CN209584007U - A kind of preparing low-emissivity coated hollow glass - Google Patents

Abstract

The utility model discloses a kind of preparing low-emissivity coated hollow glass, including two panels glass substrate, and the two panels glass substrate complements one another to form hollow structure, wherein has the Low emissivity complex function film layer of ultraviolet isolating effect at least a piece of glass substrate surface setting.Mainly pass through absorption compared to existing ultraviolet isolating product and obstruct ultraviolet line method, hollow glass described in the utility model is, it can be achieved that ultraviolet light reflection mode reaches ultraviolet isolating effect, greatly enhancing ultraviolet reflection intensity.And; the hollow glass is more easily implemented extensive deposition; while realizing ultraviolet isolating; with good function of heat insulation; its product cost is low compared with PVB scheme low with double film products simultaneously; it is easy for the art work, the ultraviolet protection protection of photography effect and some airports and the place of a large amount of reflection ultraviolet lights is needed to use.

Description

A kind of preparing low-emissivity coated hollow glass

Technical field

The utility model relates to optical coating glass production manufacturing technology fields, and in particular to one kind has ultraviolet isolating The Low emissivity hollow glass of effect.

Background technique

Solar spectrum is a kind of continuous spectrum being made of different wave length light wave, can be divided into visible light and black light two Part.Wherein, it is seen that light refers to the visible light wave of human eye of the wave-length coverage between 400~760nm, it is seen that light passes through three It is divided into seven kinds of colors such as red, orange, yellow, green, blue, blue, purple after prism scattering, all visible lights put together, show white Light.Black light can also be divided into two kinds: the exterior domain positioned at feux rouges is known as infrared ray, typically refers to wavelength greater than 760nm's Light wave；And ultraviolet light, 290~400nm of wavelength are positioned at the exterior domain of purple light.The ultraviolet range of stricti jurise is covered 100-400nm can specifically divide three wave bands, i.e. short wave ultraviolet (UVC) 100-290nm, ultraviolet B radiation (UVB) 290-320nm, long wave ultraviolet (UVA) 320-400nm.Since short wave ultraviolet is very easy to be absorbed by atmosphere, institute's ether The ultraviolet light that earth surface is irradiated in solar spectrum is concentrated mainly on 290nm-400nm.

Usual simple glass can stop UVB completely, but UVA can then penetrate glass, and in UVA SPECTRAL REGION, The reflectivity of simple glass is only 5%, as shown in Figure 5.It is well known that be exposed under the conditions of strong sunlight irradiation for a long time, Human eye can be caused to damage.And after human eye is irradiated by ultraviolet light for a long time, caused damage is even more to be difficult to restore.

The art work, antique and photography class works, for a long time receive sunlight irradiation in addition fluorescence, ultraviolet light irradiation Under effect, it may occur that discoloration, aging.Currently, still not establishing corresponding level of protection to irradiation time and degree of injury.Cause For containing solvent and binder difference in the different arts work, the dyestuff and pigment contained is also not quite similar, in identical light Under irradiation condition, their ageing time and degree of aging is all different.

For various damages caused by better protectiving ultraviolet, many methods and measure are invented ultraviolet for stopping Line, to reduce the injury from ultraviolet light.

Currently, the prior art mainly utilizes material self structure characteristic and material characteristic, ultraviolet spectra is absorbed Formula barrier, absorbs ultraviolet light by macromolecule resin material.

For example, the resin of preparation sunglasses eyeglass has ultraviolet radiation absorption effect, under strong illumination occasion, sunglasses energy Enough play the role of good antiultraviolet.But sunglasses not only stops ultraviolet light, also reduces the light transmission of some visible light, while too Positive mirror size is usually smaller, and it is bad to be allowed to applicability in some cases.

For another example, ultraviolet ray intercepting glass product, the ultraviolet light formed by pressing from both sides one layer of PVB film between two panels glass substrate Protect laminated glass.Wherein, the main component of PVB film is vinyl butyral.But since PVB film is expensive, and Finished product is at least two sheet glass, so ultraviolet ray intercepting glass higher cost.

In addition, the UV, visible light transmission curves of certain domestic PVB ultraviolet ray intercepting glass as shown in Figure 6, sample structure 6/ 1.52/6, visible light transmittance is less than 90%, it is seen that light is reflected 8% or so.If necessary to increase visible light transmittance, drop Its low reflectivity, it is also necessary to carry out plated film or coating treatment on its surface.

It in the prior art there are also a kind of method of glass antiultraviolet, is changed by the way that cerium oxide is added in glass ingredient Become glass for the transmission characteristic of ultraviolet light, obtains the glass with barrier ultraviolet light.By controlling cerium-oxide contents, Ke Yishi Now to the regulation of absorption of UV size, to obtain the glass product of different ultraviolet ray transmissivities.

But the glass of cerium oxide is added, there are certain pigmentations, and not only appearance has an impact, simultaneously for glass base The transmitance of piece and being affected for appearance color.This glass is mainly used for space station and military aspect, such as solar battery The protection of component.It does not have large-scale application in the protection of sunglasses, the art work and photographic work.

Utility model content

Big, molding shape that the purpose of the utility model is to overcome molding difficulty existing for existing ultraviolet isolating glass product Shape is limited, the cost of raw material is high and/or light transmittance is low, have the defects that appearance chromatic difference influence etc., provide one kind have it is non-absorbing The Mobyneb hollow glass of formula ultraviolet isolating effect and Low emissivity energy-conserving action.

To achieve the goals above, the technical solution adopted in the utility model are as follows:

A kind of Low emissivity energy conservation hollow glass, including two panels glass substrate, and the two panels glass substrate complements one another shape At hollow structure, wherein

There is the Low emissivity complex function film layer of ultraviolet isolating effect at least a piece of glass substrate surface setting.

According to above-mentioned technical proposal, the utility model has the Low emissivity energy conservation hollow glass of ultraviolet isolating effect, leads to It is compound to cross one layer of the sandwiched Low emissivity with ultraviolet isolating effect in the closed hollow structure that two panels glass substrate is formed Functional form film layer.

It wherein, is preferably vacuum inside the hollow structure.

Preferably, the Low emissivity complex function film layer with ultraviolet isolating effect is arranged in glass substrate outer surface On, the outer surface refers to the outer surface far from hollow structure.It is highly preferred that the complex function film layer is arranged in hollow glass Towards on the glass surface of wall face side.

Preferably, the complex function film layer is located at any glass in the two panels glass substrate surface in above-mentioned hollow structure Glass substrate surface is substrate, and is arranged on above-mentioned substrate surface.

In conjunction with above structure, the complex function type film layer is arranged inside the hollow structure, it not only can be to described Complex function type film layer plays the role of being effectively protected, and extends the normal service life of film layer, and effectively deduction and exemption are in functional form film layer Influence of the protectiveness film layer to film layer optical function is arranged in surface；Also, experimental researches prove that by ultraviolet isolating Low emissivity The hollow glass product formed in glass substrate hollow structure is arranged in, it can be achieved that ultraviolet reflectivity reaches in complex function type film layer 45% or more, ultraviolet ray transmissivity is 20% hereinafter, optimally, ultraviolet ray transmissivity can reach 10% hereinafter, and its radiation Rate is lower than 0.1, can preferably be lower than 0.05, have good function of heat insulation.

It is highly preferred that the ultraviolet isolating Low emissivity complex function film layer, is arranged in the hollow structure to be located at and build It builds on the glass substrate surface inside object.

According to above-mentioned preferred embodiment, the ultraviolet isolating Low emissivity complex function film layer is preferably provided at and is located at building On glass substrate surface inside object, by taking hollow glass structure shown in FIG. 1 as an example, hollow knot will be located in two panels glass substrate Glass substrate surface in structure is inner surface, and using remaining two surfaces as outer surface, then outer surface is towards interior of building Glass substrate is " positioned at the glass substrate of interior of building " as described in the utility model, and corresponding, the ultraviolet isolating is low Radiation recombination functional film layer is arranged on the outer surface of the glass substrate.The Low emissivity composite function film of ultraviolet isolating effect Layer is arranged in building interior side, plays good ultraviolet light insulating effect.It is preferred that above-mentioned complex function type film layer is in hollow knot Setting position in structure can further extend reflection route of the light in hollow structure, improve its reflectivity to ultraviolet light.

Further, preferably following three kinds preferred sides arranged side by side of the specific film layer structure of the Low emissivity complex function film layer Case.

Scheme one, the Low emissivity complex function film layer successively include bottom since glass substrate surface from inside to outside SiNx layers, second layer ZnO layer, third layer NiCr alloy-layer, the 4th layer Ag layers, NiCr layers of layer 5, layer 6 SiNx layer, Seven layers SiOx layers, the 8th layer TiOx layers, the 9th layer SiOx layers.

Scheme two, the Low emissivity complex function film layer successively include bottom since glass substrate surface from inside to outside SiNx layers, second layer ZnO layer, Ag layers of third layer, the 4th layer Cu layers, layer 5 NiCr alloy-layer, ZnSnOx layers of layer 6, Seven layers of ZnO layer, the 8th layer Ag layers, the 9th layer AZO layers, the tenth layer of SiNx layer, SiOx layers of eleventh floor, TiOx layers of Floor 12 and 13rd layer SiOx layers.

Scheme three, the Low emissivity complex function film layer successively include bottom since glass substrate surface from inside to outside SiNx layers, second layer ZnO layer, Ag layers of third layer, the 4th layer AZO layers, ZnSnOx layers of layer 5, layer 6 ZnO layer, layer 7 Ag layers, the 8th layer of NiCr alloy-layer, the 9th layer ZnSnOx layers, the tenth layer of ZnO layer, Ag layers of eleventh floor, AZO layers of Floor 12, 13rd layer of SiNx layer, the 14th layer SiOx layers, the 15th layer TiOx layers, the 16th layer SiOx layers.

Further, in the preferred embodiment arranged side by side of the above-mentioned 3 kinds ultraviolet isolating Low emissivity complex function film layer structures, The thickness of each film layer are as follows: positioned at bottom SiNx with a thickness of 5-25nm, positioned at middle layer SiNx with a thickness of 30-70nm, ZnO layers with a thickness of 5-20nm, the thick bottom of NiCr alloy-layer is 0.1-5nm.ZnSnOx layers of thickness range is 30-75nm.If The thickness range for setting the SiOx layer on SiNx layer surface is 25-60nm, and the thickness of the SiOx layer in TiOx layer surface is arranged in Range is 40-110nm, and Cu layers of thickness range is 0~15nm, and TiOx layers of thickness range is 20~60nm, Ag layers of thickness Range is 5~20nm, and AZO layers of thickness range is 5-15nm.

Be preferably located at the SiNx of middle layer with a thickness of 30-70nm, such as layer 6 SiNx layer, scheme two in scheme one In the tenth layer of SiNx layer, the 13rd layer of SiNx layer in scheme three, thickness is preferably 30-70nm.

Preferably, ZnO layer with a thickness of 5-20nm, second layer ZnO layer in scheme 1, layer 7 ZnO in scheme two Layer, layer 6 ZnO layer in scheme three, the thickness of the tenth layer of ZnO layer can choose 5-20nm in scheme three.

Preferably, the thick bottom of NiCr alloy-layer is 0.1-5nm.For example, third layer NiCr alloy-layer, layer 5 in scheme one NiCr layers, layer 5 NiCr alloy-layer in scheme two, the 8th layer of NiCr alloy-layer in scheme three.

Preferably, ZnSnOx layers of thickness range is 30-75nm.For example, layer 6 ZnSnOx layers in scheme two, scheme three Middle layer 5 ZnSnOx layers, the 9th layer ZnSnOx layers with a thickness of 30-75nm.

Preferably, the thickness range that the SiOx layer on SiNx layer surface is arranged in is 25-60nm.Such as the 7th in scheme one SiOx layers of layer, SiOx layers of eleventh floor in scheme two, the 14th layer of SiOx thickness degree can choose 25-60nm in scheme three.

Preferably, the thickness range that the SiOx layer in TiOx layer surface is arranged in is 40-110nm.Such as in scheme one Nine layers SiOx layers, the 13rd layer SiOx layers in scheme two, the 16th layer SiOx layers of thickness is preferably 40- in scheme three 110nm。

Preferably, Cu layers of thickness range is that the 4th layer of Cu thickness degree can choose 0- in 0~15nm, such as scheme two 15nm。

Preferably, TiOx layers of thickness range is 20~60nm.Such as the 8th layer TiOx layers in scheme one, in scheme two The 15th layer TiOx layers in TiOx layers of Floor 12, scheme three, thickness can be set to 20-60nm.

Preferably, Ag layers of thickness range is 5~20nm.Such as the 4th layer Ag layers in scheme one, third layer in scheme two Ag layers, the 8th layer Ag layers, Ag layers of third layer, Ag layers, Ag layers of eleventh floor of layer 7 in scheme three.

Preferably, AZO layers of thickness range is 5-15nm.Such as the 9th layer AZO layers in scheme two, the 4th layer in scheme three AZO layers, AZO layers of Floor 12, thickness can choose 5-15nm.

Further, the ultraviolet reflectivity 30~85% of the hollow glass product of scheme one, ultraviolet ray transmissivity 10~50%, Radiance is 0.05~0.12, has good function of heat insulation.

Further, the ultraviolet reflectivity 45~85% of the hollow glass product of scheme two, ultraviolet ray transmissivity 5~20%, Radiance is 0.08~0.02, has good function of heat insulation.

Further, the ultraviolet reflectivity 40~85% of the hollow glass product of scheme three, ultraviolet ray transmissivity 5~25%, Radiance is 0.05~0.02, has good function of heat insulation.

According to above-mentioned technical proposal, the utility model has the beneficial effects that:

1, for existing absorption ultraviolet-resistant glass product, the utility model has ultraviolet radiation absorption effect Low emissivity energy conservation hollow glass, by the way that the low spoke of one layer of ultraviolet isolating is arranged inside the hollow structure that two panels glass substrate is formed Complex function type film layer is penetrated, composite film is isolated with external environment by hollow structure inside, to play effective protection work With, effectively deduction and exemption cause the defects of film layer transmissivity is low, there are appearance chromatic differences in functional form film surface setting protectiveness film layer, It is more suitable for the protection of human eye and the protection application of the art work.

2, the composite construction of the utility model hollow film can be realized through light reflection mode, realize ultraviolet reflection barrier Effect reaches 45% or more to its reflectivity of ultraviolet light, ultraviolet light penetrates relative to existing absorption ultraviolet isolating mode Rate is 20% hereinafter, effectively obstructing ultraviolet light.Hollow glass product reflection ultraviolet light ratio is greatly enhanced simultaneously, so that birds The visibility of glass is improved, birds collision is reduced.

3, the utility model hollow film-plated glass effectively prevents existing absorption ultraviolet isolating glass product and inhales for a long time After receiving ultraviolet light, it is easy the defect of aging, extends product service life.

4, the utility model hollow glass product passes through test verification, not only has excellent ultraviolet isolating effect, also It is lower than 0.1 fine quality with radiance, there is good function of heat insulation, broader applications requirement can be suitable for.

5, the utility model hollow glass product composite film structure, processing and film plating difficulty is lower, is easily worked molding, drop Low cost can preferably expand the application range of hollow glass product.

Detailed description of the invention

Fig. 1 is the structural schematic diagram for the Low emissivity energy conservation hollow glass that the utility model has the effect of ultraviolet light Low emissivity.

Fig. 2 is the structural schematic diagram of ultraviolet isolating Low emissivity complex function film layer described in embodiment 1.

Fig. 3 is the structural schematic diagram of ultraviolet isolating Low emissivity complex function film layer described in embodiment 2.

Fig. 4 is the structural schematic diagram of ultraviolet isolating Low emissivity complex function film layer described in embodiment 3.

Fig. 5 is common 6mm float glass near ultraviolet visible light transmission curve.

Fig. 6 is that the ultraviolet light that one layer of PVB film is formed that presss from both sides between two sheet glass of certain existing domestic PVB producer production is prevented Protect the UV, visible light transmission curves of laminated glass.

Fig. 7 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 1.

Fig. 8 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 2.

Fig. 9 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 3.

Marked in the figure: A- outdoor face, B- chamber internal surface, the first glass substrate of 1-, the second glass substrate of 2-, 3- ultraviolet light Obstruct Low emissivity complex function type film layer, 4- hollow structure frame.

In 1 complex function film layer structure of embodiment illustrated in fig. 2: 311- bottom SiNx layer, 312- second layer ZnO layer, 313- Third layer NiCr alloy-layer, the 4th layer Ag layers of 314-, NiCr layers of 315- layer 5,316- layer 6 SiNx layer, 317- layer 7 SiOx layers, the 8th layer TiOx layers of 318-, the 9th layer SiOx layers of 319-.

In 2 complex function film layer structure of embodiment illustrated in fig. 3: 321- bottom SiNx layer, 322- second layer ZnO layer, 323- Ag layers of third layer, the 4th layer Cu layers of 324-, 325- layer 5 NiCr alloy-layer, ZnSnOx layers of 326- layer 6,327- layer 7 ZnO layer, the 8th layer Ag layers of 328-, the 9th layer AZO layers of 329-, the tenth layer of SiNx layer of 3210-, SiOx layers of 3211- eleventh floor, TiOx layers of 3212- Floor 12, the 13rd layer SiOx layers of 3213-.

In 3 complex function film layer structure of embodiment illustrated in fig. 4: 331- bottom SiNx layer, 332- second layer ZnO layer, 333- Ag layers of third layer, the 4th layer AZO layers of 334-, ZnSnOx layers of 335- layer 5,336- layer 6 ZnO layer, Ag layers of 337- layer 7, The 8th layer of NiCr alloy-layer of 338-, the 9th layer ZnSnOx layers of 339-, the tenth layer of ZnO layer of 3310-, Ag layers of 3311- eleventh floor, AZO layers of 3312- Floor 12, the 13rd layer of SiNx layer of 3313-, the 14th layer SiOx layers of 3314-, the 15th layer of 3315- The 16th layer of SiOx of TiOx, 3316-.

Specific embodiment

With reference to the accompanying drawing, the utility model is described in detail.

In order to make the purpose of the utility model, technical solutions and advantages more clearly understood, below in conjunction with attached drawing and implementation Example, the present invention will be further described in detail.It should be appreciated that specific embodiment described herein is only to explain this Utility model is not used to limit the utility model.

There is the structure of the Low emissivity energy conservation hollow glass product of ultraviolet light Low emissivity effect as shown in Figure 1: including first 2 two panels glass substrate of glass substrate 1 and the second glass substrate, and the first glass substrate 1 and the second glass substrate 2 complement one another, It combines to form hollow structure in the two sides of hollow structure frame 4, be set on the surface of the first glass substrate 1 or the second glass substrate 2 Set the Low emissivity complex function film layer 3 with ultraviolet isolating effect.

Preferably, ultraviolet isolating Low emissivity complex function film layer 3 is arranged on 1 outer surface of the first glass substrate, i.e., and the One glass is far from the surface of hollow structure.

Using the surface positioned at hollow structural glass substrate hollow structure side as inner surface, other two surface is appearance Face；It is indoor surface B positioned at the outer surface of interior of building, the outer surface being located outside is outdoor face A.Correspondingly, ultraviolet light hinders It is arranged on B surface every Low emissivity complex function film layer 3.

Furthermore it is also possible to be arranged ultraviolet isolating every Low emissivity complex function film layer 3 in two inner surface (the first glass The surface of substrate and the second glass substrate close to hollow structure side) in any one on.

In one specific embodiment of the utility model, the ultraviolet isolating Low emissivity complex function film layer 3, plating It overlays in the hollow structure on 1 surface of the first glass substrate of interior of building.It can be leaning on for the first glass substrate The surface of nearly interior side, is also possible to the first glass substrate close to the surface of the side of hollow structure.

With hollow glass structure described in Fig. 1 for a kind of low spoke with ultraviolet light Low emissivity effect described in the utility model The foundation structure of energy saving hollow glass product is penetrated, then specifically with the film layer of the ultraviolet isolating Low emissivity complex function film layer 3 Subject to structure, following 3 kinds of specific product embodiments are provided:

Embodiment 1

The present embodiment provides a kind of Low emissivity energy conservation hollow glass product with ultraviolet light Low emissivity effect, specifically to scheme 1 hollow structure.Use the white glass of our company's 6mm float glass process as glass substrate, wherein the white glass basis piece surface vacuum of a piece of float glass process Sputtering obtains the ultraviolet isolating Low emissivity complex function film layer 3, and film layer structure is as shown in Figure 2.

Wherein, the structure of exterior wall surface plating complex function film layer is using the first glass substrate 1 as substrate, from substrate table Face starts successively to process to obtain from inside to outside: bottom SiNx layer 311, second layer ZnO layer 312, third layer NiCr alloy-layer 313, 4th layer of Ag layer 314, layer 5 NiCr layer 315, layer 6 SiNx layer 316,317, the 8th layers TiOx layers of layer 7 SiOx layer 318 and the 9th layer of SiOx layer 319.

It processes to obtain above-mentioned composite film structure in the white glass substrate surface of 6mm float glass process using vacuum magnetic-control sputtering technique, In, bottom SiNx layer 311 with a thickness of 15nm, second layer ZnO layer 312 with a thickness of 18nm, third layer NiCr alloy-layer 313 With a thickness of 5nm, the 4th layer of Ag layer 314 with a thickness of 5-20nm, layer 5 NiCr layer 315 with a thickness of 10nm, layer 6 SiNx Layer 316 with a thickness of 30-70nm, layer 7 SiOx layer 317 with a thickness of 25-60nm, the thickness 20- of the 8th layer of TiOx layer 318 60nm and the 9th layer of SiOx layer 319 with a thickness of 40-110nm.

Through detecting, the ultraviolet reflectivity 30~85% of above-mentioned hollow glass product, ultraviolet ray transmissivity 10~50%, radiation Rate is 0.05~0.12, has good function of heat insulation.

Comparative example 1

The comparative example is prepared referring to embodiment 1, the difference from embodiment 1 is that: by ultraviolet isolating Low emissivity The thickness adjustment of each film layer in the film layer structure of complex function film layer 3 are as follows: 311 thickness 30nm of bottom SiNx layer, second layer ZnO layer 312 thickness 30nm, 313 thickness 7nm of third layer NiCr alloy-layer, the 4th layer of 314 thickness 5-20nm of Ag layer, layer 5 SiNx layer 317 thickness 80nm and the 8th layers of 315 thickness 80nm, 316 thickness 80nm of layer 6 SiOx layer, layer 7 TiOx layer SiOx layer 318 Thickness 20nm.The preparation selection of remaining hollow glass and technological parameter are consistent, and obtain hollow film-plated glass product.

Comparative example 2

The comparative example is prepared referring to embodiment 1, the difference from embodiment 1 is that: omit the low spoke of ultraviolet isolating The third layer NiCr alloy-layer 313 in complex function film layer 3 is penetrated, remaining film layer material and thickness remain unchanged, and obtain hollow plating Film glass product.

Embodiment 2

The present embodiment provides another the Low emissivity energy conservation hollow glass product with ultraviolet light Low emissivity effect, knot Structure is oppositely arranged in conjunction with hollow glass frame, constructs in obtaining as shown in Figure 1, using the white glass of two panels 6mm float glass process as substrate The product of hollow structure.Wherein, have ultraviolet isolating Low emissivity shown in Fig. 3 multiple in the glass substrate surface processing of exterior wall surface Close the film layer structure of functional film layer 3.

The structure for the complex function film layer 3 processed in the glass substrate of exterior wall surface is with the interior table of the first glass substrate 1 Face is substrate, since substrate from inside to outside successively are as follows: bottom SiNx layer 321, second layer ZnO layer 322, third layer Ag layer 323, 4th layer of Cu layer 324, layer 5 NiCr alloy-layer 325, layer 6 ZnSnOx layer 326, layer 7 ZnO layer 327, the 8th layer Ag layers 328,329, the tenth layers of SiNx layer 3210 of the 9th layer of AZO layer, eleventh floor SiOx layer 3211, Floor 12 TiOx layer 3212 and 13 layers of SiOx layer 3213.

It processes to obtain above-mentioned composite film structure in the white glass substrate surface of 6mm float glass process using vacuum magnetic-control sputtering technique, In, the bottom SiNx layer 321 with a thickness of 20nm, second layer ZnO layer 322 with a thickness of 15nm, third layer Ag layer 323 With a thickness of 9nm, the 4th layer of Cu layer 324 with a thickness of 6nm, layer 5 NiCr alloy-layer 325 with a thickness of 2nm, layer 6 ZnSnOx layer 326 with a thickness of 35nm, layer 7 ZnO layer 327 with a thickness of 15nm, the 8th layer of Ag layer 328 with a thickness of 12nm, the 9th layer of AZO layer 329 with a thickness of 10nm, the tenth layer of SiNx layer 3210 with a thickness of 45nm, SiOx layers of eleventh floor 3211 with a thickness of 35nm, Floor 12 TiOx layer 3212 with a thickness of 40nm, the 13rd layer of SiOx layer 3213 with a thickness of 60nm。

Through detecting, the ultraviolet reflectivity 45~85% of above-mentioned hollow glass product, ultraviolet ray transmissivity 5~20%, radiation Rate is 0.08~0.02, has good function of heat insulation.

Comparative example 3

The comparative example is arranged referring to embodiment 2, the difference from example 2 is that: ultraviolet isolating Low emissivity is compound In the film layer structure of functional film layer 3: the thickness of layer 5 NiCr alloy-layer 325 is adjusted to 6nm, layer 6 ZnSnOx layer 326 Thickness is adjusted to 90nm；The thickness of 9th layer of AZO layer 329 is adjusted to 30nm；The material and thickness of remaining film layer structure are constant, obtain To hollow film-plated glass product.

Embodiment 3

The present embodiment provides a kind of Low emissivity energy conservation hollow glass product with ultraviolet light Low emissivity effect, hollow glass Structure is as shown in Figure 1.The white glass of float glass process being oppositely arranged by two panels is processed in the white glass basis piece of two panels float glass process by frame 4 as substrate Form hollow structure.The white glass substrate surface of one piece of float glass process is machined with ultraviolet isolating Low emissivity complex function film layer 3, institute wherein It is as shown in Figure 4 to state complex function film layer structure.

Complex function film layer structure is using the inner surface of the first glass substrate 1 as substrate, from introversive since substrate surface What outer successively vacuum sputtering obtained: bottom SiNx layer 331, second layer ZnO layer 332,333, the 4th layers AZO layers of third layer Ag layer 334, layer 5 ZnSnOx layer 335, layer 6 ZnO layer 336,337, the 8th layers of NiCr alloy-layer 338 of layer 7 Ag layer, the 9th layer ZnSnOx layer 339, the tenth layers of 3312, the 13rd layers of ZnO layer 3310, eleventh floor Ag layer 3311, Floor 12 AZO layer SiNx layer 3313,3314, the 15th layers of TiOx3315, the 16th layer of SiOx3316 of the 14th layer of SiOx layer.

It processes to obtain above-mentioned composite film structure in the white glass substrate surface of 6mm float glass process using vacuum magnetic-control sputtering technique, In, the bottom SiNx layer 331 with a thickness of 10nm, second layer ZnO layer 332 with a thickness of 12nm, third layer Ag layer 333 With a thickness of 6nm, the 4th layer of AZO layer 334 with a thickness of 14nm, layer 5 ZnSnOx layer 335 with a thickness of 50nm, layer 6 ZnO Layer 336 with a thickness of 6nm, layer 7 Ag layer 337 with a thickness of 5nm, the 8th layer of NiCr alloy-layer 338 with a thickness of 1.5nm, 9th layer of ZnSnOx layer 339 with a thickness of 38nm, the tenth layer of ZnO layer 3310 with a thickness of 12nm, eleventh floor Ag layer 3311 With a thickness of 7nm, Floor 12 AZO layer 3312 with a thickness of 6nm, the 13rd layer of SiNx layer 3313 with a thickness of 50nm, the 14th Layer SiOx layer 3314 with a thickness of 35nm, the 15th layer of TiOx3315 with a thickness of 30nm, the thickness of the 16th layer of SiOx3316 For 55nm.

Through detecting, the ultraviolet reflectivity 40~85% of above-mentioned hollow glass product, ultraviolet ray transmissivity 5~25%, radiation Rate is 0.05~0.02, has good function of heat insulation.

Comparative example 4

The comparative example is arranged referring to embodiment 3, and the difference with embodiment 3 is: ultraviolet isolating Low emissivity is compound In the film layer structure of functional film layer 3: the 4th layer of 334 thickness of AZO layer is changed to 30nm；8th layer of 338 thickness of NiCr alloy-layer is changed to 10nm；3312 thickness of Floor 12 AZO layer is changed to 30nm；13rd layer of 3313 thickness of SiNx layer is changed to 20nm；14th layer SiOx layer 3314 is with a thickness of 100nm；16th layer of SiOx3316 is with a thickness of 120nm.Remaining technical characteristic remains unchanged, and obtains Empty coated glass product.

<test case 1>

The hollow film-plated glass product that will be prepared in embodiment 1-3 and comparative example 1-4 is divided in UV-3600 ultraviolet Data are measured on photometer, carry out major optical performance test, test result is as follows table according to JGJ/T 151-2018 standard It is shown.

The optical performance test result of 1 hollow film-plated glass product of table

Performance indicator	Tvis	Rout	UV trans/%	UV ref/%	Radiance
						Embodiment 1	0.64	0.07	15	73	0.09
Embodiment 2	0.48	0.25	6.5	81	0.05
						Embodiment 3	0.5	0.27	14	62	0.02
Comparative example 1	0.23	0.6	20	50	0.1
						Comparative example 2	0.29	0.57	25	51	0.1
Comparative example 3	0.35	0.34	21	29	0.05
						Comparative example 4	0.14	0.66	12	32	0.02

Tvis: visible light transmittance；Rout: the reflectivity of visible light glass surface.

UV trans: ultraviolet ray transmissivity %；UV ref: ultraviolet reflection rate %.

Pass through the optical performance test for hollow film-plated glass product, it may be determined that embodiment and comparative example preparation Hollow film-plated glass product reaches design object to visible light transmittance rate, and UV light reflectivity is higher, can be good at every Exhausted ultraviolet light enhances birds for the sensing capability of corresponding glass product, the contingency of bird strikes glass is avoided to occur.

<test case 2>

Hollow film-plated glass product prepared by embodiment 1-3, with existing common 6mm float glass and commercially available certain is domestic (sample structure 6/1.52/6, the white glass/PVB/ of float glass process are floating for the PVB film type ultraviolet protection laminated glass of PVB producer production Fa Baibo mm) it carries out carrying out the test of black light visible transmission performance according to national standard method.

The test result of corresponding glass product is shown as near ultraviolet ray transmission of visible light curve, specifically as shown in figures 5-9. Fig. 5 is common 6mm float glass black light visible transmission curve.Fig. 6 is the nearly purple of PVB type ultraviolet ray intercepting glass product Outer smooth visible transmission curve.Fig. 7 is the near ultraviolet visible light transmission curve of hollow glass product prepared by embodiment 1.Fig. 8 is real Apply the near ultraviolet visible light transmission curve of the hollow glass product of the preparation of example 2.Fig. 9 is hollow glass product prepared by embodiment 3 Near ultraviolet visible light transmission curve.

By test gained transmittance graph it is found that for simple glass product UVB wave band (275~320nm of wavelength) Ultraviolet light can obstruct completely substantially, but for UVA wave band (320~420nm of wavelength) with wavelength increase obstructing capacity The ultraviolet light of quick rapid decay, a large amount of UVA wave bands can pass through common 6mm float glass.Existing PVB type shown in fig. 6 is anti- Vitaglass product can be very good the ultraviolet light of barrier UVA wave band, but the infrared ray of wavelength 760nm or more is lacked Necessary obstructing capacity.The hollow film-plated glass product of Fig. 7-9 illustrated embodiment 1-3 preparation, for the ultraviolet light of UVA wave band With good barrier action, it is provided simultaneously with the barrier action of the wave band of infrared radiation thermal energy, for the infrared of 760nm or more Line has significant insulating effect, has good function of heat insulation.It is produced by the hollow glass prepared for embodiment 1-3 The comparison of product and Conventional glass, existing PVB resin ultraviolet ray intercepting glass product could be aware that the plated film UV resistance of the utility model The Low emissivity energy-saving glass of line effect has both antiultraviolet and thermal insulation function simultaneously, and it is expected to have reached utility model, can be with It realizes long-term quality stability and has both anti-infrared, antiultraviolet effect.

In conjunction with the reflection ratio in above-mentioned test case 1 for ultraviolet light, it can determine that the antiultraviolet of the utility model is made Low emissivity energy-saving glass product can satisfy heat-insulated, antiultraviolet, reflection ultraviolet light, improve glass product for birds Visuality avoids the effect of birds accidental impact exterior wall glass.

This implementation provides the preferred embodiment of more than one described only the utility model, not to limit this reality With novel, any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention etc. should all include It is within the protection scope of the utility model.

Claims (10)

1. a kind of preparing low-emissivity coated hollow glass, including two panels glass substrate, and the two panels glass substrate complements one another to be formed Hollow structure, wherein

There is the Low emissivity complex function film layer of ultraviolet isolating effect at least a piece of glass substrate surface setting.

2. preparing low-emissivity coated hollow glass according to claim 1, which is characterized in that be vacuum inside the hollow structure.

3. preparing low-emissivity coated hollow glass according to claim 1, which is characterized in that described with ultraviolet isolating effect Low emissivity complex function film layer is arranged on glass substrate outer surface, and the outer surface refers to the outer surface far from hollow structure.

4. preparing low-emissivity coated hollow glass according to claim 1, which is characterized in that the Low emissivity complex function film layer, It from inside to outside successively include bottom SiNx layer, second layer ZnO layer, third layer NiCr alloy-layer, the since glass substrate surface Four layers Ag layers, NiCr layers of layer 5, layer 6 SiNx layer, SiOx layers of layer 7, the 8th layer TiOx layers, the 9th layer SiOx layers.

5. preparing low-emissivity coated hollow glass according to claim 1, which is characterized in that the Low emissivity complex function film layer, It from inside to outside successively include bottom SiNx layer, second layer ZnO layer, Ag layers of third layer, the 4th layer of Cu since glass substrate surface Layer, layer 5 NiCr alloy-layer, ZnSnOx layers of layer 6, layer 7 ZnO layer, the 8th layer Ag layers, the 9th layer AZO layers, the tenth layer SiNx layer, SiOx layers of eleventh floor, TiOx layers and the 13rd layer SiOx layers of Floor 12.

6. preparing low-emissivity coated hollow glass according to claim 1, which is characterized in that the Low emissivity complex function film layer, It from inside to outside successively include bottom SiNx layer, second layer ZnO layer, Ag layers of third layer, the 4th layer since glass substrate surface AZO layers, ZnSnOx layers of layer 5, layer 6 ZnO layer, Ag layers of layer 7, the 8th layer of NiCr alloy-layer, the 9th layer ZnSnOx layers, Tenth layer of ZnO layer, Ag layers of eleventh floor, AZO layers, the 13rd layer SiNx layer of Floor 12, the 14th layer SiOx layers, the 15th layer TiOx layers, the 16th layer SiOx layers.

7. according to any preparing low-emissivity coated hollow glass of claim 4-6, which is characterized in that the thickness of film layer are as follows: be located at The SiNx of bottom with a thickness of 5-25nm, positioned at middle layer SiNx with a thickness of 30-70nm, ZnO layer with a thickness of 5-20nm, The thick bottom of NiCr alloy-layer is 0.1-5nm, and ZnSnOx layers of thickness range is 30-75nm, is arranged on SiNx layer surface SiOx layers of thickness range is 25-60nm, the thickness range of the SiOx layer in TiOx layer surface is arranged in as 40-110nm, Cu layers Thickness range be 0 ~ 15nm, TiOx layer of thickness range is 20 ~ 60nm, and Ag layers of thickness range is 5 ~ 20nm, AZO layers of thickness Degree range is 5-15nm.

8. preparing low-emissivity coated hollow glass according to claim 4, which is characterized in that the ultraviolet reflectivity of hollow glass product 30 ~ 85%, ultraviolet ray transmissivity 10 ~ 50%, radiance is 0.05 ~ 0.12, has good function of heat insulation.

9. preparing low-emissivity coated hollow glass according to claim 5, which is characterized in that the ultraviolet reflectivity of hollow glass product 45 ~ 85%, ultraviolet ray transmissivity 5 ~ 20%, radiance is 0.08 ~ 0.02, has good function of heat insulation.

10. preparing low-emissivity coated hollow glass according to claim 6, which is characterized in that the ultraviolet reflectance of hollow glass product Rate 40 ~ 85%, ultraviolet ray transmissivity 5 ~ 25%, radiance are 0.05 ~ 0.02, have good function of heat insulation.