CN208250167U - High low anti-double-silver low-emissivity coated glass thoroughly - Google Patents
High low anti-double-silver low-emissivity coated glass thoroughly Download PDFInfo
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- CN208250167U CN208250167U CN201820722368.2U CN201820722368U CN208250167U CN 208250167 U CN208250167 U CN 208250167U CN 201820722368 U CN201820722368 U CN 201820722368U CN 208250167 U CN208250167 U CN 208250167U
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Abstract
The utility model relates to a kind of high low anti-double-silver low-emissivity coated glass.Including glass-base; glass-base side has film plating layer; film plating layer includes from first medium layer, the first functional layer, the first protection transition zone, second dielectric layer, the second functional layer, the second protection transition zone and the third dielectric layer being successively arranged outward close to glass-base side; first medium layer includes SiNx layer and ZnAlOx layers; first functional layer and the second functional layer include Ag layers; first protection transition zone includes NiCr layers and AZO layers; second dielectric layer includes ZnSnOx layers and ZnAlOx layers, and third dielectric layer is SiNx layer.Since ZnSnOx or ZnAlOx is higher than SiNx layer as the transmitance of dielectric layer, by using thicker ZnAlOx and ZnSnOx, so that coated glass product obtains higher transmitance.Neutral grey color is presented in the utility model coated glass product, clear beautiful, has visible light transmittance and very low visible reflectance, and light thermal property is excellent, is that one kind had not only taken into account appearance but also focused on energy-saving and environment-friendly construction material.
Description
Technical field
The utility model belongs to glass processing manufacturing technology field, more particularly, to a kind of high low anti-double silver low radiation platings
Film glass.
Background technique
Low radiation coated glass is a kind of construction material of environmental protection and energy saving.Low radiation coated glass has using its film plating layer
There is the characteristic to far red light high reflectance, summer in winter can be greatly reduced to ensure room temperature and use energy consumed by air-conditioning
Source.And high low radiation coated glass thoroughly also retains simple glass to visible light with the spy compared with high transmittance on this basis
Property, it can guarantee the daylighting of Indoor environment.In addition to this, in measuring coated glass indices content, there is " selection a system
Number " is by recognition of state, equation are as follows: selection coefficient=transmitance/shading coefficient.Generally common pair of silver-colored shading coefficients are
0.2~0.5, it is seen that the double-silver low-emissivity coated glass of a high transmittance, energy-efficient performance is relatively preferable, more joyous by market
It meets.And in modern urban construction, many skyscraper are rised sheer from level ground, and " light pollution " becomes one of the problem of can not ignoring, low anti-
Penetrating glass fundamentally upper can reduce " light pollution ".Low radiation coated glass transmitance in the prior art is usually less than 70%,
In order to accomplish high transmittance, it is necessary to which the thickness for reducing Ag layers He NiCr layers thereby results in the radiance and reflectivity of this product
Also higher, high transmittance, low-E and antiradar reflectivity can not be had both by allowing for existing low radiation coated glass in this way, existing simultaneously
Having low radiation coated glass, there is also the problems such as film layer mechanical strength are low, and connective stability is low between each layer.
Summary of the invention
The purpose of this utility model is to take into account high transmittance and low in view of the above-mentioned problems, provide a kind of simple and reasonable
The saturating low anti-double-silver low-emissivity coated glass of the height of emissivity.
In order to achieve the above objectives, the utility model uses following technical proposal: the conception of the utility model is to provide
A kind of high low anti-double-silver low-emissivity coated glass, including glass-base, the glass-base side has film plating layer, special
Sign is, the film plating layer include from be successively arranged outward close to glass-base side first medium layer, the first functional layer,
First protection transition zone, second dielectric layer, the second functional layer, the second protection transition zone and third dielectric layer, wherein described
First medium layer includes from the SiNx layer being successively distributed outward close to glass-base side and ZnAlOx layers, first function
Layer and the second functional layer include Ag layers, and the first protection transition zone and the second protection transition zone include from close to glass
NiCr layer that base side is successively distributed outward and AZO layer, the second dielectric layer include from close glass-base side according to
The secondary SiNx layer being distributed outward, ZnSnOx layers and ZnAlOx layers, the third dielectric layer are SiNx layer.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the SiNx layer of the first medium layer with a thickness of
15~25nm, and the SiNx layer is directly plated on glass-base, plays the role of bottoming, can be stopped in substrate of glass
The migration and diffusion of sodium ion, ZnAlOx layers are plated on the SiNx layer of bottoming, form the combination of first medium layer.Wherein first medium
Layer can also only include SiNx layer, can also be the combination layer including SiNx layer, ZnSnOx layers and ZnAlOx layers；The first medium
The ZnAlOx layer of layer with a thickness of 11~21nm, and first functional layer is directly plated on ZnAlOx layer.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the Ag layer of first functional layer with a thickness of 4~
10nm；For the Ag layer of second functional layer with a thickness of 16~23nm, the second functional layer is interior to have Cu layers and the Cu thickness
Degree is 9~15nm.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the NiCr thickness degree of the first protection transition zone
For 0.5~2.6nm, the AZO layer of the first protection transition zone wherein can prevent metal Ag for NiCr layers with a thickness of 2~6nm
Layer is oxidized, and AZO layer due to film layer dense uniform, can be improved the binding force of metal NiCr layer and dielectric layer, raising film layer
The stability of structure.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the second dielectric layer with a thickness of 66~
86nm。
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the NiCr thickness degree of the second protection transition zone
For 0.1~1.2nm；The AZO layer of the second protection transition zone wherein can prevent metal Ag for NiCr layers with a thickness of 2~6nm
Layer is oxidized, and AZO layer due to film layer dense uniform, can be improved the binding force of metal NiCr layer and dielectric layer, raising film layer
The stability of structure.
In above-mentioned height thoroughly low anti-double-silver low-emissivity coated glass, the SiNx layer of the third dielectric layer is with a thickness of 27
~47nm and protective layer, according to SiNx high rigidity, anti abrasive characteristic, protection has good anti-zoned in entire film plating layer
Hurt performance；
Compared with prior art, this height thoroughly low anti-double-silver low-emissivity coated glass the advantages of be:
1, by rationally designing protection transition zone, so that the film layer structure of institute's plated film is stablized, adhesive force is strong, mechanical performance
It is good, it is not oxidizable.
2, by the adjustment to film layer ratio, use thicker ZnAlOx and ZnSnOx keep glass product transmitance higher,
Again by the adjustment between each film layer ratio, so that the reflection of all angles is lower.
3, low anti-double-silver low-emissivity coated glass has both high transmittance, low-E and antiradar reflectivity to this height thoroughly.Heat transfer system
Number U value is low, can sufficiently reduce the energy consumption of Indoor environment heating and refrigeration, reach excellent energy-saving effect.
Detailed description of the invention
Fig. 1 is the structure sectional view of the utility model；
In figure, glass-base 1, film plating layer 2, first medium layer 21, the first functional layer 22, first protection transition zone 23, the
Second medium layer 24, the second functional layer 25, second protect transition zone 26, third dielectric layer 27.
Specific embodiment
The utility model is described in more detail with reference to the accompanying drawings and detailed description.
As shown in Figure 1, this height low anti-double-silver low-emissivity coated glass, including glass-base 1 thoroughly, 1 side of glass-base tool
There is film plating layer 2, film plating layer 2 includes the first medium layer 21 being successively arranged outward from close 1 side of glass-base, the first functional layer
22, the first protection transition zone 23, second dielectric layer 24, the second functional layer 25, second protection transition zone 26 and third dielectric layer
27, wherein the first functional layer 22 and the second functional layer 25 here includes Ag layers, and the utility model the first functional layer 22 is by setting
The Ag layer set is constituted, and with a thickness of 4~10nm, major function is that the radiance of glass product is reduced using Ag, by sunlight
It is filtered into cold light source, improves through performance.The Ag layer of second functional layer 25 has in second functional layer 25 with a thickness of 16~23nm
Cu layers and Cu layers with a thickness of 9~15nm.
Wherein, first medium layer 21 includes from the SiNx layer and ZnAlOx being successively distributed outward close to 1 side of glass-base
Layer, SiNx layer is with a thickness of 15~25nm.SiNx layer is directly plated on glass-base 1 as prime coat, to prevent glass book
For sodium element diffusive migration in body into functional layer Ag, the structure for destroying functional layer destroys the functional layer structure containing Ag.This layer is not
Preferably too thick, excessive SiNx can reduce film layer transmitance；Adhesion layer of the ZnAlOx as the first functional layer 22, the first functional layer 22
It is directly plated on ZnAlOx layers with a thickness of 11~21nm, the flatness of entire film layer can be improved, convenient for Ag in functional layer
Deposition.
It includes from the NiCr layer being successively distributed outward close to 1 side of glass-base that the utility model first, which protects transition zone 23,
With AZO layers, NiCr layers with a thickness of 0.5~2.6nm, wherein NiCr major function is the characteristic using film layer densification, protects first
Layer silver is not oxidized；AZO layers, with a thickness of 2~6nm, are the characteristics using the densification of its ceramic structure, enhance protective layer and medium
Binding force between layer.
The utility model second dielectric layer 24 include from the SiNx layer being successively distributed outward close to 1 side of glass-base,
ZnSnOx layers and ZnAlOx layers, with a thickness of 66~86nm, film surface surface resistance can be reduced, increases visible light transmittance.
It includes from the NiCr layer being successively distributed outward close to 1 side of glass-base that the utility model second, which protects transition zone 26,
It is constituted with AZO layers, NiCr layers with a thickness of 0.1~1.2nm.AZO layers with a thickness of 2~6nm.
Successively 27~the 47nm of SiNx layer by being arranged of the utility model third dielectric layer 27.Outermost layer as film layer is protected
Layer, SiNx can improve the mechanical performance of film layer.But this layer should not be too thick, excessive SiNx can reduce film layer transmitance.
The structure of film plating layer in the present embodiment are as follows:
SiNx+ZnAlOx/Ag/NiCr+AZO/SiNx+ZnSnOx+ZnAlOx/Ag+Cu/NiCr+AZO/SiNx。
The utility model is by the plated film on glass product, by being adjusted to thicknesses of layers, the thicker ZnAlOx of use and
ZnSnOx keeps glass product transmitance higher, then by the adjustment between each film layer ratio so that the reflection of all angles compared with
It is low.The utility model light thermal property is good, and film layer structure is stablized, and adhesive force is strong, good mechanical property, not oxidizable.
The saturating low anti-double-silver low-emissivity coated glass preparation method of height in the present embodiment, comprising:
1, vacuum magnetic-control sputtering is carried out to 1 surface of glass-base with target under vacuum conditions and successively sputters first Jie of formation
Matter layer 21, the first functional layer 22, first protection transition zone 23, second dielectric layer 24, the second functional layer 25, second protect transition zone
26 and third dielectric layer 27 to forming film plating layer 2.
2, when magnetron sputtering, target used in cathode position be respectively sial target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO ceramic target,
Sial target, zinc-tin target, zinc-aluminium target, silver-colored target, nickel chromium triangle target, AZO ceramic target, sial target, wherein AZO ceramic target is by ZnOX, AlOX
There is the metal oxide target of ceramic function, the AZO tunic layer even compact being coated with made of firing.
3, sial target is the silico-aluminum target that aluminum weight ratio is 90:10, and zinc-aluminium target is the zinc that zinc-aluminium weight ratio is 98:2
Aluminium alloy target, zinc-tin target are the Zinc-tin alloy target that zinc-tin weight ratio is 50:50, and silver-colored target silver purity is 99.99%, copper target copper purity
It is the nichrome target that nickel chromium triangle weight ratio is 80:20, AZO ceramic target material purity 99.95% for 99.5%, nickel chromium triangle target, wherein
Silver-colored target, copper target and the nickel chromium triangle target is flat target, other are rotary target.
4, when magnetron sputtering, using power control, to guarantee that sputtering is stablized, and target not being destroyed, sial target power output is 0~
70Kw, sputtering technology gas high-purity argon and High Purity Nitrogen ratio are 0.78；Zinc-aluminium target power output is 0~60Kw, and sputtering technology gas is high
Straight argon and high pure oxygen ratio are 0.67；Zinc-tin target power output is 0~60Kw, and sputtering technology gas high-purity argon and High Purity Nitrogen ratio are
0.67；Silver-colored target power output is 0~20Kw, and nickel chromium triangle target power output is 0~20Kw, and AZO ceramics target power output is 0~20Kw, sputtering technology gas
Body is high-purity argon.
It is -5 that high saturating low anti-double-silver low-emissivity coated glass obtained, which is 70~95, a*g through color L*g, through the above steps
~-1, b*g is 0~2.
Low anti-double-silver low-emissivity coated glass thoroughly obtained high through the above steps, the positive face color of glass surface: L*g is 15~
30, a*g be -2~2, b*g be -10~-5；60 degree of Side Colors of glass surface: it be -3~0, b*g is -10 that L*g, which is 40~50, a*g,
~-2.
5, working gas dosage when magnetron sputtering, sial target are all Ar:N2=700sccm:900sccm, zinc-aluminium target, zinc-tin
Target is all Ar:O2=600sccm:900sccm, other flat targets and AZO target are pure Ar=1200sccm.
The specific embodiments described herein are merely examples of the spirit of the present invention.The utility model institute
Belonging to those skilled in the art can make various modifications or additions to the described embodiments or using similar
Mode substitute, but without departing from the spirit of the present application or beyond the scope of the appended claims.
Although glass-base 1, film plating layer 2, first medium layer 21, the first functional layer 22, first is used more herein
The terms such as transition zone 23, second dielectric layer 24, the second functional layer 25, second protection transition zone 26, third dielectric layer 27 are protected, but
It does not exclude the possibility of using other terms.It is practical new the use of these items is only for being more convenient to describe and explain this
The essence of type；It is contrary to the spirit of the present invention to interpret them as any one of the additional limitations.
Claims (7)
1. a kind of high low anti-double-silver low-emissivity coated glass, including glass-base (1), the glass-base (1) side tool
There are film plating layer (2), which is characterized in that the film plating layer (2) includes successively being arranged outward from close to glass-base (1) side
First medium layer (21), the first functional layer (22), the first protection transition zone (23), second dielectric layer (24), the second functional layer
(25), the second protection transition zone (26) and third dielectric layer (27), wherein the first medium layer (21) includes from close
SiNx layer that glass-base (1) side is successively distributed outward and ZnAlOx layers, first functional layer (22) and the second function
Layer (25) includes Ag layers, and first protection transition zone (23) and the second protection transition zone (26) include from close to glass
NiCr layer that base (1) side is successively distributed outward and AZO layer, the second dielectric layer (24) includes from close glass-base
(1) side is successively distributed outward SiNx layer, ZnSnOx layers and ZnAlOx layers, the third dielectric layer (27) are SiNx layer.
2. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 1, which is characterized in that the first medium
The SiNx layer of layer (21) with a thickness of 15~25nm, and the SiNx layer is directly coated on glass-base (1)；Described
The ZnAlOx layer of one dielectric layer (21) with a thickness of 11~21nm, and first functional layer (22) is directly coated on SiNx layer
On.
3. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 2, which is characterized in that first function
The Ag layer of layer (22) is with a thickness of 4~10nm；The Ag layer of second functional layer (25) is with a thickness of 16~23nm, the second functional layer
(25) have Cu layers and the Cu layer with a thickness of 9~15nm in.
4. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 1 or 2 or 3, which is characterized in that described the
The NiCr layer of one protection transition zone (23) is with a thickness of 0.5~2.6nm, the AZO thickness degree of first protection transition zone (23)
For 2~6nm.
5. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 4, which is characterized in that the second medium
Layer (24) with a thickness of 66~86nm.
6. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 4, which is characterized in that second protection
The NiCr layer of transition zone (26) is with a thickness of 0.1~1.2nm；The AZO layer of described second protection transition zone (26) with a thickness of 2~
6nm。
7. high low anti-double-silver low-emissivity coated glass thoroughly according to claim 4, which is characterized in that the third medium
The SiNx layer of layer (27) is with a thickness of 27~47nm.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201820722368.2U CN208250167U (en) | 2018-05-15 | 2018-05-15 | High low anti-double-silver low-emissivity coated glass thoroughly |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110627374A (en) * | 2019-09-27 | 2019-12-31 | 吴江南玻华东工程玻璃有限公司 | Amber medium-transmittance low-reflection double-silver energy-saving coated glass and preparation method thereof |
| CN111606578A (en) * | 2020-06-29 | 2020-09-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-radiation coated glass and preparation method thereof |
| CN112624633A (en) * | 2020-12-11 | 2021-04-09 | 安徽凤阳玻璃有限公司 | Offline single-silver temperable low-emissivity coated glass and preparation process thereof |
| CN113880453A (en) * | 2021-09-28 | 2022-01-04 | 吴江南玻华东工程玻璃有限公司 | Coated glass |
-
2018
- 2018-05-15 CN CN201820722368.2U patent/CN208250167U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110627374A (en) * | 2019-09-27 | 2019-12-31 | 吴江南玻华东工程玻璃有限公司 | Amber medium-transmittance low-reflection double-silver energy-saving coated glass and preparation method thereof |
| CN110627374B (en) * | 2019-09-27 | 2024-01-12 | 吴江南玻华东工程玻璃有限公司 | Amber middle-permeation low-reflection double-silver energy-saving coated glass and preparation method thereof |
| CN111606578A (en) * | 2020-06-29 | 2020-09-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-radiation coated glass and preparation method thereof |
| CN111606578B (en) * | 2020-06-29 | 2023-12-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-emissivity coated glass and preparation method thereof |
| CN112624633A (en) * | 2020-12-11 | 2021-04-09 | 安徽凤阳玻璃有限公司 | Offline single-silver temperable low-emissivity coated glass and preparation process thereof |
| CN113880453A (en) * | 2021-09-28 | 2022-01-04 | 吴江南玻华东工程玻璃有限公司 | Coated glass |
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