CN213446860U - Three-silver low-emissivity coated glass - Google Patents
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- CN213446860U CN213446860U CN202022195959.9U CN202022195959U CN213446860U CN 213446860 U CN213446860 U CN 213446860U CN 202022195959 U CN202022195959 U CN 202022195959U CN 213446860 U CN213446860 U CN 213446860U
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Abstract
The utility model discloses a three silver low emissivity coated glass, three silver low emissivity coated glass include: including glass basic unit and coating film in 12 retes on the glass basic unit, 12 retes are from supreme down in proper order: the first layer of zinc oxide, the second layer of silver, the third layer of zinc aluminum oxide, the fourth layer of zinc oxide or zinc tin oxide or a mixed layer of the two, the fifth layer of silver, the sixth layer of copper, the seventh layer of nickel-chromium alloy, the eighth layer of zinc aluminum oxide, the ninth layer of zinc oxide or zinc tin oxide or a mixed layer of the two, the tenth layer of silver, the eleventh layer of zinc aluminum oxide and the twelfth layer of silicon nitride. The three-silver low-emissivity coated glass has the advantages that the outdoor color is silver gray, the side color is more positive than the front color, the indoor and outdoor side color changes little, etc.
Description
Technical Field
The utility model relates to the technical field of coated glass, in particular to three-silver low-emissivity coated glass.
Background
The LOW-E glass (i.e. LOW emissivity glass) is made by plating silver (or other LOW emissivity materials) and metal oxide film on the surface of the glass, so that the emissivity E of the glass is reduced from 0.84 to below 0.15, thereby reducing the U value (i.e. heat transfer coefficient) of the glass. The LOW-E glass has high visible light transmittance and high infrared reflectance, and is characterized in that:
1. the infrared reflectivity is high, and the far infrared heat radiation can be directly reflected.
2. The surface emissivity E is low and the ability to absorb extraneous energy is small, so that the amount of re-radiated heat is small.
3. The sun-shading coefficient Sc is wide in range, and can meet the requirements of different regions according to the transmission amount of solar energy.
The division is carried out according to the number of layers of the functional layer silver, and the Low-E glass can be divided into the following parts: single silver Low-E glass, double silver Low-E glass and triple silver Low-E glass.
As the LOW-E technology becomes mature, the market demands for the appearance color of the product more and more, but for most of the three-silver LOW-E products in the market, the disadvantage that the color of the outdoor side is heavier than that of the front side is common, and the outdoor side is generally blue or purple, and the color change of the indoor front side is large, which results in poor visual effect.
SUMMERY OF THE UTILITY MODEL
The embodiment of the utility model provides a three silver low emissivity coated glass aims at solving the indoor positive side color of three silver low emissivity coated glass and changes greatly, and the heavier shortcoming of positive colour of outdoor side color.
The embodiment of the utility model provides a three silver low emissivity coated glass, including glass basic unit and coating film in 12 retes in the glass basic unit, 12 retes follow supreme down and do in proper order: the first layer of zinc oxide, the second layer of silver, the third layer of zinc aluminum oxide, the fourth layer of zinc oxide or zinc tin oxide or a mixed layer of the two, the fifth layer of silver, the sixth layer of copper, the seventh layer of nickel-chromium alloy, the eighth layer of zinc aluminum oxide, the ninth layer of zinc oxide or zinc tin oxide or a mixed layer of the two, the tenth layer of silver, the eleventh layer of zinc aluminum oxide and the twelfth layer of silicon nitride.
Further, the thickness of the first zinc oxide layer is 30 nm-40 nm.
Further, the thickness of the second silver layer is 8 nm-11 nm, the thickness of the fifth silver layer is 7 nm-11 nm, and the thickness of the tenth silver layer is 13 nm-19 nm.
Furthermore, the thickness of the third aluminum zinc oxide layer, the eighth aluminum zinc oxide layer and the eleventh aluminum zinc oxide layer is 4 nm-6 nm.
Further, the fourth zinc oxide layer or zinc tin oxide layer or a mixed layer of the two layers has a thickness of 60nm to 72 nm.
Further, the thickness of the sixth copper layer is 6 nm-9 nm.
Further, the thickness of the seventh nichrome layer is 1 nm-4 nm.
Further, the ninth zinc oxide layer or the zinc tin oxide layer or the mixed layer thereof has a thickness of 73 to 85 nm.
Further, the thickness of the twelfth silicon nitride layer is 30 nm-40 nm.
Furthermore, the total thickness of the 12 coating layers is 260 nm-309 nm.
The embodiment of the utility model provides a three silver low emissivity coated glass, three silver low emissivity coated glass include: including glass basic unit and coating film in 12 retes on the glass basic unit, 12 retes are from supreme down in proper order: the first layer of zinc oxide, the second layer of silver, the third layer of zinc aluminum oxide, the fourth layer of zinc oxide or zinc tin oxide or a mixed layer of the two, the fifth layer of silver, the sixth layer of copper, the seventh layer of nickel-chromium alloy, the eighth layer of zinc aluminum oxide, the ninth layer of zinc oxide or zinc tin oxide or a mixed layer of the two, the tenth layer of silver, the eleventh layer of zinc aluminum oxide and the twelfth layer of silicon nitride. The embodiment of the utility model provides a three silver low-emissivity coated glass have outdoor colour be silver gray, side colour than positive grey, indoor outer positive side colour change advantage such as little.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without any creative effort.
Fig. 1 is a schematic structural view of a three-silver low-emissivity coated glass provided by an embodiment of the present invention;
fig. 2 is a schematic view of the glass surface reflectivity of a three-silver low-emissivity coated glass provided by an embodiment of the invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, of the embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
It will be understood that the terms "comprises" and/or "comprising," when used in this specification and the appended claims, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
It is also to be understood that the terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used in the specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise.
It should be further understood that the term "and/or" as used in the specification and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes such combinations.
Referring to fig. 1, fig. 1 is a schematic structural view of a three-silver low-emissivity coated glass provided in an embodiment of the present invention, where the three-silver low-emissivity coated glass includes a glass base layer 100 and 12 film layers coated on the glass base layer 100, and the 12 film layers sequentially include, from bottom to top: a first zinc oxide layer 101, a second silver layer 102, a third zinc aluminum oxide layer 103, a fourth zinc oxide layer or zinc tin oxide layer or a mixed layer of the two (marked as 104), a fifth silver layer 105, a sixth copper layer 106, a seventh nichrome layer 107, an eighth zinc aluminum oxide layer 108, a ninth zinc oxide layer or zinc tin oxide layer or a mixed layer of the two (marked as 109), a tenth silver layer 110, a eleventh zinc aluminum oxide layer 111 and a twelfth silicon nitride layer 112.
The third silver low-radiation coated glass described in this embodiment includes a glass substrate 100 and 12 film layers sequentially coated on the glass substrate 100, wherein the first zinc oxide layer 101 is a first dielectric layer, the second silver layer 102 is a first low-radiation functional layer, the third zinc aluminum oxide layer 103 is a first crystalline bed dielectric layer, the fourth zinc oxide layer or zinc tin oxide layer or a mixture layer (identified as 104) of the two layers is a second dielectric combination layer, the fifth silver layer 105 is a second low-radiation functional layer, the sixth copper layer 106 is a transmission color improvement layer, the seventh nichrome layer 107 is a protective layer, the eighth zinc aluminum oxide layer 108 is a second crystalline bed dielectric layer, the ninth zinc oxide layer or zinc tin oxide layer or a mixture layer (identified as 109) of the two layers is a third dielectric combination layer, the tenth silver layer 110 is a third low-radiation functional layer, and the eleventh zinc aluminum oxide layer 111 is a third crystalline bed dielectric layer, the twelfth silicon nitride layer 112 is a fourth dielectric layer. The three-silver low-emissivity coated glass has the advantages that the outdoor color is silver gray, the side color is more positive than the front color, the color change of the indoor and outdoor front sides is small, and the like.
It should be noted that the sixth copper layer 106 is provided for the purpose of improving the transmitted color, and although the copper layer may also have the effect of improving the transmitted color when provided at other positions, the effect on the color is large when provided behind other low-emissivity functional layers (such as the second silver layer 102 or the fifth silver layer 105), which is not favorable for production debugging, and the arrangement behind the dielectric layer (such as the second dielectric combination layer 104 or the fourth dielectric layer 112) may cause the overall structure of the film layer to be more complicated, which increases the debugging difficulty. And the sixth copper layer is arranged on the fifth silver layer, so that the effect of improving the transmission color is ensured, and the complexity of the film layer and the debugging difficulty are reduced. The seventh nichrome layer 107 mainly plays a role in protecting the fifth layer and the sixth layer, and meanwhile, the absorption of visible light is increased, the visible light transmittance is reduced, and the energy saving performance of the film layer is better.
In addition, as the sputtering efficiency of ZnSn (zinc tin) is higher, a thicker ZnSnO (zinc tin oxide) film layer can be sputtered under certain sputtering power, but the surface of the ZnSnO (zinc tin oxide) film layer is not smooth, so that the growth of a silver layer is not facilitated; the ZnO (zinc oxide) film is smoother and can provide a better film growth platform for the third low functional layer silver layer (i.e., the tenth silver layer 110), that is, the film obtained by sputtering silver on the ZnSnO layer in the same amount has energy saving performance inferior to that of the film obtained by sputtering silver on the ZnO film.
It should be noted that, since ZnO (zinc oxide) is firmly connected to the glass and the first dielectric layer is thin, only the ZnO layer is used as the first dielectric layer on the glass substrate in this embodiment; the fourth dielectric layer (i.e., the twelfth layer 112) is a SiNx (silicon nitride) layer, which can ensure that the film layer has better physical and chemical properties (e.g., scratch resistance, corrosion resistance, etc.). In the prior art, a technical method of plating a silicon nitride layer on a glass substrate and plating a zinc oxide layer on the silicon nitride layer is adopted, but considering that the three-silver low-emissivity coated glass has a thicker film layer and a poorer transmittance hue than that of double-silver low-emissivity coated glass, and the like, the embodiment selects to directly plate the zinc oxide layer 101 on the glass substrate 100, so that the whole film layer is clearer compared with the prior art.
In the embodiment, on the premise of meeting color requirements, the debugging efficiency is improved by controlling the thickness of each film layer and increasing the color sensitivity of the external film layer, and the industrial production is facilitated. Meanwhile, simulation parameters of the film design software under the condition of corresponding gas proportion are determined through the thickness of each film determined by software design, process debugging and experiments and the stable process gas proportion of each target determined by multiple experiments.
In one embodiment, the thickness of the first zinc oxide layer 101 is 30nm to 40 nm; the thickness of the second silver layer 102 is 8 nm-11 nm, the thickness of the fifth silver layer 105 is 7 nm-11 nm, and the thickness of the tenth silver layer 110 is 13 nm-19 nm; the thickness of the third zinc aluminum oxide layer 103, the eighth zinc aluminum oxide layer 108 and the eleventh zinc aluminum oxide layer 111 is 4 nm-6 nm; the thickness of the fourth zinc oxide layer or the zinc tin oxide layer or the mixed layer (marked by 104) of the fourth zinc oxide layer and the zinc tin oxide layer is 60 nm-72 nm, and the thickness of the ninth zinc oxide layer or the zinc tin oxide layer or the mixed layer (marked by 109) of the ninth zinc oxide layer and the zinc tin oxide layer is 73 nm-85 nm; the thickness of the sixth copper layer 106 is 6nm to 9 nm; the thickness of the seventh nichrome layer 107 is 1 nm-4 nm; the thickness of the twelfth silicon nitride layer 112 is 30nm to 40 nm.
The three-silver low-emissivity coated glass is silver gray in appearance, the front side of the three-silver low-emissivity coated glass is slightly gray compared with the front side of the three-silver low-emissivity coated glass when being observed outdoors, and the color of the front side of the three-silver low-emissivity coated glass is small. In a specific embodiment, the color measurement result of the three-silver low-emissivity coated glass in the Lab color space is as follows: 6mm single-chip transmittance T e [42, 54], glass surface color a g e [0, -2], b g e [ 5, -7], side color a c e [0, -2.5], b c e [4, -5.5 ]. The surface emissivity E of the three-silver low-emissivity coated glass is less than 0.025, the low-emissivity coated glass has excellent low-emissivity performance, the heat transfer coefficient K is less than 1.65, and the sun-shading coefficient SC belongs to [0.24,0.28 ]. The shape of the glass surface reflection curve of the three-silver low-emissivity coated glass is shown in figure 2.
In this embodiment, magnetron sputtering is used for coating, specifically, when magnetron sputtering is used for coating the first zinc oxide layer 101 on the glass substrate 100, the number of targets used is as follows: 3-4 alternating current rotary targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:1.42, and sputtering pressure of 8-9 × 10-4mbar; the thickness of the coating film is 30 nm-40 nm;
when the second silver layer 102 is plated on the first zinc oxide layer 101 by magnetron sputtering, the number of the adopted targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon gas, the sputtering pressure is 2-3 x 10-4mbar; the thickness of the coating film is 8 nm-11 nm;
when the third layer of aluminum zinc oxide layer 103 is plated on the second layer of silver layer 102 by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas, sputtering pressure is 3-4 x 10-4mbar; the thickness of the coating film is 4 nm-6 nm;
when a fourth zinc oxide layer or a zinc tin oxide layer or a mixed layer (marked as 104) of the fourth zinc oxide layer and the zinc tin oxide layer is plated on the third zinc aluminum oxide layer 103 by magnetron sputtering, the number of the adopted targets is as follows: 5-8 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl) or zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:1.42, and sputtering pressure of 8-9 × 10-4mbar; the thickness of the coating film is 60 nm-72 nm;
when the fifth silver layer 105 is plated on the fourth zinc oxide layer or the zinc tin oxide layer or the mixed layer (marked as 104) of the fourth zinc oxide layer and the zinc tin oxide layer by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-4mbar; the thickness of the coating film is 7 nm-11 nm;
when the sixth copper layer 106 is plated on the fifth silver layer 105 by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured as copper (Cu); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-4mbar; the thickness of the coating film is 6 nm-9 nm;
when the seventh nichrome layer 107 is plated on the sixth copper layer 106 by magnetron sputtering, the number of targets used is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10- 4mbar; the thickness of the coating film is 1 nm-4 nm;
when the eighth zinc aluminum oxide layer 108 is plated on the seventh nichrome layer 107 by magnetron sputtering, the number of targets used is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas, sputtering pressure is 3-4 x 10-4mbar; the thickness of the coating film is 4 nm-6 nm;
when a ninth zinc oxide layer or a zinc tin oxide layer or a mixed layer (109) of the ninth zinc oxide layer and the zinc tin oxide layer is plated on the eighth zinc aluminum oxide layer 108 by magnetron sputtering, the number of the adopted targets is as follows: 6-8 alternating current rotary targets; the target material is configured to be zinc aluminum (ZnAl) or zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:1.42, and sputtering pressure of 8-9 × 10-4mbar; the thickness of the coating film is 73 nm-85 nm;
when the ninth layer of zinc oxide layer or the zinc tin oxide layer or the mixed layer (109) of the ninth layer and the zinc tin oxide layer is plated with the tenth layer of silver layer 110 by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-4mbar; the thickness of the coating film is 13 nm-19 nm;
when the tenth layer of aluminum zinc oxide layer 111 is plated on the tenth layer of silver layer 110 by magnetron sputtering, the number of targets used is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas, sputtering pressure is 3-4 x 10-4mbar; the thickness of the coating film is 4 nm-6 nm;
when the twelfth silicon nitride layer 112 is coated on the eleventh zinc aluminum oxide layer 111 by magnetron sputtering, the number of targets used is: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 8-9 multiplied by 10-4mbar; the thickness of the coating film is 30 nm-40 nm.
In one embodiment, the first zinc oxide layer 101 has a thickness of 36.8 nm; the thickness of the second silver layer 102 is 8 nm-11 nm, the thickness of the fifth silver layer 105 is 8.75nm, and the thickness of the tenth silver layer 110 is 15.3 nm; the thickness of the third zinc aluminum oxide layer 103, the eighth zinc aluminum oxide layer 108 and the eleventh zinc aluminum oxide layer 111 is 5 nm; the thickness of the fourth zinc oxide layer or the zinc tin oxide layer or the mixed layer of the fourth zinc oxide layer and the zinc tin oxide layer (marked as 104) is 68.8nm, and the thickness of the ninth zinc oxide layer or the zinc tin oxide layer or the mixed layer of the ninth zinc oxide layer and the zinc tin oxide layer (marked as 109) is 81 nm; the thickness of the sixth copper layer 106 is 7.6 nm; the thickness of the seventh nichrome layer 107 is 2.8 nm; the twelfth silicon nitride layer 112 has a thickness of 34 nm.
In this embodiment, the appearance color of the three-silver low-emissivity coated glass is silver gray, the front side of the three-silver low-emissivity coated glass has small color change when being observed outdoors, and the side is slightly gray compared with the front side. The color measurement result of the three-silver low-emissivity coated glass in the Lab color space is as follows: the 6mm single-chip transmittance T is 47.7, the glass surface color a g-0.5, b g-5.4, the side color a c-1.3, b c-4.2. The surface emissivity E of the three-silver low-emissivity coated glass is 0.02, the low-emissivity coated glass is excellent in low emissivity, the heat transfer coefficient K is 1.63, and the shading coefficient SC is 0.26.
When the first zinc oxide layer 101 is plated on the glass substrate 100 by magnetron sputtering, the number of the adopted targets is as follows: 4 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl); the process gas proportion is as follows: argon and oxygen in a ratio of 1:1.42, and sputtering pressure of 8-9 × 10-4mbar; the thickness of the coating film is 36.8 nm;
when the second silver layer 102 is plated on the first zinc oxide layer 101 by magnetron sputtering, the number of the adopted targets is as follows: 1 direct current plane target; the target material is configured to be silver (Ag); process gas: pure argon gas, the sputtering pressure is 2-3 x 10-4mbar; the thickness of the coating film is 8 nm-11 nm;
when the third layer of aluminum zinc oxide layer 103 is plated on the second layer of silver layer 102 by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argonThe sputtering pressure is 3 to 4 x 10-4mbar; the thickness of the coating film is 5 nm;
when a fourth zinc oxide layer or a zinc tin oxide layer or a mixed layer (marked as 104) of the fourth zinc oxide layer and the zinc tin oxide layer is plated on the third zinc aluminum oxide layer 103 by magnetron sputtering, the number of the adopted targets is as follows: 5-8 alternating current rotating targets; the target material is configured to be zinc aluminum (ZnAl) or zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen in a ratio of 1:1.42, and sputtering pressure of 8-9 × 10-4mbar; the thickness of the plated film is 68.8 nm;
when the fifth silver layer 105 is plated on the fourth zinc oxide layer or the zinc tin oxide layer or the mixed layer (marked as 104) of the fourth zinc oxide layer and the zinc tin oxide layer by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-4mbar; the thickness of the coating film is 8.75 nm;
when the sixth copper layer 106 is plated on the fifth silver layer 105 by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured as copper (Cu); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-4mbar; the thickness of the plated film is 7.6 nm;
when the seventh nichrome layer 107 is plated on the sixth copper layer 106 by magnetron sputtering, the number of targets used is as follows: 1 alternating current rotating target; the target material is configured to be nickel chromium (NiCr); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10- 4mbar; the thickness of the coating film is 2.8 nm;
when the eighth zinc aluminum oxide layer 108 is plated on the seventh nichrome layer 107 by magnetron sputtering, the number of targets used is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas, sputtering pressure is 3-4 x 10-4mbar; the thickness of the coating film is 5 nm;
when a ninth zinc oxide layer or a zinc tin oxide layer or a mixed layer (109) of the ninth zinc oxide layer and the zinc tin oxide layer is plated on the eighth zinc aluminum oxide layer 108 by magnetron sputtering, the number of the adopted targets is as follows: 6-8 alternating current rotary targets; the target material is configured to be zinc aluminum (ZnAl) or zinc tin (ZnSn); the process gas proportion is as follows: argon and oxygen, argon and oxygenThe ratio of (1: 1.42) and the sputtering pressure of 8-9 × 10-4mbar; the thickness of the plated film is 81 nm;
when the ninth layer of zinc oxide layer or the zinc tin oxide layer or the mixed layer (109) of the ninth layer and the zinc tin oxide layer is plated with the tenth layer of silver layer 110 by magnetron sputtering, the number of the adopted targets is as follows: 1 alternating current rotating target; the target material is configured to be silver (Ag); the process gas is pure argon, and the sputtering pressure is 2-3 multiplied by 10-4mbar; the thickness of the coating film is 15.3 nm;
when the tenth layer of aluminum zinc oxide layer 111 is plated on the tenth layer of silver layer 110 by magnetron sputtering, the number of targets used is as follows: 1 alternating current rotating target; the target material is configured to be zinc aluminum oxide (AZO); process gas: pure argon gas, sputtering pressure is 3-4 x 10-4mbar; the thickness of the coating film is 5 nm;
when the twelfth silicon nitride layer 112 is coated on the eleventh zinc aluminum oxide layer 111 by magnetron sputtering, the number of targets used is: 3-5 alternating current rotary targets; the target material is configured to be silicon aluminum (SiAl); the process gas proportion is as follows: argon and nitrogen, wherein the ratio of argon to nitrogen is 1:0.8, and the sputtering pressure is 8-9 multiplied by 10-4mbar; the thickness of the plating film was 34 nm.
In one embodiment, the total thickness of the 12 coating layers is 260nm to 309 nm.
In this embodiment, the total thickness of the 12 coating layers of the three-silver low-emissivity coated glass is set to 260nm to 309nm, so that the three-silver low-emissivity coated glass has good transmittance and the whole thickness is thinner and clearer as much as possible.
The embodiments are described in a progressive manner in the specification, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments are referred to each other. For the system disclosed by the embodiment, the description is relatively simple because the system corresponds to the method disclosed by the embodiment, and the relevant points can be referred to the method part for description. It should be noted that, for those skilled in the art, it is possible to make several improvements and modifications to the present application without departing from the principle of the present application, and such improvements and modifications also fall within the scope of the claims of the present application.
It is further noted that, in the present specification, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
Claims (10)
1. The utility model provides a three silver low emissivity coated glass, its characterized in that, including glass basic unit and coating film in 12 retes on the glass basic unit, 12 retes from the bottom to the top do in proper order: the first layer of zinc oxide, the second layer of silver, the third layer of zinc aluminum oxide, the fourth layer of zinc oxide or zinc tin oxide, the fifth layer of silver, the sixth layer of copper, the seventh layer of nickel-chromium alloy, the eighth layer of zinc aluminum oxide, the ninth layer of zinc oxide or zinc tin oxide, the tenth layer of silver, the eleventh layer of zinc aluminum oxide and the twelfth layer of silicon nitride.
2. The tri-silver low-emissivity coated glass of claim 1, wherein the first zinc oxide layer has a thickness of 30nm to 40 nm.
3. The three-silver low-emissivity coated glass according to claim 1, wherein the second silver layer has a thickness of 8nm to 11nm, the fifth silver layer has a thickness of 7nm to 11nm, and the tenth silver layer has a thickness of 13nm to 19 nm.
4. The tri-silver low emissivity coated glass of claim 1, wherein the third, eighth and eleventh aluminum zinc oxide layers have a thickness of 4nm to 6 nm.
5. The tri-silver low-emissivity coated glass of claim 1, wherein the fourth zinc oxide layer or zinc tin oxide layer has a thickness of 60nm to 72 nm.
6. The tri-silver low-emissivity coated glass of claim 1, wherein the thickness of the sixth copper layer is 6nm to 9 nm.
7. The tri-silver low emissivity coated glass of claim 1, wherein said seventh nichrome layer has a thickness of 1nm to 4 nm.
8. The tri-silver low-emissivity coated glass of claim 1, wherein the ninth layer of zinc oxide or zinc tin oxide has a thickness of 73nm to 85 nm.
9. The tri-silver low-emissivity coated glass of claim 1, wherein the twelfth silicon nitride layer has a thickness of 30nm to 40 nm.
10. The three-silver low-emissivity coated glass of claim 1, wherein the total thickness of said 12 coating layers is 260nm to 309 nm.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111995259A (en) * | 2020-09-29 | 2020-11-27 | 吴江南玻华东工程玻璃有限公司 | Three-silver low-emissivity coated glass and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111995259A (en) * | 2020-09-29 | 2020-11-27 | 吴江南玻华东工程玻璃有限公司 | Three-silver low-emissivity coated glass and preparation method thereof |
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