CN110627374A - Amber medium-transmittance low-reflection double-silver energy-saving coated glass and preparation method thereof - Google Patents
Amber medium-transmittance low-reflection double-silver energy-saving coated glass and preparation method thereof Download PDFInfo
- Publication number
- CN110627374A CN110627374A CN201910923967.XA CN201910923967A CN110627374A CN 110627374 A CN110627374 A CN 110627374A CN 201910923967 A CN201910923967 A CN 201910923967A CN 110627374 A CN110627374 A CN 110627374A
- Authority
- CN
- China
- Prior art keywords
- layer
- thickness
- protective layer
- magnetron sputtering
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 85
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 43
- 239000004332 silver Substances 0.000 title claims abstract description 41
- 238000002834 transmittance Methods 0.000 title claims abstract description 30
- 238000002360 preparation method Methods 0.000 title abstract description 9
- 239000010410 layer Substances 0.000 claims abstract description 219
- 239000011241 protective layer Substances 0.000 claims abstract description 99
- 239000002346 layers by function Substances 0.000 claims abstract description 91
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 56
- 238000000034 method Methods 0.000 claims abstract description 48
- 230000008569 process Effects 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000002131 composite material Substances 0.000 claims abstract description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 58
- 238000004544 sputter deposition Methods 0.000 claims description 40
- 239000007789 gas Substances 0.000 claims description 30
- 238000007747 plating Methods 0.000 claims description 30
- 229910052786 argon Inorganic materials 0.000 claims description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 18
- 239000001301 oxygen Substances 0.000 claims description 18
- 229910052760 oxygen Inorganic materials 0.000 claims description 18
- 229910007717 ZnSnO Inorganic materials 0.000 claims description 16
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 239000012495 reaction gas Substances 0.000 claims description 9
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 claims description 5
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 5
- 229910001120 nichrome Inorganic materials 0.000 claims description 5
- 229910001220 stainless steel Inorganic materials 0.000 claims description 5
- 239000010935 stainless steel Substances 0.000 claims description 5
- 229910004286 SiNxOy Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910003087 TiOx Inorganic materials 0.000 claims description 4
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims description 4
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000005245 sintering Methods 0.000 claims 1
- 238000002310 reflectometry Methods 0.000 abstract description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical group [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 50
- 239000011787 zinc oxide Substances 0.000 description 25
- 239000010949 copper Substances 0.000 description 15
- 238000000151 deposition Methods 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 4
- 238000001579 optical reflectometry Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 244000248349 Citrus limon Species 0.000 description 1
- 235000005979 Citrus limon Nutrition 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 235000019993 champagne Nutrition 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3649—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3684—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used for decoration purposes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention discloses amber middle-transmittance low-transmittance reverse double-silver energy-saving coated glass and a preparation method thereof, wherein the amber middle-transmittance low-reflectance double-silver energy-saving coated glass comprises a glass substrate and a composite film layer plated on one side surface of the glass substrate, wherein the composite film layer comprises a first functional layer, a first medium protective layer, a second functional layer, a third functional layer, a first protective layer, a third medium protective layer, a fourth functional layer, a second protective layer and a fourth medium protective layer which are sequentially and adjacently compounded on a glass substrate from inside to outside; the first functional layer is an SSTROX layer; the preparation method adopts a magnetron sputtering process, and ten film layers are sequentially and adjacently plated on the glass substrate from inside to outside. According to the amber middle-transmission low-reflection double-silver energy-saving coated glass designed by the invention, the reflectivity of the product is reduced through the matching of the composite film layer structure and the film layer thickness, the reflectivity of the outdoor surface is less than 7, and the light pollution is effectively prevented; the appearance of the coated glass is amber, and the appearance color of glass products in the market is enriched.
Description
Technical Field
The invention relates to the field of glass production, in particular to amber double-silver energy-saving coated glass with medium transmittance and low reflectance and a preparation method thereof.
Background
The existing engineering glass products are basically blue-gray in appearance and single in color, so that the colors of buildings are uniform, and aesthetic fatigue is easy to make. With the increasingly strict requirements of Shanghai environment evaluation systems on the exterior reflection of LOW-E products for building curtain walls, more and more projects are required in Shanghai areas to require curtain wall reflectivity to be lower than 9%, so that the requirement that the reflectivity is lower than 9% is met, and the products are rich, beautiful and beautiful in appearance color, luster and attractive. The problems of high reflectivity and low transmittance (the visible light transmittance is lower than 38%) of the color series products developed on the market at present generally do not meet the national standard requirement (the visible light transmittance of a curtain wall is higher than 40%) so that the color series products cannot be popularized, so that the glass which can meet the transmittance requirement and the reflectance requirement needs to be developed, the appearance color of the low-reflectivity products can be enriched, and different requirements of the market can be met.
At present, a great deal of production research is carried out on champagne-color series coated glass, but the visible light reflectivity is high, the light pollution is easy to cause, and the market demand cannot be met, for example, the invention patent application with the publication number of CN106904842A discloses champagne-color double-silver low-emissivity coated glass, and the color range of a single glass sheet with the thickness of 6mm is as follows: r is more than or equal to 14.5 and less than or equal to 17, a is more than or equal to 2 and less than or equal to 2.5, and b is more than or equal to 7 and less than or equal to 8. For example, patent application publication No. CN207468490U discloses champagne-colored double silver Low-E glass, in which the reflectivity of the single glass surface is about 16%, the color a × g is about 7, and b × g is about 28, and the reflectivity of the products of the above two patents is high, and both are liable to cause light pollution.
Disclosure of Invention
In order to solve the problems in the prior art, the invention provides amber middle-transmission low-reflection double-silver energy-saving coated glass and a preparation method thereof, so as to enrich the color of the glass and reduce the reflectivity, and the technical scheme is as follows:
the invention provides amber middle-transmittance low-transmittance reverse double-silver energy-saving coated glass, which comprises a glass substrate and a composite film layer plated on one side surface of the glass substrate, wherein the composite film layer comprises a first functional layer, a first medium protective layer, a second functional layer, a third functional layer, a first protective layer, a third medium protective layer, a fourth functional layer, a second protective layer and a fourth medium protective layer which are sequentially and adjacently compounded on a glass substrate from inside to outside; the first functional layer is an SSTZrOX layer, and the thickness of the SSTZrOX layer is 3.5-5 nm.
Further, the first dielectric protection layer is an AZO layer, the second dielectric protection layer is a ZnO layer, and the third dielectric protection layer is a ZnO/ZnSnO layer.
Further, the thickness of the AZO layer is 7-9nm, the thickness of the ZnO layer is 26-34nm, and the total thickness of the ZnO/ZnSnO layer is 38-46 nm.
Further, the fourth dielectric protection layer is Si3N4Any one or more of SiNxOy, SiOx and TiOx, and the thickness of the fourth dielectric protective layer is 15-25 nm.
Further, the second functional layer and the fourth functional layer are both Ag layers, and the third functional layer is a Cu layer.
Further, the thickness of the second functional layer is 9-10nm, the thickness of the third functional layer is 3-4nm, and the thickness of the fourth functional layer is 4.5-5.5 nm.
Furthermore, the first protective layer and the second protective layer are both one or more of CrNxOy, CrNx, NiCrNx, NiCrNxOy and NiCr composite layers; the thickness of the first protective layer is 1.5-2nm, and the thickness of the second protective layer is 1-2 nm.
The invention also provides a preparation method of the amber middle-transmission low-reflection double-silver energy-saving coated glass, which comprises the following steps: a magnetron sputtering process is adopted, and a first functional layer with the thickness of 3.5-5nm, a first medium protective layer with the thickness of 7-9nm, a second medium protective layer with the thickness of 26-34nm, a second functional layer with the thickness of 9-10nm, a third functional layer with the thickness of 3-4nm, a first protective layer with the thickness of 1.5-2nm, a third medium protective layer with the thickness of 38-46nm, a fourth functional layer with the thickness of 4.5-5.5nm, a second protective layer with the thickness of 1-2nm and a fourth medium protective layer with the thickness of 15-25nm are sequentially and adjacently plated on a glass substrate from inside to outside.
Further, (1) magnetron sputtering the first functional layer: plating a first functional layer SSTZrOX layer on a glass substrate by adopting a magnetron sputtering process, and sputtering a zirconium-doped stainless steel target Fe by using an alternating current medium frequency power supply and oxygen as reaction gases: zr is 80:20, the argon-oxygen flow ratio is 650SCCM-750 SCCM: 850SCCM-950 SCCM;
(2) magnetron sputtering of a first dielectric protective layer: plating a first dielectric protection layer AZO layer on the SSTZrOX layer as a first functional layer by adopting a magnetron sputtering process, sputtering a ceramic AZO target by using a medium-frequency alternating-current power supply, and using pure argon as sputtering gas, wherein the flow ratio of the argon is 1400-1600 SCCM;
(3) magnetron sputtering a second dielectric protective layer: plating a second medium protective layer ZnO layer on the first medium protective layer AZO layer by a magnetron sputtering process, sputtering by using an alternating current power supply, using argon and oxygen as sputtering gases, wherein the gas flow ratio is 650-750 SCCM: 950-1050 SCCM;
(4) magnetron sputtering a second functional layer: plating a second functional layer Ag layer on the second medium protective layer ZnO layer by adopting a magnetron sputtering process, sputtering a pure Ag target by using a direct current power supply, and using argon as sputtering gas with the flow of the argon being 1100SCCM-1300 SCCM;
(5) magnetron sputtering a third functional layer: plating a third functional layer Cu layer on the second functional layer Ag layer by adopting a magnetron sputtering process, sputtering by using a direct current power supply, using argon as process gas, and controlling the gas flow to be 1100SCCM-1300 SCCM;
(6) magnetron sputtering of a first protective layer: plating a first protective layer CrNxOy layer on the third functional layer Cu layer by adopting a magnetron sputtering process, sputtering by using a direct-current power supply, using nitrogen as reaction gas, and permeating a small amount of oxygen;
(7) magnetron sputtering a third dielectric protective layer: plating a third medium protective layer ZnO/ZnSnO layer on the first protective layer CrNxOy layer by adopting a magnetron sputtering process, sputtering a Zn/ZnSn target by using an alternating-current intermediate-frequency power supply and using argon and oxygen as reaction gases, wherein the flow ratio of the argon to the oxygen is 650SCCM-750 SCCM: 950SCCM-1050 SCCM;
(8) magnetron sputtering a fourth functional layer: plating a fourth functional layer Ag layer on the third medium protective layer ZnO/ZnSnO layer by adopting a magnetron sputtering process, and sputtering by using a direct current power supply, wherein the gas flow is 1100SCCM-1300 SCCM;
(9) magnetron sputtering a second protective layer: plating a second protective layer CrNxOy layer on the fourth functional layer Ag layer by adopting a magnetron sputtering process, sputtering by using a direct-current power supply, using nitrogen as reaction gas, and permeating a small amount of oxygen;
(10) magnetron sputtering a fourth dielectric protective layer, plating a fourth dielectric protective layer Si on the CrNxOy layer of the second protective layer by adopting a magnetron sputtering process3N4The layer is formed by sputtering a silicon-aluminum target by using an alternating current medium frequency power supply and argon nitrogen as a reaction gas, wherein the mass percentage of silicon to aluminum is 90:10, and the flow ratio of argon to nitrogen is 650-750 SCCM: 850SCCM-950 SCCM.
Further, the thickness of the SSTZrOX layer is 3.98nm, the thickness of the AZO layer is 8nm, the thickness of the ZnO layer is 30.2nm, the thickness of the Ag layer is 9.45nm, the thickness of the Cu layer is 3.65nm, the thickness of the CrNxOy layer is 1.98nm, the thickness of the ZnO/ZnSnO layer is 42.1nm, the thickness of the Ag layer is 5.20nm, the thickness of the CrNxOy layer is 1.39nm, and the thickness of the Si layer is 3.98nm3N4The thickness of the layer was 20.5 nm.
The technical scheme provided by the invention has the following beneficial effects:
a. the amber middle-transmission low-reflection double-silver energy-saving coated glass developed by the invention is amber in appearance, and can enrich the appearance color of glass products in the market;
b. according to the amber middle-transmission low-reflection double-silver energy-saving coated glass, the reflectivity of the product is reduced through the matching of the composite film layer structure and the film layer thickness, and the visible light reflectivity of the outdoor surface of the product is less than 7;
c. the amber middle-transmittance low-reflection double-silver energy-saving coated glass developed by the invention has beautiful and attractive color, can effectively reduce the visible light reflectivity while achieving the transmittance meeting the requirements of laws and regulations, and can prevent the light pollution phenomenon.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a side view of an amber middle transmission low reflection double silver energy-saving coated glass provided by an embodiment of the invention;
fig. 2 is a test result graph of a glass surface visible light reflection curve of the amber middle transmission low reflection double-silver energy-saving coated glass provided by the embodiment of the invention;
fig. 3 is a graph of a test result of a film surface visible light reflection curve of the amber middle transmission low reflection double-silver energy-saving coated glass provided by the embodiment of the invention.
Wherein the reference numerals include: 1-a glass substrate, 2-a composite film layer, 21-a first functional layer, 22-a first dielectric protective layer, 23-a second dielectric protective layer, 24-a second functional layer, 25-a third functional layer, 26-a first protective layer, 27-a third dielectric protective layer, 28-a fourth functional layer, 29-a second protective layer, and 30-a fourth dielectric protective layer.
Detailed Description
In order to make the technical solutions of the present invention better understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the invention described herein are capable of operation in sequences other than those illustrated or described herein. Furthermore, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, apparatus, article, or device that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or device.
The glass product with the transmittance of between 40 and 60 percent is called as a medium-transmittance product; low reflectance as referred to herein means a visible light reflectance of less than 7.
In an embodiment of the invention, an amber middle-transmittance low-reflectance double-silver energy-saving coated glass and a preparation method thereof are provided, and a specific structure is shown in fig. 1, the amber middle-transmittance low-reflectance double-silver energy-saving coated glass comprises a glass substrate 1 and a composite film layer 2 plated on one side surface of the glass substrate 1, wherein the composite film layer 2 comprises a first functional layer 21, a first dielectric protective layer 22, a second dielectric protective layer 23, a second functional layer 24, a third functional layer 25, a first protective layer 26, a third dielectric protective layer 27, a fourth functional layer 28, a second protective layer 29 and a fourth dielectric protective layer 30 which are sequentially compounded on the glass substrate from inside to outside in an adjacent manner.
The method comprises the following specific steps:
the first functional layer, namely the innermost layer, is an SSTZrOX layer, namely a zirconium-doped stainless steel oxide layer, the refractive index of the film layer is improved during reactive sputtering by doping zirconium in the stainless steel, the refractive index of the film layer can reach about 2.0, the transmittance of a product is further improved, and an amber color layer can be adjusted to obtain an amber effect. The thickness of the SSTZrOX layer is 3.5-5 nm.
The first dielectric protection layer 22 is an AZO layer, namely an aluminum-doped zinc oxide layer, which can improve the flatness of the film layer, and can reduce the radiance by laying a ZnO, Ag, Cu layer, and the thickness of the AZO layer is 7-9 nm.
The second dielectric protection layer 23 is a ZnO layer, the thickness of the ZnO layer is 26-34nm,
the second functional layer 24 is an Ag layer which can effectively reduce the radiance, the thickness of the second functional layer 24 is 9-10nm,
the third functional layer 25 is a Cu layer, namely a metal copper layer, which can improve the transmission color of the film layer and reduce the radiance, and the thickness of the Cu layer is 3-4 nm; the Cu layer has the functions of improving energy-saving performance and improving the transmission color of the product.
The first protection layer 26 is any one or any multiple of CrNxOy, CrNx, NiCrNx, NiCrNxOy and NiCr, can improve the wear resistance and oxidation resistance of the film layer to protect the silver layer and the copper layer from being oxidized, is preferably a CrNxOy chromium oxynitride layer, and the thickness of the first protection layer 26 is 1.5-2 nm.
The third dielectric protection layer 27 is a ZnO/ZnSnO layer which can be used for controlling and adjusting the color of the film layer, and the total thickness of the ZnO/ZnSnO layer is 38-46 nm.
The fourth functional layer 28 is an Ag layer, i.e., a metal silver layer, and has good conductivity, so that the radiance of the film layer can be effectively reduced, and the effects of environmental protection and energy saving are achieved, and the thickness of the fourth functional layer is 4.5-5.5 nm.
The second protection layer 29 is any one or any multi-layer composite layer of CrNxOy, CrNx, NiCrNx, NiCrNxOy and NiCr, preferably CrNxOy, namely a chromium oxynitride layer, so that the wear resistance and the oxidation resistance of the film layer are improved, and the thickness of the second protection layer 29 is 1-2 nm.
The fourth dielectric protection layer 30, i.e. the outermost layer, is Si3N4Any one or more of SiNxOy, SiOx and TiOx, preferably Si3N4Layer, i.e. silicon nitride layer, Si3N4The layer is a very hard material, improves the physical property and the scratch resistance of the film layer, ensures that the whole coating has good mechanical durability, and is arranged at the outermost layer as a first barrier for protecting the whole film layer; the thickness of the fourth dielectric protection layer 30 is 15-25 nm.
Further explanation is as follows: the x and the y are positive numbers, the protective layer can protect the functional layer from being damaged, and the medium protective layer not only has the function of protecting the functional layer, but also can be used for adjusting the color.
The invention also provides a method for preparing the amber medium-transmittance low-reflection double-silver energy-saving coated glass, which comprises the following steps: a magnetron sputtering process is adopted, and a first functional layer 21 with the thickness of 3.5-5nm, a first medium protective layer 22 with the thickness of 7-9nm, a second medium protective layer 23 with the thickness of 26-34nm, a second functional layer 24 with the thickness of 9-10nm, a third functional layer 25 with the thickness of 3-4nm, a first protective layer 26 with the thickness of 1.5-2nm, a third medium protective layer 27 with the thickness of 38-46nm, a fourth functional layer 28 with the thickness of 4.5-5.5nm, a second protective layer 29 with the thickness of 1-2nm and a fourth medium protective layer 30 with the thickness of 15-25nm are sequentially and adjacently plated on the glass substrate 1 from inside to outside.
The color of each film layer can be adjusted, through the combined action of all the film layers, the finally prepared amber middle-transmission low-reflection double-silver energy-saving coated glass can show an amber color (amber comprises light yellow, light golden, lemon yellow, orange yellow, brown yellow, champagne and the like), and the amber color can be adjusted only if the thickness of each film layer is within the range. According to the amber middle-transmission low-reflection double-silver energy-saving coated glass provided by the invention, the reflectivity can be adjusted to be below 7 through a specific film layer structure and a specific proportion (film layer thickness), so that the light pollution caused by buildings can be effectively reduced, and even the amber middle-transmission low-reflection double-silver energy-saving coated glass is basically free of light pollution.
The following are specific examples.
Example 1
The structure of the composite film layer 2 on the surface of the glass substrate is as follows: sequentially from inside to outside, the innermost layer of the first functional layer 21 is SSTZrOX, the first dielectric protection layer 22 is an AZO layer, the second dielectric protection layer 23 is a ZnO layer, the second functional layer 24 is an Ag layer, the third functional layer 25 is a Cu layer, the first protection layer 26 is a CrNxOy layer, the third dielectric protection layer 27 is a ZnO/ZnSnO layer, the fourth functional layer 28 is an Ag layer, the second protection layer 29 is a CrNxOy layer, and the fourth dielectric protection layer 30 is Si3N4And (3) a layer.
The thicknesses of the film layers in the composite film layer 2 are 3.98nm, 8nm, 30.2nm, 9.45nm, 3.65nm, 1.98nm, 42.1nm, 5.20nm, 1.39nm and 20.5nm in sequence.
The preparation method of the amber middle-transmission low-reflection double-silver energy-saving coated glass in the embodiment comprises the following steps:
(1) plating a first functional layer on a glass substrate (the thickness of the selected glass substrate is 6mm) by adopting a magnetron sputtering process, and sputtering a zirconium-doped stainless steel target Fe by using an alternating current medium-frequency power supply and oxygen as reaction gases: zr is 80:20, the argon-oxygen flow ratio is 650SCCM-750 SCCM: 850SCCM-950SCCM, the argon-oxygen flow ratio is preferably 700SCCM: 900SCCM, and depositing an SSTZrOX layer with the thickness of a film layer of 3.98nm, wherein the flow ratio of argon and oxygen in the step determines the quality of the formed film;
(2) plating a first dielectric protection layer AZO layer on the SSTZrOX layer as a first functional layer by adopting a magnetron sputtering process, sputtering a ceramic AZO target by using a medium-frequency alternating-current power supply, using pure argon as sputtering gas, wherein the argon flow ratio is 1400-1600 SCCM, the argon flow ratio is preferably 1500SCCM, depositing an AZO layer with the thickness of 8nm, and paving a cushion by sputtering ZnO, Ag and Cu layers;
(3) plating a second medium protective layer ZnO layer on the first medium protective layer AZO layer by adopting a magnetron sputtering process, sputtering by using an alternating current power supply, and using Ar and O2Gas as sputtering gas, the gas flow ratio is 650-: 950-: 1000SCCM, depositing a ZnO layer with the film thickness of 30.2 nm;
(4) plating a second functional layer Ag layer on the second medium protective layer ZnO layer by adopting a magnetron sputtering process, sputtering a pure Ag target by using a direct current power supply, using argon as sputtering gas, wherein the argon flow is 1100SCCM-1300SCCM, the argon flow is preferably 1200SCCM, and depositing an Ag layer with the film thickness of 9.45 nm;
(5) plating a third functional layer Cu layer on the second functional layer Ag layer by adopting a magnetron sputtering process, sputtering by using a direct current power supply, taking argon as process gas, wherein the gas flow is 1100SCCM-1300SCCM, the gas flow is preferably 1200SCCM, and depositing a Cu layer with the film thickness of 3.65 nm;
(6) plating a first protective layer CrNxOy layer on the third functional layer Cu layer by adopting a magnetron sputtering process, sputtering by using a direct-current power supply, using nitrogen as reaction gas, permeating a small amount of oxygen, and depositing a CrNxOy layer with the film thickness of 1.98 nm;
(7) plating a third medium protective layer ZnO/ZnSnO layer on the first protective layer CrNxOy layer by adopting a magnetron sputtering process, sputtering a Zn/ZnSn target by using an alternating-current intermediate-frequency power supply and using argon and oxygen as reaction gases, wherein the flow ratio of the argon to the oxygen is 650SCCM-750 SCCM: 950SCCM-1050SCCM, the preferred argon-oxygen flow ratio is 700SCCM:1000SCCM, and the ZnO/ZnSnO layer with the deposited film layer thickness of 42.1 nm;
(8) plating a fourth functional layer Ag layer on the third dielectric protective layer ZnO/ZnSnO layer by adopting a magnetron sputtering process, and sputtering by using a direct-current power supply, wherein the gas flow is 1100SCCM-1300SCCM, the gas flow is 1200SCCM, and the Ag layer with the thickness of a deposited film layer being 5.20 nm;
(9) plating a second protective layer CrNxOy layer on the fourth functional layer Ag layer by adopting a magnetron sputtering process, sputtering by using a direct-current power supply, using nitrogen as reaction gas, permeating a small amount of oxygen, and depositing a CrNxOy layer with the film thickness of 1.39 nm;
(10) plating a fourth medium protective layer on the CrNxOy layer by adopting a magnetron sputtering process, sputtering a silicon-aluminum target by using an alternating-current medium-frequency power supply and argon-nitrogen as a reaction gas, wherein the mass percent of silicon to aluminum is 90:10, and the flow ratio of argon to nitrogen is 650SCCM-750 SCCM: 850SCCM-950SCCM, the argon nitrogen flow ratio is preferably 700SCCM: 900SCCM, Si with a deposited film thickness of 20.5nm3N4And (3) a layer. The metallic aluminum Al is used for increasing the conductivity of the raw material in the magnetron sputtering process, the metallic aluminum Al does not participate in the reaction, and the magnetron sputtering Si cannot be smoothly carried out if the conductivity is increased without adopting the metallic aluminum Al mixture due to the extremely poor conductivity of the non-metallic semiconductor silicon Si3N4And (3) a layer.
The amber middle-transmission low-reflection double-silver energy-saving coated Glass prepared in the embodiment is subjected to a reflectivity test, the test result of the Glass surface visible light reflection curve is shown in fig. 2, the test result of the film surface visible light reflection curve is shown in fig. 3 (in fig. 2 and 3, reflection is the reflectivity, wavelength is the wavelength, Glass side is the Glass surface, Coating side is the film surface; fig. 2 and 3 both have two curves, one is a theoretical curve, the other is an actual curve, and the actual reflection curve is the result of the combined action when each film layer reaches a certain thickness), and the Glass surface and the film surface are explained as follows: the glass comprises two surfaces which are oppositely arranged up and down, wherein one surface is a film coating surface (namely an energy-saving LOW-E film), the other surface is a glass surface (or a tin surface), a spectral curve displayed by reflection observed from the front surface of the glass surface is a glass surface curve (namely a reflection diagram of the outdoor surface of the glass to visible light), and a spectral curve displayed by reflection observed from the front surface of the film coating surface is a film surface curve. The curves of fig. 2 and 3 can be quantified by a measuring instrument to obtain the following table 1.
TABLE 1 color values of amber middle transmission low reflection double silver energy-saving coated glass of this example
As is clear from Table 1, the glass surface had a reflectance of 6.55, the film surface had a reflectance of 5.15, and the reflectances were all 7 or less; glass of this color value exhibits an amber color. The visible light transmittance is 46.05, and the high visible light transmittance indicates that the lamp is closer to nature, so that the illumination cost is reduced; the reduced reflectivity reduces light pollution. a and b are psychochromaticities, + a indicates red, + a indicates green, + b indicates yellow, -b indicates blue, a T indicates the degree of red and green of transmitted light, b T indicates the degree of pure yellow and blue of transmitted light, R is an abbreviation for reflectance, R% indicates the percentage of reflected light, and T% indicates the percentage of transmitted visible light.
In other embodiments, the first protective layer may be selected from any one of CrNx, NiCrNx, NiCrNxOy, NiCr; the fourth dielectric protection layer can be selected from any one of SiNxOy, SiOx and TiOx.
The amber middle-transmittance low-reflection double-silver energy-saving coated glass developed by the invention has amber appearance, is beautiful and glossy, is extremely beautiful, and can enrich the appearance color of glass products in the market. The amber middle-transmission low-reflection double-silver energy-saving coated glass provided by the invention has the reflectivity adjusted to be below 7, so that the light pollution caused by buildings can be effectively reduced, and even basically no light pollution can be realized. The amber middle-transmittance low-reflection double-silver energy-saving coated glass developed by the invention has beautiful and attractive color, can effectively reduce the visible light reflectivity and prevent the light pollution phenomenon while achieving the transmittance meeting the requirements of laws and regulations, and can be suitable for different requirements of different regions.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (10)
1. The amber middle-transmittance low-transmittance anti-reflection double-silver energy-saving coated glass is characterized by comprising a glass substrate (1) and a composite film layer (2) plated on one side surface of the glass substrate (1), wherein the composite film layer (2) comprises a first functional layer (21), a first dielectric protective layer (22), a second dielectric protective layer (23), a second functional layer (24), a third functional layer (25), a first protective layer (26), a third dielectric protective layer (27), a fourth functional layer (28), a second protective layer (29) and a fourth dielectric protective layer (30) which are sequentially and adjacently compounded on a glass substrate from inside to outside; the first functional layer (21) is an SSTZrOX layer, and the thickness of the SSTZrOX layer is 3.5-5 nm.
2. The amber middle-transmission low-reflection double-silver energy-saving coated glass as claimed in claim 1, wherein the first dielectric protection layer (22) is an AZO layer, the second dielectric protection layer (23) is a ZnO layer, and the third dielectric protection layer (27) is a ZnO/ZnSnO layer.
3. The amber energy-saving double-silver coated glass with medium transmittance and low reflectance as claimed in claim 2, wherein the AZO layer has a thickness of 7-9nm, the ZnO layer has a thickness of 26-34nm, and the total thickness of the ZnO/ZnSnO layer is 38-46 nm.
4. The amber medium-transparent low-reflection double-silver energy-saving coated glass as claimed in claim 1, wherein the fourth dielectric protection layer (30) is Si3N4Any one or more of SiNxOy, SiOx and TiOx, and the thickness of the fourth dielectric protection layer (30) is 15-25 nm.
5. The amber medium-transparent low-reflection double-silver energy-saving coated glass as claimed in claim 1, wherein the second functional layer (24) and the fourth functional layer (28) are both Ag layers, and the third functional layer (25) is a Cu layer.
6. The amber energy-saving double-silver coated glass with medium transmittance and low reflectance according to claim 5, wherein the thickness of the second functional layer (24) is 9-10nm, the thickness of the third functional layer (25) is 3-4nm, and the thickness of the fourth functional layer is 4.5-5.5 nm.
7. The amber middle-transparent low-reflection double-silver energy-saving coated glass as claimed in claim 1, wherein the first protective layer (26) and the second protective layer (29) are both any one or a plurality of composite layers of CrNxOy, CrNx, NiCrNx, NiCrNxOy and NiCr; the thickness of the first protective layer (26) is 1.5-2nm, and the thickness of the second protective layer (29) is 1-2 nm.
8. The method for preparing the amber energy-saving double-silver coated glass with medium transmittance and low reflectance according to any one of claims 1 to 7, which is characterized by comprising the following steps:
a magnetron sputtering process is adopted, and a first functional layer with the thickness of 3.5-5nm, a first medium protective layer with the thickness of 7-9nm, a second medium protective layer with the thickness of 26-34nm, a second functional layer with the thickness of 9-10nm, a third functional layer with the thickness of 3-4nm, a first protective layer with the thickness of 1.5-2nm, a third medium protective layer with the thickness of 38-46nm, a fourth functional layer with the thickness of 4.5-5.5nm, a second protective layer with the thickness of 1-2nm and a fourth medium protective layer with the thickness of 15-25nm are sequentially and adjacently plated on a glass substrate from inside to outside.
9. The method for preparing amber middle-transmitting low-reflection double-silver energy-saving coated glass according to claim 8,
(1) magnetron sputtering a first functional layer: plating a first functional layer SSTZrOX layer on a glass substrate by adopting a magnetron sputtering process, and sputtering a zirconium-doped stainless steel target Fe by using an alternating current medium frequency power supply and oxygen as reaction gases: zr is 80:20, the argon-oxygen flow ratio is 650SCCM-750 SCCM: 850SCCM-950 SCCM;
(2) magnetron sputtering of a first dielectric protective layer: plating a first dielectric protection layer AZO layer on the SSTZrOX layer as a first functional layer by adopting a magnetron sputtering process, sputtering a ceramic AZO target by using a medium-frequency alternating-current power supply, and using pure argon as sputtering gas, wherein the flow ratio of the argon is 1400-1600 SCCM;
(3) magnetron sputtering a second dielectric protective layer: plating a second medium protective layer ZnO layer on the first medium protective layer AZO layer by a magnetron sputtering process, sputtering by using an alternating current power supply, using argon and oxygen as sputtering gases, wherein the gas flow ratio is 650-750 SCCM: 950-1050 SCCM;
(4) magnetron sputtering a second functional layer: plating a second functional layer Ag layer on the second medium protective layer ZnO layer by adopting a magnetron sputtering process, sputtering a pure Ag target by using a direct current power supply, and using argon as sputtering gas with the flow of the argon being 1100SCCM-1300 SCCM;
(5) magnetron sputtering a third functional layer: plating a third functional layer Cu layer on the second functional layer Ag layer by adopting a magnetron sputtering process, sputtering by using a direct current power supply, using argon as process gas, and controlling the gas flow to be 1100SCCM-1300 SCCM;
(6) magnetron sputtering of a first protective layer: plating a first protective layer CrNxOy layer on the third functional layer Cu layer by adopting a magnetron sputtering process, sputtering by using a direct-current power supply, using nitrogen as reaction gas, and permeating a small amount of oxygen;
(7) magnetron sputtering a third dielectric protective layer: plating a third medium protective layer ZnO/ZnSnO layer on the first protective layer CrNxOy layer by adopting a magnetron sputtering process, sputtering a Zn/ZnSn target by using an alternating-current intermediate-frequency power supply and using argon and oxygen as reaction gases, wherein the flow ratio of the argon to the oxygen is 650SCCM-750 SCCM: 950SCCM-1050 SCCM;
(8) magnetron sputtering a fourth functional layer: plating a fourth functional layer Ag layer on the third medium protective layer ZnO/ZnSnO layer by adopting a magnetron sputtering process, and sputtering by using a direct current power supply, wherein the gas flow is 1100SCCM-1300 SCCM;
(9) magnetron sputtering a second protective layer: plating a second protective layer CrNxOy layer on the fourth functional layer Ag layer by adopting a magnetron sputtering process, sputtering by using a direct-current power supply, using nitrogen as reaction gas, and permeating a small amount of oxygen;
(10) magnetron sputtering a fourth dielectric protective layer, plating a fourth dielectric protective layer Si on the CrNxOy layer of the second protective layer by adopting a magnetron sputtering process3N4The layer is formed by sputtering a silicon-aluminum target by using an alternating current medium frequency power supply and argon nitrogen as a reaction gas, wherein the mass percentage of silicon to aluminum is 90:10, and the flow ratio of argon to nitrogen is 650-750 SCCM: 850SCCM-950 SCCM.
10. The method for preparing amber middle-transmitting low-reflection double-silver energy-saving coated glass according to claim 9, wherein the thickness of the SSTZrOX layer is 3.98nm, the thickness of the AZO layer is 8nm, the thickness of the ZnO layer is 30.2nm, the thickness of the Ag layer is 9.45nm, and the method for preparing the SSTZrOX layer and the AZO layer is characterized in thatThe thickness of the Cu layer is 3.65nm, the thickness of the CrNxOy layer is 1.98nm, the thickness of the ZnO/ZnSnO layer is 42.1nm, the thickness of the Ag layer is 5.20nm, the thickness of the CrNxOy layer is 1.39nm, and the Si layer is formed by sintering3N4The thickness of the layer was 20.5 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910923967.XA CN110627374B (en) | 2019-09-27 | 2019-09-27 | Amber middle-permeation low-reflection double-silver energy-saving coated glass and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910923967.XA CN110627374B (en) | 2019-09-27 | 2019-09-27 | Amber middle-permeation low-reflection double-silver energy-saving coated glass and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110627374A true CN110627374A (en) | 2019-12-31 |
| CN110627374B CN110627374B (en) | 2024-01-12 |
Family
ID=68974528
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910923967.XA Active CN110627374B (en) | 2019-09-27 | 2019-09-27 | Amber middle-permeation low-reflection double-silver energy-saving coated glass and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110627374B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111606578A (en) * | 2020-06-29 | 2020-09-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-radiation coated glass and preparation method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060081993A1 (en) * | 2004-10-14 | 2006-04-20 | Thiel James P | High luminance coated glass |
| CN104441815A (en) * | 2014-11-12 | 2015-03-25 | 揭阳市宏光镀膜玻璃有限公司 | Golden-class double-silver LOW-E glass with high light transmittance, and preparation method of glass |
| CN207330752U (en) * | 2017-08-18 | 2018-05-08 | 吴江南玻华东工程玻璃有限公司 | A kind of golden yellow can temperable di-silver low-emissivity coated glass |
| CN208250167U (en) * | 2018-05-15 | 2018-12-18 | 浙江旗滨节能玻璃有限公司 | High low anti-double-silver low-emissivity coated glass thoroughly |
| WO2019157798A1 (en) * | 2018-02-13 | 2019-08-22 | 江苏奥蓝工程玻璃有限公司 | Double-silver low-emission coated glass and preparation method thereof |
| CN210736573U (en) * | 2019-09-27 | 2020-06-12 | 吴江南玻华东工程玻璃有限公司 | Amber middle-transparent low-reflection double-silver energy-saving coated glass |
-
2019
- 2019-09-27 CN CN201910923967.XA patent/CN110627374B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060081993A1 (en) * | 2004-10-14 | 2006-04-20 | Thiel James P | High luminance coated glass |
| CN104441815A (en) * | 2014-11-12 | 2015-03-25 | 揭阳市宏光镀膜玻璃有限公司 | Golden-class double-silver LOW-E glass with high light transmittance, and preparation method of glass |
| CN207330752U (en) * | 2017-08-18 | 2018-05-08 | 吴江南玻华东工程玻璃有限公司 | A kind of golden yellow can temperable di-silver low-emissivity coated glass |
| WO2019157798A1 (en) * | 2018-02-13 | 2019-08-22 | 江苏奥蓝工程玻璃有限公司 | Double-silver low-emission coated glass and preparation method thereof |
| CN208250167U (en) * | 2018-05-15 | 2018-12-18 | 浙江旗滨节能玻璃有限公司 | High low anti-double-silver low-emissivity coated glass thoroughly |
| CN210736573U (en) * | 2019-09-27 | 2020-06-12 | 吴江南玻华东工程玻璃有限公司 | Amber middle-transparent low-reflection double-silver energy-saving coated glass |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111606578A (en) * | 2020-06-29 | 2020-09-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-radiation coated glass and preparation method thereof |
| CN111606578B (en) * | 2020-06-29 | 2023-12-01 | 吴江南玻华东工程玻璃有限公司 | Temperable low-reflection double-silver low-emissivity coated glass and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN110627374B (en) | 2024-01-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101497501B (en) | Three-silver low radiation film glass | |
| CN101830643B (en) | Double silver coating glass and manufacturing method thereof | |
| EP1527028B1 (en) | Temperable high shading performance coatings | |
| EP1819643A2 (en) | Coated article with ir reflecting layer(s) and method of making same | |
| CN111606578B (en) | Temperable low-reflection double-silver low-emissivity coated glass and preparation method thereof | |
| CN202186945U (en) | LOW-E film coating glass | |
| CN110028251B (en) | Copper-containing double-silver low-emissivity coated glass capable of being subsequently processed and preparation method thereof | |
| WO2018165406A1 (en) | Coated article having low-e coating with ir reflecting layer(s) and high index nitrided dielectric layers | |
| CN107663029B (en) | European gray low-emissivity coated glass | |
| CN110627374A (en) | Amber medium-transmittance low-reflection double-silver energy-saving coated glass and preparation method thereof | |
| CN104441815B (en) | A kind of two silver-colored LOW-E glass of golden class of high transmission rate and preparation method | |
| CN108264243B (en) | Low-emissivity coated glass | |
| CN210736573U (en) | Amber middle-transparent low-reflection double-silver energy-saving coated glass | |
| CN108101383B (en) | Temperable Low-E energy-saving glass | |
| CN205258316U (en) | Low radiation coated glass of two silver of ocean blue | |
| CN212559994U (en) | Temperable low-reflection double-silver low-radiation coated glass | |
| CN204955584U (en) | Low radiation coated glass of rose pinchbeck silver | |
| CN110092594A (en) | Three silver coating glass of one kind and preparation method thereof | |
| CN212559993U (en) | High-transmittance low-reflection steel three-silver low-emissivity glass | |
| CN212559996U (en) | Double-silver low-emissivity coated glass | |
| CN202344934U (en) | Offsite-processing four-silver low-radiation coated glass | |
| CN213446860U (en) | Three-silver low-emissivity coated glass | |
| CN114368919A (en) | Light-transmission-color hot-processable energy-saving LOW-E product | |
| CN201825868U (en) | Silver-containing low emissivity glass | |
| CN111517669A (en) | High-transmittance low-reflection steel three-silver low-emissivity glass and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |