CN105645783A - Coated glass with high light transmittance and low radiation and preparation method thereof - Google Patents
Coated glass with high light transmittance and low radiation and preparation method thereof Download PDFInfo
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Abstract
The invention discloses a coated glass with a high light transmittance and low radiation and a preparation method thereof. The coated glass is composed of a glass substrate, a first medium layer, a functional layer, a second medium layer, and a third medium layer, wherein the first medium layer, the functional layer, the second medium layer, and the third medium layer are orderly laminated on at least one surface of the glass substrate; the first medium layer is an aluminum doped zinc oxide membrane layer, the functional layer is a silver membrane layer, the second medium layer is a zinc oxide membrane layer, and the third medium layer is a silicon nitride membrane layer. Through optimizing each coating layer of the coated glass and replacing the conventional nickel-chromium alloy membranes, the radiation performance of coated glass is reduced, and at the same time, the light transmittance is improved. Furthermore, through the optimization of each coating, the binding force between the coatings and the glass substrate is enhanced, the coatings are impact and uniform, the performance of coatings on resisting oxidation and scratching is strong, and the overall using performance of the coated glass is improved.
Description
Technical field
The application relates to low radiation coated glass field, particularly relates to low radiation coated glass and its preparation method of a kind of high printing opacity.
Background technology
According to standard GB/T/18915.2-2002 definition, low radiation coated glass is also known as low emissivity glass, and " Low-E " glass is the coated glass that a kind of far infrared rays to wavelength region 4.5um-25um has relatively high reflectance. In the Film Design of existing off-line low radiation coated glass; the protective layer of the general silver layer using nichrome as functional layer and optical attenuation layer; visible ray is had certain attenuation by this kind of alloy material; the effect that superelevation is saturating cannot be produced; use the monolithic visible light transmissivity of the low radiation coated glass prepared by this alloy material to be generally no more than 82%, the high printing opacity low radiation coated glass that visible light transmissivity is greater than 85% cannot be prepared.
Summary of the invention
The object of the application is to provide the visible light transmissivity that a kind of structure improves and reaches low radiation coated glass and its preparation method of 85% even higher high printing opacity.
The application have employed following technical scheme:
The one side of the application discloses the low radiation coated glass of a kind of high printing opacity, is made up of the first medium layer on glass substrate and at least one surface being sequentially laminated in glass substrate, functional layer, second dielectric layer, the 3rd medium layer; First medium layer is aluminium-doped zinc oxide rete, and functional layer is silver film, and second dielectric layer is zinc oxide film, and the 3rd medium layer is silicon nitride film layer.
It should be noted that, the film system that the application adopts the first medium layer of particular combination, functional layer, second dielectric layer and the 3rd medium layer composition to be formed substitutes nichrome film system, make the low radiation coated glass of preparation while ensureing low radiance, possesses better transmittance, the visible light transmissivity of low radiation coated glass in a kind of implementation of the application, it is also called transmittance, all it is greater than 85%.It should be added that, according to existing routine understanding, the low radiation coated glass that transmittance is greater than 85% by the application is defined as the low radiation coated glass of high printing opacity.
Preferably, the thickness of first medium layer is 29.6��46.3nm, and the thickness of functional layer is 7.7��11nm, and the thickness of second dielectric layer is 5.7��19.3nm, and the thickness of the 3rd medium layer is 15.8��36.1nm.
Preferably, glass substrate is float-glass substrate.
The another side of the application discloses the preparation method of the low radiation coated glass of the high printing opacity of the application, comprises the steps,
Step S01: glass substrate is carried out surface treatment;
Step S02: deposit first medium layer, functional layer, second dielectric layer, the 3rd medium layer successively at surface treated glass baseplate surface, form the low radiation coated glass of high printing opacity.
Preferably, it is deposited as magnetron sputtering deposition.
Preferably, the sputtering vacuum tightness of magnetron sputtering deposition is 2 �� 10-3Mbar��5 �� 10-3mbar��
The useful effect of the application is:
The low radiation coated glass of the application, by being optimized by each layer of multicoating, replaces conventional nichrome film system so that the low radiation coated glass of preparation, while ensureing low radiance, possesses better transmittance; Meanwhile, by the optimization to each layer so that the bonding force of coatings and glass substrate is strong, coatings is fine and close, evenly, rete is anti-oxidant, scratch resistance capability is strong; Improve low radiation coated glass use properties on the whole.
Accompanying drawing explanation
Fig. 1 is the structural representation of the low radiation coated glass of high printing opacity in the embodiment of the present application;
Fig. 2-4 is the curve of spectrum schematic diagram of the low radiation coated glass of the high printing opacity of the embodiment of the present application one, and wherein, Fig. 2 is the curve of spectrum of glass surface reflectivity, and Fig. 3 is the curve of spectrum of coated surface reflectivity, and Fig. 4 is visible light transmissivity;
Fig. 5-7 is the curve of spectrum schematic diagram of the low radiation coated glass of the high printing opacity of the embodiment of the present application two, and wherein, Fig. 5 is the curve of spectrum of glass surface reflectivity, and Fig. 6 is the curve of spectrum of coated surface reflectivity, and Fig. 7 is visible light transmissivity;
Fig. 8-10 is the curve of spectrum schematic diagram of the low radiation coated glass of the high printing opacity of the embodiment of the present application three, and wherein, Fig. 8 is the curve of spectrum of glass surface reflectivity, and Fig. 9 is the curve of spectrum of coated surface reflectivity, and Figure 10 is visible light transmissivity;
Figure 11-13 is the curve of spectrum schematic diagram of the low radiation coated glass of the high printing opacity of the embodiment of the present application four, and wherein, Figure 11 is the curve of spectrum of glass surface reflectivity, and Figure 12 is the curve of spectrum of coated surface reflectivity, and Figure 13 is visible light transmissivity;
Figure 14-16 is the curve of spectrum schematic diagram of the low radiation coated glass of the high printing opacity of the embodiment of the present application five, and wherein, Figure 14 is the curve of spectrum of glass surface reflectivity, and Figure 15 is the curve of spectrum of coated surface reflectivity, and Figure 16 is visible light transmissivity;
Figure 17 is the FB(flow block) of the preparation method of high printing opacity low radiation coated glass in the embodiment of the present application.
Embodiment
The application is mainly for the deficiency of existing low radiation coated glass in structure design, the each layer of plated film is optimized, concrete, the low radiation coated glass of the application is as shown in Figure 1, by glass substrate 1 and the coatings being deposited on glass substrate 1 surface, coatings is sequentially first medium layer 21, functional layer 22, second dielectric layer 23, the 3rd medium layer 24 according to the order being deposited on glass.Wherein, first medium layer 21 is aluminium-doped zinc oxide rete, and functional layer 22 is silver film, and second dielectric layer 23 is zinc oxide film, and the 3rd medium layer 24 is silicon nitride film layer.
It should be noted that, the low radiation coated glass of the application, each layer organically combines, and replaces existing nichrome film system, and wherein, first medium layer has the Na stoped in glass substrate+Permeate in rete; Functional layer plays place mat effect, and the silver film making functional layer thereon can film forming better; Increase the adsorptive power between rete and glass substrate, it is to increase process based prediction model; The optical property of controlling diaphragm system and the effect of color. Functional layer and silver film have reduction radiant ratio, strengthen insulation or heat-proof quality, the optical property of controlling diaphragm system and the effect of color. Second dielectric layer has protection functional layer, reduces oxidation; The optical property of controlling diaphragm system and the effect of color. 3rd medium layer has the whole film layer structure of protection, reduces oxidation, improves process based prediction model; The optical property of controlling diaphragm system and the effect of color. Each layer combines in order, thus has ensured the overall performance of low radiation coated glass, and particularly in transmittance, at the low radiation coated glass of the application, its transmittance is all greater than 85%.
Correspondingly, on the basis of the low radiation coated glass of the high printing opacity of the application, the application also studies and optimizes the preparation method of the low radiation coated glass of the high printing opacity of the application, and concrete, as shown in figure 17, the preparation method of the application comprises the steps:
Step S01: pre-treatment, carries out surface treatment to glass substrate; Mainly clean float glass, using cleaned float glass as glass substrate, the float glass after cleaning is sent into vacuum chamber, keep vacuum degree in vacuum chamber 8 �� 10-6More than mbar;
Step S02: film deposition processes, and deposits first medium layer, functional layer, second dielectric layer, the 3rd medium layer successively at surface treated glass baseplate surface, forms the low radiation coated glass of high printing opacity.
In the preferred version of the application, it is preferable that employing magnetron sputtering deposition prepare each layer plated film, and, it is preferable that the sputtering vacuum tightness of magnetron sputtering deposition be 2 �� 10-3Mbar��5 �� 10-3Mbar. Further, in step S01, the embodiment of the application specifically adopts Benteler cleaning machine to be cleaned by float glass. And magnetron sputtering deposition specifically adopts the magnetron sputtering film device of that company of Feng Adeng of Germany production, the adjustment of sputtering layer thickness, it may also be useful to online photometer measurement Film color parameter, judges the thickness of sputtering rete accordingly.
In the context of detection of low radiation coated glass, in a kind of implementation of the application, concentration is adopted to be the HCl solution of 1mol/L and concentration to be the NaOH solution of 1mol/L as steeping fluid, according to national standard " GBT18918.2-2002 coated glass the 2nd part low radiation coated glass ", the acid resistance of the low radiation coated glass of detection the application and alkaline resistance properties. Meanwhile, the test analytical instrument tests such as bench photometer, shredder, U4100 UV, visible light infrared spectrophotometer are also adopted to obtain glass surface reflectivity, the film face reflectivity of low radiation coated glass and pass through spectrum.
It should be noted that, after each Rotating fields of sputtering target material and plated film is determined, it is resolved that the core of product performance feature is exactly the thickness of each layer, namely by adjustment coating process, control each layer thickness, finally reach different effects.In a kind of preferred version of the application, the thickness of design first medium layer is 29.6��46.3nm, and the thickness of functional layer is 7.7��11nm, and the thickness of second dielectric layer is 5.7��19.3nm, and the thickness of the 3rd medium layer is 15.8��36.1nm.
By reference to the accompanying drawings the application is described in further detail below by specific embodiment. The application is only further described by following examples, it should not be interpreted as the restriction to the application.
Embodiment one
The low radiation coated glass of the high printing opacity of this example, its glass substrate is the float glass of 6mm, and silver film that aluminium-doped zinc oxide rete that first medium layer is 32.6nm, functional layer are 10.9nm, second dielectric layer are the zinc oxide film of 9.5nm, the 3rd medium layer is the silicon nitride film layer of 28.3nm.
The preparation method of the low radiation coated glass of the high printing opacity of this example is as follows:
Step S01: pre-treatment, adopts Benteler cleaning machine to clean float glass; Float glass after cleaning is sent into vacuum chamber, keeps vacuum degree in vacuum chamber 8 �� 10-6More than mbar.
Step S02: film deposition processes, and deposits first medium layer, functional layer, second dielectric layer, the 3rd medium layer successively at surface treated glass baseplate surface, specific as follows:
Adopting argon gas as working gas, AC power sputtered aluminum doping zinc-oxide pottery rotates target, and magnetron sputtering thickness is the aluminium-doped zinc oxide rete of 32.6nm on the glass substrate.
Adopting argon gas as working gas, direct supply sputtering plane silver target, magnetron sputtering silver film on aluminium-doped zinc oxide rete, sputtering thickness is 10.9nm.
Adopting argon gas and oxygen to be working gas, AC power sputtering rotates zinc-aluminium target, and magnetron sputtering zinc oxide film on silver film, sputtering thickness is 9.5nm, and the mass ratio of zinc-aluminium target is Zn:Al=98:2, and the throughput ratio of argon gas and oxygen is 3:4.
Adopting argon gas and nitrogen to be working gas, AC power sputtering rotates sial target, magnetron sputtering silicon nitride film layer on zinc oxide film, and thickness is 28.3nm; The mass ratio Si:Al=92:8 of sial target, the throughput ratio of argon gas and nitrogen is 1:1.
After above-mentioned steps terminates, employing on-line checkingi photometer, DatacolarCHECKII measure the appearance color of the low radiation coated glass of the high printing opacity of this example preparation, meanwhile, the glass substrate that this example adopts being carried out identical test as a comparison, result is as shown in table 1. Adopting the on-line checkingi photometer measurement curve of spectrum, the curve of spectrum obtained is as shown in accompanying drawing 2��Fig. 4, and Fig. 2 is the curve of spectrum of glass surface reflectivity, and Fig. 3 is the curve of spectrum of coated surface reflectivity, and Fig. 4 is visible light transmittance rate.
Curve of spectrum result shows, the low radiation coated glass of the high printing opacity of this example preparation, and the light reflectance of 800nm wavelength is about 0.15 by its glass surface, the luminous reflectance factor of below 800nm wavelength is lower, and it is greater than 800nm wavelength, strengthen along with wavelength increases its emissivity, as shown in Figure 2. The coated surface of low radiation coated glass also has similar result, as shown in Figure 3, and the luminous reflectance factor of 800nm wavelength also just about 0.20. From Fig. 2 and Fig. 3, the low radiation coated glass of this example preparation is all relatively low to the visible light reflectance of 380nm��780nm, between 0.05��0.16, and the reflectivity of infrared rays is obviously stronger. The test result of visible light transmissivity or title transmittance is corresponding with the reflectance test result of Fig. 2 and Fig. 3, as shown in Figure 4, the transmitance of the visible ray of 380nm��780nm is reached as high as about 89%.
In addition, it should be noted that, what this example adopted is that the common float glass of 6mm is as glass substrate, and the film layer structure of the high printing opacity low radiation coated glass of the application is not only limited in common float glass, other float glass such as ultra-white float glass, tinted shade etc. can also be used for the application, and having good transmittance, as glass substrate, its thickness usually can at 3-19mm.
Embodiment two
The low radiation coated glass of the high printing opacity of this example is identical with embodiment one structure, and just each layer thickness is slightly different. Silver film that aluminium-doped zinc oxide rete that first medium layer is 29.6nm, functional layer are 7.7nm, second dielectric layer are the zinc oxide film of 12.6nm, the 3rd medium layer is the silicon nitride film layer of 15.8nm, and glass substrate is identical with embodiment one. The pre-treatment of glass substrate and film deposition process are identical with embodiment one, just control magnetron sputtering condition so that each layer reaches the thickness of this example.
Same, adopt the testing method identical with embodiment one to be tested by the low radiation coated glass of the high printing opacity of this example, the test results such as appearance color are as shown in table 1, and the curve of spectrum is as shown in Fig. 5��7. Fig. 5 is the curve of spectrum of glass surface reflectivity, and Fig. 6 is the curve of spectrum of coated surface reflectivity, and Fig. 7 is visible light transmittance rate.
Curve of spectrum result shows, the low radiation coated glass of the high printing opacity of this example preparation, and the light reflectance of 800nm wavelength is about 0.11 by its glass surface, the luminous reflectance factor of below 800nm wavelength is lower, and it is greater than 800nm wavelength, strengthen along with wavelength increases its emissivity, as shown in Figure 5. The coated surface of high printing opacity low radiation coated glass also has similar result, as shown in Figure 6, and the luminous reflectance factor of 800nm wavelength also just about 0.15. From Fig. 5 and Fig. 6, the low radiation coated glass of the high printing opacity of this example preparation is all relatively low to the visible light reflectance of 380nm��780nm, between 0.06��0.12, and the reflectivity of infrared rays is obviously stronger. The test result of visible light transmissivity or title transmittance is corresponding with the reflectance test result of Fig. 5 and Fig. 6, as shown in Figure 7, the transmitance of the visible ray of 380nm��780nm is reached as high as about 88%.
Embodiment three
The low radiation coated glass of the high printing opacity of this example is identical with embodiment one structure, and just each layer thickness is slightly different. Silver film that aluminium-doped zinc oxide rete that first medium layer is 37.5nm, functional layer are 11nm, second dielectric layer are the zinc oxide film of 10.5nm, the 3rd medium layer is the silicon nitride film layer of 33.5nm, and glass substrate is identical with embodiment one. The pre-treatment of glass substrate and film deposition process are identical with embodiment one, just control magnetron sputtering condition so that each layer reaches the thickness of this example.
Same, adopt the testing method identical with embodiment one to be tested by the low radiation coated glass of the high printing opacity of this example, the test results such as appearance color are as shown in table 1, and the curve of spectrum is as shown in figs. 8-10. Fig. 8 is the curve of spectrum of glass surface reflectivity, and Fig. 9 is the curve of spectrum of coated surface reflectivity, and Figure 10 is visible light transmittance rate.
Curve of spectrum result shows, the low radiation coated glass of the high printing opacity of this example preparation, and the light reflectance of 800nm wavelength is about 0.12 by its glass surface, the luminous reflectance factor of 500nm��700nm wavelength is lower, and it is greater than 800nm wavelength, strengthen along with wavelength increases its emissivity, as shown in Figure 8.The coated surface of low radiation coated glass also has similar result, as shown in Figure 9, and the luminous reflectance factor of 800nm wavelength also just about 0.15. From Fig. 8 and Fig. 9, the high printing opacity low radiation coated glass of this example preparation is all relatively low to the visible light reflectance of 380nm��780nm, between 0.07��0.14, and the reflectivity of infrared rays is obviously stronger. The test result of visible light transmissivity or title transmittance is corresponding with the reflectance test result of Fig. 8 and Fig. 9, as shown in Figure 10, the transmitance of the visible ray of 380nm��780nm is reached as high as about 89%.
Embodiment four
The low radiation coated glass of the high printing opacity of this example is identical with embodiment one structure, and just each layer thickness is slightly different. Silver film that aluminium-doped zinc oxide rete that first medium layer is 44nm, functional layer are 9.8nm, second dielectric layer are the zinc oxide film of 19.3nm, the 3rd medium layer is the silicon nitride film layer of 25nm, and glass substrate is identical with embodiment one. The pre-treatment of glass substrate and film deposition process are identical with embodiment one, just control magnetron sputtering condition so that each layer reaches the thickness of this example.
Same, adopt the testing method identical with embodiment one to be tested by the low radiation coated glass of the high printing opacity of this example, the test results such as appearance color are as shown in table 1, and the curve of spectrum is as shown in Figure 11��13. Figure 11 is the curve of spectrum of glass surface reflectivity, and Figure 12 is the curve of spectrum of coated surface reflectivity, and Figure 13 is visible light transmittance rate.
Curve of spectrum result shows, the low radiation coated glass of the high printing opacity of this example preparation, and the light reflectance of 800nm wavelength is about 0.09 by its glass surface, the luminous reflectance factor of 500nm��700nm wavelength is lower, and it is greater than 800nm wavelength, strengthen along with wavelength increases its emissivity, as shown in figure 11. The coated surface of high printing opacity low radiation coated glass also has similar result, as shown in figure 12, and the luminous reflectance factor of 800nm wavelength also just about 0.10. From Figure 11 and Figure 12, the high printing opacity low radiation coated glass of this example preparation is all relatively low to the visible light reflectance of 380nm��780nm, between 0.05��0.18, and the reflectivity of infrared rays is obviously stronger. The test result of visible light transmissivity is corresponding with the reflectance test result of Figure 11 and Figure 12, as shown in figure 13, the transmitance of the visible ray of 380nm��780nm is reached as high as about 90%.
Embodiment five
The low radiation coated glass of the high printing opacity of this example is identical with embodiment one structure, and just each layer thickness is slightly different. Silver film that aluminium-doped zinc oxide rete that first medium layer is 46.3nm, functional layer are 9.8nm, second dielectric layer are the zinc oxide film of 5.7nm, the 3rd medium layer is the silicon nitride film layer of 36.1nm, and glass substrate is identical with embodiment one. The pre-treatment of glass substrate and film deposition process are identical with embodiment one, just control magnetron sputtering condition so that each layer reaches the thickness of this example.
Same, adopt the testing method identical with embodiment one to be tested by the low radiation coated glass of the high printing opacity of this example, the test results such as appearance color are as shown in table 1, and the curve of spectrum is as shown in Figure 14��16. Figure 14 is the curve of spectrum of glass surface reflectivity, and Figure 15 is the curve of spectrum of coated surface reflectivity, and Figure 16 is visible light transmittance rate.
Curve of spectrum result shows, the low radiation coated glass of the high printing opacity of this example preparation, and the light reflectance of 800nm wavelength is about 0.10 by its glass surface, the luminous reflectance factor of 500nm��700nm wavelength is lower, and it is greater than 800nm wavelength, strengthen along with wavelength increases its emissivity, as shown in figure 14.The coated surface of high printing opacity low radiation coated glass also has similar result, as shown in figure 15, and the luminous reflectance factor of 800nm wavelength also just about 0.12. From Figure 14 and Figure 15, the high printing opacity low radiation coated glass of this example preparation is all relatively low to the visible light reflectance of 380nm��780nm, between 0.10��0.18, and the reflectivity of infrared rays is obviously stronger. The test result of visible light transmissivity is corresponding with the reflectance test result of Figure 14 and Figure 15, as shown in figure 16, the transmitance of the visible ray of 380nm��780nm is reached as high as about 90%.
The appearance color detected result of the high printing opacity low radiation coated glass of table 1
In table 1, the implication of each letter is as follows:
G represents the glass surface of coated glass, and R*g represents the reflectance value of coated glass glass surface; A*g and b*g represents the color value of the glass surface of coated glass, and a*g is more just representing that color is more red, and the more negative expression color of a*g is more green, and b*g is more just representing that color is more yellow, and the more negative expression color of b*g is more blue; L*g represents the brightness of the glass surface of coated glass.
F represents the coated surface of coated glass; R*f represents the reflectance value in coated glass film face; A*f and b*f represents the color value in coated glass film face, and a*f is more just representing that color is more red, and the more negative expression color of a*f is more green; B*f is more just representing that color is more yellow, and the more negative expression color of b*f is more blue; L*f represents the brightness in coated glass film face.
T represents passing through of coated glass; Tr represents the transmitance of coated glass; A*T and b*T represents that the color value that coated glass passes through, a*T are more just representing that color is more red, and the more negative expression color of a*T is more green; B*T is more just representing that color is more yellow, and the more negative expression color of b*T is more blue; L*T represents the brightness that coated glass passes through.
Table 1 result display, the color a*g of embodiment 1-5 about 0, because of people a*g is represented red green more responsive, in order to make Color Neutral partially blue, a*g remains on about-1��2 substantially. The color b*g of embodiment 1-5 is negative, because blueness more gives sensation saturating clearly than yellow, therefore b*g is optimal selection-6��-13.
Above content is further description the application done in conjunction with concrete enforcement mode, can not assert that the concrete enforcement of the application is confined to these explanations. For the application person of an ordinary skill in the technical field, under the prerequisite not departing from the application's design, it is also possible to make some simple deduction or replace, all should be considered as belonging to the protection domain of the application.
Claims (6)
1. the low radiation coated glass of a high printing opacity, it is characterised in that: it is made up of the first medium layer on glass substrate and at least one surface being sequentially laminated in glass substrate, functional layer, second dielectric layer, the 3rd medium layer;
Described first medium layer is aluminium-doped zinc oxide rete, and described functional layer is silver film, and described second dielectric layer is zinc oxide film, and described 3rd medium layer is silicon nitride film layer.
2. low radiation coated glass according to claim 1, it is characterized in that: the thickness of described first medium layer is 29.6��46.3nm, the thickness of described functional layer is 7.7��11nm, the thickness of described second dielectric layer is 5.7��19.3nm, and the thickness of described 3rd medium layer is 15.8��36.1nm.
3. low radiation coated glass according to claim 1, it is characterised in that: described glass substrate is float-glass substrate.
4. the preparation method of the low radiation coated glass of high printing opacity according to the arbitrary item of claim 1-3, it is characterised in that: comprise the steps,
Step S01: described glass substrate is carried out surface treatment;
Step S02: deposit described first medium layer, functional layer, second dielectric layer, the 3rd medium layer successively at surface treated glass baseplate surface, form described low radiation coated glass.
5. preparation method according to claim 4, it is characterised in that: described in be deposited as magnetron sputtering deposition.
6. preparation method according to claim 5, it is characterised in that: the sputtering vacuum tightness of described magnetron sputtering deposition is 2 �� 10-3mbar��5 �� 10-3mbar.
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Application publication date: 20160608 |