CN112125535A - Low-emissivity coated glass and preparation method thereof - Google Patents
Low-emissivity coated glass and preparation method thereof Download PDFInfo
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- CN112125535A CN112125535A CN202011026814.4A CN202011026814A CN112125535A CN 112125535 A CN112125535 A CN 112125535A CN 202011026814 A CN202011026814 A CN 202011026814A CN 112125535 A CN112125535 A CN 112125535A
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- 239000011521 glass Substances 0.000 title claims abstract description 74
- 238000002360 preparation method Methods 0.000 title claims abstract description 10
- 239000010410 layer Substances 0.000 claims abstract description 218
- 239000000758 substrate Substances 0.000 claims abstract description 40
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 38
- 229910052709 silver Inorganic materials 0.000 claims abstract description 38
- 239000004332 silver Substances 0.000 claims abstract description 38
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 claims abstract description 34
- 239000002346 layers by function Substances 0.000 claims abstract description 32
- 238000010521 absorption reaction Methods 0.000 claims abstract description 30
- 239000011241 protective layer Substances 0.000 claims abstract description 27
- 238000000576 coating method Methods 0.000 claims description 115
- 239000011248 coating agent Substances 0.000 claims description 73
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 45
- 239000013077 target material Substances 0.000 claims description 35
- 230000005855 radiation Effects 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 229910052786 argon Inorganic materials 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000007789 gas Substances 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims 4
- 230000002035 prolonged effect Effects 0.000 abstract description 5
- 230000007774 longterm Effects 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 10
- 238000004544 sputter deposition Methods 0.000 description 10
- 239000007888 film coating Substances 0.000 description 7
- 238000009501 film coating Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 3
- 230000003064 anti-oxidating effect Effects 0.000 description 3
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910001120 nichrome Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910052682 stishovite Inorganic materials 0.000 description 3
- 229910052905 tridymite Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3615—Coatings of the type glass/metal/other inorganic layers, at least one layer being non-metallic
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/361—Coatings of the type glass/metal/inorganic compound/metal/inorganic compound/other
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3639—Multilayers containing at least two functional metal layers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3655—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing at least one conducting layer
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/366—Low-emissivity or solar control coatings
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/27—Mixtures of metals, alloys
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/31—Pre-treatment
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Abstract
The invention discloses low-radiation coated glass and a preparation method thereof, and the low-radiation coated glass comprises a glass substrate, a silver film layer, an oxide conducting layer, a dielectric layer, a zinc-tin layer, a functional layer, a first film layer, a second film layer, an ultraviolet absorption layer and a protective layer, wherein the first film layer is arranged on the upper surface of the functional layer, the functional layer is arranged on the upper surface of the zinc-tin layer, the zinc-tin layer is arranged on the upper surface of the dielectric layer, the dielectric layer is arranged on the upper surface of the oxide conducting layer, the oxide conducting layer is arranged on the upper surface of the silver film layer, and the silver film layer is arranged on the upper surface of the glass substrate, the storage time of the invention is prolonged by the silver film layer and the dielectric layer, and the invention is convenient for long-term storage.
Description
Technical Field
The invention relates to the technical field of coated glass, in particular to low-emissivity coated glass and a preparation method thereof.
Background
The low-emissivity coated glass is formed by coating a mixed film layer consisting of a nano nitride film, an oxide film, a metal film with low emissivity and the like on the surface of glass by a magnetron vacuum sputtering method. Greatly reduces the surface radiance of the glass, has certain optical and thermal properties, and is widely applied to the field of buildings. The low-emissivity coated glass has the characteristics of low heat transfer coefficient, infrared ray reflection and the like.
In the use process of the existing low-radiation coated glass, in order to reduce the radiation of the coated glass, a large number of coating layers are added, and although a certain effect is achieved on the radiation reduction of the coated glass, the light transmission of the coated glass is greatly reduced, the appearance and the use effect are reduced, and the use of the coated glass is influenced.
Disclosure of Invention
The invention aims to provide low-emissivity coated glass and a preparation method thereof, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme: the low-emissivity coated glass comprises a glass substrate, a silver film layer, an oxide conducting layer, a dielectric layer, a zinc-tin layer, a functional layer, a first film layer, a second film layer, an ultraviolet absorption layer and a protective layer, wherein the first film layer is arranged on the upper surface of the functional layer, the functional layer is arranged on the upper surface of the zinc-tin layer, the zinc-tin layer is arranged on the upper surface of the dielectric layer, the dielectric layer is arranged on the upper surface of the oxide conducting layer, the oxide conducting layer is arranged on the upper surface of the silver film layer, and the silver film layer is arranged on the upper surface of the glass substrate.
As further preferable in the present technical solution: the protective layer is arranged on the upper surface of the ultraviolet absorption layer.
As further preferable in the present technical solution: the ultraviolet absorption layer is arranged on the upper surface of the second film layer.
As further preferable in the present technical solution: the second film layer is arranged on the upper surface of the first film layer.
As further preferable in the present technical solution: the thickness of the silver film layer is 40-60nm, and the thickness of the oxide conducting layer is 40-80 nm.
As further preferable in the present technical solution: the thickness of the dielectric layer is 20-40nm, and the thickness of the zinc tin layer is 10-30 nm.
As further preferable in the present technical solution: the thickness of the functional layer is 40-60nm, and the thickness of the first film layer is 20-40 nm.
As further preferable in the present technical solution: the thickness of the second film layer is 30-50nm, the thickness of the ultraviolet absorption layer is 40-60nm, and the thickness of the protection layer is 50-70 nm.
A preparation method of low-emissivity coated glass comprises the following steps:
s1, conveying the glass substrate into a film coating chamber, adopting a magnetron sputtering film coating method, controlling the temperature in the film coating chamber to be 20-30 ℃, adding a mixed gas of oxygen and argon into the film coating chamber, and coating the glass substrate by taking a silver film layer as a target material;
s2, taking the oxide conductive layer as a target, and coating the obtained product in the S1 by a coating method of magnetron sputtering;
s3, taking the dielectric layer as a target material, and coating the obtained object in the S2 by a coating method of magnetron sputtering;
s4, taking the zinc-tin layer as a target material, and coating the obtained substance in the S3 by a coating method of magnetron sputtering;
s5, taking the functional layer as a target material, and coating the obtained product in the S4 by a coating method of magnetron sputtering;
s6, coating the obtained product in the S5 by a coating method of magnetron sputtering by taking the first film layer as a target material;
s7, coating the obtained product in the S6 by a coating method of magnetron sputtering by taking the second film layer as a target material;
s8, taking the ultraviolet absorption layer as a target material, and coating the obtained substance in the S7 by a coating method of magnetron sputtering;
s9, coating the obtained product in S8 by a coating method of magnetron sputtering with the protective layer as a target.
As further preferable in the present technical solution: in S1, before the glass substrate is coated, the glass substrate is cleaned by a cleaning device, and then dried and sent to a coating chamber.
Compared with the prior art, the invention has the beneficial effects that: in the using process of the invention, the radiation of the invention is reduced through the oxide conducting layer and the ultraviolet absorption layer, and meanwhile, the light transmittance of the invention is improved through the zinc tin layer, so that the appearance and the using effect of the invention are improved, and the storage time of the invention is improved through the silver film layer and the dielectric layer, thereby facilitating the long-term storage of the invention.
Drawings
FIG. 1 is a schematic structural diagram of the present invention.
In the figure: 1. a glass substrate; 2. a silver film layer; 3. an oxide conductive layer; 4. a dielectric layer; 5. a zinc-tin layer; 6. a functional layer; 7. a first film layer; 8. a second film layer; 9. an ultraviolet absorbing layer; 10. and a protective layer.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example one
Referring to fig. 1, the present invention provides a technical solution: the utility model provides a low-emissivity coated glass, including glass substrate 1, silver rete 2, oxide conducting layer 3, dielectric layer 4, zinc tin layer 5, functional layer 6, first rete 7, second rete 8, ultraviolet absorbing layer 9 and protective layer 10, first rete 7 sets up in the upper surface of functional layer 6, functional layer 6 sets up in the upper surface of zinc tin layer 5, zinc tin layer 5 sets up in the upper surface of dielectric layer 4, dielectric layer 4 sets up in the upper surface of oxide conducting layer 3, oxide conducting layer 3 sets up in the upper surface of silver rete 2, silver rete 2 sets up in the upper surface of glass substrate 1.
In this embodiment, specifically: the protective layer 10 is arranged on the upper surface of the ultraviolet absorption layer 9; the protective layer 10 is made of NiCr alloy, so that the oxidation resistance of the silver film layer 2 is improved, the requirement on the storage environment is low, and the storage time of the invention is prolonged.
In this embodiment, specifically: the ultraviolet absorption layer 9 is arranged on the upper surface of the second film layer 8; by arranging the ultraviolet absorption layer 9, the ultraviolet absorption effect is achieved, and the radiation of the invention is reduced.
In this embodiment, specifically: the second film layer 8 is arranged on the upper surface of the first film layer 7; through the arrangement of the second film layer 8, the second film layer 8 is made of a silicon-aluminum alloy film, and the firmness of the invention is improved.
In this embodiment, specifically: the thickness of the silver film layer 2 is 40nm, and the thickness of the oxide conducting layer 3 is 40 nm; the silver film layer 2 plays an anti-oxidation role for the invention, and the oxide conducting layer 3 plays an infrared reflection function, so that the radiation of the invention is reduced.
In this embodiment, specifically: the thickness of the dielectric layer 4 is 20nm, and the thickness of the zinc-tin layer 5 is 10 nm; through the arrangement of the dielectric layer 4, the material of the dielectric layer 4 is Si3N4, so that the color of the invention is more uniform.
In this embodiment, specifically: the thickness of the functional layer 6 is 40nm, and the thickness of the first film layer 7 is 20 nm; the functional layer 6 is made of SiO2, so that the tightness of the sputtering coating is improved, and the first film layer 7 is made of a zinc-tin alloy film, so that the sputtering coating efficiency of the sputtering coating is improved.
In this embodiment, specifically: the thickness of the second film layer 8 is 30nm, the thickness of the ultraviolet absorption layer 9 is 40nm, and the thickness of the protective layer 10 is 50 nm; the protective layer 10 effectively increases the storage time of the device.
A preparation method of low-emissivity coated glass comprises the following steps:
s1, conveying the glass substrate 1 into a coating chamber, adopting a magnetron sputtering coating method, controlling the temperature in the coating chamber to be 20 ℃, adding a mixed gas of oxygen and argon into the coating chamber, and coating the glass substrate 1 by taking the silver film layer 2 as a target material;
s2, coating the obtained product in the S1 by a coating method of magnetron sputtering by taking the oxide conductive layer 3 as a target;
s3, taking the dielectric layer 4 as a target material, and coating the obtained object in the S2 by a coating method of magnetron sputtering;
s4, coating the obtained product in the S3 by a coating method of magnetron sputtering by taking the zinc-tin layer 5 as a target material;
s5, coating the obtained product in the S4 by a coating method of magnetron sputtering by taking the functional layer 6 as a target material;
s6, coating the obtained product in the S5 by a coating method of magnetron sputtering by taking the first film layer 7 as a target material;
s7, coating the obtained product in the S6 by using the second film layer 8 as a target material through a magnetron sputtering coating method;
s8, coating the obtained product in the S7 by a coating method of magnetron sputtering by taking the ultraviolet absorption layer 9 as a target material;
s9, coating the obtained product in S8 by a coating method of magnetron sputtering with the protective layer 10 as a target.
In this embodiment, specifically: in S1, before coating the glass substrate 1, cleaning the glass substrate 1 by a cleaning device, drying the cleaned glass substrate 1, and then sending the dried glass substrate into a coating chamber; the film coating effect of the invention is better.
Example two
Referring to fig. 1, the present invention provides a technical solution: the utility model provides a low-emissivity coated glass, including glass substrate 1, silver rete 2, oxide conducting layer 3, dielectric layer 4, zinc tin layer 5, functional layer 6, first rete 7, second rete 8, ultraviolet absorbing layer 9 and protective layer 10, first rete 7 sets up in the upper surface of functional layer 6, functional layer 6 sets up in the upper surface of zinc tin layer 5, zinc tin layer 5 sets up in the upper surface of dielectric layer 4, dielectric layer 4 sets up in the upper surface of oxide conducting layer 3, oxide conducting layer 3 sets up in the upper surface of silver rete 2, silver rete 2 sets up in the upper surface of glass substrate 1.
In this embodiment, specifically: the protective layer 10 is arranged on the upper surface of the ultraviolet absorption layer 9; the protective layer 10 is made of NiCr alloy, so that the oxidation resistance of the silver film layer 2 is improved, the requirement on the storage environment is low, and the storage time of the invention is prolonged.
In this embodiment, specifically: the ultraviolet absorption layer 9 is arranged on the upper surface of the second film layer 8; by arranging the ultraviolet absorption layer 9, the ultraviolet absorption effect is achieved, and the radiation of the invention is reduced.
In this embodiment, specifically: the second film layer 8 is arranged on the upper surface of the first film layer 7; through the arrangement of the second film layer 8, the second film layer 8 is made of a silicon-aluminum alloy film, and the firmness of the invention is improved.
In this embodiment, specifically: the thickness of the silver film layer 2 is 50nm, and the thickness of the oxide conducting layer 3 is 60 nm; the silver film layer 2 plays an anti-oxidation role for the invention, and the oxide conducting layer 3 plays an infrared reflection function, so that the radiation of the invention is reduced.
In this embodiment, specifically: the thickness of the dielectric layer 4 is 30nm, and the thickness of the zinc tin layer 5 is 20 nm; through the arrangement of the dielectric layer 4, the material of the dielectric layer 4 is Si3N4, so that the color of the invention is more uniform.
In this embodiment, specifically: the thickness of the functional layer 6 is 50nm, and the thickness of the first film layer 7 is 30 nm; the functional layer 6 is made of SiO2, so that the tightness of the sputtering coating is improved, and the first film layer 7 is made of a zinc-tin alloy film, so that the sputtering coating efficiency of the sputtering coating is improved.
In this embodiment, specifically: the thickness of the second film layer 8 is 40nm, the thickness of the ultraviolet absorption layer 9 is 50nm, and the thickness of the protective layer 10 is 60 nm; the protective layer 10 effectively increases the storage time of the device.
A preparation method of low-emissivity coated glass comprises the following steps:
s1, conveying the glass substrate 1 into a coating chamber, adopting a magnetron sputtering coating method, controlling the temperature in the coating chamber to be 25 ℃, adding a mixed gas of oxygen and argon into the coating chamber, and coating the glass substrate 1 by taking the silver film layer 2 as a target material;
s2, coating the obtained product in the S1 by a coating method of magnetron sputtering by taking the oxide conductive layer 3 as a target;
s3, taking the dielectric layer 4 as a target material, and coating the obtained object in the S2 by a coating method of magnetron sputtering;
s4, coating the obtained product in the S3 by a coating method of magnetron sputtering by taking the zinc-tin layer 5 as a target material;
s5, coating the obtained product in the S4 by a coating method of magnetron sputtering by taking the functional layer 6 as a target material;
s6, coating the obtained product in the S5 by a coating method of magnetron sputtering by taking the first film layer 7 as a target material;
s7, coating the obtained product in the S6 by using the second film layer 8 as a target material through a magnetron sputtering coating method;
s8, coating the obtained product in the S7 by a coating method of magnetron sputtering by taking the ultraviolet absorption layer 9 as a target material;
s9, coating the obtained product in S8 by a coating method of magnetron sputtering with the protective layer 10 as a target.
In this embodiment, specifically: in S1, before coating the glass substrate 1, cleaning the glass substrate 1 by a cleaning device, drying the cleaned glass substrate 1, and then sending the dried glass substrate into a coating chamber; the film coating effect of the invention is better.
EXAMPLE III
Referring to fig. 1, the present invention provides a technical solution: the utility model provides a low-emissivity coated glass, including glass substrate 1, silver rete 2, oxide conducting layer 3, dielectric layer 4, zinc tin layer 5, functional layer 6, first rete 7, second rete 8, ultraviolet absorbing layer 9 and protective layer 10, first rete 7 sets up in the upper surface of functional layer 6, functional layer 6 sets up in the upper surface of zinc tin layer 5, zinc tin layer 5 sets up in the upper surface of dielectric layer 4, dielectric layer 4 sets up in the upper surface of oxide conducting layer 3, oxide conducting layer 3 sets up in the upper surface of silver rete 2, silver rete 2 sets up in the upper surface of glass substrate 1.
In this embodiment, specifically: the protective layer 10 is arranged on the upper surface of the ultraviolet absorption layer 9; the protective layer 10 is made of NiCr alloy, so that the oxidation resistance of the silver film layer 2 is improved, the requirement on the storage environment is low, and the storage time of the invention is prolonged.
In this embodiment, specifically: the ultraviolet absorption layer 9 is arranged on the upper surface of the second film layer 8; by arranging the ultraviolet absorption layer 9, the ultraviolet absorption effect is achieved, and the radiation of the invention is reduced.
In this embodiment, specifically: the second film layer 8 is arranged on the upper surface of the first film layer 7; through the arrangement of the second film layer 8, the second film layer 8 is made of a silicon-aluminum alloy film, and the firmness of the invention is improved.
In this embodiment, specifically: the thickness of the silver film layer 2 is 60nm, and the thickness of the oxide conducting layer 3 is 80 nm; the silver film layer 2 plays an anti-oxidation role for the invention, and the oxide conducting layer 3 plays an infrared reflection function, so that the radiation of the invention is reduced.
In this embodiment, specifically: the thickness of the dielectric layer 4 is 40nm, and the thickness of the zinc-tin layer 5 is 30 nm; through the arrangement of the dielectric layer 4, the material of the dielectric layer 4 is Si3N4, so that the color of the invention is more uniform.
In this embodiment, specifically: the thickness of the functional layer 6 is 60nm, and the thickness of the first film layer 7 is 40 nm; the functional layer 6 is made of SiO2, so that the tightness of the sputtering coating is improved, and the first film layer 7 is made of a zinc-tin alloy film, so that the sputtering coating efficiency of the sputtering coating is improved.
In this embodiment, specifically: the thickness of the second film layer 8 is 50nm, the thickness of the ultraviolet absorption layer 9 is 60nm, and the thickness of the protective layer 10 is 70 nm; the protective layer 10 effectively increases the storage time of the device.
A preparation method of low-emissivity coated glass comprises the following steps:
s1, conveying the glass substrate 1 into a coating chamber, adopting a magnetron sputtering coating method, controlling the temperature in the coating chamber to be 30 ℃, adding a mixed gas of oxygen and argon into the coating chamber, and coating the glass substrate 1 by taking the silver film layer 2 as a target material;
s2, coating the obtained product in the S1 by a coating method of magnetron sputtering by taking the oxide conductive layer 3 as a target;
s3, taking the dielectric layer 4 as a target material, and coating the obtained object in the S2 by a coating method of magnetron sputtering;
s4, coating the obtained product in the S3 by a coating method of magnetron sputtering by taking the zinc-tin layer 5 as a target material;
s5, coating the obtained product in the S4 by a coating method of magnetron sputtering by taking the functional layer 6 as a target material;
s6, coating the obtained product in the S5 by a coating method of magnetron sputtering by taking the first film layer 7 as a target material;
s7, coating the obtained product in the S6 by using the second film layer 8 as a target material through a magnetron sputtering coating method;
s8, coating the obtained product in the S7 by a coating method of magnetron sputtering by taking the ultraviolet absorption layer 9 as a target material;
s9, coating the obtained product in S8 by a coating method of magnetron sputtering with the protective layer 10 as a target.
In this embodiment, specifically: in S1, before coating the glass substrate 1, cleaning the glass substrate 1 by a cleaning device, drying the cleaned glass substrate 1, and then sending the dried glass substrate into a coating chamber; the film coating effect of the invention is better.
When the solar cell is used, the radiation of the solar cell is reduced through the oxide conducting layer 3 and the ultraviolet absorption layer 9, meanwhile, the light transmittance of the solar cell is improved through the zinc tin layer 5, so that the appearance and the using effect of the solar cell are improved, the storage time of the solar cell is prolonged through the silver film layer 2 and the dielectric layer 4, and the solar cell is convenient to store for a long time.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (10)
1. The utility model provides a low radiation coated glass, includes glass substrate (1), silver rete (2), oxide conducting layer (3), dielectric layer (4), zinc tin layer (5), functional layer (6), first rete (7), second rete (8), ultraviolet absorbing layer (9) and protective layer (10), its characterized in that: the first film layer (7) is arranged on the upper surface of the functional layer (6), the functional layer (6) is arranged on the upper surface of the zinc-tin layer (5), the zinc-tin layer (5) is arranged on the upper surface of the dielectric layer (4), the dielectric layer (4) is arranged on the upper surface of the oxide conducting layer (3), the oxide conducting layer (3) is arranged on the upper surface of the silver film layer (2), and the silver film layer (2) is arranged on the upper surface of the glass substrate (1).
2. The low-emissivity coated glass according to claim 1, wherein: the protective layer (10) is arranged on the upper surface of the ultraviolet absorption layer (9).
3. The low-emissivity coated glass according to claim 1, wherein: the ultraviolet absorption layer (9) is arranged on the upper surface of the second film layer (8).
4. The low-emissivity coated glass according to claim 1, wherein: the second film layer (8) is arranged on the upper surface of the first film layer (7).
5. The low-emissivity coated glass according to claim 1, wherein: the thickness of the silver film layer (2) is 40-60nm, and the thickness of the oxide conducting layer (3) is 40-80 nm.
6. The low-emissivity coated glass according to claim 1, wherein: the thickness of the dielectric layer (4) is 20-40nm, and the thickness of the zinc tin layer (5) is 10-30 nm.
7. The low-emissivity coated glass according to claim 1, wherein: the thickness of the functional layer (6) is 40-60nm, and the thickness of the first film layer (7) is 20-40 nm.
8. The low-emissivity coated glass according to claim 1, wherein: the thickness of the second film layer (8) is 30-50nm, the thickness of the ultraviolet absorption layer (9) is 40-60nm, and the thickness of the protective layer (10) is 50-70 nm.
9. A preparation method of low-emissivity coated glass is characterized by comprising the following steps: the method comprises the following steps:
s1, conveying the glass substrate (1) into a coating chamber, adopting a magnetron sputtering coating method, controlling the temperature in the coating chamber to be 20-30 ℃, adding a mixed gas of oxygen and argon into the coating chamber, and coating the glass substrate (1) by taking the silver film layer (2) as a target material;
s2, using the oxide conducting layer (3) as a target, and plating the obtained product in the S1 by a plating method of magnetron sputtering;
s3, taking the dielectric layer (4) as a target material, and coating the obtained object in the S2 by a coating method of magnetron sputtering;
s4, using the zinc-tin layer (5) as a target material, and plating the obtained substance in the S3 by a plating method of magnetron sputtering;
s5, coating the obtained product in the S4 by a coating method of magnetron sputtering by taking the functional layer (6) as a target material;
s6, using the first film layer (7) as a target material, and coating the obtained substance in the S5 by a coating method of magnetron sputtering;
s7, coating the obtained product in the S6 by a coating method of magnetron sputtering by taking the second film layer (8) as a target material;
s8, coating the obtained product in the S7 by a coating method of magnetron sputtering by taking the ultraviolet absorption layer (9) as a target material;
s9, coating the obtained product in S8 by a coating method of magnetron sputtering with the protective layer (10) as a target.
10. The method for preparing a low-emissivity coated glass according to claim 9, wherein the method comprises: in S1, before the glass substrate (1) is coated, the glass substrate (1) is cleaned by cleaning equipment, and then the cleaned glass substrate (1) is dried and sent into a coating chamber after being dried.
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Application publication date: 20201225 |