product
Also higher, high transmittance, low-E and antiradar reflectivity can not be had both by allowing for existing low radiation coated glass in this way, existing simultaneously
Have low radiation coated glass there is also：The problems such as film layer mechanical strength is low, and connective stability is low between each layer.
Invention content
Regarding the issue above, the present invention provides it is a kind of simple and reasonable, take into account high transmittance and low radiation
The saturating low anti-double-silver low-emissivity coated glass of height of rate.
Another object of the present invention is in view of the above-mentioned problems, a kind of height easy to manufacture of offer is thoroughly low anti-double silver-colored low
Radiation film coating glass preparation method.
In order to achieve the above objectives, present invention employs following technical proposals：The first conception of the present invention is to provide one kind
There is film plating layer, feature to exist for high low anti-double-silver low-emissivity coated glass, including glass-base thoroughly, the glass-base side
In the film plating layer includes the first medium layer being arranged outward successively close to glass-base side certainly, the first functional layer, first
Protect transition zone, second dielectric layer, the second functional layer, the second protection transition zone and third dielectric layer, wherein described first
Dielectric layer include from the SiNx layer being distributed outward successively close to glass-base side and ZnAlOx layer, first functional layer with
Second functional layer includes Ag layers, and the described first protection transition zone and the second protection transition zone include from close to glass-base
NiCr layers that side is distributed outward successively and AZO layer, the second dielectric layer include from close glass-base side successively to
The SiNx layer of outer distribution, ZnSnOx layers and ZnAlOx layers, the third dielectric layer are SiNx layer.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the thickness of the SiNx layer of the first medium layer is
15~25nm, and the SiNx layer is directly plated on glass-base, plays the role of bottoming, can be stopped in substrate of glass
The migration and diffusion of sodium ion, ZnAlOx layers are plated on the SiNx layer of bottoming, form the combination of first medium layer.Wherein first medium
Layer can also only include SiNx layer, can also be the combination layer including SiNx layer, ZnSnOx layers and ZnAlOx layers；The first medium
The thickness of the ZnAlOx layers of layer is 11~21nm, and first functional layer is directly plated on ZnAlOx layers.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the Ag layer thickness of first functional layer is 4~
10nm；The Ag layer thickness of second functional layer is 16~23nm, has Cu layers and the Cu thickness in the second functional layer
Degree is 9~15nm.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the NiCr layer thickness of the described first protection transition zone
AZO layer thickness for 0.5~2.6nm, the described first protection transition zone is 2~6nm, and wherein NiCr layers can prevent metal Ag
Layer is aoxidized, and AZO layer due to film layer dense uniform, can improve the binding force of metal NiCr layer and dielectric layer, raising film layer
The stability of structure.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the thickness of the second dielectric layer is 66~
86nm。
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the NiCr layer thickness of the described second protection transition zone
For 0.1~1.2nm；The AZO layer thickness of the second protection transition zone is 2~6nm, and wherein NiCr layers can prevent metal Ag
Layer is aoxidized, and AZO layer due to film layer dense uniform, can improve the binding force of metal NiCr layer and dielectric layer, raising film layer
The stability of structure.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the SiNx layer thickness of the third dielectric layer is 27
~47nm and protective layer, according to SiNx high rigidity, anti abrasive characteristic, protection has good anti-zoned in entire film plating layer
Hinder performance；
The second conception of the present invention is to provide a kind of high low anti-double-silver low-emissivity coated glass preparation method, this method
Including：
It carries out vacuum magnetic-control sputtering to glass-base surface with target under vacuum conditions and sputters successively to form first medium
Layer, the first functional layer, the first protection transition zone, second dielectric layer, the second functional layer, the second protection transition zone and third medium
Layer is to form film plating layer.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, when magnetron sputtering, target used in cathode position
Material is followed successively by sial target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO metal oxides target, sial target, zinc-tin target, zinc-aluminium target, silver respectively
Target, nickel chromium triangle target, AZO metal oxides target and sial target.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, the sial target is aluminum weight ratio
It is 90:10 silico-aluminum target, zinc-aluminium target are that zinc-aluminium weight ratio is 98:2 allumen target, zinc-tin target are that zinc-tin weight ratio is
50:50 Zinc-tin alloy target, silver-colored target silver purity are 99.99%, and copper target copper purity is 99.5%, nickel chromium triangle target is that nickel chromium triangle weight ratio is
80:20 nichrome target, AZO metal oxide target material purity 99.95%, wherein silver-colored target, copper target and the nickel chromium triangle target
For flat target, other are rotary target.Wherein AZO metal oxides target is that have ceramic work(made of being fired by ZnOX, AlOX
The metal oxide target of energy, the AZO tunic layer even compacts being coated with.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, when magnetron sputtering, using power control,
To ensure that sputtering is stablized, and target is not destroyed, sial target power output is 0~70Kw, sputtering technology gas high-purity argon and High Purity Nitrogen ratio
Example is 0.78；Zinc-aluminium target power output is 0~60Kw, and sputtering technology gas high-purity argon and high pure oxygen ratio are 0.67；Zinc-tin target power output
For 0~60Kw, sputtering technology gas high-purity argon and High Purity Nitrogen ratio are 0.67；Silver-colored target power output is 0~20Kw, and nickel chromium triangle target power output is
0~20Kw, AZO metal oxide target power output are 0~20Kw, and sputtering technology gas is high-purity argon.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, the structure of the film plating layer is：
SiNx+ZnAlOx/Ag/NiCr+AZO/SiNx+ZnSnOx+ZnAlOx/Ag+Cu/NiCr+AZO/SiNx。
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, high thoroughly low anti-double silver low radiation platings
It is -5~0, b*g is -1~2 that film glass, which is 85~95, a*g through color L*g, and transmitance T is 70~80.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, high thoroughly low anti-double silver low radiation platings
Film glass, the positive face color of glass surface：It is 1~4, b*g is -10~5 that L*g, which is 20~30, a*g, and it is 4~6 that glass surface, which reflects Rg,.Side face
Color：It is -1~2, b*g is -10~5 that L*g, which is 40~50, a*g,.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, high thoroughly low anti-double silver low radiation platings
Film glass, film surface color：It is -1~2, b*g is 0~3 that L*g, which is 20~30, a*g, and it is 3~5 that glass surface, which reflects Rg,.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass preparation method, high thoroughly low anti-double silver low radiation platings
Film glass synthesizes the hollow glass of 6+12A+6, and transmitance reaches 65~75%, and outdoor reflectivity is less than 10%.
Compared with prior art, the advantages of saturating low anti-double-silver low-emissivity coated glass of this height and preparation method thereof, is：
1, transition zone is protected by rational design so that the film layer structure of institute's plated film is stablized, strong adhesive force, mechanical performance
It is good, it is not oxidizable.
2, by the adjustment to film layer ratio, use thicker ZnAlOx and ZnSnOx make glass product transmitance higher,
Pass through the adjustment between each film layer ratio again so that the reflection of all angles is relatively low.
3, low anti-double-silver low-emissivity coated glass has both high transmittance, low-E and antiradar reflectivity to this height thoroughly.Heat transfer system
Number U values are low, can fully reduce the energy consumption of Indoor environment heating and refrigeration, reach excellent energy-saving effect.
Description of the drawings
Fig. 1 is the structure sectional view of the present invention；
In figure, glass-base 1, film plating layer 2, first medium layer 21, the first functional layer 22, first protection transition zone 23, the
Second medium layer 24, the second functional layer 25, second protection transition zone 26, third dielectric layer 27.
Specific implementation mode
The present invention will be further described in detail with reference to the accompanying drawings and detailed description.
As shown in Figure 1, this height low anti-double-silver low-emissivity coated glass, including glass-base 1 thoroughly, 1 side of glass-base tool
It includes the first medium layer 21 being arranged outward successively close to 1 side of glass-base certainly, the first functional layer to have film plating layer 2, film plating layer 2
22, the first protection transition zone 23, second dielectric layer 24, the second functional layer 25, second protection transition zone 26 and third dielectric layer
27, wherein the first functional layer 22 and the second functional layer 25 here includes Ag layer, and the first functional layer 22 of the present invention is by being arranged
Ag layers of composition, thickness are 4~10nm, and major function is that the radiance of glass product is reduced using Ag, and sunlight is filtered
At cold light source, improve through performance.The Ag layer thickness of second functional layer 25 is 16~23nm, has Cu layers in the second functional layer 25
And Cu layer thickness is 9~15nm.
Wherein, first medium layer 21 includes from the SiNx layer and ZnAlOx being distributed outward successively close to 1 side of glass-base
Layer, SiNx layer thickness are 15~25nm.SiNx layer is directly plated on as prime coat on glass-base 1, to prevent glass book
In sodium element diffusive migration to functional layer Ag in body, the structure for destroying functional layer destroys the functional layer structure containing Ag.This layer is not
Preferably too thick, excessive SiNx can reduce film layer transmitance；Adhesion layers of the ZnAlOx as the first functional layer 22, the first functional layer 22
It is 11~21nm to be directly plated on thickness on ZnAlOx layers, can improve the flatness of entire film layer, convenient for Ag in functional layer
Deposition.
The present invention first protect transition zone 23 include from the NiCr layers being distributed outward successively close to 1 side of glass-base with
AZO layers, NiCr layer thickness is 0.5~2.6nm, and wherein NiCr major functions are the characteristics using film layer densification, protect first layer
Silver is not oxidized；AZO layer thickness is 2~6nm, is the characteristic using the densification of its ceramic structure, enhances protective layer and dielectric layer
Between binding force.
Second dielectric layer 24 of the present invention includes from SiNx layer, the ZnSnOx being distributed outward successively close to 1 side of glass-base
Layer and ZnAlOx layer, thickness is 66~86nm, can reduce film surface surface resistance, increase visible light transmittance.
The present invention second protect transition zone 26 include from the NiCr layers being distributed outward successively close to 1 side of glass-base with
AZO layers of composition, NiCr layer thickness are 0.1~1.2nm.AZO layer thickness is 2~6nm.
Third dielectric layer 27 of the present invention 27~47nm of S iNx layers by being arranged successively.As the outermost layer protective layer of film layer,
SiNx can improve the mechanical performance of film layer.But this layer should not be too thick, excessive SiNx can reduce film layer transmitance.
The structure of film plating layer in the present embodiment is：
SiNx+ZnAlOx/Ag/NiCr+AZO/SiNx+ZnSnOx+ZnAlOx/Ag+Cu/NiCr+AZO/SiNx。
The present invention is by the plated film on glass product, by being adjusted to thicknesses of layers, the thicker ZnAlOx of use and
ZnSnOx makes glass product transmitance higher, then passes through the adjustment between each film layer ratio so that the reflection of all angles compared with
It is low.Light thermal property of the present invention is good, and film layer structure is stablized, strong adhesive force, and good mechanical property is not oxidizable.
The saturating low anti-double-silver low-emissivity coated glass preparation method of height in the present embodiment, including：
1, vacuum magnetic-control sputtering is carried out to 1 surface of glass-base with target under vacuum conditions and sputters first Jie of formation successively
Matter layer 21, the first functional layer 22, first protection transition zone 23, second dielectric layer 24, the second functional layer 25, second protect transition zone
26 and third dielectric layer 27 to form film plating layer 2.
2, when magnetron sputtering, target used in cathode position be respectively sial target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO ceramic targets,
Sial target, zinc-tin target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO ceramic targets, sial target, wherein AZO ceramic targets are by ZnOX, AlOX
There is the metal oxide target of ceramic function, the AZO tunic layer even compacts being coated with made of firing.
3, it is 90 that sial target, which is aluminum weight ratio,:10 silico-aluminum target, zinc-aluminium target are that zinc-aluminium weight ratio is 98:2 zinc
Aluminium alloy target, zinc-tin target are that zinc-tin weight ratio is 50:50 Zinc-tin alloy target, silver-colored target silver purity are 99.99%, copper target copper purity
It is that nickel chromium triangle weight ratio is 80 for 99.5%, nickel chromium triangle target:20 nichrome target, AZO ceramic targets material purity 99.95%, wherein
Silver-colored target, copper target and the nickel chromium triangle target is flat target, other are rotary target.
4, when magnetron sputtering, using power control, to ensure that sputtering is stablized, and target not being destroyed, sial target power output is 0~
70Kw, sputtering technology gas high-purity argon and High Purity Nitrogen ratio are 0.78；Zinc-aluminium target power output is 0~60Kw, and sputtering technology gas is high
Straight argon and high pure oxygen ratio are 0.67；Zinc-tin target power output is 0~60Kw, and sputtering technology gas high-purity argon and High Purity Nitrogen ratio are
0.67；Silver-colored target power output is 0~20Kw, and nickel chromium triangle target power output is 0~20Kw, and AZO ceramics target power outputs are 0~20Kw, sputtering technology gas
Body is high-purity argon.
It is -5 that high low anti-double-silver low-emissivity coated glass thoroughly made from through the above steps, which is 70~95, a*g through color L*g,
~-1, b*g is 0~2.
High low anti-double-silver low-emissivity coated glass thoroughly obtained through the above steps, the positive face color of glass surface：L*g be 15~
30, a*g be -2~2, b*g be -10~-5；60 degree of Side Colors of glass surface：It is -3~0, b*g is -10 that L*g, which is 40~50, a*g,
~-2.
5, working gas dosage when magnetron sputtering, sial target are all Ar：N2=700sccm：900sccm, zinc-aluminium target, zinc-tin
Target is all Ar：O2=600sccm：900sccm, other flat targets and AZO targets are pure Ar=1200sccm.
Specific embodiment described herein is only an example for the spirit of the invention.Technology belonging to the present invention is led
The technical staff in domain can make various modifications or additions to the described embodiments or replace by a similar method
In generation, however, it does not deviate from the spirit of the invention or beyond the scope of the appended claims.
Although glass-base 1, film plating layer 2, first medium layer 21, the first functional layer 22, first is used more herein
The terms such as transition zone 23, second dielectric layer 24, the second functional layer 25, second protection transition zone 26, third dielectric layer 27 are protected, but
It does not preclude the possibility of using other terms.The use of these items is only for more easily describe and explain the present invention's
Essence；Any one of the additional limitations is construed as all to disagree with spirit of that invention.
Claims (10)
1. a kind of high low anti-double-silver low-emissivity coated glass, including glass-base (1), the glass-base (1) side tool
There is film plating layer (2), which is characterized in that the film plating layer (2) includes being arranged outward successively from close to glass-base (1) side
First medium layer (21), the first functional layer (22), the first protection transition zone (23), second dielectric layer (24), the second functional layer
(25), the second protection transition zone (26) and third dielectric layer (27), wherein the first medium layer (21) includes from close
SiNx layer that glass-base (1) side is distributed outward successively and ZnAlOx layers, first functional layer (22) and the second function
Layer (25) includes Ag layers, and the described first protection transition zone (23) and the second protection transition zone (26) include from close to glass
NiCr layers that base (1) side is distributed outward successively and AZO layer, the second dielectric layer (24) includes from close glass-base
(1) side is distributed outward successively SiNx layer, ZnSnOx layers and ZnAlOx layers, the third dielectric layer (27) is SiNx layer.
2. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 1, which is characterized in that the first medium
The thickness of the SiNx layer of layer (21) is 15~25nm, and the SiNx layer is directly coated on glass-base (1)；Described
The thickness of the ZnAlOx layers of one dielectric layer (21) is 11~21nm, and first functional layer (22) is directly coated on SiNx layer
On.
3. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 2, which is characterized in that first function
The Ag layer thickness of layer (22) is 4~10nm；The Ag layer thickness of second functional layer (25) is 16~23nm, the second functional layer
(25) with Cu layer and the Cu layer thickness it is 9~15nm in.
4. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 1 or 2 or 3, which is characterized in that described the
The NiCr layer thickness of one protection transition zone (23) is 0.5~2.6nm, the AZO layer thickness of the described first protection transition zone (23)
For 2~6nm.
5. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 4, which is characterized in that the second medium
The thickness of layer (24) is 66~86nm.
6. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 4, which is characterized in that second protection
The NiCr layer thickness of transition zone (26) is 0.1~1.2nm；The AZO layer thickness of the described second protection transition zone (26) is 2~
6nm。
7. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 4, which is characterized in that the third medium
The SiNx layer thickness of layer (27) is 27~47nm.
8. the saturating low anti-double silver of the height of high low anti-double-silver low-emissivity coated glass thoroughly according to any one of claims 1-7
Low radiation coated glass preparation method, which is characterized in that this method includes：
It carries out vacuum magnetic-control sputtering to glass-base (1) surface with target under vacuum conditions and sputters successively to form first medium layer
(21), the first functional layer (22), the first protection transition zone (23), second dielectric layer (24), the second functional layer (25), the second protection
Transition zone (26) and third dielectric layer (27) are to form film plating layer (2).
9. high low anti-double-silver low-emissivity coated glass preparation method thoroughly according to claim 8, which is characterized in that magnetic control splashes
When penetrating, target used in cathode position is followed successively by sial target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO metal oxides target, sial respectively
Target, zinc-tin target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO metal oxides target and sial target.Wherein AZO metal oxides target is
By ZnOX、AlOXThere is the metal oxide target of ceramic function, the AZO tunic layer even compacts being coated with made of firing.
10. high low anti-double-silver low-emissivity coated glass preparation method thoroughly according to claim 8, which is characterized in that described
Sial target be aluminum weight ratio be 90:10 silico-aluminum target, zinc-aluminium target are that zinc-aluminium weight ratio is 98:2 allumen target,
Zinc-tin target is that zinc-tin weight ratio is 50:50 Zinc-tin alloy target, silver-colored target silver purity be 99.99%, copper target copper purity be 99.5%,
Nickel chromium triangle target is that nickel chromium triangle weight ratio is 80:20 nichrome target, AZO metal oxide target material purity 99.95%, wherein institute
Silver-colored target, copper target and the nickel chromium triangle target stated are flat target, other are rotary target.
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| CN201810460546.3A CN108328942A (en) | 2018-05-15 | 2018-05-15 | High low anti-double-silver low-emissivity coated glass and preparation method thereof thoroughly |
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